Metal particle effects on thin film capacitors in high volume manufacturing

Muralidhar R. Rao, Sheila T. O'Neil, Shiban Tiku

Skyworks Solutions Inc., 2427 W. Hillcrest Drive, Newbury Park, CA 91320

muralidhar.rao@skyworksinc.com, 805 480 4556, sheila.oneil@skyworksinc.com, 805 480 4376 shiban.tiku@skyworksinc.com, 805 480 4302

 

Keywords:   Thin film capacitors, particles, microwave integrated circuits, power amplifiers, breakdown voltage

 

Abstract

The effect of metal particles on thin film dielectric capacitors is characterized. Electrical characteristics of statistically significant numbers of capacitors are measured. A figure of merit is derived from the cumulative distribution of capacitor burnout voltages. The figure of merit is correlated with the number of particles per wafer. The use of the figure of merit in establishing process consistency and reproducibility is demonstrated.

 

 

4.5.pdf              Return to TOC