Optical Lithographic Performance and Resolution Using Strong Dark-Field Phase-Shifting of Discrete Patterns

John S. Petersen and David J. Gerold
Petersen Advanced Lithography, Inc

Today, non-optical lithographic techniques are used to image the smallest discrete gate patterns used to make advanced GaAs devices. These techniques are very powerful but have low throughput. With growing device demand, there is a need to make these small features with the more cost-effective optical lithography. This paper briefly discusses the physics of the imaging process for several optical imaging techniques that extend gate resolution and compares and contrasts expected performance of the techniques.