Oxygen Plasma Photoresist Strip in High Valume HBT Production

Jiang Wang, Sam Mony and Nercy Ebrahimi

Skyworks Solution Inc., Newbury Park, California 91320, USA

805-480-4318, Jiang.wang@skyworksinc.com

 

 

Keywords: HBT, resist stgrip, oxygen plasma

 

Abstract

A dry resist strip process using oxygen plasma is reported to strip resist layers after He++ ion-implantation and dielectric SiN etch.  The new dry strip process implemented has the following advantages over a wet NMP strip: (1) dry strip tools have good process control with end point monitoring, (2) elimination of environmentally harmful chemicals, (3) tremendous cost savings, and (4) process time reduction.

 

12.5 pdf             Return to TOC