-
Williams, Dennis
WIN Semiconductors Corp.-
A Ultra High Ruggedness Performance of InGaP/GaAs HBT
Chiou, WiN Semiconductors Corp.Tung-Yao Chou, WIN Semiconductors Corp.Cheng-Kuo Lin, WIN Semiconductors CorpDennis Williams, WIN Semiconductors Corp.
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A. Briere, Michael
ACOO Enterprises LLC-
The Status of GaN based Power Device Development at International Rectifier
Michael A. Briere, ACOO Enterprises LLC
-
-
Adams, J.
MicroLink Devices, Inc.-
Epitaxial Lift-Off of Large-Area GaAs Thin-Film Multi-Junction Solar Cells
C. Youtsey, MicroLink Devices, Inc.J. Adams, MicroLink Devices, Inc.R. Chan, MicroLink Devices, Inc.V. Elarde, MicroLink Devices, Inc.G. Hillier, MicroLink Devices, Inc.M. Osowski, MicroLink Devices, Inc.D. McCallum, MicroLink Devices, Inc.H. Miyamoto, MicroLink Devices, Inc.N. Pan, MicroLink Devices, Inc.C. Stender, MicroLink Devices, Inc.R. Tatavarti, MicroLink Devices, Inc.F. Tuminello, MicroLink Devices, Inc.A. Wibowo, MicroLink Devices, Inc.
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Aden, Steve
Azur Space Solar Power GmbH, Roy Blunt, IQE plc, Sylvi Claußnitzer, GAIT Consultant, Iwan Davies, IQE plc, Gerhard Hirschle, United Monolithic-
The CLP Regulation – Opportunity for Global Standardization of Substance Classifications or Threat to Innovation from Regulatory Overreach?
Hermann Schenk, Azur Space Solar Power GmbH, Roy Blunt, IQE plc, Sylvi Claußnitzer, GAIT Consultant, Iwan Davies, IQE plc, Gerhard Hirschle, United MonolithicFreiberger Compound Materials, Azur Space Solar Power GmbH, Roy Blunt, IQE plc, Sylvi Claußnitzer, GAIT Consultant, Iwan Davies, IQE plc, Gerhard Hirschle, United MonolithicSteve Aden, Azur Space Solar Power GmbH, Roy Blunt, IQE plc, Sylvi Claußnitzer, GAIT Consultant, Iwan Davies, IQE plc, Gerhard Hirschle, United MonolithicAvago Technologies, Azur Space Solar Power GmbH, Roy Blunt, IQE plc, Sylvi Claußnitzer, GAIT Consultant, Iwan Davies, IQE plc, Gerhard Hirschle, United MonolithicHani Badawi, Azur Space Solar Power GmbH, Roy Blunt, IQE plc, Sylvi Claußnitzer, GAIT Consultant, Iwan Davies, IQE plc, Gerhard Hirschle, United MonolithicAXT, Azur Space Solar Power GmbH, Roy Blunt, IQE plc, Sylvi Claußnitzer, GAIT Consultant, Iwan Davies, IQE plc, Gerhard Hirschle, United MonolithicThomas Bergunde, Azur Space Solar Power GmbH, Roy Blunt, IQE plc, Sylvi Claußnitzer, GAIT Consultant, Iwan Davies, IQE plc, Gerhard Hirschle, United MonolithicSemiconductors GmbH, Azur Space Solar Power GmbH, Roy Blunt, IQE plc, Sylvi Claußnitzer, GAIT Consultant, Iwan Davies, IQE plc, Gerhard Hirschle, United MonolithicRainer Krause, Azur Space Solar Power GmbH, Roy Blunt, IQE plc, Sylvi Claußnitzer, GAIT Consultant, Iwan Davies, IQE plc, Gerhard Hirschle, United MonolithicSoitec, Azur Space Solar Power GmbH, Roy Blunt, IQE plc, Sylvi Claußnitzer, GAIT Consultant, Iwan Davies, IQE plc, Gerhard Hirschle, United MonolithicBirgit Müller, Azur Space Solar Power GmbH, Roy Blunt, IQE plc, Sylvi Claußnitzer, GAIT Consultant, Iwan Davies, IQE plc, Gerhard Hirschle, United MonolithicThomas Pearsall, Azur Space Solar Power GmbH, Roy Blunt, IQE plc, Sylvi Claußnitzer, GAIT Consultant, Iwan Davies, IQE plc, Gerhard Hirschle, United MonolithicEPIC Association, Azur Space Solar Power GmbH, Roy Blunt, IQE plc, Sylvi Claußnitzer, GAIT Consultant, Iwan Davies, IQE plc, Gerhard Hirschle, United MonolithicJohn Sharp, Azur Space Solar Power GmbH, Roy Blunt, IQE plc, Sylvi Claußnitzer, GAIT Consultant, Iwan Davies, IQE plc, Gerhard Hirschle, United MonolithicTriQuint Semiconductor
-
-
Association, EPIC
Azur Space Solar Power GmbH, Roy Blunt, IQE plc, Sylvi Claußnitzer, GAIT Consultant, Iwan Davies, IQE plc, Gerhard Hirschle, United Monolithic-
The CLP Regulation – Opportunity for Global Standardization of Substance Classifications or Threat to Innovation from Regulatory Overreach?
Hermann Schenk, Azur Space Solar Power GmbH, Roy Blunt, IQE plc, Sylvi Claußnitzer, GAIT Consultant, Iwan Davies, IQE plc, Gerhard Hirschle, United MonolithicFreiberger Compound Materials, Azur Space Solar Power GmbH, Roy Blunt, IQE plc, Sylvi Claußnitzer, GAIT Consultant, Iwan Davies, IQE plc, Gerhard Hirschle, United MonolithicSteve Aden, Azur Space Solar Power GmbH, Roy Blunt, IQE plc, Sylvi Claußnitzer, GAIT Consultant, Iwan Davies, IQE plc, Gerhard Hirschle, United MonolithicAvago Technologies, Azur Space Solar Power GmbH, Roy Blunt, IQE plc, Sylvi Claußnitzer, GAIT Consultant, Iwan Davies, IQE plc, Gerhard Hirschle, United MonolithicHani Badawi, Azur Space Solar Power GmbH, Roy Blunt, IQE plc, Sylvi Claußnitzer, GAIT Consultant, Iwan Davies, IQE plc, Gerhard Hirschle, United MonolithicAXT, Azur Space Solar Power GmbH, Roy Blunt, IQE plc, Sylvi Claußnitzer, GAIT Consultant, Iwan Davies, IQE plc, Gerhard Hirschle, United MonolithicThomas Bergunde, Azur Space Solar Power GmbH, Roy Blunt, IQE plc, Sylvi Claußnitzer, GAIT Consultant, Iwan Davies, IQE plc, Gerhard Hirschle, United MonolithicSemiconductors GmbH, Azur Space Solar Power GmbH, Roy Blunt, IQE plc, Sylvi Claußnitzer, GAIT Consultant, Iwan Davies, IQE plc, Gerhard Hirschle, United MonolithicRainer Krause, Azur Space Solar Power GmbH, Roy Blunt, IQE plc, Sylvi Claußnitzer, GAIT Consultant, Iwan Davies, IQE plc, Gerhard Hirschle, United MonolithicSoitec, Azur Space Solar Power GmbH, Roy Blunt, IQE plc, Sylvi Claußnitzer, GAIT Consultant, Iwan Davies, IQE plc, Gerhard Hirschle, United MonolithicBirgit Müller, Azur Space Solar Power GmbH, Roy Blunt, IQE plc, Sylvi Claußnitzer, GAIT Consultant, Iwan Davies, IQE plc, Gerhard Hirschle, United MonolithicThomas Pearsall, Azur Space Solar Power GmbH, Roy Blunt, IQE plc, Sylvi Claußnitzer, GAIT Consultant, Iwan Davies, IQE plc, Gerhard Hirschle, United MonolithicEPIC Association, Azur Space Solar Power GmbH, Roy Blunt, IQE plc, Sylvi Claußnitzer, GAIT Consultant, Iwan Davies, IQE plc, Gerhard Hirschle, United MonolithicJohn Sharp, Azur Space Solar Power GmbH, Roy Blunt, IQE plc, Sylvi Claußnitzer, GAIT Consultant, Iwan Davies, IQE plc, Gerhard Hirschle, United MonolithicTriQuint Semiconductor
-
-
AXT,
Azur Space Solar Power GmbH, Roy Blunt, IQE plc, Sylvi Claußnitzer, GAIT Consultant, Iwan Davies, IQE plc, Gerhard Hirschle, United Monolithic-
The CLP Regulation – Opportunity for Global Standardization of Substance Classifications or Threat to Innovation from Regulatory Overreach?
Hermann Schenk, Azur Space Solar Power GmbH, Roy Blunt, IQE plc, Sylvi Claußnitzer, GAIT Consultant, Iwan Davies, IQE plc, Gerhard Hirschle, United MonolithicFreiberger Compound Materials, Azur Space Solar Power GmbH, Roy Blunt, IQE plc, Sylvi Claußnitzer, GAIT Consultant, Iwan Davies, IQE plc, Gerhard Hirschle, United MonolithicSteve Aden, Azur Space Solar Power GmbH, Roy Blunt, IQE plc, Sylvi Claußnitzer, GAIT Consultant, Iwan Davies, IQE plc, Gerhard Hirschle, United MonolithicAvago Technologies, Azur Space Solar Power GmbH, Roy Blunt, IQE plc, Sylvi Claußnitzer, GAIT Consultant, Iwan Davies, IQE plc, Gerhard Hirschle, United MonolithicHani Badawi, Azur Space Solar Power GmbH, Roy Blunt, IQE plc, Sylvi Claußnitzer, GAIT Consultant, Iwan Davies, IQE plc, Gerhard Hirschle, United MonolithicAXT, Azur Space Solar Power GmbH, Roy Blunt, IQE plc, Sylvi Claußnitzer, GAIT Consultant, Iwan Davies, IQE plc, Gerhard Hirschle, United MonolithicThomas Bergunde, Azur Space Solar Power GmbH, Roy Blunt, IQE plc, Sylvi Claußnitzer, GAIT Consultant, Iwan Davies, IQE plc, Gerhard Hirschle, United MonolithicSemiconductors GmbH, Azur Space Solar Power GmbH, Roy Blunt, IQE plc, Sylvi Claußnitzer, GAIT Consultant, Iwan Davies, IQE plc, Gerhard Hirschle, United MonolithicRainer Krause, Azur Space Solar Power GmbH, Roy Blunt, IQE plc, Sylvi Claußnitzer, GAIT Consultant, Iwan Davies, IQE plc, Gerhard Hirschle, United MonolithicSoitec, Azur Space Solar Power GmbH, Roy Blunt, IQE plc, Sylvi Claußnitzer, GAIT Consultant, Iwan Davies, IQE plc, Gerhard Hirschle, United MonolithicBirgit Müller, Azur Space Solar Power GmbH, Roy Blunt, IQE plc, Sylvi Claußnitzer, GAIT Consultant, Iwan Davies, IQE plc, Gerhard Hirschle, United MonolithicThomas Pearsall, Azur Space Solar Power GmbH, Roy Blunt, IQE plc, Sylvi Claußnitzer, GAIT Consultant, Iwan Davies, IQE plc, Gerhard Hirschle, United MonolithicEPIC Association, Azur Space Solar Power GmbH, Roy Blunt, IQE plc, Sylvi Claußnitzer, GAIT Consultant, Iwan Davies, IQE plc, Gerhard Hirschle, United MonolithicJohn Sharp, Azur Space Solar Power GmbH, Roy Blunt, IQE plc, Sylvi Claußnitzer, GAIT Consultant, Iwan Davies, IQE plc, Gerhard Hirschle, United MonolithicTriQuint Semiconductor
-
-
Badawi, Hani
Azur Space Solar Power GmbH, Roy Blunt, IQE plc, Sylvi Claußnitzer, GAIT Consultant, Iwan Davies, IQE plc, Gerhard Hirschle, United Monolithic-
The CLP Regulation – Opportunity for Global Standardization of Substance Classifications or Threat to Innovation from Regulatory Overreach?
Hermann Schenk, Azur Space Solar Power GmbH, Roy Blunt, IQE plc, Sylvi Claußnitzer, GAIT Consultant, Iwan Davies, IQE plc, Gerhard Hirschle, United MonolithicFreiberger Compound Materials, Azur Space Solar Power GmbH, Roy Blunt, IQE plc, Sylvi Claußnitzer, GAIT Consultant, Iwan Davies, IQE plc, Gerhard Hirschle, United MonolithicSteve Aden, Azur Space Solar Power GmbH, Roy Blunt, IQE plc, Sylvi Claußnitzer, GAIT Consultant, Iwan Davies, IQE plc, Gerhard Hirschle, United MonolithicAvago Technologies, Azur Space Solar Power GmbH, Roy Blunt, IQE plc, Sylvi Claußnitzer, GAIT Consultant, Iwan Davies, IQE plc, Gerhard Hirschle, United MonolithicHani Badawi, Azur Space Solar Power GmbH, Roy Blunt, IQE plc, Sylvi Claußnitzer, GAIT Consultant, Iwan Davies, IQE plc, Gerhard Hirschle, United MonolithicAXT, Azur Space Solar Power GmbH, Roy Blunt, IQE plc, Sylvi Claußnitzer, GAIT Consultant, Iwan Davies, IQE plc, Gerhard Hirschle, United MonolithicThomas Bergunde, Azur Space Solar Power GmbH, Roy Blunt, IQE plc, Sylvi Claußnitzer, GAIT Consultant, Iwan Davies, IQE plc, Gerhard Hirschle, United MonolithicSemiconductors GmbH, Azur Space Solar Power GmbH, Roy Blunt, IQE plc, Sylvi Claußnitzer, GAIT Consultant, Iwan Davies, IQE plc, Gerhard Hirschle, United MonolithicRainer Krause, Azur Space Solar Power GmbH, Roy Blunt, IQE plc, Sylvi Claußnitzer, GAIT Consultant, Iwan Davies, IQE plc, Gerhard Hirschle, United MonolithicSoitec, Azur Space Solar Power GmbH, Roy Blunt, IQE plc, Sylvi Claußnitzer, GAIT Consultant, Iwan Davies, IQE plc, Gerhard Hirschle, United MonolithicBirgit Müller, Azur Space Solar Power GmbH, Roy Blunt, IQE plc, Sylvi Claußnitzer, GAIT Consultant, Iwan Davies, IQE plc, Gerhard Hirschle, United MonolithicThomas Pearsall, Azur Space Solar Power GmbH, Roy Blunt, IQE plc, Sylvi Claußnitzer, GAIT Consultant, Iwan Davies, IQE plc, Gerhard Hirschle, United MonolithicEPIC Association, Azur Space Solar Power GmbH, Roy Blunt, IQE plc, Sylvi Claußnitzer, GAIT Consultant, Iwan Davies, IQE plc, Gerhard Hirschle, United MonolithicJohn Sharp, Azur Space Solar Power GmbH, Roy Blunt, IQE plc, Sylvi Claußnitzer, GAIT Consultant, Iwan Davies, IQE plc, Gerhard Hirschle, United MonolithicTriQuint Semiconductor
-
-
Banerji, Pallab
Indian Institute of Technology Kharagpur-
Analytical and Simulative Viewpoint of Graded Barrier AlGaN/GaN HEMT for High Input Impedance, Breakdown Voltage and Channel mobility
Palash Das, Indian Institute of TechnologyPallab Banerji, Indian Institute of Technology KharagpurDhrubes Biswas, Indian Institute of Technology
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Bass, R.
Naval Research Laboratory-
40 nm T-Gate Process Development using ZEP Reflow
D. J. MeyerB. P. DowneyR. Bass, Naval Research LaboratoryD. S. Katzer
-
-
Beene, Jerry
TriQuint Semiconductor,TX-
Set up and Characterization of an Optical Wide Stepper Process For DR15 Technology as a replacement for E-Beam Lithography
Amy Zhou, TriQuint Semiconductor, TXJerry Beene, TriQuint Semiconductor,TXMarcus King, TriQuint Semiconductor, TXMing-Yih Kao, Qorvo, Inc.Hua-Tang Chen, Qorvo, Inc.Chris Puckett, TriQuint Semiconductor
-
-
Benjamin, Mark
Lehighton Electronics Inc,-
Affect of Wafer Height and Bow on Eddy Current Sheet Resistance Measurements
Mark Benjamin, Lehighton Electronics Inc,
-
-
Bergunde, Thomas
Azur Space Solar Power GmbH, Roy Blunt, IQE plc, Sylvi Claußnitzer, GAIT Consultant, Iwan Davies, IQE plc, Gerhard Hirschle, United Monolithic-
The CLP Regulation – Opportunity for Global Standardization of Substance Classifications or Threat to Innovation from Regulatory Overreach?
Hermann Schenk, Azur Space Solar Power GmbH, Roy Blunt, IQE plc, Sylvi Claußnitzer, GAIT Consultant, Iwan Davies, IQE plc, Gerhard Hirschle, United MonolithicFreiberger Compound Materials, Azur Space Solar Power GmbH, Roy Blunt, IQE plc, Sylvi Claußnitzer, GAIT Consultant, Iwan Davies, IQE plc, Gerhard Hirschle, United MonolithicSteve Aden, Azur Space Solar Power GmbH, Roy Blunt, IQE plc, Sylvi Claußnitzer, GAIT Consultant, Iwan Davies, IQE plc, Gerhard Hirschle, United MonolithicAvago Technologies, Azur Space Solar Power GmbH, Roy Blunt, IQE plc, Sylvi Claußnitzer, GAIT Consultant, Iwan Davies, IQE plc, Gerhard Hirschle, United MonolithicHani Badawi, Azur Space Solar Power GmbH, Roy Blunt, IQE plc, Sylvi Claußnitzer, GAIT Consultant, Iwan Davies, IQE plc, Gerhard Hirschle, United MonolithicAXT, Azur Space Solar Power GmbH, Roy Blunt, IQE plc, Sylvi Claußnitzer, GAIT Consultant, Iwan Davies, IQE plc, Gerhard Hirschle, United MonolithicThomas Bergunde, Azur Space Solar Power GmbH, Roy Blunt, IQE plc, Sylvi Claußnitzer, GAIT Consultant, Iwan Davies, IQE plc, Gerhard Hirschle, United MonolithicSemiconductors GmbH, Azur Space Solar Power GmbH, Roy Blunt, IQE plc, Sylvi Claußnitzer, GAIT Consultant, Iwan Davies, IQE plc, Gerhard Hirschle, United MonolithicRainer Krause, Azur Space Solar Power GmbH, Roy Blunt, IQE plc, Sylvi Claußnitzer, GAIT Consultant, Iwan Davies, IQE plc, Gerhard Hirschle, United MonolithicSoitec, Azur Space Solar Power GmbH, Roy Blunt, IQE plc, Sylvi Claußnitzer, GAIT Consultant, Iwan Davies, IQE plc, Gerhard Hirschle, United MonolithicBirgit Müller, Azur Space Solar Power GmbH, Roy Blunt, IQE plc, Sylvi Claußnitzer, GAIT Consultant, Iwan Davies, IQE plc, Gerhard Hirschle, United MonolithicThomas Pearsall, Azur Space Solar Power GmbH, Roy Blunt, IQE plc, Sylvi Claußnitzer, GAIT Consultant, Iwan Davies, IQE plc, Gerhard Hirschle, United MonolithicEPIC Association, Azur Space Solar Power GmbH, Roy Blunt, IQE plc, Sylvi Claußnitzer, GAIT Consultant, Iwan Davies, IQE plc, Gerhard Hirschle, United MonolithicJohn Sharp, Azur Space Solar Power GmbH, Roy Blunt, IQE plc, Sylvi Claußnitzer, GAIT Consultant, Iwan Davies, IQE plc, Gerhard Hirschle, United MonolithicTriQuint Semiconductor
-
-
Bernardoni, M.
Department of Information Engineering, University of Parma-
Empirical and Physical Modeling of Self-Heating in Power AlGaN/GaN HEMTs
M. Bernardoni, Department of Information Engineering, University of ParmaN. Delmonte, Department of Information Engineering, University of ParmaR. Menozzi, University of Parma, Italy
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-
Bernstein, Steven
Raytheon Company-
GaN Technology for Radars
Colin S. Whelan, Raytheon CompanyNicholas J. Kolias, Raytheon CompanySteven Brierley, Raytheon CompanyChris MacDonald, Raytheon CompanySteven Bernstein, Raytheon Company
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Bhatia, Pavan
Brewer Science, TriQuint Semiconductor-
Rework Reduction and Optimization of 150MM Wafer Mount Process
Pavan Bhatia, Brewer Science, TriQuint Semiconductor
-
-
Biswas, Dhrubes
Indian Institute of Technology-
Analytical and Simulative Viewpoint of Graded Barrier AlGaN/GaN HEMT for High Input Impedance, Breakdown Voltage and Channel mobility
Palash Das, Indian Institute of TechnologyPallab Banerji, Indian Institute of Technology KharagpurDhrubes Biswas, Indian Institute of Technology
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-
Black, W.T.
RFMD-
Repair and Maintenance in High-Volume MBE Production
W.T. Black, RFMD
-
-
Brierley, Steven
Raytheon Company-
GaN Technology for Radars
Colin S. Whelan, Raytheon CompanyNicholas J. Kolias, Raytheon CompanySteven Brierley, Raytheon CompanyChris MacDonald, Raytheon CompanySteven Bernstein, Raytheon Company
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-
Campbell, Jan
-
ADHESION CHARACTERIZATION OF PHOTO-DEFINABLE EPOXIES ON HIGH ASPECT RATIO STRUCTURES FOR HIGH PERFORMANCE APPLICATIONS
Jan CampbellQizhi He
-
-
Chan, R.
MicroLink Devices, Inc.-
Epitaxial Lift-Off of Large-Area GaAs Thin-Film Multi-Junction Solar Cells
C. Youtsey, MicroLink Devices, Inc.J. Adams, MicroLink Devices, Inc.R. Chan, MicroLink Devices, Inc.V. Elarde, MicroLink Devices, Inc.G. Hillier, MicroLink Devices, Inc.M. Osowski, MicroLink Devices, Inc.D. McCallum, MicroLink Devices, Inc.H. Miyamoto, MicroLink Devices, Inc.N. Pan, MicroLink Devices, Inc.C. Stender, MicroLink Devices, Inc.R. Tatavarti, MicroLink Devices, Inc.F. Tuminello, MicroLink Devices, Inc.A. Wibowo, MicroLink Devices, Inc.
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-
Chang, Chih-Chuan
WIN Semiconductors Corp.-
150 nm T-shape Gate Process Capacity Improvement
Se-Jung Lee, WIN Semiconductors Corp.Chih-Chuan Chang, WIN Semiconductors Corp.
-
-
Chang, Kerry
WIN Semiconductors Corp.-
To Improve E-beam T-gate Yield by Pre-Cleaning Process
Hao-Yu Ting, WIN Semiconductors Corp.John Huang, WIN Semiconductors Corp.Hsi-Tsung Lin, WIN Semiconductors Corp.Eric Kuo, WIN Semiconductors Corp.Se-Jung Lee, WIN Semiconductors Corp.David Wu, WIN Semiconductors CorpWilliam Lai, WIN Semiconductors Corp.Kerry Chang, WIN Semiconductors Corp.Wen-Kai Wang, WIN Semiconductors Corp.
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-
Chen, Hua-Tang
Qorvo, Inc.-
Set up and Characterization of an Optical Wide Stepper Process For DR15 Technology as a replacement for E-Beam Lithography
Amy Zhou, TriQuint Semiconductor, TXJerry Beene, TriQuint Semiconductor,TXMarcus King, TriQuint Semiconductor, TXMing-Yih Kao, Qorvo, Inc.Hua-Tang Chen, Qorvo, Inc.Chris Puckett, TriQuint Semiconductor
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Chen, Minkar
Global Communications Seminconductor, LLC-
Methods for Removing TiOx Residue from Au Bond Pad
Lena Luu, Global Communications Semiconductor, LLCMinkar Chen, Global Communications Seminconductor, LLCFrank Monzon, Global Communications Semiconductors, Inc.
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-
Chen, Ping-Wei
WIN Semiconductors Corp.-
Yield Improvement for Thin 50 um GaAs Product Line
Rui-Ching Wei, WIN Semiconductors Corp.Huang-Wen Wang, WIN Semiconductors Corp.Chen-Che Chin, WIN Semiconductors Corp.Summer Chiang, WIN Semiconductors Corp.Jimmy Her, WIN Semiconductors Corp.Ping-Wei Chen, WIN Semiconductors Corp.Kevin Huang, WIN Semiconductors Corp.
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Chen, Young-Shying
Electronics and OptoElectronics Research Laboratories (EOL), ITR-
Novel of Normally-off GaN HEMT Device Structure by Using Nano-rods Technology
Chwan-Ying Lee, Electronics and OptoElectronics Research Laboratories (EOL), ITRYoung-Shying Chen, Electronics and OptoElectronics Research Laboratories (EOL), ITRLurng-Shehng Lee, Electronics and OptoElectronics Research Laboratories (EOL), ITRChien-Chung Hung, Electronics and OptoElectronics Research Laboratories (EOL), ITRCheng-Tyng Yen, Electronics and OptoElectronics Research Laboratories (EOL), ITRSuh-Fang Lin, Electronics and OptoElectronics Research Laboratories (EOL), ITRRong Xuan, Technology Development Division, Episil-Precision Inc, TaiwanWei-Hung Kuo, Industrial Technology Research InstituteTzu-Kun Ku, Electronics and OptoElectronics Research Laboratories (EOL), ITR
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Chen a, Young-Shying
Cheng-Tyng Yen (a, Patrick Chuang (b,Young-Shying Chen (a, Chien-Chung Hung (a, Chwan-Ying Lee (a, Lurng-Shehng Lee (a, Tzu-Ming Yang (a, Kuan-Wei Chu (a, Ming-Jinn Tsai (a, Gary Chen (b, Tony Huang (b-
Characteristics of 4H-SiC Dual-Metal and MOS Trench Schottky Rectifiers
Cheng-Tyng Yen a, Cheng-Tyng Yen (a, Patrick Chuang (b,Young-Shying Chen (a, Chien-Chung Hung (a, Chwan-Ying Lee (a, Lurng-Shehng Lee (a, Tzu-Ming Yang (a, Kuan-Wei Chu (a, Ming-Jinn Tsai (a, Gary Chen (b, Tony Huang (bPatrick Chuang b, Cheng-Tyng Yen (a, Patrick Chuang (b,Young-Shying Chen (a, Chien-Chung Hung (a, Chwan-Ying Lee (a, Lurng-Shehng Lee (a, Tzu-Ming Yang (a, Kuan-Wei Chu (a, Ming-Jinn Tsai (a, Gary Chen (b, Tony Huang (bYoung-Shying Chen a, Cheng-Tyng Yen (a, Patrick Chuang (b,Young-Shying Chen (a, Chien-Chung Hung (a, Chwan-Ying Lee (a, Lurng-Shehng Lee (a, Tzu-Ming Yang (a, Kuan-Wei Chu (a, Ming-Jinn Tsai (a, Gary Chen (b, Tony Huang (bChien-Chung Hung a, Cheng-Tyng Yen (a, Patrick Chuang (b,Young-Shying Chen (a, Chien-Chung Hung (a, Chwan-Ying Lee (a, Lurng-Shehng Lee (a, Tzu-Ming Yang (a, Kuan-Wei Chu (a, Ming-Jinn Tsai (a, Gary Chen (b, Tony Huang (bChwan-Ying Lee a, Cheng-Tyng Yen (a, Patrick Chuang (b,Young-Shying Chen (a, Chien-Chung Hung (a, Chwan-Ying Lee (a, Lurng-Shehng Lee (a, Tzu-Ming Yang (a, Kuan-Wei Chu (a, Ming-Jinn Tsai (a, Gary Chen (b, Tony Huang (bLurng-Shehng Lee a, Cheng-Tyng Yen (a, Patrick Chuang (b,Young-Shying Chen (a, Chien-Chung Hung (a, Chwan-Ying Lee (a, Lurng-Shehng Lee (a, Tzu-Ming Yang (a, Kuan-Wei Chu (a, Ming-Jinn Tsai (a, Gary Chen (b, Tony Huang (bTzu-Ming Yang a, Cheng-Tyng Yen (a, Patrick Chuang (b,Young-Shying Chen (a, Chien-Chung Hung (a, Chwan-Ying Lee (a, Lurng-Shehng Lee (a, Tzu-Ming Yang (a, Kuan-Wei Chu (a, Ming-Jinn Tsai (a, Gary Chen (b, Tony Huang (bKuan-Wei Chu a, Cheng-Tyng Yen (a, Patrick Chuang (b,Young-Shying Chen (a, Chien-Chung Hung (a, Chwan-Ying Lee (a, Lurng-Shehng Lee (a, Tzu-Ming Yang (a, Kuan-Wei Chu (a, Ming-Jinn Tsai (a, Gary Chen (b, Tony Huang (bMing-Jinn Tsai a, Cheng-Tyng Yen (a, Patrick Chuang (b,Young-Shying Chen (a, Chien-Chung Hung (a, Chwan-Ying Lee (a, Lurng-Shehng Lee (a, Tzu-Ming Yang (a, Kuan-Wei Chu (a, Ming-Jinn Tsai (a, Gary Chen (b, Tony Huang (bGary Chen b, Cheng-Tyng Yen (a, Patrick Chuang (b,Young-Shying Chen (a, Chien-Chung Hung (a, Chwan-Ying Lee (a, Lurng-Shehng Lee (a, Tzu-Ming Yang (a, Kuan-Wei Chu (a, Ming-Jinn Tsai (a, Gary Chen (b, Tony Huang (bTony Huang b, Cheng-Tyng Yen (a, Patrick Chuang (b,Young-Shying Chen (a, Chien-Chung Hung (a, Chwan-Ying Lee (a, Lurng-Shehng Lee (a, Tzu-Ming Yang (a, Kuan-Wei Chu (a, Ming-Jinn Tsai (a, Gary Chen (b, Tony Huang (b
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Chen b, Gary
Cheng-Tyng Yen (a, Patrick Chuang (b,Young-Shying Chen (a, Chien-Chung Hung (a, Chwan-Ying Lee (a, Lurng-Shehng Lee (a, Tzu-Ming Yang (a, Kuan-Wei Chu (a, Ming-Jinn Tsai (a, Gary Chen (b, Tony Huang (b-
Characteristics of 4H-SiC Dual-Metal and MOS Trench Schottky Rectifiers
Cheng-Tyng Yen a, Cheng-Tyng Yen (a, Patrick Chuang (b,Young-Shying Chen (a, Chien-Chung Hung (a, Chwan-Ying Lee (a, Lurng-Shehng Lee (a, Tzu-Ming Yang (a, Kuan-Wei Chu (a, Ming-Jinn Tsai (a, Gary Chen (b, Tony Huang (bPatrick Chuang b, Cheng-Tyng Yen (a, Patrick Chuang (b,Young-Shying Chen (a, Chien-Chung Hung (a, Chwan-Ying Lee (a, Lurng-Shehng Lee (a, Tzu-Ming Yang (a, Kuan-Wei Chu (a, Ming-Jinn Tsai (a, Gary Chen (b, Tony Huang (bYoung-Shying Chen a, Cheng-Tyng Yen (a, Patrick Chuang (b,Young-Shying Chen (a, Chien-Chung Hung (a, Chwan-Ying Lee (a, Lurng-Shehng Lee (a, Tzu-Ming Yang (a, Kuan-Wei Chu (a, Ming-Jinn Tsai (a, Gary Chen (b, Tony Huang (bChien-Chung Hung a, Cheng-Tyng Yen (a, Patrick Chuang (b,Young-Shying Chen (a, Chien-Chung Hung (a, Chwan-Ying Lee (a, Lurng-Shehng Lee (a, Tzu-Ming Yang (a, Kuan-Wei Chu (a, Ming-Jinn Tsai (a, Gary Chen (b, Tony Huang (bChwan-Ying Lee a, Cheng-Tyng Yen (a, Patrick Chuang (b,Young-Shying Chen (a, Chien-Chung Hung (a, Chwan-Ying Lee (a, Lurng-Shehng Lee (a, Tzu-Ming Yang (a, Kuan-Wei Chu (a, Ming-Jinn Tsai (a, Gary Chen (b, Tony Huang (bLurng-Shehng Lee a, Cheng-Tyng Yen (a, Patrick Chuang (b,Young-Shying Chen (a, Chien-Chung Hung (a, Chwan-Ying Lee (a, Lurng-Shehng Lee (a, Tzu-Ming Yang (a, Kuan-Wei Chu (a, Ming-Jinn Tsai (a, Gary Chen (b, Tony Huang (bTzu-Ming Yang a, Cheng-Tyng Yen (a, Patrick Chuang (b,Young-Shying Chen (a, Chien-Chung Hung (a, Chwan-Ying Lee (a, Lurng-Shehng Lee (a, Tzu-Ming Yang (a, Kuan-Wei Chu (a, Ming-Jinn Tsai (a, Gary Chen (b, Tony Huang (bKuan-Wei Chu a, Cheng-Tyng Yen (a, Patrick Chuang (b,Young-Shying Chen (a, Chien-Chung Hung (a, Chwan-Ying Lee (a, Lurng-Shehng Lee (a, Tzu-Ming Yang (a, Kuan-Wei Chu (a, Ming-Jinn Tsai (a, Gary Chen (b, Tony Huang (bMing-Jinn Tsai a, Cheng-Tyng Yen (a, Patrick Chuang (b,Young-Shying Chen (a, Chien-Chung Hung (a, Chwan-Ying Lee (a, Lurng-Shehng Lee (a, Tzu-Ming Yang (a, Kuan-Wei Chu (a, Ming-Jinn Tsai (a, Gary Chen (b, Tony Huang (bGary Chen b, Cheng-Tyng Yen (a, Patrick Chuang (b,Young-Shying Chen (a, Chien-Chung Hung (a, Chwan-Ying Lee (a, Lurng-Shehng Lee (a, Tzu-Ming Yang (a, Kuan-Wei Chu (a, Ming-Jinn Tsai (a, Gary Chen (b, Tony Huang (bTony Huang b, Cheng-Tyng Yen (a, Patrick Chuang (b,Young-Shying Chen (a, Chien-Chung Hung (a, Chwan-Ying Lee (a, Lurng-Shehng Lee (a, Tzu-Ming Yang (a, Kuan-Wei Chu (a, Ming-Jinn Tsai (a, Gary Chen (b, Tony Huang (b
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Cheng, Kezia
Skyworks Solutions Inc.-
Improving Front Side Process Uniformity by Back-Side Metallization
Kezia Cheng, Skyworks Solutions Inc.
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Chiang, Summer
WIN Semiconductors Corp.-
Yield Improvement for Thin 50 um GaAs Product Line
Rui-Ching Wei, WIN Semiconductors Corp.Huang-Wen Wang, WIN Semiconductors Corp.Chen-Che Chin, WIN Semiconductors Corp.Summer Chiang, WIN Semiconductors Corp.Jimmy Her, WIN Semiconductors Corp.Ping-Wei Chen, WIN Semiconductors Corp.Kevin Huang, WIN Semiconductors Corp.
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Chin, Chen-Che
WIN Semiconductors Corp.-
Yield Improvement for Thin 50 um GaAs Product Line
Rui-Ching Wei, WIN Semiconductors Corp.Huang-Wen Wang, WIN Semiconductors Corp.Chen-Che Chin, WIN Semiconductors Corp.Summer Chiang, WIN Semiconductors Corp.Jimmy Her, WIN Semiconductors Corp.Ping-Wei Chen, WIN Semiconductors Corp.Kevin Huang, WIN Semiconductors Corp.
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Chiou,
WiN Semiconductors Corp.-
A Ultra High Ruggedness Performance of InGaP/GaAs HBT
Chiou, WiN Semiconductors Corp.Tung-Yao Chou, WIN Semiconductors Corp.Cheng-Kuo Lin, WIN Semiconductors CorpDennis Williams, WIN Semiconductors Corp.
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Chou, Tung-Yao
WIN Semiconductors Corp.-
A Ultra High Ruggedness Performance of InGaP/GaAs HBT
Chiou, WiN Semiconductors Corp.Tung-Yao Chou, WIN Semiconductors Corp.Cheng-Kuo Lin, WIN Semiconductors CorpDennis Williams, WIN Semiconductors Corp.
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Chu a, Kuan-Wei
Cheng-Tyng Yen (a, Patrick Chuang (b,Young-Shying Chen (a, Chien-Chung Hung (a, Chwan-Ying Lee (a, Lurng-Shehng Lee (a, Tzu-Ming Yang (a, Kuan-Wei Chu (a, Ming-Jinn Tsai (a, Gary Chen (b, Tony Huang (b-
Characteristics of 4H-SiC Dual-Metal and MOS Trench Schottky Rectifiers
Cheng-Tyng Yen a, Cheng-Tyng Yen (a, Patrick Chuang (b,Young-Shying Chen (a, Chien-Chung Hung (a, Chwan-Ying Lee (a, Lurng-Shehng Lee (a, Tzu-Ming Yang (a, Kuan-Wei Chu (a, Ming-Jinn Tsai (a, Gary Chen (b, Tony Huang (bPatrick Chuang b, Cheng-Tyng Yen (a, Patrick Chuang (b,Young-Shying Chen (a, Chien-Chung Hung (a, Chwan-Ying Lee (a, Lurng-Shehng Lee (a, Tzu-Ming Yang (a, Kuan-Wei Chu (a, Ming-Jinn Tsai (a, Gary Chen (b, Tony Huang (bYoung-Shying Chen a, Cheng-Tyng Yen (a, Patrick Chuang (b,Young-Shying Chen (a, Chien-Chung Hung (a, Chwan-Ying Lee (a, Lurng-Shehng Lee (a, Tzu-Ming Yang (a, Kuan-Wei Chu (a, Ming-Jinn Tsai (a, Gary Chen (b, Tony Huang (bChien-Chung Hung a, Cheng-Tyng Yen (a, Patrick Chuang (b,Young-Shying Chen (a, Chien-Chung Hung (a, Chwan-Ying Lee (a, Lurng-Shehng Lee (a, Tzu-Ming Yang (a, Kuan-Wei Chu (a, Ming-Jinn Tsai (a, Gary Chen (b, Tony Huang (bChwan-Ying Lee a, Cheng-Tyng Yen (a, Patrick Chuang (b,Young-Shying Chen (a, Chien-Chung Hung (a, Chwan-Ying Lee (a, Lurng-Shehng Lee (a, Tzu-Ming Yang (a, Kuan-Wei Chu (a, Ming-Jinn Tsai (a, Gary Chen (b, Tony Huang (bLurng-Shehng Lee a, Cheng-Tyng Yen (a, Patrick Chuang (b,Young-Shying Chen (a, Chien-Chung Hung (a, Chwan-Ying Lee (a, Lurng-Shehng Lee (a, Tzu-Ming Yang (a, Kuan-Wei Chu (a, Ming-Jinn Tsai (a, Gary Chen (b, Tony Huang (bTzu-Ming Yang a, Cheng-Tyng Yen (a, Patrick Chuang (b,Young-Shying Chen (a, Chien-Chung Hung (a, Chwan-Ying Lee (a, Lurng-Shehng Lee (a, Tzu-Ming Yang (a, Kuan-Wei Chu (a, Ming-Jinn Tsai (a, Gary Chen (b, Tony Huang (bKuan-Wei Chu a, Cheng-Tyng Yen (a, Patrick Chuang (b,Young-Shying Chen (a, Chien-Chung Hung (a, Chwan-Ying Lee (a, Lurng-Shehng Lee (a, Tzu-Ming Yang (a, Kuan-Wei Chu (a, Ming-Jinn Tsai (a, Gary Chen (b, Tony Huang (bMing-Jinn Tsai a, Cheng-Tyng Yen (a, Patrick Chuang (b,Young-Shying Chen (a, Chien-Chung Hung (a, Chwan-Ying Lee (a, Lurng-Shehng Lee (a, Tzu-Ming Yang (a, Kuan-Wei Chu (a, Ming-Jinn Tsai (a, Gary Chen (b, Tony Huang (bGary Chen b, Cheng-Tyng Yen (a, Patrick Chuang (b,Young-Shying Chen (a, Chien-Chung Hung (a, Chwan-Ying Lee (a, Lurng-Shehng Lee (a, Tzu-Ming Yang (a, Kuan-Wei Chu (a, Ming-Jinn Tsai (a, Gary Chen (b, Tony Huang (bTony Huang b, Cheng-Tyng Yen (a, Patrick Chuang (b,Young-Shying Chen (a, Chien-Chung Hung (a, Chwan-Ying Lee (a, Lurng-Shehng Lee (a, Tzu-Ming Yang (a, Kuan-Wei Chu (a, Ming-Jinn Tsai (a, Gary Chen (b, Tony Huang (b
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Chua, Fu-Chuan
a) Chang Gung University b) Center National Cheng Kung University c) Chung Shan Institute of Science and Technology-
Improved Gate leakage and Microwave Performance by Inserting A Thin Erbium oxide layer on AlGaN/GaN/Silicon HEMT Structure
Fu-Chuan Chua, a) Chang Gung University b) Center National Cheng Kung University c) Chung Shan Institute of Science and TechnologyYing-Jie Tsaia, a) Chang Gung University b) Center National Cheng Kung University c) Chung Shan Institute of Science and TechnologySheng-Yu Liaoa, a) Chang Gung University b) Center National Cheng Kung University c) Chung Shan Institute of Science and TechnologyChou-Shuang Huanga, a) Chang Gung University b) Center National Cheng Kung University c) Chung Shan Institute of Science and TechnologyRay-Ming Lina, a) Chang Gung University b) Center National Cheng Kung University c) Chung Shan Institute of Science and TechnologySheng-Fu Yub, a) Chang Gung University b) Center National Cheng Kung University c) Chung Shan Institute of Science and TechnologyShuh-Sen Renc, a) Chang Gung University b) Center National Cheng Kung University c) Chung Shan Institute of Science and Technology
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Chuang b, Patrick
Cheng-Tyng Yen (a, Patrick Chuang (b,Young-Shying Chen (a, Chien-Chung Hung (a, Chwan-Ying Lee (a, Lurng-Shehng Lee (a, Tzu-Ming Yang (a, Kuan-Wei Chu (a, Ming-Jinn Tsai (a, Gary Chen (b, Tony Huang (b-
Characteristics of 4H-SiC Dual-Metal and MOS Trench Schottky Rectifiers
Cheng-Tyng Yen a, Cheng-Tyng Yen (a, Patrick Chuang (b,Young-Shying Chen (a, Chien-Chung Hung (a, Chwan-Ying Lee (a, Lurng-Shehng Lee (a, Tzu-Ming Yang (a, Kuan-Wei Chu (a, Ming-Jinn Tsai (a, Gary Chen (b, Tony Huang (bPatrick Chuang b, Cheng-Tyng Yen (a, Patrick Chuang (b,Young-Shying Chen (a, Chien-Chung Hung (a, Chwan-Ying Lee (a, Lurng-Shehng Lee (a, Tzu-Ming Yang (a, Kuan-Wei Chu (a, Ming-Jinn Tsai (a, Gary Chen (b, Tony Huang (bYoung-Shying Chen a, Cheng-Tyng Yen (a, Patrick Chuang (b,Young-Shying Chen (a, Chien-Chung Hung (a, Chwan-Ying Lee (a, Lurng-Shehng Lee (a, Tzu-Ming Yang (a, Kuan-Wei Chu (a, Ming-Jinn Tsai (a, Gary Chen (b, Tony Huang (bChien-Chung Hung a, Cheng-Tyng Yen (a, Patrick Chuang (b,Young-Shying Chen (a, Chien-Chung Hung (a, Chwan-Ying Lee (a, Lurng-Shehng Lee (a, Tzu-Ming Yang (a, Kuan-Wei Chu (a, Ming-Jinn Tsai (a, Gary Chen (b, Tony Huang (bChwan-Ying Lee a, Cheng-Tyng Yen (a, Patrick Chuang (b,Young-Shying Chen (a, Chien-Chung Hung (a, Chwan-Ying Lee (a, Lurng-Shehng Lee (a, Tzu-Ming Yang (a, Kuan-Wei Chu (a, Ming-Jinn Tsai (a, Gary Chen (b, Tony Huang (bLurng-Shehng Lee a, Cheng-Tyng Yen (a, Patrick Chuang (b,Young-Shying Chen (a, Chien-Chung Hung (a, Chwan-Ying Lee (a, Lurng-Shehng Lee (a, Tzu-Ming Yang (a, Kuan-Wei Chu (a, Ming-Jinn Tsai (a, Gary Chen (b, Tony Huang (bTzu-Ming Yang a, Cheng-Tyng Yen (a, Patrick Chuang (b,Young-Shying Chen (a, Chien-Chung Hung (a, Chwan-Ying Lee (a, Lurng-Shehng Lee (a, Tzu-Ming Yang (a, Kuan-Wei Chu (a, Ming-Jinn Tsai (a, Gary Chen (b, Tony Huang (bKuan-Wei Chu a, Cheng-Tyng Yen (a, Patrick Chuang (b,Young-Shying Chen (a, Chien-Chung Hung (a, Chwan-Ying Lee (a, Lurng-Shehng Lee (a, Tzu-Ming Yang (a, Kuan-Wei Chu (a, Ming-Jinn Tsai (a, Gary Chen (b, Tony Huang (bMing-Jinn Tsai a, Cheng-Tyng Yen (a, Patrick Chuang (b,Young-Shying Chen (a, Chien-Chung Hung (a, Chwan-Ying Lee (a, Lurng-Shehng Lee (a, Tzu-Ming Yang (a, Kuan-Wei Chu (a, Ming-Jinn Tsai (a, Gary Chen (b, Tony Huang (bGary Chen b, Cheng-Tyng Yen (a, Patrick Chuang (b,Young-Shying Chen (a, Chien-Chung Hung (a, Chwan-Ying Lee (a, Lurng-Shehng Lee (a, Tzu-Ming Yang (a, Kuan-Wei Chu (a, Ming-Jinn Tsai (a, Gary Chen (b, Tony Huang (bTony Huang b, Cheng-Tyng Yen (a, Patrick Chuang (b,Young-Shying Chen (a, Chien-Chung Hung (a, Chwan-Ying Lee (a, Lurng-Shehng Lee (a, Tzu-Ming Yang (a, Kuan-Wei Chu (a, Ming-Jinn Tsai (a, Gary Chen (b, Tony Huang (b
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Compound Materials, Freiberger
Azur Space Solar Power GmbH, Roy Blunt, IQE plc, Sylvi Claußnitzer, GAIT Consultant, Iwan Davies, IQE plc, Gerhard Hirschle, United Monolithic-
The CLP Regulation – Opportunity for Global Standardization of Substance Classifications or Threat to Innovation from Regulatory Overreach?
Hermann Schenk, Azur Space Solar Power GmbH, Roy Blunt, IQE plc, Sylvi Claußnitzer, GAIT Consultant, Iwan Davies, IQE plc, Gerhard Hirschle, United MonolithicFreiberger Compound Materials, Azur Space Solar Power GmbH, Roy Blunt, IQE plc, Sylvi Claußnitzer, GAIT Consultant, Iwan Davies, IQE plc, Gerhard Hirschle, United MonolithicSteve Aden, Azur Space Solar Power GmbH, Roy Blunt, IQE plc, Sylvi Claußnitzer, GAIT Consultant, Iwan Davies, IQE plc, Gerhard Hirschle, United MonolithicAvago Technologies, Azur Space Solar Power GmbH, Roy Blunt, IQE plc, Sylvi Claußnitzer, GAIT Consultant, Iwan Davies, IQE plc, Gerhard Hirschle, United MonolithicHani Badawi, Azur Space Solar Power GmbH, Roy Blunt, IQE plc, Sylvi Claußnitzer, GAIT Consultant, Iwan Davies, IQE plc, Gerhard Hirschle, United MonolithicAXT, Azur Space Solar Power GmbH, Roy Blunt, IQE plc, Sylvi Claußnitzer, GAIT Consultant, Iwan Davies, IQE plc, Gerhard Hirschle, United MonolithicThomas Bergunde, Azur Space Solar Power GmbH, Roy Blunt, IQE plc, Sylvi Claußnitzer, GAIT Consultant, Iwan Davies, IQE plc, Gerhard Hirschle, United MonolithicSemiconductors GmbH, Azur Space Solar Power GmbH, Roy Blunt, IQE plc, Sylvi Claußnitzer, GAIT Consultant, Iwan Davies, IQE plc, Gerhard Hirschle, United MonolithicRainer Krause, Azur Space Solar Power GmbH, Roy Blunt, IQE plc, Sylvi Claußnitzer, GAIT Consultant, Iwan Davies, IQE plc, Gerhard Hirschle, United MonolithicSoitec, Azur Space Solar Power GmbH, Roy Blunt, IQE plc, Sylvi Claußnitzer, GAIT Consultant, Iwan Davies, IQE plc, Gerhard Hirschle, United MonolithicBirgit Müller, Azur Space Solar Power GmbH, Roy Blunt, IQE plc, Sylvi Claußnitzer, GAIT Consultant, Iwan Davies, IQE plc, Gerhard Hirschle, United MonolithicThomas Pearsall, Azur Space Solar Power GmbH, Roy Blunt, IQE plc, Sylvi Claußnitzer, GAIT Consultant, Iwan Davies, IQE plc, Gerhard Hirschle, United MonolithicEPIC Association, Azur Space Solar Power GmbH, Roy Blunt, IQE plc, Sylvi Claußnitzer, GAIT Consultant, Iwan Davies, IQE plc, Gerhard Hirschle, United MonolithicJohn Sharp, Azur Space Solar Power GmbH, Roy Blunt, IQE plc, Sylvi Claußnitzer, GAIT Consultant, Iwan Davies, IQE plc, Gerhard Hirschle, United MonolithicTriQuint Semiconductor
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Cox, Keith
Dynaloy, LLC Samuel Mony, Jiang Wang, Tom Grayson Skyworks Solutions, Inc., Thorsten Matthias, Thomas Glinsner, Martin Schmidbauer EV Group-
A New Single Wafer Cleaning Technology for Compound Semiconductor Manufacturing
Richard Peters, Dynaloy, LLC Samuel Mony, Jiang Wang, Tom Grayson Skyworks Solutions, Inc., Thorsten Matthias, Thomas Glinsner, Martin Schmidbauer EV GroupSpencer Hochstetler, Dynaloy, LLC Samuel Mony, Jiang Wang, Tom Grayson Skyworks Solutions, Inc., Thorsten Matthias, Thomas Glinsner, Martin Schmidbauer EV GroupKeith Cox, Dynaloy, LLC Samuel Mony, Jiang Wang, Tom Grayson Skyworks Solutions, Inc., Thorsten Matthias, Thomas Glinsner, Martin Schmidbauer EV GroupPalmer Holbrook, Dynaloy, LLC Samuel Mony, Jiang Wang, Tom Grayson Skyworks Solutions, Inc., Thorsten Matthias, Thomas Glinsner, Martin Schmidbauer EV Group
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D. Mackenzie, Kenneth
-
High Throughput Stress-Controlled Silicon Nitride Deposition For Compound Semiconductor Device Manufacturing
Kenneth D. MackenzieRohit Khanna, Plasma-Therm LLC
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Das, Palash
Indian Institute of Technology-
Analytical and Simulative Viewpoint of Graded Barrier AlGaN/GaN HEMT for High Input Impedance, Breakdown Voltage and Channel mobility
Palash Das, Indian Institute of TechnologyPallab Banerji, Indian Institute of Technology KharagpurDhrubes Biswas, Indian Institute of Technology
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Della-Morrow, Celicia
TriQuint Semiconductor-
Backside Via Process of GaN Device Fabrication
Ju-Ai Ruan, Qorvo Inc.Craig Hall, QorvoCelicia Della-Morrow, TriQuint SemiconductorTom Nagle, Qorvo, Inc.Yinbao Yang, Qorvo, Inc.
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Delmonte, N.
Department of Information Engineering, University of Parma-
Empirical and Physical Modeling of Self-Heating in Power AlGaN/GaN HEMTs
M. Bernardoni, Department of Information Engineering, University of ParmaN. Delmonte, Department of Information Engineering, University of ParmaR. Menozzi, University of Parma, Italy
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Dimoulas, A.
MBE Laboratory, NCSR DEMOKRITOS-
Germanium and compound semiconductor manufacturing for advanced CMOS
A. Dimoulas, MBE Laboratory, NCSR DEMOKRITOS
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Donald Cheng, K.Y.
University of Illinois at Urbana-Champaign-
Non-Linearity Characterization of Submicron Type-I InP/InGaAs/InP and Type-I/II AlInP/GaAsSb/InP DHBTs
Huiming Xu, University of Illinois at Urbana-ChampaignEric Iverson, University of Illinois at Urbana-ChampaignK.Y. Donald Cheng, University of Illinois at Urbana-Champaign
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Downey, B. P.
-
40 nm T-Gate Process Development using ZEP Reflow
D. J. MeyerB. P. DowneyR. Bass, Naval Research LaboratoryD. S. Katzer
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Duckham, Alan
-
PVD Magnetron Sputtering Parameters and their Effect on the Composition of AuSn Solder
Heiner Lichtenberger*, * Materion Microelectronics and Services ** NEXX SystemsAlan DuckhamSteve Golovato**, * Materion Microelectronics and Services ** NEXX Systems
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Eddy, C.R.
-
Profiling the Temperature Distribution in AlGaN/GaN HEMTs with Nanocrystalline Diamond Heat Spreading Layers
C.R. Eddy
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Eichler, Stefan
Freiberger Compound Materials GmbH-
Green Gallium Arsenide (GaAs) Substrate Manufacturing
Stefan Eichler, Freiberger Compound Materials GmbH
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Elarde, V.
MicroLink Devices, Inc.-
Epitaxial Lift-Off of Large-Area GaAs Thin-Film Multi-Junction Solar Cells
C. Youtsey, MicroLink Devices, Inc.J. Adams, MicroLink Devices, Inc.R. Chan, MicroLink Devices, Inc.V. Elarde, MicroLink Devices, Inc.G. Hillier, MicroLink Devices, Inc.M. Osowski, MicroLink Devices, Inc.D. McCallum, MicroLink Devices, Inc.H. Miyamoto, MicroLink Devices, Inc.N. Pan, MicroLink Devices, Inc.C. Stender, MicroLink Devices, Inc.R. Tatavarti, MicroLink Devices, Inc.F. Tuminello, MicroLink Devices, Inc.A. Wibowo, MicroLink Devices, Inc.
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Farmosa, Scott
Skyworks Solutions-
Successful GaAs Backend Process Improvement
Scott Farmosa, Skyworks SolutionsJennifer Welborn, Skyworks SolutionsDaniel Nercessian, Skyworks Solutions
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Fender, Jason
-
A Call to Higher Quality in GaAs
Jose SuarezJason Fender -
Method for Detecting GaAs Die Fractures in Device Manufacturing Through the Use of a Designed Test Vehicle
Jason FenderJose Suarez
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Freitag, R.G.
Northrop Grumman Electronic Systems-
Low-Loss Metal-on-BCB Technology for Next-Generation GaN MMICs
E.J. Stewart, Northrop Grumman Electronic SystemsR.G. Freitag, Northrop Grumman Electronic SystemsJ. S. Mason, Northrop Grumman Mission SystemsM.J. Walker, Northrop Grumman Electronic SystemsH.G. Henry, Northrop Grumman Electronic Systems
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Gao, Xiang
IQE RF LLC-
Development of AlGaN/GaN HEMTs on Different Substrates
Ming Pan, Veeco InstrumentsXiang Gao, IQE RF LLCDaniel Gorka, IQE RF LLCMark Oliver, IQE RF LLC
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Geerpuram, Dwarakanath
Plasma-Therm LLC-
The Effects of Increasing the Aspect Ratio of GaAs Backside Vias
Holly Rubin, Plasma-Therm LLCDwarakanath Geerpuram, Plasma-Therm LLCRuss Westerman, Plasma-Therm, LLC
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GmbH, Semiconductors
Azur Space Solar Power GmbH, Roy Blunt, IQE plc, Sylvi Claußnitzer, GAIT Consultant, Iwan Davies, IQE plc, Gerhard Hirschle, United Monolithic-
The CLP Regulation – Opportunity for Global Standardization of Substance Classifications or Threat to Innovation from Regulatory Overreach?
Hermann Schenk, Azur Space Solar Power GmbH, Roy Blunt, IQE plc, Sylvi Claußnitzer, GAIT Consultant, Iwan Davies, IQE plc, Gerhard Hirschle, United MonolithicFreiberger Compound Materials, Azur Space Solar Power GmbH, Roy Blunt, IQE plc, Sylvi Claußnitzer, GAIT Consultant, Iwan Davies, IQE plc, Gerhard Hirschle, United MonolithicSteve Aden, Azur Space Solar Power GmbH, Roy Blunt, IQE plc, Sylvi Claußnitzer, GAIT Consultant, Iwan Davies, IQE plc, Gerhard Hirschle, United MonolithicAvago Technologies, Azur Space Solar Power GmbH, Roy Blunt, IQE plc, Sylvi Claußnitzer, GAIT Consultant, Iwan Davies, IQE plc, Gerhard Hirschle, United MonolithicHani Badawi, Azur Space Solar Power GmbH, Roy Blunt, IQE plc, Sylvi Claußnitzer, GAIT Consultant, Iwan Davies, IQE plc, Gerhard Hirschle, United MonolithicAXT, Azur Space Solar Power GmbH, Roy Blunt, IQE plc, Sylvi Claußnitzer, GAIT Consultant, Iwan Davies, IQE plc, Gerhard Hirschle, United MonolithicThomas Bergunde, Azur Space Solar Power GmbH, Roy Blunt, IQE plc, Sylvi Claußnitzer, GAIT Consultant, Iwan Davies, IQE plc, Gerhard Hirschle, United MonolithicSemiconductors GmbH, Azur Space Solar Power GmbH, Roy Blunt, IQE plc, Sylvi Claußnitzer, GAIT Consultant, Iwan Davies, IQE plc, Gerhard Hirschle, United MonolithicRainer Krause, Azur Space Solar Power GmbH, Roy Blunt, IQE plc, Sylvi Claußnitzer, GAIT Consultant, Iwan Davies, IQE plc, Gerhard Hirschle, United MonolithicSoitec, Azur Space Solar Power GmbH, Roy Blunt, IQE plc, Sylvi Claußnitzer, GAIT Consultant, Iwan Davies, IQE plc, Gerhard Hirschle, United MonolithicBirgit Müller, Azur Space Solar Power GmbH, Roy Blunt, IQE plc, Sylvi Claußnitzer, GAIT Consultant, Iwan Davies, IQE plc, Gerhard Hirschle, United MonolithicThomas Pearsall, Azur Space Solar Power GmbH, Roy Blunt, IQE plc, Sylvi Claußnitzer, GAIT Consultant, Iwan Davies, IQE plc, Gerhard Hirschle, United MonolithicEPIC Association, Azur Space Solar Power GmbH, Roy Blunt, IQE plc, Sylvi Claußnitzer, GAIT Consultant, Iwan Davies, IQE plc, Gerhard Hirschle, United MonolithicJohn Sharp, Azur Space Solar Power GmbH, Roy Blunt, IQE plc, Sylvi Claußnitzer, GAIT Consultant, Iwan Davies, IQE plc, Gerhard Hirschle, United MonolithicTriQuint Semiconductor
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Golovato**, Steve
* Materion Microelectronics and Services ** NEXX Systems-
PVD Magnetron Sputtering Parameters and their Effect on the Composition of AuSn Solder
Heiner Lichtenberger*, * Materion Microelectronics and Services ** NEXX SystemsAlan DuckhamSteve Golovato**, * Materion Microelectronics and Services ** NEXX Systems
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Gorka, Daniel
IQE RF LLC-
Development of AlGaN/GaN HEMTs on Different Substrates
Ming Pan, Veeco InstrumentsXiang Gao, IQE RF LLCDaniel Gorka, IQE RF LLCMark Oliver, IQE RF LLC
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Hafiz, F.
Shibaura Institute of Technology-
Removal of Surface-Related Current Slump in Field-Plate GaAs FETs
F. Hafiz, Shibaura Institute of TechnologyM. Kumeno, Shibaura Institute of TechnologyT. Tanaka, Hitachi Metals
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Hall, Craig
Qorvo-
Backside Via Process of GaN Device Fabrication
Ju-Ai Ruan, Qorvo Inc.Craig Hall, QorvoCelicia Della-Morrow, TriQuint SemiconductorTom Nagle, Qorvo, Inc.Yinbao Yang, Qorvo, Inc.
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He, Qizhi
-
ADHESION CHARACTERIZATION OF PHOTO-DEFINABLE EPOXIES ON HIGH ASPECT RATIO STRUCTURES FOR HIGH PERFORMANCE APPLICATIONS
Jan CampbellQizhi He
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Henry, H.G.
Northrop Grumman Electronic Systems-
Low-Loss Metal-on-BCB Technology for Next-Generation GaN MMICs
E.J. Stewart, Northrop Grumman Electronic SystemsR.G. Freitag, Northrop Grumman Electronic SystemsJ. S. Mason, Northrop Grumman Mission SystemsM.J. Walker, Northrop Grumman Electronic SystemsH.G. Henry, Northrop Grumman Electronic Systems
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Her, Jimmy
WIN Semiconductors Corp.-
Yield Improvement for Thin 50 um GaAs Product Line
Rui-Ching Wei, WIN Semiconductors Corp.Huang-Wen Wang, WIN Semiconductors Corp.Chen-Che Chin, WIN Semiconductors Corp.Summer Chiang, WIN Semiconductors Corp.Jimmy Her, WIN Semiconductors Corp.Ping-Wei Chen, WIN Semiconductors Corp.Kevin Huang, WIN Semiconductors Corp.
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Hillier, G.
MicroLink Devices, Inc.-
Epitaxial Lift-Off of Large-Area GaAs Thin-Film Multi-Junction Solar Cells
C. Youtsey, MicroLink Devices, Inc.J. Adams, MicroLink Devices, Inc.R. Chan, MicroLink Devices, Inc.V. Elarde, MicroLink Devices, Inc.G. Hillier, MicroLink Devices, Inc.M. Osowski, MicroLink Devices, Inc.D. McCallum, MicroLink Devices, Inc.H. Miyamoto, MicroLink Devices, Inc.N. Pan, MicroLink Devices, Inc.C. Stender, MicroLink Devices, Inc.R. Tatavarti, MicroLink Devices, Inc.F. Tuminello, MicroLink Devices, Inc.A. Wibowo, MicroLink Devices, Inc.
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Hiramoto, M.
Samco Inc.-
Chlorine-Based ICP Etching for Improving the Luminance Efficiency in Nitride LEDs
H. Ogiya, Samco Inc.T. Nishimiya, Samco Inc.M. Hiramoto, Samco Inc.
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Hochstetler, Spencer
Dynaloy, LLC Samuel Mony, Jiang Wang, Tom Grayson Skyworks Solutions, Inc., Thorsten Matthias, Thomas Glinsner, Martin Schmidbauer EV Group-
A New Single Wafer Cleaning Technology for Compound Semiconductor Manufacturing
Richard Peters, Dynaloy, LLC Samuel Mony, Jiang Wang, Tom Grayson Skyworks Solutions, Inc., Thorsten Matthias, Thomas Glinsner, Martin Schmidbauer EV GroupSpencer Hochstetler, Dynaloy, LLC Samuel Mony, Jiang Wang, Tom Grayson Skyworks Solutions, Inc., Thorsten Matthias, Thomas Glinsner, Martin Schmidbauer EV GroupKeith Cox, Dynaloy, LLC Samuel Mony, Jiang Wang, Tom Grayson Skyworks Solutions, Inc., Thorsten Matthias, Thomas Glinsner, Martin Schmidbauer EV GroupPalmer Holbrook, Dynaloy, LLC Samuel Mony, Jiang Wang, Tom Grayson Skyworks Solutions, Inc., Thorsten Matthias, Thomas Glinsner, Martin Schmidbauer EV Group
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Holbrook, Palmer
Dynaloy, LLC Samuel Mony, Jiang Wang, Tom Grayson Skyworks Solutions, Inc., Thorsten Matthias, Thomas Glinsner, Martin Schmidbauer EV Group-
A New Single Wafer Cleaning Technology for Compound Semiconductor Manufacturing
Richard Peters, Dynaloy, LLC Samuel Mony, Jiang Wang, Tom Grayson Skyworks Solutions, Inc., Thorsten Matthias, Thomas Glinsner, Martin Schmidbauer EV GroupSpencer Hochstetler, Dynaloy, LLC Samuel Mony, Jiang Wang, Tom Grayson Skyworks Solutions, Inc., Thorsten Matthias, Thomas Glinsner, Martin Schmidbauer EV GroupKeith Cox, Dynaloy, LLC Samuel Mony, Jiang Wang, Tom Grayson Skyworks Solutions, Inc., Thorsten Matthias, Thomas Glinsner, Martin Schmidbauer EV GroupPalmer Holbrook, Dynaloy, LLC Samuel Mony, Jiang Wang, Tom Grayson Skyworks Solutions, Inc., Thorsten Matthias, Thomas Glinsner, Martin Schmidbauer EV Group
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Hong, Bing-Shan
WIN Semiconductors Corp.-
Novel Bi-HEMT Technology for LTE Handset Application
Bing-Shan Hong, WIN Semiconductors Corp.Shu-Hsiao Tsai, WIN Semiconductors CorpCheng-Kuo Lin, WIN Semiconductors CorpShinichiro Takatani, WIN Semiconductors Corp
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Hsiao; G. Chen; S. Chou; H. Liao, T.
WIN Semiconductors Corp.-
Manufacturing of Cu-pillar Bump for III-V MMIC Thermal Management
T. Hsiao; G. Chen; S. Chou; H. Liao, WIN Semiconductors Corp.
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Huang, John
WIN Semiconductors Corp.-
To Improve E-beam T-gate Yield by Pre-Cleaning Process
Hao-Yu Ting, WIN Semiconductors Corp.John Huang, WIN Semiconductors Corp.Hsi-Tsung Lin, WIN Semiconductors Corp.Eric Kuo, WIN Semiconductors Corp.Se-Jung Lee, WIN Semiconductors Corp.David Wu, WIN Semiconductors CorpWilliam Lai, WIN Semiconductors Corp.Kerry Chang, WIN Semiconductors Corp.Wen-Kai Wang, WIN Semiconductors Corp.
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Huang, Kevin
WIN Semiconductors Corp.-
Yield Improvement for Thin 50 um GaAs Product Line
Rui-Ching Wei, WIN Semiconductors Corp.Huang-Wen Wang, WIN Semiconductors Corp.Chen-Che Chin, WIN Semiconductors Corp.Summer Chiang, WIN Semiconductors Corp.Jimmy Her, WIN Semiconductors Corp.Ping-Wei Chen, WIN Semiconductors Corp.Kevin Huang, WIN Semiconductors Corp.
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Huang b, Tony
Cheng-Tyng Yen (a, Patrick Chuang (b,Young-Shying Chen (a, Chien-Chung Hung (a, Chwan-Ying Lee (a, Lurng-Shehng Lee (a, Tzu-Ming Yang (a, Kuan-Wei Chu (a, Ming-Jinn Tsai (a, Gary Chen (b, Tony Huang (b-
Characteristics of 4H-SiC Dual-Metal and MOS Trench Schottky Rectifiers
Cheng-Tyng Yen a, Cheng-Tyng Yen (a, Patrick Chuang (b,Young-Shying Chen (a, Chien-Chung Hung (a, Chwan-Ying Lee (a, Lurng-Shehng Lee (a, Tzu-Ming Yang (a, Kuan-Wei Chu (a, Ming-Jinn Tsai (a, Gary Chen (b, Tony Huang (bPatrick Chuang b, Cheng-Tyng Yen (a, Patrick Chuang (b,Young-Shying Chen (a, Chien-Chung Hung (a, Chwan-Ying Lee (a, Lurng-Shehng Lee (a, Tzu-Ming Yang (a, Kuan-Wei Chu (a, Ming-Jinn Tsai (a, Gary Chen (b, Tony Huang (bYoung-Shying Chen a, Cheng-Tyng Yen (a, Patrick Chuang (b,Young-Shying Chen (a, Chien-Chung Hung (a, Chwan-Ying Lee (a, Lurng-Shehng Lee (a, Tzu-Ming Yang (a, Kuan-Wei Chu (a, Ming-Jinn Tsai (a, Gary Chen (b, Tony Huang (bChien-Chung Hung a, Cheng-Tyng Yen (a, Patrick Chuang (b,Young-Shying Chen (a, Chien-Chung Hung (a, Chwan-Ying Lee (a, Lurng-Shehng Lee (a, Tzu-Ming Yang (a, Kuan-Wei Chu (a, Ming-Jinn Tsai (a, Gary Chen (b, Tony Huang (bChwan-Ying Lee a, Cheng-Tyng Yen (a, Patrick Chuang (b,Young-Shying Chen (a, Chien-Chung Hung (a, Chwan-Ying Lee (a, Lurng-Shehng Lee (a, Tzu-Ming Yang (a, Kuan-Wei Chu (a, Ming-Jinn Tsai (a, Gary Chen (b, Tony Huang (bLurng-Shehng Lee a, Cheng-Tyng Yen (a, Patrick Chuang (b,Young-Shying Chen (a, Chien-Chung Hung (a, Chwan-Ying Lee (a, Lurng-Shehng Lee (a, Tzu-Ming Yang (a, Kuan-Wei Chu (a, Ming-Jinn Tsai (a, Gary Chen (b, Tony Huang (bTzu-Ming Yang a, Cheng-Tyng Yen (a, Patrick Chuang (b,Young-Shying Chen (a, Chien-Chung Hung (a, Chwan-Ying Lee (a, Lurng-Shehng Lee (a, Tzu-Ming Yang (a, Kuan-Wei Chu (a, Ming-Jinn Tsai (a, Gary Chen (b, Tony Huang (bKuan-Wei Chu a, Cheng-Tyng Yen (a, Patrick Chuang (b,Young-Shying Chen (a, Chien-Chung Hung (a, Chwan-Ying Lee (a, Lurng-Shehng Lee (a, Tzu-Ming Yang (a, Kuan-Wei Chu (a, Ming-Jinn Tsai (a, Gary Chen (b, Tony Huang (bMing-Jinn Tsai a, Cheng-Tyng Yen (a, Patrick Chuang (b,Young-Shying Chen (a, Chien-Chung Hung (a, Chwan-Ying Lee (a, Lurng-Shehng Lee (a, Tzu-Ming Yang (a, Kuan-Wei Chu (a, Ming-Jinn Tsai (a, Gary Chen (b, Tony Huang (bGary Chen b, Cheng-Tyng Yen (a, Patrick Chuang (b,Young-Shying Chen (a, Chien-Chung Hung (a, Chwan-Ying Lee (a, Lurng-Shehng Lee (a, Tzu-Ming Yang (a, Kuan-Wei Chu (a, Ming-Jinn Tsai (a, Gary Chen (b, Tony Huang (bTony Huang b, Cheng-Tyng Yen (a, Patrick Chuang (b,Young-Shying Chen (a, Chien-Chung Hung (a, Chwan-Ying Lee (a, Lurng-Shehng Lee (a, Tzu-Ming Yang (a, Kuan-Wei Chu (a, Ming-Jinn Tsai (a, Gary Chen (b, Tony Huang (b
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Huang*, Sen
Student Presentation , Hong Kong University of Science and Technology, Institute of Microelectronics Chinese Academy of Science-
ALD-grown Ultrathin AlN Film for Passivation of AlGaN/GaN HEMTs
Sen Huang*, Student Presentation , Hong Kong University of Science and Technology, Institute of Microelectronics Chinese Academy of ScienceQimeng Jiang, The Hong Kong University of Science and TechnologyShu Yang, The Hong Kong University of Science and TechnologyChunhua Zhou, Hong Kong University of Science and Technology
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Huanga, Chou-Shuang
a) Chang Gung University b) Center National Cheng Kung University c) Chung Shan Institute of Science and Technology-
Improved Gate leakage and Microwave Performance by Inserting A Thin Erbium oxide layer on AlGaN/GaN/Silicon HEMT Structure
Fu-Chuan Chua, a) Chang Gung University b) Center National Cheng Kung University c) Chung Shan Institute of Science and TechnologyYing-Jie Tsaia, a) Chang Gung University b) Center National Cheng Kung University c) Chung Shan Institute of Science and TechnologySheng-Yu Liaoa, a) Chang Gung University b) Center National Cheng Kung University c) Chung Shan Institute of Science and TechnologyChou-Shuang Huanga, a) Chang Gung University b) Center National Cheng Kung University c) Chung Shan Institute of Science and TechnologyRay-Ming Lina, a) Chang Gung University b) Center National Cheng Kung University c) Chung Shan Institute of Science and TechnologySheng-Fu Yub, a) Chang Gung University b) Center National Cheng Kung University c) Chung Shan Institute of Science and TechnologyShuh-Sen Renc, a) Chang Gung University b) Center National Cheng Kung University c) Chung Shan Institute of Science and Technology
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Hung, Chien-Chung
Electronics and OptoElectronics Research Laboratories (EOL), ITR-
Novel of Normally-off GaN HEMT Device Structure by Using Nano-rods Technology
Chwan-Ying Lee, Electronics and OptoElectronics Research Laboratories (EOL), ITRYoung-Shying Chen, Electronics and OptoElectronics Research Laboratories (EOL), ITRLurng-Shehng Lee, Electronics and OptoElectronics Research Laboratories (EOL), ITRChien-Chung Hung, Electronics and OptoElectronics Research Laboratories (EOL), ITRCheng-Tyng Yen, Electronics and OptoElectronics Research Laboratories (EOL), ITRSuh-Fang Lin, Electronics and OptoElectronics Research Laboratories (EOL), ITRRong Xuan, Technology Development Division, Episil-Precision Inc, TaiwanWei-Hung Kuo, Industrial Technology Research InstituteTzu-Kun Ku, Electronics and OptoElectronics Research Laboratories (EOL), ITR
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Hung a, Chien-Chung
Cheng-Tyng Yen (a, Patrick Chuang (b,Young-Shying Chen (a, Chien-Chung Hung (a, Chwan-Ying Lee (a, Lurng-Shehng Lee (a, Tzu-Ming Yang (a, Kuan-Wei Chu (a, Ming-Jinn Tsai (a, Gary Chen (b, Tony Huang (b-
Characteristics of 4H-SiC Dual-Metal and MOS Trench Schottky Rectifiers
Cheng-Tyng Yen a, Cheng-Tyng Yen (a, Patrick Chuang (b,Young-Shying Chen (a, Chien-Chung Hung (a, Chwan-Ying Lee (a, Lurng-Shehng Lee (a, Tzu-Ming Yang (a, Kuan-Wei Chu (a, Ming-Jinn Tsai (a, Gary Chen (b, Tony Huang (bPatrick Chuang b, Cheng-Tyng Yen (a, Patrick Chuang (b,Young-Shying Chen (a, Chien-Chung Hung (a, Chwan-Ying Lee (a, Lurng-Shehng Lee (a, Tzu-Ming Yang (a, Kuan-Wei Chu (a, Ming-Jinn Tsai (a, Gary Chen (b, Tony Huang (bYoung-Shying Chen a, Cheng-Tyng Yen (a, Patrick Chuang (b,Young-Shying Chen (a, Chien-Chung Hung (a, Chwan-Ying Lee (a, Lurng-Shehng Lee (a, Tzu-Ming Yang (a, Kuan-Wei Chu (a, Ming-Jinn Tsai (a, Gary Chen (b, Tony Huang (bChien-Chung Hung a, Cheng-Tyng Yen (a, Patrick Chuang (b,Young-Shying Chen (a, Chien-Chung Hung (a, Chwan-Ying Lee (a, Lurng-Shehng Lee (a, Tzu-Ming Yang (a, Kuan-Wei Chu (a, Ming-Jinn Tsai (a, Gary Chen (b, Tony Huang (bChwan-Ying Lee a, Cheng-Tyng Yen (a, Patrick Chuang (b,Young-Shying Chen (a, Chien-Chung Hung (a, Chwan-Ying Lee (a, Lurng-Shehng Lee (a, Tzu-Ming Yang (a, Kuan-Wei Chu (a, Ming-Jinn Tsai (a, Gary Chen (b, Tony Huang (bLurng-Shehng Lee a, Cheng-Tyng Yen (a, Patrick Chuang (b,Young-Shying Chen (a, Chien-Chung Hung (a, Chwan-Ying Lee (a, Lurng-Shehng Lee (a, Tzu-Ming Yang (a, Kuan-Wei Chu (a, Ming-Jinn Tsai (a, Gary Chen (b, Tony Huang (bTzu-Ming Yang a, Cheng-Tyng Yen (a, Patrick Chuang (b,Young-Shying Chen (a, Chien-Chung Hung (a, Chwan-Ying Lee (a, Lurng-Shehng Lee (a, Tzu-Ming Yang (a, Kuan-Wei Chu (a, Ming-Jinn Tsai (a, Gary Chen (b, Tony Huang (bKuan-Wei Chu a, Cheng-Tyng Yen (a, Patrick Chuang (b,Young-Shying Chen (a, Chien-Chung Hung (a, Chwan-Ying Lee (a, Lurng-Shehng Lee (a, Tzu-Ming Yang (a, Kuan-Wei Chu (a, Ming-Jinn Tsai (a, Gary Chen (b, Tony Huang (bMing-Jinn Tsai a, Cheng-Tyng Yen (a, Patrick Chuang (b,Young-Shying Chen (a, Chien-Chung Hung (a, Chwan-Ying Lee (a, Lurng-Shehng Lee (a, Tzu-Ming Yang (a, Kuan-Wei Chu (a, Ming-Jinn Tsai (a, Gary Chen (b, Tony Huang (bGary Chen b, Cheng-Tyng Yen (a, Patrick Chuang (b,Young-Shying Chen (a, Chien-Chung Hung (a, Chwan-Ying Lee (a, Lurng-Shehng Lee (a, Tzu-Ming Yang (a, Kuan-Wei Chu (a, Ming-Jinn Tsai (a, Gary Chen (b, Tony Huang (bTony Huang b, Cheng-Tyng Yen (a, Patrick Chuang (b,Young-Shying Chen (a, Chien-Chung Hung (a, Chwan-Ying Lee (a, Lurng-Shehng Lee (a, Tzu-Ming Yang (a, Kuan-Wei Chu (a, Ming-Jinn Tsai (a, Gary Chen (b, Tony Huang (b
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Imada, Tadahiro
Fujitsu Laboratories Ltd.-
Effect of Oxidant Source on Threshold Voltage Shift of AlGaN/GaN MIS-HEMTs Using ALD-Al2O3 Gate Insulator films
Shiro Ozaki, Fujitsu LimitedToshihiro Ohki, Fujitsu Laboratories Ltd.Masahito Kanamura, Fujitsu Laboratories Ltd.Tadahiro Imada, Fujitsu Laboratories Ltd.Norikazu Nakamura, Fujitsu Limited and Fujitsu Laboratories Ltd.Naoya Okamoto, Fujitsu Laboratories Ltd.
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Iverson, Eric
University of Illinois at Urbana-Champaign-
Non-Linearity Characterization of Submicron Type-I InP/InGaAs/InP and Type-I/II AlInP/GaAsSb/InP DHBTs
Huiming Xu, University of Illinois at Urbana-ChampaignEric Iverson, University of Illinois at Urbana-ChampaignK.Y. Donald Cheng, University of Illinois at Urbana-Champaign
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J Carroll, Patrick
RF Micro Devices, Inc.-
Use of Knowledge Discovery fromWafer Fab Data for Yield Improvement
Patrick J Carroll, RF Micro Devices, Inc.
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J. Aldrich, David
President and Chief Executive Officer, Skyworks Solutions, Inc.-
Semiconductor Innovation: Enabling Mobile Connectivity
David J. Aldrich, President and Chief Executive Officer, Skyworks Solutions, Inc.
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J. Kolias, Nicholas
Raytheon Company-
GaN Technology for Radars
Colin S. Whelan, Raytheon CompanyNicholas J. Kolias, Raytheon CompanySteven Brierley, Raytheon CompanyChris MacDonald, Raytheon CompanySteven Bernstein, Raytheon Company
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J. Meyer, D.
-
40 nm T-Gate Process Development using ZEP Reflow
D. J. MeyerB. P. DowneyR. Bass, Naval Research LaboratoryD. S. Katzer
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Jiang, Qimeng
The Hong Kong University of Science and Technology-
ALD-grown Ultrathin AlN Film for Passivation of AlGaN/GaN HEMTs
Sen Huang*, Student Presentation , Hong Kong University of Science and Technology, Institute of Microelectronics Chinese Academy of ScienceQimeng Jiang, The Hong Kong University of Science and TechnologyShu Yang, The Hong Kong University of Science and TechnologyChunhua Zhou, Hong Kong University of Science and Technology
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John C.C. Fan, Dr.
Kopin Corporation-
Challenges and Opportunities in the III-V Industry: A Quarter Century View
Dr. John C.C. Fan, Kopin Corporation
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Kamogawa, Harry
Hitachi Cable, Ltd.-
Light response in buffer leakages and its application for epi quality development in AlGaN/GaN HEMT structures
Takeshi Tanaka, SCIOCS Company Ltd.Harry Kamogawa, Hitachi Cable, Ltd.
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Kanamura, Masahito
Fujitsu Laboratories Ltd.-
Effect of Oxidant Source on Threshold Voltage Shift of AlGaN/GaN MIS-HEMTs Using ALD-Al2O3 Gate Insulator films
Shiro Ozaki, Fujitsu LimitedToshihiro Ohki, Fujitsu Laboratories Ltd.Masahito Kanamura, Fujitsu Laboratories Ltd.Tadahiro Imada, Fujitsu Laboratories Ltd.Norikazu Nakamura, Fujitsu Limited and Fujitsu Laboratories Ltd.Naoya Okamoto, Fujitsu Laboratories Ltd.
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Kao, Ming-Yih
Qorvo, Inc.-
Set up and Characterization of an Optical Wide Stepper Process For DR15 Technology as a replacement for E-Beam Lithography
Amy Zhou, TriQuint Semiconductor, TXJerry Beene, TriQuint Semiconductor,TXMarcus King, TriQuint Semiconductor, TXMing-Yih Kao, Qorvo, Inc.Hua-Tang Chen, Qorvo, Inc.Chris Puckett, TriQuint Semiconductor
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Kao, Tsung-Ting
Georgia Institute of Technology,-
Threshold Voltage Control of Recessed-Gate III-N HFETs Using an Electrode-less Wet Etching Technique
Yi-Che Lee, Georgia Institute of TechnologyCheng-Yin Wang, Georgia Institute of TechnologyTsung-Ting Kao, Georgia Institute of Technology,
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Khanna, Rohit
Plasma-Therm LLC-
High Throughput Stress-Controlled Silicon Nitride Deposition For Compound Semiconductor Device Manufacturing
Kenneth D. MackenzieRohit Khanna, Plasma-Therm LLC
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King, Marcus
TriQuint Semiconductor, TX-
Set up and Characterization of an Optical Wide Stepper Process For DR15 Technology as a replacement for E-Beam Lithography
Amy Zhou, TriQuint Semiconductor, TXJerry Beene, TriQuint Semiconductor,TXMarcus King, TriQuint Semiconductor, TXMing-Yih Kao, Qorvo, Inc.Hua-Tang Chen, Qorvo, Inc.Chris Puckett, TriQuint Semiconductor
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Krause, Rainer
Azur Space Solar Power GmbH, Roy Blunt, IQE plc, Sylvi Claußnitzer, GAIT Consultant, Iwan Davies, IQE plc, Gerhard Hirschle, United Monolithic-
The CLP Regulation – Opportunity for Global Standardization of Substance Classifications or Threat to Innovation from Regulatory Overreach?
Hermann Schenk, Azur Space Solar Power GmbH, Roy Blunt, IQE plc, Sylvi Claußnitzer, GAIT Consultant, Iwan Davies, IQE plc, Gerhard Hirschle, United MonolithicFreiberger Compound Materials, Azur Space Solar Power GmbH, Roy Blunt, IQE plc, Sylvi Claußnitzer, GAIT Consultant, Iwan Davies, IQE plc, Gerhard Hirschle, United MonolithicSteve Aden, Azur Space Solar Power GmbH, Roy Blunt, IQE plc, Sylvi Claußnitzer, GAIT Consultant, Iwan Davies, IQE plc, Gerhard Hirschle, United MonolithicAvago Technologies, Azur Space Solar Power GmbH, Roy Blunt, IQE plc, Sylvi Claußnitzer, GAIT Consultant, Iwan Davies, IQE plc, Gerhard Hirschle, United MonolithicHani Badawi, Azur Space Solar Power GmbH, Roy Blunt, IQE plc, Sylvi Claußnitzer, GAIT Consultant, Iwan Davies, IQE plc, Gerhard Hirschle, United MonolithicAXT, Azur Space Solar Power GmbH, Roy Blunt, IQE plc, Sylvi Claußnitzer, GAIT Consultant, Iwan Davies, IQE plc, Gerhard Hirschle, United MonolithicThomas Bergunde, Azur Space Solar Power GmbH, Roy Blunt, IQE plc, Sylvi Claußnitzer, GAIT Consultant, Iwan Davies, IQE plc, Gerhard Hirschle, United MonolithicSemiconductors GmbH, Azur Space Solar Power GmbH, Roy Blunt, IQE plc, Sylvi Claußnitzer, GAIT Consultant, Iwan Davies, IQE plc, Gerhard Hirschle, United MonolithicRainer Krause, Azur Space Solar Power GmbH, Roy Blunt, IQE plc, Sylvi Claußnitzer, GAIT Consultant, Iwan Davies, IQE plc, Gerhard Hirschle, United MonolithicSoitec, Azur Space Solar Power GmbH, Roy Blunt, IQE plc, Sylvi Claußnitzer, GAIT Consultant, Iwan Davies, IQE plc, Gerhard Hirschle, United MonolithicBirgit Müller, Azur Space Solar Power GmbH, Roy Blunt, IQE plc, Sylvi Claußnitzer, GAIT Consultant, Iwan Davies, IQE plc, Gerhard Hirschle, United MonolithicThomas Pearsall, Azur Space Solar Power GmbH, Roy Blunt, IQE plc, Sylvi Claußnitzer, GAIT Consultant, Iwan Davies, IQE plc, Gerhard Hirschle, United MonolithicEPIC Association, Azur Space Solar Power GmbH, Roy Blunt, IQE plc, Sylvi Claußnitzer, GAIT Consultant, Iwan Davies, IQE plc, Gerhard Hirschle, United MonolithicJohn Sharp, Azur Space Solar Power GmbH, Roy Blunt, IQE plc, Sylvi Claußnitzer, GAIT Consultant, Iwan Davies, IQE plc, Gerhard Hirschle, United MonolithicTriQuint Semiconductor
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Ku, Tzu-Kun
Electronics and OptoElectronics Research Laboratories (EOL), ITR-
Novel of Normally-off GaN HEMT Device Structure by Using Nano-rods Technology
Chwan-Ying Lee, Electronics and OptoElectronics Research Laboratories (EOL), ITRYoung-Shying Chen, Electronics and OptoElectronics Research Laboratories (EOL), ITRLurng-Shehng Lee, Electronics and OptoElectronics Research Laboratories (EOL), ITRChien-Chung Hung, Electronics and OptoElectronics Research Laboratories (EOL), ITRCheng-Tyng Yen, Electronics and OptoElectronics Research Laboratories (EOL), ITRSuh-Fang Lin, Electronics and OptoElectronics Research Laboratories (EOL), ITRRong Xuan, Technology Development Division, Episil-Precision Inc, TaiwanWei-Hung Kuo, Industrial Technology Research InstituteTzu-Kun Ku, Electronics and OptoElectronics Research Laboratories (EOL), ITR
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-
Kumeno, M.
Shibaura Institute of Technology-
Removal of Surface-Related Current Slump in Field-Plate GaAs FETs
F. Hafiz, Shibaura Institute of TechnologyM. Kumeno, Shibaura Institute of TechnologyT. Tanaka, Hitachi Metals
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Kuo, Eric
WIN Semiconductors Corp.-
To Improve E-beam T-gate Yield by Pre-Cleaning Process
Hao-Yu Ting, WIN Semiconductors Corp.John Huang, WIN Semiconductors Corp.Hsi-Tsung Lin, WIN Semiconductors Corp.Eric Kuo, WIN Semiconductors Corp.Se-Jung Lee, WIN Semiconductors Corp.David Wu, WIN Semiconductors CorpWilliam Lai, WIN Semiconductors Corp.Kerry Chang, WIN Semiconductors Corp.Wen-Kai Wang, WIN Semiconductors Corp.
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Kuo, Wei-Hung
Industrial Technology Research Institute-
Novel of Normally-off GaN HEMT Device Structure by Using Nano-rods Technology
Chwan-Ying Lee, Electronics and OptoElectronics Research Laboratories (EOL), ITRYoung-Shying Chen, Electronics and OptoElectronics Research Laboratories (EOL), ITRLurng-Shehng Lee, Electronics and OptoElectronics Research Laboratories (EOL), ITRChien-Chung Hung, Electronics and OptoElectronics Research Laboratories (EOL), ITRCheng-Tyng Yen, Electronics and OptoElectronics Research Laboratories (EOL), ITRSuh-Fang Lin, Electronics and OptoElectronics Research Laboratories (EOL), ITRRong Xuan, Technology Development Division, Episil-Precision Inc, TaiwanWei-Hung Kuo, Industrial Technology Research InstituteTzu-Kun Ku, Electronics and OptoElectronics Research Laboratories (EOL), ITR
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Laboutin, O.
Kopin Corporation-
An In-Situ Reflectance Implementation for High Volume Electronic Device Epitaxial Wafer Production
M. Youngers, Kopin CorporationP. Rice, Kopin CorporationG. Yeboah, Kopin CorporationE. Rehder, Kopin CorporationO. Laboutin, Kopin CorporationK. S. Stevens, Kopin Corporation
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Lai, William
WIN Semiconductors Corp.-
To Improve E-beam T-gate Yield by Pre-Cleaning Process
Hao-Yu Ting, WIN Semiconductors Corp.John Huang, WIN Semiconductors Corp.Hsi-Tsung Lin, WIN Semiconductors Corp.Eric Kuo, WIN Semiconductors Corp.Se-Jung Lee, WIN Semiconductors Corp.David Wu, WIN Semiconductors CorpWilliam Lai, WIN Semiconductors Corp.Kerry Chang, WIN Semiconductors Corp.Wen-Kai Wang, WIN Semiconductors Corp.
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-
Lee, Chwan-Ying
Electronics and OptoElectronics Research Laboratories (EOL), ITR-
Novel of Normally-off GaN HEMT Device Structure by Using Nano-rods Technology
Chwan-Ying Lee, Electronics and OptoElectronics Research Laboratories (EOL), ITRYoung-Shying Chen, Electronics and OptoElectronics Research Laboratories (EOL), ITRLurng-Shehng Lee, Electronics and OptoElectronics Research Laboratories (EOL), ITRChien-Chung Hung, Electronics and OptoElectronics Research Laboratories (EOL), ITRCheng-Tyng Yen, Electronics and OptoElectronics Research Laboratories (EOL), ITRSuh-Fang Lin, Electronics and OptoElectronics Research Laboratories (EOL), ITRRong Xuan, Technology Development Division, Episil-Precision Inc, TaiwanWei-Hung Kuo, Industrial Technology Research InstituteTzu-Kun Ku, Electronics and OptoElectronics Research Laboratories (EOL), ITR
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-
Lee, Lurng-Shehng
Electronics and OptoElectronics Research Laboratories (EOL), ITR-
Novel of Normally-off GaN HEMT Device Structure by Using Nano-rods Technology
Chwan-Ying Lee, Electronics and OptoElectronics Research Laboratories (EOL), ITRYoung-Shying Chen, Electronics and OptoElectronics Research Laboratories (EOL), ITRLurng-Shehng Lee, Electronics and OptoElectronics Research Laboratories (EOL), ITRChien-Chung Hung, Electronics and OptoElectronics Research Laboratories (EOL), ITRCheng-Tyng Yen, Electronics and OptoElectronics Research Laboratories (EOL), ITRSuh-Fang Lin, Electronics and OptoElectronics Research Laboratories (EOL), ITRRong Xuan, Technology Development Division, Episil-Precision Inc, TaiwanWei-Hung Kuo, Industrial Technology Research InstituteTzu-Kun Ku, Electronics and OptoElectronics Research Laboratories (EOL), ITR
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Lee, Se-Jung
WIN Semiconductors Corp.-
To Improve E-beam T-gate Yield by Pre-Cleaning Process
Hao-Yu Ting, WIN Semiconductors Corp.John Huang, WIN Semiconductors Corp.Hsi-Tsung Lin, WIN Semiconductors Corp.Eric Kuo, WIN Semiconductors Corp.Se-Jung Lee, WIN Semiconductors Corp.David Wu, WIN Semiconductors CorpWilliam Lai, WIN Semiconductors Corp.Kerry Chang, WIN Semiconductors Corp.Wen-Kai Wang, WIN Semiconductors Corp. -
150 nm T-shape Gate Process Capacity Improvement
Se-Jung Lee, WIN Semiconductors Corp.Chih-Chuan Chang, WIN Semiconductors Corp.
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-
Lee, Yi-Che
Georgia Institute of Technology-
Threshold Voltage Control of Recessed-Gate III-N HFETs Using an Electrode-less Wet Etching Technique
Yi-Che Lee, Georgia Institute of TechnologyCheng-Yin Wang, Georgia Institute of TechnologyTsung-Ting Kao, Georgia Institute of Technology,
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Lee a, Chwan-Ying
Cheng-Tyng Yen (a, Patrick Chuang (b,Young-Shying Chen (a, Chien-Chung Hung (a, Chwan-Ying Lee (a, Lurng-Shehng Lee (a, Tzu-Ming Yang (a, Kuan-Wei Chu (a, Ming-Jinn Tsai (a, Gary Chen (b, Tony Huang (b-
Characteristics of 4H-SiC Dual-Metal and MOS Trench Schottky Rectifiers
Cheng-Tyng Yen a, Cheng-Tyng Yen (a, Patrick Chuang (b,Young-Shying Chen (a, Chien-Chung Hung (a, Chwan-Ying Lee (a, Lurng-Shehng Lee (a, Tzu-Ming Yang (a, Kuan-Wei Chu (a, Ming-Jinn Tsai (a, Gary Chen (b, Tony Huang (bPatrick Chuang b, Cheng-Tyng Yen (a, Patrick Chuang (b,Young-Shying Chen (a, Chien-Chung Hung (a, Chwan-Ying Lee (a, Lurng-Shehng Lee (a, Tzu-Ming Yang (a, Kuan-Wei Chu (a, Ming-Jinn Tsai (a, Gary Chen (b, Tony Huang (bYoung-Shying Chen a, Cheng-Tyng Yen (a, Patrick Chuang (b,Young-Shying Chen (a, Chien-Chung Hung (a, Chwan-Ying Lee (a, Lurng-Shehng Lee (a, Tzu-Ming Yang (a, Kuan-Wei Chu (a, Ming-Jinn Tsai (a, Gary Chen (b, Tony Huang (bChien-Chung Hung a, Cheng-Tyng Yen (a, Patrick Chuang (b,Young-Shying Chen (a, Chien-Chung Hung (a, Chwan-Ying Lee (a, Lurng-Shehng Lee (a, Tzu-Ming Yang (a, Kuan-Wei Chu (a, Ming-Jinn Tsai (a, Gary Chen (b, Tony Huang (bChwan-Ying Lee a, Cheng-Tyng Yen (a, Patrick Chuang (b,Young-Shying Chen (a, Chien-Chung Hung (a, Chwan-Ying Lee (a, Lurng-Shehng Lee (a, Tzu-Ming Yang (a, Kuan-Wei Chu (a, Ming-Jinn Tsai (a, Gary Chen (b, Tony Huang (bLurng-Shehng Lee a, Cheng-Tyng Yen (a, Patrick Chuang (b,Young-Shying Chen (a, Chien-Chung Hung (a, Chwan-Ying Lee (a, Lurng-Shehng Lee (a, Tzu-Ming Yang (a, Kuan-Wei Chu (a, Ming-Jinn Tsai (a, Gary Chen (b, Tony Huang (bTzu-Ming Yang a, Cheng-Tyng Yen (a, Patrick Chuang (b,Young-Shying Chen (a, Chien-Chung Hung (a, Chwan-Ying Lee (a, Lurng-Shehng Lee (a, Tzu-Ming Yang (a, Kuan-Wei Chu (a, Ming-Jinn Tsai (a, Gary Chen (b, Tony Huang (bKuan-Wei Chu a, Cheng-Tyng Yen (a, Patrick Chuang (b,Young-Shying Chen (a, Chien-Chung Hung (a, Chwan-Ying Lee (a, Lurng-Shehng Lee (a, Tzu-Ming Yang (a, Kuan-Wei Chu (a, Ming-Jinn Tsai (a, Gary Chen (b, Tony Huang (bMing-Jinn Tsai a, Cheng-Tyng Yen (a, Patrick Chuang (b,Young-Shying Chen (a, Chien-Chung Hung (a, Chwan-Ying Lee (a, Lurng-Shehng Lee (a, Tzu-Ming Yang (a, Kuan-Wei Chu (a, Ming-Jinn Tsai (a, Gary Chen (b, Tony Huang (bGary Chen b, Cheng-Tyng Yen (a, Patrick Chuang (b,Young-Shying Chen (a, Chien-Chung Hung (a, Chwan-Ying Lee (a, Lurng-Shehng Lee (a, Tzu-Ming Yang (a, Kuan-Wei Chu (a, Ming-Jinn Tsai (a, Gary Chen (b, Tony Huang (bTony Huang b, Cheng-Tyng Yen (a, Patrick Chuang (b,Young-Shying Chen (a, Chien-Chung Hung (a, Chwan-Ying Lee (a, Lurng-Shehng Lee (a, Tzu-Ming Yang (a, Kuan-Wei Chu (a, Ming-Jinn Tsai (a, Gary Chen (b, Tony Huang (b
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Lee a, Lurng-Shehng
Cheng-Tyng Yen (a, Patrick Chuang (b,Young-Shying Chen (a, Chien-Chung Hung (a, Chwan-Ying Lee (a, Lurng-Shehng Lee (a, Tzu-Ming Yang (a, Kuan-Wei Chu (a, Ming-Jinn Tsai (a, Gary Chen (b, Tony Huang (b-
Characteristics of 4H-SiC Dual-Metal and MOS Trench Schottky Rectifiers
Cheng-Tyng Yen a, Cheng-Tyng Yen (a, Patrick Chuang (b,Young-Shying Chen (a, Chien-Chung Hung (a, Chwan-Ying Lee (a, Lurng-Shehng Lee (a, Tzu-Ming Yang (a, Kuan-Wei Chu (a, Ming-Jinn Tsai (a, Gary Chen (b, Tony Huang (bPatrick Chuang b, Cheng-Tyng Yen (a, Patrick Chuang (b,Young-Shying Chen (a, Chien-Chung Hung (a, Chwan-Ying Lee (a, Lurng-Shehng Lee (a, Tzu-Ming Yang (a, Kuan-Wei Chu (a, Ming-Jinn Tsai (a, Gary Chen (b, Tony Huang (bYoung-Shying Chen a, Cheng-Tyng Yen (a, Patrick Chuang (b,Young-Shying Chen (a, Chien-Chung Hung (a, Chwan-Ying Lee (a, Lurng-Shehng Lee (a, Tzu-Ming Yang (a, Kuan-Wei Chu (a, Ming-Jinn Tsai (a, Gary Chen (b, Tony Huang (bChien-Chung Hung a, Cheng-Tyng Yen (a, Patrick Chuang (b,Young-Shying Chen (a, Chien-Chung Hung (a, Chwan-Ying Lee (a, Lurng-Shehng Lee (a, Tzu-Ming Yang (a, Kuan-Wei Chu (a, Ming-Jinn Tsai (a, Gary Chen (b, Tony Huang (bChwan-Ying Lee a, Cheng-Tyng Yen (a, Patrick Chuang (b,Young-Shying Chen (a, Chien-Chung Hung (a, Chwan-Ying Lee (a, Lurng-Shehng Lee (a, Tzu-Ming Yang (a, Kuan-Wei Chu (a, Ming-Jinn Tsai (a, Gary Chen (b, Tony Huang (bLurng-Shehng Lee a, Cheng-Tyng Yen (a, Patrick Chuang (b,Young-Shying Chen (a, Chien-Chung Hung (a, Chwan-Ying Lee (a, Lurng-Shehng Lee (a, Tzu-Ming Yang (a, Kuan-Wei Chu (a, Ming-Jinn Tsai (a, Gary Chen (b, Tony Huang (bTzu-Ming Yang a, Cheng-Tyng Yen (a, Patrick Chuang (b,Young-Shying Chen (a, Chien-Chung Hung (a, Chwan-Ying Lee (a, Lurng-Shehng Lee (a, Tzu-Ming Yang (a, Kuan-Wei Chu (a, Ming-Jinn Tsai (a, Gary Chen (b, Tony Huang (bKuan-Wei Chu a, Cheng-Tyng Yen (a, Patrick Chuang (b,Young-Shying Chen (a, Chien-Chung Hung (a, Chwan-Ying Lee (a, Lurng-Shehng Lee (a, Tzu-Ming Yang (a, Kuan-Wei Chu (a, Ming-Jinn Tsai (a, Gary Chen (b, Tony Huang (bMing-Jinn Tsai a, Cheng-Tyng Yen (a, Patrick Chuang (b,Young-Shying Chen (a, Chien-Chung Hung (a, Chwan-Ying Lee (a, Lurng-Shehng Lee (a, Tzu-Ming Yang (a, Kuan-Wei Chu (a, Ming-Jinn Tsai (a, Gary Chen (b, Tony Huang (bGary Chen b, Cheng-Tyng Yen (a, Patrick Chuang (b,Young-Shying Chen (a, Chien-Chung Hung (a, Chwan-Ying Lee (a, Lurng-Shehng Lee (a, Tzu-Ming Yang (a, Kuan-Wei Chu (a, Ming-Jinn Tsai (a, Gary Chen (b, Tony Huang (bTony Huang b, Cheng-Tyng Yen (a, Patrick Chuang (b,Young-Shying Chen (a, Chien-Chung Hung (a, Chwan-Ying Lee (a, Lurng-Shehng Lee (a, Tzu-Ming Yang (a, Kuan-Wei Chu (a, Ming-Jinn Tsai (a, Gary Chen (b, Tony Huang (b
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Li, Qiang
Hong Kong University of Science and Technology-
Inverted-type InAlAs/InGaAs MOSHEMT with Regrown Source/Drain Exhibiting High Current and Low On-resistance
Qiang Li, Hong Kong University of Science and TechnologyXiuju Zhou, Hong Kong University of Science and Technology
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Liaoa, Sheng-Yu
a) Chang Gung University b) Center National Cheng Kung University c) Chung Shan Institute of Science and Technology-
Improved Gate leakage and Microwave Performance by Inserting A Thin Erbium oxide layer on AlGaN/GaN/Silicon HEMT Structure
Fu-Chuan Chua, a) Chang Gung University b) Center National Cheng Kung University c) Chung Shan Institute of Science and TechnologyYing-Jie Tsaia, a) Chang Gung University b) Center National Cheng Kung University c) Chung Shan Institute of Science and TechnologySheng-Yu Liaoa, a) Chang Gung University b) Center National Cheng Kung University c) Chung Shan Institute of Science and TechnologyChou-Shuang Huanga, a) Chang Gung University b) Center National Cheng Kung University c) Chung Shan Institute of Science and TechnologyRay-Ming Lina, a) Chang Gung University b) Center National Cheng Kung University c) Chung Shan Institute of Science and TechnologySheng-Fu Yub, a) Chang Gung University b) Center National Cheng Kung University c) Chung Shan Institute of Science and TechnologyShuh-Sen Renc, a) Chang Gung University b) Center National Cheng Kung University c) Chung Shan Institute of Science and Technology
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Lichtenberger*, Heiner
* Materion Microelectronics and Services ** NEXX Systems-
PVD Magnetron Sputtering Parameters and their Effect on the Composition of AuSn Solder
Heiner Lichtenberger*, * Materion Microelectronics and Services ** NEXX SystemsAlan DuckhamSteve Golovato**, * Materion Microelectronics and Services ** NEXX Systems
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Lin, Cheng-Kuo
WIN Semiconductors Corp-
A Ultra High Ruggedness Performance of InGaP/GaAs HBT
Chiou, WiN Semiconductors Corp.Tung-Yao Chou, WIN Semiconductors Corp.Cheng-Kuo Lin, WIN Semiconductors CorpDennis Williams, WIN Semiconductors Corp. -
Novel Bi-HEMT Technology for LTE Handset Application
Bing-Shan Hong, WIN Semiconductors Corp.Shu-Hsiao Tsai, WIN Semiconductors CorpCheng-Kuo Lin, WIN Semiconductors CorpShinichiro Takatani, WIN Semiconductors Corp
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Lin, Hsi-Tsung
WIN Semiconductors Corp.-
To Improve E-beam T-gate Yield by Pre-Cleaning Process
Hao-Yu Ting, WIN Semiconductors Corp.John Huang, WIN Semiconductors Corp.Hsi-Tsung Lin, WIN Semiconductors Corp.Eric Kuo, WIN Semiconductors Corp.Se-Jung Lee, WIN Semiconductors Corp.David Wu, WIN Semiconductors CorpWilliam Lai, WIN Semiconductors Corp.Kerry Chang, WIN Semiconductors Corp.Wen-Kai Wang, WIN Semiconductors Corp.
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Lin, Hsin-Ying
Graduate Institute of Photonics and Optoelectronics and 2National Taiwan University-
Demonstration of Low Subthreshold Swing a-InGaZnO Thin Film Transistors
Liang-Yu Su, National Taiwan UniversityHsin-Ying Lin, Graduate Institute of Photonics and Optoelectronics and 2National Taiwan UniversityHuang-Kai Lin, Neoton Optoelectronics, Inc.
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Lin, Huang-Kai
Neoton Optoelectronics, Inc.-
Demonstration of Low Subthreshold Swing a-InGaZnO Thin Film Transistors
Liang-Yu Su, National Taiwan UniversityHsin-Ying Lin, Graduate Institute of Photonics and Optoelectronics and 2National Taiwan UniversityHuang-Kai Lin, Neoton Optoelectronics, Inc.
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Lin, Suh-Fang
Electronics and OptoElectronics Research Laboratories (EOL), ITR-
Novel of Normally-off GaN HEMT Device Structure by Using Nano-rods Technology
Chwan-Ying Lee, Electronics and OptoElectronics Research Laboratories (EOL), ITRYoung-Shying Chen, Electronics and OptoElectronics Research Laboratories (EOL), ITRLurng-Shehng Lee, Electronics and OptoElectronics Research Laboratories (EOL), ITRChien-Chung Hung, Electronics and OptoElectronics Research Laboratories (EOL), ITRCheng-Tyng Yen, Electronics and OptoElectronics Research Laboratories (EOL), ITRSuh-Fang Lin, Electronics and OptoElectronics Research Laboratories (EOL), ITRRong Xuan, Technology Development Division, Episil-Precision Inc, TaiwanWei-Hung Kuo, Industrial Technology Research InstituteTzu-Kun Ku, Electronics and OptoElectronics Research Laboratories (EOL), ITR
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Lina, Ray-Ming
a) Chang Gung University b) Center National Cheng Kung University c) Chung Shan Institute of Science and Technology-
Improved Gate leakage and Microwave Performance by Inserting A Thin Erbium oxide layer on AlGaN/GaN/Silicon HEMT Structure
Fu-Chuan Chua, a) Chang Gung University b) Center National Cheng Kung University c) Chung Shan Institute of Science and TechnologyYing-Jie Tsaia, a) Chang Gung University b) Center National Cheng Kung University c) Chung Shan Institute of Science and TechnologySheng-Yu Liaoa, a) Chang Gung University b) Center National Cheng Kung University c) Chung Shan Institute of Science and TechnologyChou-Shuang Huanga, a) Chang Gung University b) Center National Cheng Kung University c) Chung Shan Institute of Science and TechnologyRay-Ming Lina, a) Chang Gung University b) Center National Cheng Kung University c) Chung Shan Institute of Science and TechnologySheng-Fu Yub, a) Chang Gung University b) Center National Cheng Kung University c) Chung Shan Institute of Science and TechnologyShuh-Sen Renc, a) Chang Gung University b) Center National Cheng Kung University c) Chung Shan Institute of Science and Technology
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Luu, Lena
Global Communications Semiconductor, LLC-
Methods for Removing TiOx Residue from Au Bond Pad
Lena Luu, Global Communications Semiconductor, LLCMinkar Chen, Global Communications Seminconductor, LLCFrank Monzon, Global Communications Semiconductors, Inc.
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M. Eastham, James
TriQuint Semiconductor-
Predicting, Validating, and Improving Yield of Multi-Chip RF Modules During Product Development
James M. Eastham, TriQuint Semiconductor
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MacDonald, Chris
Raytheon Company-
GaN Technology for Radars
Colin S. Whelan, Raytheon CompanyNicholas J. Kolias, Raytheon CompanySteven Brierley, Raytheon CompanyChris MacDonald, Raytheon CompanySteven Bernstein, Raytheon Company
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Mason, J. S.
Northrop Grumman Mission Systems-
Low-Loss Metal-on-BCB Technology for Next-Generation GaN MMICs
E.J. Stewart, Northrop Grumman Electronic SystemsR.G. Freitag, Northrop Grumman Electronic SystemsJ. S. Mason, Northrop Grumman Mission SystemsM.J. Walker, Northrop Grumman Electronic SystemsH.G. Henry, Northrop Grumman Electronic Systems
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McCallum, D.
MicroLink Devices, Inc.-
Epitaxial Lift-Off of Large-Area GaAs Thin-Film Multi-Junction Solar Cells
C. Youtsey, MicroLink Devices, Inc.J. Adams, MicroLink Devices, Inc.R. Chan, MicroLink Devices, Inc.V. Elarde, MicroLink Devices, Inc.G. Hillier, MicroLink Devices, Inc.M. Osowski, MicroLink Devices, Inc.D. McCallum, MicroLink Devices, Inc.H. Miyamoto, MicroLink Devices, Inc.N. Pan, MicroLink Devices, Inc.C. Stender, MicroLink Devices, Inc.R. Tatavarti, MicroLink Devices, Inc.F. Tuminello, MicroLink Devices, Inc.A. Wibowo, MicroLink Devices, Inc.
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Menozzi, R.
University of Parma, Italy-
Empirical and Physical Modeling of Self-Heating in Power AlGaN/GaN HEMTs
M. Bernardoni, Department of Information Engineering, University of ParmaN. Delmonte, Department of Information Engineering, University of ParmaR. Menozzi, University of Parma, Italy
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Meyuhas, Ariel
The MAX Group-
The Best MES Selection Process & Benchmark Survey For a Semiconductor Fab Case Study
Danny Rosner, MAX I.E.G. LLCAriel Meyuhas, The MAX Group
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Miyamoto, H.
MicroLink Devices, Inc.-
Epitaxial Lift-Off of Large-Area GaAs Thin-Film Multi-Junction Solar Cells
C. Youtsey, MicroLink Devices, Inc.J. Adams, MicroLink Devices, Inc.R. Chan, MicroLink Devices, Inc.V. Elarde, MicroLink Devices, Inc.G. Hillier, MicroLink Devices, Inc.M. Osowski, MicroLink Devices, Inc.D. McCallum, MicroLink Devices, Inc.H. Miyamoto, MicroLink Devices, Inc.N. Pan, MicroLink Devices, Inc.C. Stender, MicroLink Devices, Inc.R. Tatavarti, MicroLink Devices, Inc.F. Tuminello, MicroLink Devices, Inc.A. Wibowo, MicroLink Devices, Inc.
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Monzon, Frank
Global Communications Semiconductors, Inc.-
Methods for Removing TiOx Residue from Au Bond Pad
Lena Luu, Global Communications Semiconductor, LLCMinkar Chen, Global Communications Seminconductor, LLCFrank Monzon, Global Communications Semiconductors, Inc.
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Müller, Birgit
Azur Space Solar Power GmbH, Roy Blunt, IQE plc, Sylvi Claußnitzer, GAIT Consultant, Iwan Davies, IQE plc, Gerhard Hirschle, United Monolithic-
The CLP Regulation – Opportunity for Global Standardization of Substance Classifications or Threat to Innovation from Regulatory Overreach?
Hermann Schenk, Azur Space Solar Power GmbH, Roy Blunt, IQE plc, Sylvi Claußnitzer, GAIT Consultant, Iwan Davies, IQE plc, Gerhard Hirschle, United MonolithicFreiberger Compound Materials, Azur Space Solar Power GmbH, Roy Blunt, IQE plc, Sylvi Claußnitzer, GAIT Consultant, Iwan Davies, IQE plc, Gerhard Hirschle, United MonolithicSteve Aden, Azur Space Solar Power GmbH, Roy Blunt, IQE plc, Sylvi Claußnitzer, GAIT Consultant, Iwan Davies, IQE plc, Gerhard Hirschle, United MonolithicAvago Technologies, Azur Space Solar Power GmbH, Roy Blunt, IQE plc, Sylvi Claußnitzer, GAIT Consultant, Iwan Davies, IQE plc, Gerhard Hirschle, United MonolithicHani Badawi, Azur Space Solar Power GmbH, Roy Blunt, IQE plc, Sylvi Claußnitzer, GAIT Consultant, Iwan Davies, IQE plc, Gerhard Hirschle, United MonolithicAXT, Azur Space Solar Power GmbH, Roy Blunt, IQE plc, Sylvi Claußnitzer, GAIT Consultant, Iwan Davies, IQE plc, Gerhard Hirschle, United MonolithicThomas Bergunde, Azur Space Solar Power GmbH, Roy Blunt, IQE plc, Sylvi Claußnitzer, GAIT Consultant, Iwan Davies, IQE plc, Gerhard Hirschle, United MonolithicSemiconductors GmbH, Azur Space Solar Power GmbH, Roy Blunt, IQE plc, Sylvi Claußnitzer, GAIT Consultant, Iwan Davies, IQE plc, Gerhard Hirschle, United MonolithicRainer Krause, Azur Space Solar Power GmbH, Roy Blunt, IQE plc, Sylvi Claußnitzer, GAIT Consultant, Iwan Davies, IQE plc, Gerhard Hirschle, United MonolithicSoitec, Azur Space Solar Power GmbH, Roy Blunt, IQE plc, Sylvi Claußnitzer, GAIT Consultant, Iwan Davies, IQE plc, Gerhard Hirschle, United MonolithicBirgit Müller, Azur Space Solar Power GmbH, Roy Blunt, IQE plc, Sylvi Claußnitzer, GAIT Consultant, Iwan Davies, IQE plc, Gerhard Hirschle, United MonolithicThomas Pearsall, Azur Space Solar Power GmbH, Roy Blunt, IQE plc, Sylvi Claußnitzer, GAIT Consultant, Iwan Davies, IQE plc, Gerhard Hirschle, United MonolithicEPIC Association, Azur Space Solar Power GmbH, Roy Blunt, IQE plc, Sylvi Claußnitzer, GAIT Consultant, Iwan Davies, IQE plc, Gerhard Hirschle, United MonolithicJohn Sharp, Azur Space Solar Power GmbH, Roy Blunt, IQE plc, Sylvi Claußnitzer, GAIT Consultant, Iwan Davies, IQE plc, Gerhard Hirschle, United MonolithicTriQuint Semiconductor
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Nagle, Tom
Qorvo, Inc.-
Backside Via Process of GaN Device Fabrication
Ju-Ai Ruan, Qorvo Inc.Craig Hall, QorvoCelicia Della-Morrow, TriQuint SemiconductorTom Nagle, Qorvo, Inc.Yinbao Yang, Qorvo, Inc.
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Nakamura, Norikazu
Fujitsu Limited and Fujitsu Laboratories Ltd.-
Effect of Oxidant Source on Threshold Voltage Shift of AlGaN/GaN MIS-HEMTs Using ALD-Al2O3 Gate Insulator films
Shiro Ozaki, Fujitsu LimitedToshihiro Ohki, Fujitsu Laboratories Ltd.Masahito Kanamura, Fujitsu Laboratories Ltd.Tadahiro Imada, Fujitsu Laboratories Ltd.Norikazu Nakamura, Fujitsu Limited and Fujitsu Laboratories Ltd.Naoya Okamoto, Fujitsu Laboratories Ltd.
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Nelson, Drew
IQE plc-
Current Developments in Epi Foundry Services for Advanced Wireless Applications
Drew Nelson, IQE plc
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Nercessian, Daniel
Skyworks Solutions-
Successful GaAs Backend Process Improvement
Scott Farmosa, Skyworks SolutionsJennifer Welborn, Skyworks SolutionsDaniel Nercessian, Skyworks Solutions
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Nishimiya, T.
Samco Inc.-
Chlorine-Based ICP Etching for Improving the Luminance Efficiency in Nitride LEDs
H. Ogiya, Samco Inc.T. Nishimiya, Samco Inc.M. Hiramoto, Samco Inc.
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Ogiya, H.
Samco Inc.-
Chlorine-Based ICP Etching for Improving the Luminance Efficiency in Nitride LEDs
H. Ogiya, Samco Inc.T. Nishimiya, Samco Inc.M. Hiramoto, Samco Inc.
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Ohki, Toshihiro
Fujitsu Laboratories Ltd.-
Effect of Oxidant Source on Threshold Voltage Shift of AlGaN/GaN MIS-HEMTs Using ALD-Al2O3 Gate Insulator films
Shiro Ozaki, Fujitsu LimitedToshihiro Ohki, Fujitsu Laboratories Ltd.Masahito Kanamura, Fujitsu Laboratories Ltd.Tadahiro Imada, Fujitsu Laboratories Ltd.Norikazu Nakamura, Fujitsu Limited and Fujitsu Laboratories Ltd.Naoya Okamoto, Fujitsu Laboratories Ltd.
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Okamoto, Naoya
Fujitsu Laboratories Ltd.-
Effect of Oxidant Source on Threshold Voltage Shift of AlGaN/GaN MIS-HEMTs Using ALD-Al2O3 Gate Insulator films
Shiro Ozaki, Fujitsu LimitedToshihiro Ohki, Fujitsu Laboratories Ltd.Masahito Kanamura, Fujitsu Laboratories Ltd.Tadahiro Imada, Fujitsu Laboratories Ltd.Norikazu Nakamura, Fujitsu Limited and Fujitsu Laboratories Ltd.Naoya Okamoto, Fujitsu Laboratories Ltd.
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Oliver, Mark
IQE RF LLC-
Development of AlGaN/GaN HEMTs on Different Substrates
Ming Pan, Veeco InstrumentsXiang Gao, IQE RF LLCDaniel Gorka, IQE RF LLCMark Oliver, IQE RF LLC
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Osowski, M.
MicroLink Devices, Inc.-
Epitaxial Lift-Off of Large-Area GaAs Thin-Film Multi-Junction Solar Cells
C. Youtsey, MicroLink Devices, Inc.J. Adams, MicroLink Devices, Inc.R. Chan, MicroLink Devices, Inc.V. Elarde, MicroLink Devices, Inc.G. Hillier, MicroLink Devices, Inc.M. Osowski, MicroLink Devices, Inc.D. McCallum, MicroLink Devices, Inc.H. Miyamoto, MicroLink Devices, Inc.N. Pan, MicroLink Devices, Inc.C. Stender, MicroLink Devices, Inc.R. Tatavarti, MicroLink Devices, Inc.F. Tuminello, MicroLink Devices, Inc.A. Wibowo, MicroLink Devices, Inc.
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Otoki, Yohei
SCIOCS-
What Happened, What Was Done and What Was Learned in CS Industry through Catastrophic Disasters in Japan
Yohei Otoki, SCIOCS
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Ozaki, Shiro
Fujitsu Limited-
Effect of Oxidant Source on Threshold Voltage Shift of AlGaN/GaN MIS-HEMTs Using ALD-Al2O3 Gate Insulator films
Shiro Ozaki, Fujitsu LimitedToshihiro Ohki, Fujitsu Laboratories Ltd.Masahito Kanamura, Fujitsu Laboratories Ltd.Tadahiro Imada, Fujitsu Laboratories Ltd.Norikazu Nakamura, Fujitsu Limited and Fujitsu Laboratories Ltd.Naoya Okamoto, Fujitsu Laboratories Ltd.
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Pan, Ming
Veeco Instruments-
Development of AlGaN/GaN HEMTs on Different Substrates
Ming Pan, Veeco InstrumentsXiang Gao, IQE RF LLCDaniel Gorka, IQE RF LLCMark Oliver, IQE RF LLC
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Pan, N.
MicroLink Devices, Inc.-
Epitaxial Lift-Off of Large-Area GaAs Thin-Film Multi-Junction Solar Cells
C. Youtsey, MicroLink Devices, Inc.J. Adams, MicroLink Devices, Inc.R. Chan, MicroLink Devices, Inc.V. Elarde, MicroLink Devices, Inc.G. Hillier, MicroLink Devices, Inc.M. Osowski, MicroLink Devices, Inc.D. McCallum, MicroLink Devices, Inc.H. Miyamoto, MicroLink Devices, Inc.N. Pan, MicroLink Devices, Inc.C. Stender, MicroLink Devices, Inc.R. Tatavarti, MicroLink Devices, Inc.F. Tuminello, MicroLink Devices, Inc.A. Wibowo, MicroLink Devices, Inc.
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Patterson, Neill
TriQuint Semiconductor-
A Robust, Non-Parametric Method to Identify Outliers and Improve Final Yield and Quality
Neill Patterson, TriQuint Semiconductor
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Pearsall, Thomas
Azur Space Solar Power GmbH, Roy Blunt, IQE plc, Sylvi Claußnitzer, GAIT Consultant, Iwan Davies, IQE plc, Gerhard Hirschle, United Monolithic-
The CLP Regulation – Opportunity for Global Standardization of Substance Classifications or Threat to Innovation from Regulatory Overreach?
Hermann Schenk, Azur Space Solar Power GmbH, Roy Blunt, IQE plc, Sylvi Claußnitzer, GAIT Consultant, Iwan Davies, IQE plc, Gerhard Hirschle, United MonolithicFreiberger Compound Materials, Azur Space Solar Power GmbH, Roy Blunt, IQE plc, Sylvi Claußnitzer, GAIT Consultant, Iwan Davies, IQE plc, Gerhard Hirschle, United MonolithicSteve Aden, Azur Space Solar Power GmbH, Roy Blunt, IQE plc, Sylvi Claußnitzer, GAIT Consultant, Iwan Davies, IQE plc, Gerhard Hirschle, United MonolithicAvago Technologies, Azur Space Solar Power GmbH, Roy Blunt, IQE plc, Sylvi Claußnitzer, GAIT Consultant, Iwan Davies, IQE plc, Gerhard Hirschle, United MonolithicHani Badawi, Azur Space Solar Power GmbH, Roy Blunt, IQE plc, Sylvi Claußnitzer, GAIT Consultant, Iwan Davies, IQE plc, Gerhard Hirschle, United MonolithicAXT, Azur Space Solar Power GmbH, Roy Blunt, IQE plc, Sylvi Claußnitzer, GAIT Consultant, Iwan Davies, IQE plc, Gerhard Hirschle, United MonolithicThomas Bergunde, Azur Space Solar Power GmbH, Roy Blunt, IQE plc, Sylvi Claußnitzer, GAIT Consultant, Iwan Davies, IQE plc, Gerhard Hirschle, United MonolithicSemiconductors GmbH, Azur Space Solar Power GmbH, Roy Blunt, IQE plc, Sylvi Claußnitzer, GAIT Consultant, Iwan Davies, IQE plc, Gerhard Hirschle, United MonolithicRainer Krause, Azur Space Solar Power GmbH, Roy Blunt, IQE plc, Sylvi Claußnitzer, GAIT Consultant, Iwan Davies, IQE plc, Gerhard Hirschle, United MonolithicSoitec, Azur Space Solar Power GmbH, Roy Blunt, IQE plc, Sylvi Claußnitzer, GAIT Consultant, Iwan Davies, IQE plc, Gerhard Hirschle, United MonolithicBirgit Müller, Azur Space Solar Power GmbH, Roy Blunt, IQE plc, Sylvi Claußnitzer, GAIT Consultant, Iwan Davies, IQE plc, Gerhard Hirschle, United MonolithicThomas Pearsall, Azur Space Solar Power GmbH, Roy Blunt, IQE plc, Sylvi Claußnitzer, GAIT Consultant, Iwan Davies, IQE plc, Gerhard Hirschle, United MonolithicEPIC Association, Azur Space Solar Power GmbH, Roy Blunt, IQE plc, Sylvi Claußnitzer, GAIT Consultant, Iwan Davies, IQE plc, Gerhard Hirschle, United MonolithicJohn Sharp, Azur Space Solar Power GmbH, Roy Blunt, IQE plc, Sylvi Claußnitzer, GAIT Consultant, Iwan Davies, IQE plc, Gerhard Hirschle, United MonolithicTriQuint Semiconductor
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Peters, Richard
Dynaloy, LLC Samuel Mony, Jiang Wang, Tom Grayson Skyworks Solutions, Inc., Thorsten Matthias, Thomas Glinsner, Martin Schmidbauer EV Group-
A New Single Wafer Cleaning Technology for Compound Semiconductor Manufacturing
Richard Peters, Dynaloy, LLC Samuel Mony, Jiang Wang, Tom Grayson Skyworks Solutions, Inc., Thorsten Matthias, Thomas Glinsner, Martin Schmidbauer EV GroupSpencer Hochstetler, Dynaloy, LLC Samuel Mony, Jiang Wang, Tom Grayson Skyworks Solutions, Inc., Thorsten Matthias, Thomas Glinsner, Martin Schmidbauer EV GroupKeith Cox, Dynaloy, LLC Samuel Mony, Jiang Wang, Tom Grayson Skyworks Solutions, Inc., Thorsten Matthias, Thomas Glinsner, Martin Schmidbauer EV GroupPalmer Holbrook, Dynaloy, LLC Samuel Mony, Jiang Wang, Tom Grayson Skyworks Solutions, Inc., Thorsten Matthias, Thomas Glinsner, Martin Schmidbauer EV Group
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Puckett, Chris
TriQuint Semiconductor-
Set up and Characterization of an Optical Wide Stepper Process For DR15 Technology as a replacement for E-Beam Lithography
Amy Zhou, TriQuint Semiconductor, TXJerry Beene, TriQuint Semiconductor,TXMarcus King, TriQuint Semiconductor, TXMing-Yih Kao, Qorvo, Inc.Hua-Tang Chen, Qorvo, Inc.Chris Puckett, TriQuint Semiconductor
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R. Barnes, A.
ESA/ESTEC Noordwijk-
Preliminary Reliability Data from Accelerated RF Life Tests on European GaN HEMTs
A. R. Barnes, ESA/ESTEC NoordwijkF. Vitobello, ESA/ESTEC Noordwijk
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Rajaram, G.
University of Hyderabad-
New insights into formation of Ni-based alloyed Ohmic contacts to GaAs
G. Rajaram, University of Hyderabad
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Raman, Sanjay
Rodgers, Defense Advanced Research Projects Agency, Tsu-Hsi Chang, Booz Allen Hamilton Inc.-
The DARPA Diverse Accessible Heterogeneous Integration (DAHI) Program: Towards a Next-Generation Technology Platform for High-Performance Microsystems
Sanjay Raman, Rodgers, Defense Advanced Research Projects Agency, Tsu-Hsi Chang, Booz Allen Hamilton Inc.
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Rehder, E.
Kopin Corporation-
An In-Situ Reflectance Implementation for High Volume Electronic Device Epitaxial Wafer Production
M. Youngers, Kopin CorporationP. Rice, Kopin CorporationG. Yeboah, Kopin CorporationE. Rehder, Kopin CorporationO. Laboutin, Kopin CorporationK. S. Stevens, Kopin Corporation
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Renc, Shuh-Sen
a) Chang Gung University b) Center National Cheng Kung University c) Chung Shan Institute of Science and Technology-
Improved Gate leakage and Microwave Performance by Inserting A Thin Erbium oxide layer on AlGaN/GaN/Silicon HEMT Structure
Fu-Chuan Chua, a) Chang Gung University b) Center National Cheng Kung University c) Chung Shan Institute of Science and TechnologyYing-Jie Tsaia, a) Chang Gung University b) Center National Cheng Kung University c) Chung Shan Institute of Science and TechnologySheng-Yu Liaoa, a) Chang Gung University b) Center National Cheng Kung University c) Chung Shan Institute of Science and TechnologyChou-Shuang Huanga, a) Chang Gung University b) Center National Cheng Kung University c) Chung Shan Institute of Science and TechnologyRay-Ming Lina, a) Chang Gung University b) Center National Cheng Kung University c) Chung Shan Institute of Science and TechnologySheng-Fu Yub, a) Chang Gung University b) Center National Cheng Kung University c) Chung Shan Institute of Science and TechnologyShuh-Sen Renc, a) Chang Gung University b) Center National Cheng Kung University c) Chung Shan Institute of Science and Technology
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Rice, P.
Kopin Corporation-
An In-Situ Reflectance Implementation for High Volume Electronic Device Epitaxial Wafer Production
M. Youngers, Kopin CorporationP. Rice, Kopin CorporationG. Yeboah, Kopin CorporationE. Rehder, Kopin CorporationO. Laboutin, Kopin CorporationK. S. Stevens, Kopin Corporation
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Rosner, Danny
MAX I.E.G. LLC-
The Best MES Selection Process & Benchmark Survey For a Semiconductor Fab Case Study
Danny Rosner, MAX I.E.G. LLCAriel Meyuhas, The MAX Group
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Ruan, Ju-Ai
Qorvo Inc.-
Backside Via Process of GaN Device Fabrication
Ju-Ai Ruan, Qorvo Inc.Craig Hall, QorvoCelicia Della-Morrow, TriQuint SemiconductorTom Nagle, Qorvo, Inc.Yinbao Yang, Qorvo, Inc.
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Rubin, Holly
Plasma-Therm LLC-
The Effects of Increasing the Aspect Ratio of GaAs Backside Vias
Holly Rubin, Plasma-Therm LLCDwarakanath Geerpuram, Plasma-Therm LLCRuss Westerman, Plasma-Therm, LLC
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S. Katzer, D.
-
40 nm T-Gate Process Development using ZEP Reflow
D. J. MeyerB. P. DowneyR. Bass, Naval Research LaboratoryD. S. Katzer
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S. Stevens, K.
Kopin Corporation-
An In-Situ Reflectance Implementation for High Volume Electronic Device Epitaxial Wafer Production
M. Youngers, Kopin CorporationP. Rice, Kopin CorporationG. Yeboah, Kopin CorporationE. Rehder, Kopin CorporationO. Laboutin, Kopin CorporationK. S. Stevens, Kopin Corporation
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S. Whelan, Colin
Raytheon Company-
GaN Technology for Radars
Colin S. Whelan, Raytheon CompanyNicholas J. Kolias, Raytheon CompanySteven Brierley, Raytheon CompanyChris MacDonald, Raytheon CompanySteven Bernstein, Raytheon Company
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Schenk, Hermann
Azur Space Solar Power GmbH, Roy Blunt, IQE plc, Sylvi Claußnitzer, GAIT Consultant, Iwan Davies, IQE plc, Gerhard Hirschle, United Monolithic-
The CLP Regulation – Opportunity for Global Standardization of Substance Classifications or Threat to Innovation from Regulatory Overreach?
Hermann Schenk, Azur Space Solar Power GmbH, Roy Blunt, IQE plc, Sylvi Claußnitzer, GAIT Consultant, Iwan Davies, IQE plc, Gerhard Hirschle, United MonolithicFreiberger Compound Materials, Azur Space Solar Power GmbH, Roy Blunt, IQE plc, Sylvi Claußnitzer, GAIT Consultant, Iwan Davies, IQE plc, Gerhard Hirschle, United MonolithicSteve Aden, Azur Space Solar Power GmbH, Roy Blunt, IQE plc, Sylvi Claußnitzer, GAIT Consultant, Iwan Davies, IQE plc, Gerhard Hirschle, United MonolithicAvago Technologies, Azur Space Solar Power GmbH, Roy Blunt, IQE plc, Sylvi Claußnitzer, GAIT Consultant, Iwan Davies, IQE plc, Gerhard Hirschle, United MonolithicHani Badawi, Azur Space Solar Power GmbH, Roy Blunt, IQE plc, Sylvi Claußnitzer, GAIT Consultant, Iwan Davies, IQE plc, Gerhard Hirschle, United MonolithicAXT, Azur Space Solar Power GmbH, Roy Blunt, IQE plc, Sylvi Claußnitzer, GAIT Consultant, Iwan Davies, IQE plc, Gerhard Hirschle, United MonolithicThomas Bergunde, Azur Space Solar Power GmbH, Roy Blunt, IQE plc, Sylvi Claußnitzer, GAIT Consultant, Iwan Davies, IQE plc, Gerhard Hirschle, United MonolithicSemiconductors GmbH, Azur Space Solar Power GmbH, Roy Blunt, IQE plc, Sylvi Claußnitzer, GAIT Consultant, Iwan Davies, IQE plc, Gerhard Hirschle, United MonolithicRainer Krause, Azur Space Solar Power GmbH, Roy Blunt, IQE plc, Sylvi Claußnitzer, GAIT Consultant, Iwan Davies, IQE plc, Gerhard Hirschle, United MonolithicSoitec, Azur Space Solar Power GmbH, Roy Blunt, IQE plc, Sylvi Claußnitzer, GAIT Consultant, Iwan Davies, IQE plc, Gerhard Hirschle, United MonolithicBirgit Müller, Azur Space Solar Power GmbH, Roy Blunt, IQE plc, Sylvi Claußnitzer, GAIT Consultant, Iwan Davies, IQE plc, Gerhard Hirschle, United MonolithicThomas Pearsall, Azur Space Solar Power GmbH, Roy Blunt, IQE plc, Sylvi Claußnitzer, GAIT Consultant, Iwan Davies, IQE plc, Gerhard Hirschle, United MonolithicEPIC Association, Azur Space Solar Power GmbH, Roy Blunt, IQE plc, Sylvi Claußnitzer, GAIT Consultant, Iwan Davies, IQE plc, Gerhard Hirschle, United MonolithicJohn Sharp, Azur Space Solar Power GmbH, Roy Blunt, IQE plc, Sylvi Claußnitzer, GAIT Consultant, Iwan Davies, IQE plc, Gerhard Hirschle, United MonolithicTriQuint Semiconductor
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Semiconductor, TriQuint
-
The CLP Regulation – Opportunity for Global Standardization of Substance Classifications or Threat to Innovation from Regulatory Overreach?
Hermann Schenk, Azur Space Solar Power GmbH, Roy Blunt, IQE plc, Sylvi Claußnitzer, GAIT Consultant, Iwan Davies, IQE plc, Gerhard Hirschle, United MonolithicFreiberger Compound Materials, Azur Space Solar Power GmbH, Roy Blunt, IQE plc, Sylvi Claußnitzer, GAIT Consultant, Iwan Davies, IQE plc, Gerhard Hirschle, United MonolithicSteve Aden, Azur Space Solar Power GmbH, Roy Blunt, IQE plc, Sylvi Claußnitzer, GAIT Consultant, Iwan Davies, IQE plc, Gerhard Hirschle, United MonolithicAvago Technologies, Azur Space Solar Power GmbH, Roy Blunt, IQE plc, Sylvi Claußnitzer, GAIT Consultant, Iwan Davies, IQE plc, Gerhard Hirschle, United MonolithicHani Badawi, Azur Space Solar Power GmbH, Roy Blunt, IQE plc, Sylvi Claußnitzer, GAIT Consultant, Iwan Davies, IQE plc, Gerhard Hirschle, United MonolithicAXT, Azur Space Solar Power GmbH, Roy Blunt, IQE plc, Sylvi Claußnitzer, GAIT Consultant, Iwan Davies, IQE plc, Gerhard Hirschle, United MonolithicThomas Bergunde, Azur Space Solar Power GmbH, Roy Blunt, IQE plc, Sylvi Claußnitzer, GAIT Consultant, Iwan Davies, IQE plc, Gerhard Hirschle, United MonolithicSemiconductors GmbH, Azur Space Solar Power GmbH, Roy Blunt, IQE plc, Sylvi Claußnitzer, GAIT Consultant, Iwan Davies, IQE plc, Gerhard Hirschle, United MonolithicRainer Krause, Azur Space Solar Power GmbH, Roy Blunt, IQE plc, Sylvi Claußnitzer, GAIT Consultant, Iwan Davies, IQE plc, Gerhard Hirschle, United MonolithicSoitec, Azur Space Solar Power GmbH, Roy Blunt, IQE plc, Sylvi Claußnitzer, GAIT Consultant, Iwan Davies, IQE plc, Gerhard Hirschle, United MonolithicBirgit Müller, Azur Space Solar Power GmbH, Roy Blunt, IQE plc, Sylvi Claußnitzer, GAIT Consultant, Iwan Davies, IQE plc, Gerhard Hirschle, United MonolithicThomas Pearsall, Azur Space Solar Power GmbH, Roy Blunt, IQE plc, Sylvi Claußnitzer, GAIT Consultant, Iwan Davies, IQE plc, Gerhard Hirschle, United MonolithicEPIC Association, Azur Space Solar Power GmbH, Roy Blunt, IQE plc, Sylvi Claußnitzer, GAIT Consultant, Iwan Davies, IQE plc, Gerhard Hirschle, United MonolithicJohn Sharp, Azur Space Solar Power GmbH, Roy Blunt, IQE plc, Sylvi Claußnitzer, GAIT Consultant, Iwan Davies, IQE plc, Gerhard Hirschle, United MonolithicTriQuint Semiconductor
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Sharp, John
Azur Space Solar Power GmbH, Roy Blunt, IQE plc, Sylvi Claußnitzer, GAIT Consultant, Iwan Davies, IQE plc, Gerhard Hirschle, United Monolithic-
The CLP Regulation – Opportunity for Global Standardization of Substance Classifications or Threat to Innovation from Regulatory Overreach?
Hermann Schenk, Azur Space Solar Power GmbH, Roy Blunt, IQE plc, Sylvi Claußnitzer, GAIT Consultant, Iwan Davies, IQE plc, Gerhard Hirschle, United MonolithicFreiberger Compound Materials, Azur Space Solar Power GmbH, Roy Blunt, IQE plc, Sylvi Claußnitzer, GAIT Consultant, Iwan Davies, IQE plc, Gerhard Hirschle, United MonolithicSteve Aden, Azur Space Solar Power GmbH, Roy Blunt, IQE plc, Sylvi Claußnitzer, GAIT Consultant, Iwan Davies, IQE plc, Gerhard Hirschle, United MonolithicAvago Technologies, Azur Space Solar Power GmbH, Roy Blunt, IQE plc, Sylvi Claußnitzer, GAIT Consultant, Iwan Davies, IQE plc, Gerhard Hirschle, United MonolithicHani Badawi, Azur Space Solar Power GmbH, Roy Blunt, IQE plc, Sylvi Claußnitzer, GAIT Consultant, Iwan Davies, IQE plc, Gerhard Hirschle, United MonolithicAXT, Azur Space Solar Power GmbH, Roy Blunt, IQE plc, Sylvi Claußnitzer, GAIT Consultant, Iwan Davies, IQE plc, Gerhard Hirschle, United MonolithicThomas Bergunde, Azur Space Solar Power GmbH, Roy Blunt, IQE plc, Sylvi Claußnitzer, GAIT Consultant, Iwan Davies, IQE plc, Gerhard Hirschle, United MonolithicSemiconductors GmbH, Azur Space Solar Power GmbH, Roy Blunt, IQE plc, Sylvi Claußnitzer, GAIT Consultant, Iwan Davies, IQE plc, Gerhard Hirschle, United MonolithicRainer Krause, Azur Space Solar Power GmbH, Roy Blunt, IQE plc, Sylvi Claußnitzer, GAIT Consultant, Iwan Davies, IQE plc, Gerhard Hirschle, United MonolithicSoitec, Azur Space Solar Power GmbH, Roy Blunt, IQE plc, Sylvi Claußnitzer, GAIT Consultant, Iwan Davies, IQE plc, Gerhard Hirschle, United MonolithicBirgit Müller, Azur Space Solar Power GmbH, Roy Blunt, IQE plc, Sylvi Claußnitzer, GAIT Consultant, Iwan Davies, IQE plc, Gerhard Hirschle, United MonolithicThomas Pearsall, Azur Space Solar Power GmbH, Roy Blunt, IQE plc, Sylvi Claußnitzer, GAIT Consultant, Iwan Davies, IQE plc, Gerhard Hirschle, United MonolithicEPIC Association, Azur Space Solar Power GmbH, Roy Blunt, IQE plc, Sylvi Claußnitzer, GAIT Consultant, Iwan Davies, IQE plc, Gerhard Hirschle, United MonolithicJohn Sharp, Azur Space Solar Power GmbH, Roy Blunt, IQE plc, Sylvi Claußnitzer, GAIT Consultant, Iwan Davies, IQE plc, Gerhard Hirschle, United MonolithicTriQuint Semiconductor
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Snodgrass, Ryan
TriQuint Semiconductor-
Bridging the Social Gap Working Together for Continued Prosperity and Growth
Ryan Snodgrass, TriQuint SemiconductorJinhong Yang, Qorvo
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Soitec,
Azur Space Solar Power GmbH, Roy Blunt, IQE plc, Sylvi Claußnitzer, GAIT Consultant, Iwan Davies, IQE plc, Gerhard Hirschle, United Monolithic-
The CLP Regulation – Opportunity for Global Standardization of Substance Classifications or Threat to Innovation from Regulatory Overreach?
Hermann Schenk, Azur Space Solar Power GmbH, Roy Blunt, IQE plc, Sylvi Claußnitzer, GAIT Consultant, Iwan Davies, IQE plc, Gerhard Hirschle, United MonolithicFreiberger Compound Materials, Azur Space Solar Power GmbH, Roy Blunt, IQE plc, Sylvi Claußnitzer, GAIT Consultant, Iwan Davies, IQE plc, Gerhard Hirschle, United MonolithicSteve Aden, Azur Space Solar Power GmbH, Roy Blunt, IQE plc, Sylvi Claußnitzer, GAIT Consultant, Iwan Davies, IQE plc, Gerhard Hirschle, United MonolithicAvago Technologies, Azur Space Solar Power GmbH, Roy Blunt, IQE plc, Sylvi Claußnitzer, GAIT Consultant, Iwan Davies, IQE plc, Gerhard Hirschle, United MonolithicHani Badawi, Azur Space Solar Power GmbH, Roy Blunt, IQE plc, Sylvi Claußnitzer, GAIT Consultant, Iwan Davies, IQE plc, Gerhard Hirschle, United MonolithicAXT, Azur Space Solar Power GmbH, Roy Blunt, IQE plc, Sylvi Claußnitzer, GAIT Consultant, Iwan Davies, IQE plc, Gerhard Hirschle, United MonolithicThomas Bergunde, Azur Space Solar Power GmbH, Roy Blunt, IQE plc, Sylvi Claußnitzer, GAIT Consultant, Iwan Davies, IQE plc, Gerhard Hirschle, United MonolithicSemiconductors GmbH, Azur Space Solar Power GmbH, Roy Blunt, IQE plc, Sylvi Claußnitzer, GAIT Consultant, Iwan Davies, IQE plc, Gerhard Hirschle, United MonolithicRainer Krause, Azur Space Solar Power GmbH, Roy Blunt, IQE plc, Sylvi Claußnitzer, GAIT Consultant, Iwan Davies, IQE plc, Gerhard Hirschle, United MonolithicSoitec, Azur Space Solar Power GmbH, Roy Blunt, IQE plc, Sylvi Claußnitzer, GAIT Consultant, Iwan Davies, IQE plc, Gerhard Hirschle, United MonolithicBirgit Müller, Azur Space Solar Power GmbH, Roy Blunt, IQE plc, Sylvi Claußnitzer, GAIT Consultant, Iwan Davies, IQE plc, Gerhard Hirschle, United MonolithicThomas Pearsall, Azur Space Solar Power GmbH, Roy Blunt, IQE plc, Sylvi Claußnitzer, GAIT Consultant, Iwan Davies, IQE plc, Gerhard Hirschle, United MonolithicEPIC Association, Azur Space Solar Power GmbH, Roy Blunt, IQE plc, Sylvi Claußnitzer, GAIT Consultant, Iwan Davies, IQE plc, Gerhard Hirschle, United MonolithicJohn Sharp, Azur Space Solar Power GmbH, Roy Blunt, IQE plc, Sylvi Claußnitzer, GAIT Consultant, Iwan Davies, IQE plc, Gerhard Hirschle, United MonolithicTriQuint Semiconductor
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Stender, C.
MicroLink Devices, Inc.-
Epitaxial Lift-Off of Large-Area GaAs Thin-Film Multi-Junction Solar Cells
C. Youtsey, MicroLink Devices, Inc.J. Adams, MicroLink Devices, Inc.R. Chan, MicroLink Devices, Inc.V. Elarde, MicroLink Devices, Inc.G. Hillier, MicroLink Devices, Inc.M. Osowski, MicroLink Devices, Inc.D. McCallum, MicroLink Devices, Inc.H. Miyamoto, MicroLink Devices, Inc.N. Pan, MicroLink Devices, Inc.C. Stender, MicroLink Devices, Inc.R. Tatavarti, MicroLink Devices, Inc.F. Tuminello, MicroLink Devices, Inc.A. Wibowo, MicroLink Devices, Inc.
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Stevenson, Richard
Consultant Editor, Compound Semiconductor magazine-
Europe’s Compound Semiconductor Industry
Richard Stevenson, Consultant Editor, Compound Semiconductor magazine
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Stewart, E.J.
Northrop Grumman Electronic Systems-
Low-Loss Metal-on-BCB Technology for Next-Generation GaN MMICs
E.J. Stewart, Northrop Grumman Electronic SystemsR.G. Freitag, Northrop Grumman Electronic SystemsJ. S. Mason, Northrop Grumman Mission SystemsM.J. Walker, Northrop Grumman Electronic SystemsH.G. Henry, Northrop Grumman Electronic Systems
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Su, Liang-Yu
National Taiwan University-
Demonstration of Low Subthreshold Swing a-InGaZnO Thin Film Transistors
Liang-Yu Su, National Taiwan UniversityHsin-Ying Lin, Graduate Institute of Photonics and Optoelectronics and 2National Taiwan UniversityHuang-Kai Lin, Neoton Optoelectronics, Inc.
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Suarez, Jose
-
A Call to Higher Quality in GaAs
Jose SuarezJason Fender -
Method for Detecting GaAs Die Fractures in Device Manufacturing Through the Use of a Designed Test Vehicle
Jason FenderJose Suarez
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Takatani, Shinichiro
WIN Semiconductors Corp-
Novel Bi-HEMT Technology for LTE Handset Application
Bing-Shan Hong, WIN Semiconductors Corp.Shu-Hsiao Tsai, WIN Semiconductors CorpCheng-Kuo Lin, WIN Semiconductors CorpShinichiro Takatani, WIN Semiconductors Corp
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Tanaka, T.
Hitachi Metals-
Removal of Surface-Related Current Slump in Field-Plate GaAs FETs
F. Hafiz, Shibaura Institute of TechnologyM. Kumeno, Shibaura Institute of TechnologyT. Tanaka, Hitachi Metals
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Tanaka, Takeshi
SCIOCS Company Ltd.-
Light response in buffer leakages and its application for epi quality development in AlGaN/GaN HEMT structures
Takeshi Tanaka, SCIOCS Company Ltd.Harry Kamogawa, Hitachi Cable, Ltd.
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Tatavarti, R.
MicroLink Devices, Inc.-
Epitaxial Lift-Off of Large-Area GaAs Thin-Film Multi-Junction Solar Cells
C. Youtsey, MicroLink Devices, Inc.J. Adams, MicroLink Devices, Inc.R. Chan, MicroLink Devices, Inc.V. Elarde, MicroLink Devices, Inc.G. Hillier, MicroLink Devices, Inc.M. Osowski, MicroLink Devices, Inc.D. McCallum, MicroLink Devices, Inc.H. Miyamoto, MicroLink Devices, Inc.N. Pan, MicroLink Devices, Inc.C. Stender, MicroLink Devices, Inc.R. Tatavarti, MicroLink Devices, Inc.F. Tuminello, MicroLink Devices, Inc.A. Wibowo, MicroLink Devices, Inc.
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Technologies, Avago
Azur Space Solar Power GmbH, Roy Blunt, IQE plc, Sylvi Claußnitzer, GAIT Consultant, Iwan Davies, IQE plc, Gerhard Hirschle, United Monolithic-
The CLP Regulation – Opportunity for Global Standardization of Substance Classifications or Threat to Innovation from Regulatory Overreach?
Hermann Schenk, Azur Space Solar Power GmbH, Roy Blunt, IQE plc, Sylvi Claußnitzer, GAIT Consultant, Iwan Davies, IQE plc, Gerhard Hirschle, United MonolithicFreiberger Compound Materials, Azur Space Solar Power GmbH, Roy Blunt, IQE plc, Sylvi Claußnitzer, GAIT Consultant, Iwan Davies, IQE plc, Gerhard Hirschle, United MonolithicSteve Aden, Azur Space Solar Power GmbH, Roy Blunt, IQE plc, Sylvi Claußnitzer, GAIT Consultant, Iwan Davies, IQE plc, Gerhard Hirschle, United MonolithicAvago Technologies, Azur Space Solar Power GmbH, Roy Blunt, IQE plc, Sylvi Claußnitzer, GAIT Consultant, Iwan Davies, IQE plc, Gerhard Hirschle, United MonolithicHani Badawi, Azur Space Solar Power GmbH, Roy Blunt, IQE plc, Sylvi Claußnitzer, GAIT Consultant, Iwan Davies, IQE plc, Gerhard Hirschle, United MonolithicAXT, Azur Space Solar Power GmbH, Roy Blunt, IQE plc, Sylvi Claußnitzer, GAIT Consultant, Iwan Davies, IQE plc, Gerhard Hirschle, United MonolithicThomas Bergunde, Azur Space Solar Power GmbH, Roy Blunt, IQE plc, Sylvi Claußnitzer, GAIT Consultant, Iwan Davies, IQE plc, Gerhard Hirschle, United MonolithicSemiconductors GmbH, Azur Space Solar Power GmbH, Roy Blunt, IQE plc, Sylvi Claußnitzer, GAIT Consultant, Iwan Davies, IQE plc, Gerhard Hirschle, United MonolithicRainer Krause, Azur Space Solar Power GmbH, Roy Blunt, IQE plc, Sylvi Claußnitzer, GAIT Consultant, Iwan Davies, IQE plc, Gerhard Hirschle, United MonolithicSoitec, Azur Space Solar Power GmbH, Roy Blunt, IQE plc, Sylvi Claußnitzer, GAIT Consultant, Iwan Davies, IQE plc, Gerhard Hirschle, United MonolithicBirgit Müller, Azur Space Solar Power GmbH, Roy Blunt, IQE plc, Sylvi Claußnitzer, GAIT Consultant, Iwan Davies, IQE plc, Gerhard Hirschle, United MonolithicThomas Pearsall, Azur Space Solar Power GmbH, Roy Blunt, IQE plc, Sylvi Claußnitzer, GAIT Consultant, Iwan Davies, IQE plc, Gerhard Hirschle, United MonolithicEPIC Association, Azur Space Solar Power GmbH, Roy Blunt, IQE plc, Sylvi Claußnitzer, GAIT Consultant, Iwan Davies, IQE plc, Gerhard Hirschle, United MonolithicJohn Sharp, Azur Space Solar Power GmbH, Roy Blunt, IQE plc, Sylvi Claußnitzer, GAIT Consultant, Iwan Davies, IQE plc, Gerhard Hirschle, United MonolithicTriQuint Semiconductor
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Ting, Hao-Yu
WIN Semiconductors Corp.-
To Improve E-beam T-gate Yield by Pre-Cleaning Process
Hao-Yu Ting, WIN Semiconductors Corp.John Huang, WIN Semiconductors Corp.Hsi-Tsung Lin, WIN Semiconductors Corp.Eric Kuo, WIN Semiconductors Corp.Se-Jung Lee, WIN Semiconductors Corp.David Wu, WIN Semiconductors CorpWilliam Lai, WIN Semiconductors Corp.Kerry Chang, WIN Semiconductors Corp.Wen-Kai Wang, WIN Semiconductors Corp.
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Tsai, Shu-Hsiao
WIN Semiconductors Corp-
Novel Bi-HEMT Technology for LTE Handset Application
Bing-Shan Hong, WIN Semiconductors Corp.Shu-Hsiao Tsai, WIN Semiconductors CorpCheng-Kuo Lin, WIN Semiconductors CorpShinichiro Takatani, WIN Semiconductors Corp
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Tsai a, Ming-Jinn
Cheng-Tyng Yen (a, Patrick Chuang (b,Young-Shying Chen (a, Chien-Chung Hung (a, Chwan-Ying Lee (a, Lurng-Shehng Lee (a, Tzu-Ming Yang (a, Kuan-Wei Chu (a, Ming-Jinn Tsai (a, Gary Chen (b, Tony Huang (b-
Characteristics of 4H-SiC Dual-Metal and MOS Trench Schottky Rectifiers
Cheng-Tyng Yen a, Cheng-Tyng Yen (a, Patrick Chuang (b,Young-Shying Chen (a, Chien-Chung Hung (a, Chwan-Ying Lee (a, Lurng-Shehng Lee (a, Tzu-Ming Yang (a, Kuan-Wei Chu (a, Ming-Jinn Tsai (a, Gary Chen (b, Tony Huang (bPatrick Chuang b, Cheng-Tyng Yen (a, Patrick Chuang (b,Young-Shying Chen (a, Chien-Chung Hung (a, Chwan-Ying Lee (a, Lurng-Shehng Lee (a, Tzu-Ming Yang (a, Kuan-Wei Chu (a, Ming-Jinn Tsai (a, Gary Chen (b, Tony Huang (bYoung-Shying Chen a, Cheng-Tyng Yen (a, Patrick Chuang (b,Young-Shying Chen (a, Chien-Chung Hung (a, Chwan-Ying Lee (a, Lurng-Shehng Lee (a, Tzu-Ming Yang (a, Kuan-Wei Chu (a, Ming-Jinn Tsai (a, Gary Chen (b, Tony Huang (bChien-Chung Hung a, Cheng-Tyng Yen (a, Patrick Chuang (b,Young-Shying Chen (a, Chien-Chung Hung (a, Chwan-Ying Lee (a, Lurng-Shehng Lee (a, Tzu-Ming Yang (a, Kuan-Wei Chu (a, Ming-Jinn Tsai (a, Gary Chen (b, Tony Huang (bChwan-Ying Lee a, Cheng-Tyng Yen (a, Patrick Chuang (b,Young-Shying Chen (a, Chien-Chung Hung (a, Chwan-Ying Lee (a, Lurng-Shehng Lee (a, Tzu-Ming Yang (a, Kuan-Wei Chu (a, Ming-Jinn Tsai (a, Gary Chen (b, Tony Huang (bLurng-Shehng Lee a, Cheng-Tyng Yen (a, Patrick Chuang (b,Young-Shying Chen (a, Chien-Chung Hung (a, Chwan-Ying Lee (a, Lurng-Shehng Lee (a, Tzu-Ming Yang (a, Kuan-Wei Chu (a, Ming-Jinn Tsai (a, Gary Chen (b, Tony Huang (bTzu-Ming Yang a, Cheng-Tyng Yen (a, Patrick Chuang (b,Young-Shying Chen (a, Chien-Chung Hung (a, Chwan-Ying Lee (a, Lurng-Shehng Lee (a, Tzu-Ming Yang (a, Kuan-Wei Chu (a, Ming-Jinn Tsai (a, Gary Chen (b, Tony Huang (bKuan-Wei Chu a, Cheng-Tyng Yen (a, Patrick Chuang (b,Young-Shying Chen (a, Chien-Chung Hung (a, Chwan-Ying Lee (a, Lurng-Shehng Lee (a, Tzu-Ming Yang (a, Kuan-Wei Chu (a, Ming-Jinn Tsai (a, Gary Chen (b, Tony Huang (bMing-Jinn Tsai a, Cheng-Tyng Yen (a, Patrick Chuang (b,Young-Shying Chen (a, Chien-Chung Hung (a, Chwan-Ying Lee (a, Lurng-Shehng Lee (a, Tzu-Ming Yang (a, Kuan-Wei Chu (a, Ming-Jinn Tsai (a, Gary Chen (b, Tony Huang (bGary Chen b, Cheng-Tyng Yen (a, Patrick Chuang (b,Young-Shying Chen (a, Chien-Chung Hung (a, Chwan-Ying Lee (a, Lurng-Shehng Lee (a, Tzu-Ming Yang (a, Kuan-Wei Chu (a, Ming-Jinn Tsai (a, Gary Chen (b, Tony Huang (bTony Huang b, Cheng-Tyng Yen (a, Patrick Chuang (b,Young-Shying Chen (a, Chien-Chung Hung (a, Chwan-Ying Lee (a, Lurng-Shehng Lee (a, Tzu-Ming Yang (a, Kuan-Wei Chu (a, Ming-Jinn Tsai (a, Gary Chen (b, Tony Huang (b
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Tsaia, Ying-Jie
a) Chang Gung University b) Center National Cheng Kung University c) Chung Shan Institute of Science and Technology-
Improved Gate leakage and Microwave Performance by Inserting A Thin Erbium oxide layer on AlGaN/GaN/Silicon HEMT Structure
Fu-Chuan Chua, a) Chang Gung University b) Center National Cheng Kung University c) Chung Shan Institute of Science and TechnologyYing-Jie Tsaia, a) Chang Gung University b) Center National Cheng Kung University c) Chung Shan Institute of Science and TechnologySheng-Yu Liaoa, a) Chang Gung University b) Center National Cheng Kung University c) Chung Shan Institute of Science and TechnologyChou-Shuang Huanga, a) Chang Gung University b) Center National Cheng Kung University c) Chung Shan Institute of Science and TechnologyRay-Ming Lina, a) Chang Gung University b) Center National Cheng Kung University c) Chung Shan Institute of Science and TechnologySheng-Fu Yub, a) Chang Gung University b) Center National Cheng Kung University c) Chung Shan Institute of Science and TechnologyShuh-Sen Renc, a) Chang Gung University b) Center National Cheng Kung University c) Chung Shan Institute of Science and Technology
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Tsumura, Akihiro
Sangyo Times, Inc.-
Present Situation and Trend of Compound Semiconductor Industry in Japan
Akihiro Tsumura, Sangyo Times, Inc.
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Tuminello, F.
MicroLink Devices, Inc.-
Epitaxial Lift-Off of Large-Area GaAs Thin-Film Multi-Junction Solar Cells
C. Youtsey, MicroLink Devices, Inc.J. Adams, MicroLink Devices, Inc.R. Chan, MicroLink Devices, Inc.V. Elarde, MicroLink Devices, Inc.G. Hillier, MicroLink Devices, Inc.M. Osowski, MicroLink Devices, Inc.D. McCallum, MicroLink Devices, Inc.H. Miyamoto, MicroLink Devices, Inc.N. Pan, MicroLink Devices, Inc.C. Stender, MicroLink Devices, Inc.R. Tatavarti, MicroLink Devices, Inc.F. Tuminello, MicroLink Devices, Inc.A. Wibowo, MicroLink Devices, Inc.
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Vitobello, F.
ESA/ESTEC Noordwijk-
Preliminary Reliability Data from Accelerated RF Life Tests on European GaN HEMTs
A. R. Barnes, ESA/ESTEC NoordwijkF. Vitobello, ESA/ESTEC Noordwijk
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Walker, M.J.
Northrop Grumman Electronic Systems-
Low-Loss Metal-on-BCB Technology for Next-Generation GaN MMICs
E.J. Stewart, Northrop Grumman Electronic SystemsR.G. Freitag, Northrop Grumman Electronic SystemsJ. S. Mason, Northrop Grumman Mission SystemsM.J. Walker, Northrop Grumman Electronic SystemsH.G. Henry, Northrop Grumman Electronic Systems
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Wang, Cheng-Yin
Georgia Institute of Technology-
Threshold Voltage Control of Recessed-Gate III-N HFETs Using an Electrode-less Wet Etching Technique
Yi-Che Lee, Georgia Institute of TechnologyCheng-Yin Wang, Georgia Institute of TechnologyTsung-Ting Kao, Georgia Institute of Technology,
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Wang, Huang-Wen
WIN Semiconductors Corp.-
Yield Improvement for Thin 50 um GaAs Product Line
Rui-Ching Wei, WIN Semiconductors Corp.Huang-Wen Wang, WIN Semiconductors Corp.Chen-Che Chin, WIN Semiconductors Corp.Summer Chiang, WIN Semiconductors Corp.Jimmy Her, WIN Semiconductors Corp.Ping-Wei Chen, WIN Semiconductors Corp.Kevin Huang, WIN Semiconductors Corp.
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Wang, Wen-Kai
WIN Semiconductors Corp.-
To Improve E-beam T-gate Yield by Pre-Cleaning Process
Hao-Yu Ting, WIN Semiconductors Corp.John Huang, WIN Semiconductors Corp.Hsi-Tsung Lin, WIN Semiconductors Corp.Eric Kuo, WIN Semiconductors Corp.Se-Jung Lee, WIN Semiconductors Corp.David Wu, WIN Semiconductors CorpWilliam Lai, WIN Semiconductors Corp.Kerry Chang, WIN Semiconductors Corp.Wen-Kai Wang, WIN Semiconductors Corp.
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Wei, Rui-Ching
WIN Semiconductors Corp.-
Yield Improvement for Thin 50 um GaAs Product Line
Rui-Ching Wei, WIN Semiconductors Corp.Huang-Wen Wang, WIN Semiconductors Corp.Chen-Che Chin, WIN Semiconductors Corp.Summer Chiang, WIN Semiconductors Corp.Jimmy Her, WIN Semiconductors Corp.Ping-Wei Chen, WIN Semiconductors Corp.Kevin Huang, WIN Semiconductors Corp.
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Welborn, Jennifer
Skyworks Solutions-
Successful GaAs Backend Process Improvement
Scott Farmosa, Skyworks SolutionsJennifer Welborn, Skyworks SolutionsDaniel Nercessian, Skyworks Solutions
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Westerman, Russ
Plasma-Therm, LLC-
The Effects of Increasing the Aspect Ratio of GaAs Backside Vias
Holly Rubin, Plasma-Therm LLCDwarakanath Geerpuram, Plasma-Therm LLCRuss Westerman, Plasma-Therm, LLC
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Wibowo, A.
MicroLink Devices, Inc.-
Epitaxial Lift-Off of Large-Area GaAs Thin-Film Multi-Junction Solar Cells
C. Youtsey, MicroLink Devices, Inc.J. Adams, MicroLink Devices, Inc.R. Chan, MicroLink Devices, Inc.V. Elarde, MicroLink Devices, Inc.G. Hillier, MicroLink Devices, Inc.M. Osowski, MicroLink Devices, Inc.D. McCallum, MicroLink Devices, Inc.H. Miyamoto, MicroLink Devices, Inc.N. Pan, MicroLink Devices, Inc.C. Stender, MicroLink Devices, Inc.R. Tatavarti, MicroLink Devices, Inc.F. Tuminello, MicroLink Devices, Inc.A. Wibowo, MicroLink Devices, Inc.
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Wu, David
WIN Semiconductors Corp-
To Improve E-beam T-gate Yield by Pre-Cleaning Process
Hao-Yu Ting, WIN Semiconductors Corp.John Huang, WIN Semiconductors Corp.Hsi-Tsung Lin, WIN Semiconductors Corp.Eric Kuo, WIN Semiconductors Corp.Se-Jung Lee, WIN Semiconductors Corp.David Wu, WIN Semiconductors CorpWilliam Lai, WIN Semiconductors Corp.Kerry Chang, WIN Semiconductors Corp.Wen-Kai Wang, WIN Semiconductors Corp.
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Xu, Huiming
University of Illinois at Urbana-Champaign-
Non-Linearity Characterization of Submicron Type-I InP/InGaAs/InP and Type-I/II AlInP/GaAsSb/InP DHBTs
Huiming Xu, University of Illinois at Urbana-ChampaignEric Iverson, University of Illinois at Urbana-ChampaignK.Y. Donald Cheng, University of Illinois at Urbana-Champaign
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Xuan, Rong
Technology Development Division, Episil-Precision Inc, Taiwan-
Novel of Normally-off GaN HEMT Device Structure by Using Nano-rods Technology
Chwan-Ying Lee, Electronics and OptoElectronics Research Laboratories (EOL), ITRYoung-Shying Chen, Electronics and OptoElectronics Research Laboratories (EOL), ITRLurng-Shehng Lee, Electronics and OptoElectronics Research Laboratories (EOL), ITRChien-Chung Hung, Electronics and OptoElectronics Research Laboratories (EOL), ITRCheng-Tyng Yen, Electronics and OptoElectronics Research Laboratories (EOL), ITRSuh-Fang Lin, Electronics and OptoElectronics Research Laboratories (EOL), ITRRong Xuan, Technology Development Division, Episil-Precision Inc, TaiwanWei-Hung Kuo, Industrial Technology Research InstituteTzu-Kun Ku, Electronics and OptoElectronics Research Laboratories (EOL), ITR
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Yang, Jinhong
Qorvo-
Bridging the Social Gap Working Together for Continued Prosperity and Growth
Ryan Snodgrass, TriQuint SemiconductorJinhong Yang, Qorvo
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Yang, Shu
The Hong Kong University of Science and Technology-
ALD-grown Ultrathin AlN Film for Passivation of AlGaN/GaN HEMTs
Sen Huang*, Student Presentation , Hong Kong University of Science and Technology, Institute of Microelectronics Chinese Academy of ScienceQimeng Jiang, The Hong Kong University of Science and TechnologyShu Yang, The Hong Kong University of Science and TechnologyChunhua Zhou, Hong Kong University of Science and Technology
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Yang, Yinbao
Qorvo, Inc.-
Backside Via Process of GaN Device Fabrication
Ju-Ai Ruan, Qorvo Inc.Craig Hall, QorvoCelicia Della-Morrow, TriQuint SemiconductorTom Nagle, Qorvo, Inc.Yinbao Yang, Qorvo, Inc.
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Yang a, Tzu-Ming
Cheng-Tyng Yen (a, Patrick Chuang (b,Young-Shying Chen (a, Chien-Chung Hung (a, Chwan-Ying Lee (a, Lurng-Shehng Lee (a, Tzu-Ming Yang (a, Kuan-Wei Chu (a, Ming-Jinn Tsai (a, Gary Chen (b, Tony Huang (b-
Characteristics of 4H-SiC Dual-Metal and MOS Trench Schottky Rectifiers
Cheng-Tyng Yen a, Cheng-Tyng Yen (a, Patrick Chuang (b,Young-Shying Chen (a, Chien-Chung Hung (a, Chwan-Ying Lee (a, Lurng-Shehng Lee (a, Tzu-Ming Yang (a, Kuan-Wei Chu (a, Ming-Jinn Tsai (a, Gary Chen (b, Tony Huang (bPatrick Chuang b, Cheng-Tyng Yen (a, Patrick Chuang (b,Young-Shying Chen (a, Chien-Chung Hung (a, Chwan-Ying Lee (a, Lurng-Shehng Lee (a, Tzu-Ming Yang (a, Kuan-Wei Chu (a, Ming-Jinn Tsai (a, Gary Chen (b, Tony Huang (bYoung-Shying Chen a, Cheng-Tyng Yen (a, Patrick Chuang (b,Young-Shying Chen (a, Chien-Chung Hung (a, Chwan-Ying Lee (a, Lurng-Shehng Lee (a, Tzu-Ming Yang (a, Kuan-Wei Chu (a, Ming-Jinn Tsai (a, Gary Chen (b, Tony Huang (bChien-Chung Hung a, Cheng-Tyng Yen (a, Patrick Chuang (b,Young-Shying Chen (a, Chien-Chung Hung (a, Chwan-Ying Lee (a, Lurng-Shehng Lee (a, Tzu-Ming Yang (a, Kuan-Wei Chu (a, Ming-Jinn Tsai (a, Gary Chen (b, Tony Huang (bChwan-Ying Lee a, Cheng-Tyng Yen (a, Patrick Chuang (b,Young-Shying Chen (a, Chien-Chung Hung (a, Chwan-Ying Lee (a, Lurng-Shehng Lee (a, Tzu-Ming Yang (a, Kuan-Wei Chu (a, Ming-Jinn Tsai (a, Gary Chen (b, Tony Huang (bLurng-Shehng Lee a, Cheng-Tyng Yen (a, Patrick Chuang (b,Young-Shying Chen (a, Chien-Chung Hung (a, Chwan-Ying Lee (a, Lurng-Shehng Lee (a, Tzu-Ming Yang (a, Kuan-Wei Chu (a, Ming-Jinn Tsai (a, Gary Chen (b, Tony Huang (bTzu-Ming Yang a, Cheng-Tyng Yen (a, Patrick Chuang (b,Young-Shying Chen (a, Chien-Chung Hung (a, Chwan-Ying Lee (a, Lurng-Shehng Lee (a, Tzu-Ming Yang (a, Kuan-Wei Chu (a, Ming-Jinn Tsai (a, Gary Chen (b, Tony Huang (bKuan-Wei Chu a, Cheng-Tyng Yen (a, Patrick Chuang (b,Young-Shying Chen (a, Chien-Chung Hung (a, Chwan-Ying Lee (a, Lurng-Shehng Lee (a, Tzu-Ming Yang (a, Kuan-Wei Chu (a, Ming-Jinn Tsai (a, Gary Chen (b, Tony Huang (bMing-Jinn Tsai a, Cheng-Tyng Yen (a, Patrick Chuang (b,Young-Shying Chen (a, Chien-Chung Hung (a, Chwan-Ying Lee (a, Lurng-Shehng Lee (a, Tzu-Ming Yang (a, Kuan-Wei Chu (a, Ming-Jinn Tsai (a, Gary Chen (b, Tony Huang (bGary Chen b, Cheng-Tyng Yen (a, Patrick Chuang (b,Young-Shying Chen (a, Chien-Chung Hung (a, Chwan-Ying Lee (a, Lurng-Shehng Lee (a, Tzu-Ming Yang (a, Kuan-Wei Chu (a, Ming-Jinn Tsai (a, Gary Chen (b, Tony Huang (bTony Huang b, Cheng-Tyng Yen (a, Patrick Chuang (b,Young-Shying Chen (a, Chien-Chung Hung (a, Chwan-Ying Lee (a, Lurng-Shehng Lee (a, Tzu-Ming Yang (a, Kuan-Wei Chu (a, Ming-Jinn Tsai (a, Gary Chen (b, Tony Huang (b
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Yeboah, G.
Kopin Corporation-
An In-Situ Reflectance Implementation for High Volume Electronic Device Epitaxial Wafer Production
M. Youngers, Kopin CorporationP. Rice, Kopin CorporationG. Yeboah, Kopin CorporationE. Rehder, Kopin CorporationO. Laboutin, Kopin CorporationK. S. Stevens, Kopin Corporation
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Yen, Cheng-Tyng
Electronics and OptoElectronics Research Laboratories (EOL), ITR-
Novel of Normally-off GaN HEMT Device Structure by Using Nano-rods Technology
Chwan-Ying Lee, Electronics and OptoElectronics Research Laboratories (EOL), ITRYoung-Shying Chen, Electronics and OptoElectronics Research Laboratories (EOL), ITRLurng-Shehng Lee, Electronics and OptoElectronics Research Laboratories (EOL), ITRChien-Chung Hung, Electronics and OptoElectronics Research Laboratories (EOL), ITRCheng-Tyng Yen, Electronics and OptoElectronics Research Laboratories (EOL), ITRSuh-Fang Lin, Electronics and OptoElectronics Research Laboratories (EOL), ITRRong Xuan, Technology Development Division, Episil-Precision Inc, TaiwanWei-Hung Kuo, Industrial Technology Research InstituteTzu-Kun Ku, Electronics and OptoElectronics Research Laboratories (EOL), ITR
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Yen a, Cheng-Tyng
Cheng-Tyng Yen (a, Patrick Chuang (b,Young-Shying Chen (a, Chien-Chung Hung (a, Chwan-Ying Lee (a, Lurng-Shehng Lee (a, Tzu-Ming Yang (a, Kuan-Wei Chu (a, Ming-Jinn Tsai (a, Gary Chen (b, Tony Huang (b-
Characteristics of 4H-SiC Dual-Metal and MOS Trench Schottky Rectifiers
Cheng-Tyng Yen a, Cheng-Tyng Yen (a, Patrick Chuang (b,Young-Shying Chen (a, Chien-Chung Hung (a, Chwan-Ying Lee (a, Lurng-Shehng Lee (a, Tzu-Ming Yang (a, Kuan-Wei Chu (a, Ming-Jinn Tsai (a, Gary Chen (b, Tony Huang (bPatrick Chuang b, Cheng-Tyng Yen (a, Patrick Chuang (b,Young-Shying Chen (a, Chien-Chung Hung (a, Chwan-Ying Lee (a, Lurng-Shehng Lee (a, Tzu-Ming Yang (a, Kuan-Wei Chu (a, Ming-Jinn Tsai (a, Gary Chen (b, Tony Huang (bYoung-Shying Chen a, Cheng-Tyng Yen (a, Patrick Chuang (b,Young-Shying Chen (a, Chien-Chung Hung (a, Chwan-Ying Lee (a, Lurng-Shehng Lee (a, Tzu-Ming Yang (a, Kuan-Wei Chu (a, Ming-Jinn Tsai (a, Gary Chen (b, Tony Huang (bChien-Chung Hung a, Cheng-Tyng Yen (a, Patrick Chuang (b,Young-Shying Chen (a, Chien-Chung Hung (a, Chwan-Ying Lee (a, Lurng-Shehng Lee (a, Tzu-Ming Yang (a, Kuan-Wei Chu (a, Ming-Jinn Tsai (a, Gary Chen (b, Tony Huang (bChwan-Ying Lee a, Cheng-Tyng Yen (a, Patrick Chuang (b,Young-Shying Chen (a, Chien-Chung Hung (a, Chwan-Ying Lee (a, Lurng-Shehng Lee (a, Tzu-Ming Yang (a, Kuan-Wei Chu (a, Ming-Jinn Tsai (a, Gary Chen (b, Tony Huang (bLurng-Shehng Lee a, Cheng-Tyng Yen (a, Patrick Chuang (b,Young-Shying Chen (a, Chien-Chung Hung (a, Chwan-Ying Lee (a, Lurng-Shehng Lee (a, Tzu-Ming Yang (a, Kuan-Wei Chu (a, Ming-Jinn Tsai (a, Gary Chen (b, Tony Huang (bTzu-Ming Yang a, Cheng-Tyng Yen (a, Patrick Chuang (b,Young-Shying Chen (a, Chien-Chung Hung (a, Chwan-Ying Lee (a, Lurng-Shehng Lee (a, Tzu-Ming Yang (a, Kuan-Wei Chu (a, Ming-Jinn Tsai (a, Gary Chen (b, Tony Huang (bKuan-Wei Chu a, Cheng-Tyng Yen (a, Patrick Chuang (b,Young-Shying Chen (a, Chien-Chung Hung (a, Chwan-Ying Lee (a, Lurng-Shehng Lee (a, Tzu-Ming Yang (a, Kuan-Wei Chu (a, Ming-Jinn Tsai (a, Gary Chen (b, Tony Huang (bMing-Jinn Tsai a, Cheng-Tyng Yen (a, Patrick Chuang (b,Young-Shying Chen (a, Chien-Chung Hung (a, Chwan-Ying Lee (a, Lurng-Shehng Lee (a, Tzu-Ming Yang (a, Kuan-Wei Chu (a, Ming-Jinn Tsai (a, Gary Chen (b, Tony Huang (bGary Chen b, Cheng-Tyng Yen (a, Patrick Chuang (b,Young-Shying Chen (a, Chien-Chung Hung (a, Chwan-Ying Lee (a, Lurng-Shehng Lee (a, Tzu-Ming Yang (a, Kuan-Wei Chu (a, Ming-Jinn Tsai (a, Gary Chen (b, Tony Huang (bTony Huang b, Cheng-Tyng Yen (a, Patrick Chuang (b,Young-Shying Chen (a, Chien-Chung Hung (a, Chwan-Ying Lee (a, Lurng-Shehng Lee (a, Tzu-Ming Yang (a, Kuan-Wei Chu (a, Ming-Jinn Tsai (a, Gary Chen (b, Tony Huang (b
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Youngers, M.
Kopin Corporation-
An In-Situ Reflectance Implementation for High Volume Electronic Device Epitaxial Wafer Production
M. Youngers, Kopin CorporationP. Rice, Kopin CorporationG. Yeboah, Kopin CorporationE. Rehder, Kopin CorporationO. Laboutin, Kopin CorporationK. S. Stevens, Kopin Corporation
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Youtsey, C.
MicroLink Devices, Inc.-
Epitaxial Lift-Off of Large-Area GaAs Thin-Film Multi-Junction Solar Cells
C. Youtsey, MicroLink Devices, Inc.J. Adams, MicroLink Devices, Inc.R. Chan, MicroLink Devices, Inc.V. Elarde, MicroLink Devices, Inc.G. Hillier, MicroLink Devices, Inc.M. Osowski, MicroLink Devices, Inc.D. McCallum, MicroLink Devices, Inc.H. Miyamoto, MicroLink Devices, Inc.N. Pan, MicroLink Devices, Inc.C. Stender, MicroLink Devices, Inc.R. Tatavarti, MicroLink Devices, Inc.F. Tuminello, MicroLink Devices, Inc.A. Wibowo, MicroLink Devices, Inc.
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Yu, Sheng-Fu
National Cheng Kung University-
Investigation of Efficiency Droop for InGaN-based LEDs with Carrier Localization State and Polarization Effect
Sheng-Fu Yu, National Cheng Kung University
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Yub, Sheng-Fu
a) Chang Gung University b) Center National Cheng Kung University c) Chung Shan Institute of Science and Technology-
Improved Gate leakage and Microwave Performance by Inserting A Thin Erbium oxide layer on AlGaN/GaN/Silicon HEMT Structure
Fu-Chuan Chua, a) Chang Gung University b) Center National Cheng Kung University c) Chung Shan Institute of Science and TechnologyYing-Jie Tsaia, a) Chang Gung University b) Center National Cheng Kung University c) Chung Shan Institute of Science and TechnologySheng-Yu Liaoa, a) Chang Gung University b) Center National Cheng Kung University c) Chung Shan Institute of Science and TechnologyChou-Shuang Huanga, a) Chang Gung University b) Center National Cheng Kung University c) Chung Shan Institute of Science and TechnologyRay-Ming Lina, a) Chang Gung University b) Center National Cheng Kung University c) Chung Shan Institute of Science and TechnologySheng-Fu Yub, a) Chang Gung University b) Center National Cheng Kung University c) Chung Shan Institute of Science and TechnologyShuh-Sen Renc, a) Chang Gung University b) Center National Cheng Kung University c) Chung Shan Institute of Science and Technology
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Zhou, Amy
TriQuint Semiconductor, TX-
Set up and Characterization of an Optical Wide Stepper Process For DR15 Technology as a replacement for E-Beam Lithography
Amy Zhou, TriQuint Semiconductor, TXJerry Beene, TriQuint Semiconductor,TXMarcus King, TriQuint Semiconductor, TXMing-Yih Kao, Qorvo, Inc.Hua-Tang Chen, Qorvo, Inc.Chris Puckett, TriQuint Semiconductor
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Zhou, Chunhua
Hong Kong University of Science and Technology-
ALD-grown Ultrathin AlN Film for Passivation of AlGaN/GaN HEMTs
Sen Huang*, Student Presentation , Hong Kong University of Science and Technology, Institute of Microelectronics Chinese Academy of ScienceQimeng Jiang, The Hong Kong University of Science and TechnologyShu Yang, The Hong Kong University of Science and TechnologyChunhua Zhou, Hong Kong University of Science and Technology
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Zhou, Xiuju
Hong Kong University of Science and Technology-
Inverted-type InAlAs/InGaAs MOSHEMT with Regrown Source/Drain Exhibiting High Current and Low On-resistance
Qiang Li, Hong Kong University of Science and TechnologyXiuju Zhou, Hong Kong University of Science and Technology
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