Etching InP with H2, BC13 and Ar

Edwin Sabin,
TRW, One Space Park, Redondo Beach, CA  90278

When hydrogen is added to a BC13 plasma the etch rate of InP is decreased substantially.  Mass spectrometer data indicates that the chlorine only etchant ions are the dominant etching species.  When hydrogen  is added to the plasma, the hydrogen etchant species that are formed absorbed on the InP surface faster then the chlorine only etchant species.  Therefore, the hydrogen etchant species preclude the chlorine only etchant species from being absorbed on the InP surface.  As more hydrogen is added to the gas phase, more chlorine only etchant species are precluded from being absorbed on the InP surface.  Since less chlorine only etchant species are available to etch the InP surface then the overall etch rate is reduced.

 

05a.pdf 

Return to TOC