In-Line
Defectivity Methodology for a GaAs Manufacturing Facility
Jan Campbell, Karen
Lenaburg, Niki Liggins
Motorola,
Semiconductor Product Sector
Compound
Semiconductor One, CS-1
Phone: 480.413.7427
Fax: 480.413.5748 Email: jancampbell@motorola.com
Abstract
Yield management based on
in-line defect inspections must be implemented in order to be successful in a
modern semiconductor manufacturing facility. This includes collecting large
amounts of data that must be analyzed and maintained. Most fabrication
facilities employ some form of defect inspection. Although often thought of as
“non value” added inspections, a sampling plan must be realistic, provide
meaningful data, and a mechanism for yield improvement. It is important to
implement advance methods in defectivity and yield correlation to identify and
address defects that result in yield excursions. This paper presents the implementation
of a methodology that has resulted in increased yields and the reduction of
yield excursions.