Oxygen Plasma Photoresist Strip in High Valume HBT Production

Jiang Wang, Sam Mony and Nercy Ebrahimi

Skyworks Solution Inc., Newbury Park, California 91320, USA

805-480-4318, Jiang.wang@skyworksinc.com



Keywords: HBT, resist stgrip, oxygen plasma



A dry resist strip process using oxygen plasma is reported to strip resist layers after He++ ion-implantation and dielectric SiN etch.  The new dry strip process implemented has the following advantages over a wet NMP strip: (1) dry strip tools have good process control with end point monitoring, (2) elimination of environmentally harmful chemicals, (3) tremendous cost savings, and (4) process time reduction.


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