-
Abrokwah, Jonathan
Avago Technologies-
10a.4 Reduction in Current Leakage Fails Through an Improved Metal Lift-off Process
Joe Hunter, Avago TechnologiesJonathan Abrokwah, Avago Technologies -
11.4 A SiN Passivation for Improved Moisture Reliability of Au Interconnect With Low-K BCB ILD
Jonathan Abrokwah, Avago TechnologiesNathan Perkins, Avago TechnologiesScott Rumery, Avago TechnologiesGreg Halac, Avago TechnologiesRobert Long, Avago Technologies
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Afroz, Shamima
Northrop Grumman-
6a.3 Reduction of Thin Film Stress-induced Micro-masking by Using Ti/Ni Hard Mask for High Power SiC Transistor Fabrication
Shamima Afroz, Northrop GrummanJason Thomen, Northrop Grumman CorporationJames Oliver, Northrop Grumman CorporationEvan Jones, Wolfspeed | A Cree Company
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Afshar, Amir
University of Alberta-
6a.1 Plasma-Enhanced ALD for Improved MOS Interfaces in III-V Semiconductors
Vallen Rezazadeh, University of AlbertaKyle Bothe, University of AlbertaAmir Afshar, University of AlbertaKenneth Cadien, University of AlbertaDouglas Barlage, University of Alberta
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Agwani, Suhail
Freescale Semiconductor, Inc.-
2.2 GaN Compelling Features for Developing RF Power Markets
Pierre Piel, Freescale Semiconductor Inc.Suhail Agwani, Freescale Semiconductor, Inc.Bruce Green, Freescale Semiconductor, Inc.Jim Norling, Freescale Semiconductor, Inc.Wayne Burger, Freescale Semiconductor, Inc.Monte Miller, Freescale Semiconductor Inc.
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Ahmad, Imad
Northrop Grumman Corporation-
5a.3 Characterization and Modeling of Sub-Harmonic Oscillations in GaAs and GaN FET Technologies
Mike Salib, Northrop Grumman CorporationImad Ahmad, Northrop Grumman Corporation
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Ahn, Shihyun
University of Florida-
8b.4 Investigation of Traps in AlGaN/GaN High Electron Mobility Transistors by Sub-Bandgap Optical Pumping
Tsung-Sheng Kang, University of FloridaYi-Hsuan Lin, University of FloridaShihyun Ahn, University of FloridaFan Ren, University of FloridaErin Patrick, University of FloridaMark Law, University of FloridaDavid Cheney, University of FloridaBrent Gila, University of FloridaStephen Pearton, University of Florida -
10b.2 Recovery in dc Performance of Off-State Step-Stressed AlGaN/GaN High Electron Mobility Transistor with Thermal Annealing
Byungjae Kim, University of FloridaShihyun Ahn, University of FloridaFan Ren, University of FloridaStephen Pearton, University of FloridaDavid Smith, Arizona State UniversityTsung-Sheng Kang, University of FloridaJunhao Zhu
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Allain, Fabienne
CEA, Leti-
9.2 Performance Limiting Leakage Current Across Ar-Implantation Isolation in AlGaN/GaN Structures for High Power Applications
Janina Moereke, United Monolithic Semiconductorss GmBHErwan Morvan, CEA, LetiWilliam Vandendaele, CEA, LetiFabienne Allain, CEA, LetiAlphonse Torres, CEA, LetiMatthew Charles, CEA, LetiMarc Plissonnier, CEA, Leti
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Altman, D.
-
7a.3 GaN on Diamond: Pushing the Boundaries of Conventional MMIC Design and Fabrication
D. AltmanMatthew Tyhach, Raytheon CompanyV. KaperJ. Sanctuary
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Andreev, Andrei
Infineon Technologies Austria AG-
5b.3 Effect of Carbon Doping on the Voltage-Blocking Properties of AlN/AlGaN/GaN Heterostructures
Martin Huber, Infineon Technologies Austria AGIngo Daumiller, Infineon Technologies Austria AGAndrei Andreev, Infineon Technologies Austria AGMarco Silvestri, Infineon Technologies Austria AGLauri Knuuttila, Infineon Technologies Austria AGMichael Wahl, IFOS Institut fuer Oberflaechen- und Schichtanalytik GmbHMichael Kopnarski, IFOS Institut fuer Oberflaechen- und Schichtanalytik GmbHAlberta Bonanni, Johannes Kepler University LinzAnders Lundskog, Infineon Technologies Austria AG
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Asubar, Joel
University of Fukui-
8b.3 AlGaN/GaN HEMTs on Free-standing GaN Substrates with Breakdown Voltage of 5 kV and Effective Lateral Critical Field of 1 MV/cm
Jie Hong Ng, University of FukuiJoel Asubar, University of FukuiHirokuni Tokuda, University of FukuiMasaaki Kuzuhara, University of Fukui
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Banerjee, Abishek
ON Semiconductor, Oudenaarde 9700, Belgium-
8b.2 Dynamic-Ron in Small and Large C-doped AlGaN/GaN-on-Si HEMTs
Serge Karboyan, Nexperia. Manchester, UKSara Martin Horcajo, Centre for Device Thermography and Reliability (CDTR), University of BristolJames Pomeroy, University of BristolIndranil Chatterjee, H H Wills Physics Laboratory, University of Bristol, BS8 1TL, United KingdomMichael Uren, University of BristolPeter Moens, ON Semiconductor, Corp. R&DAbishek Banerjee, ON Semiconductor, Oudenaarde 9700, BelgiumMarkus Caesar, ON Semiconductor, Oudenaarde 9700, BelgiumMartin Kuball, University of Bristol
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Bao, Qilong
Institute of Microelectronics, Chinese Academy of Sciences, Beijing 100029, China-
12.5 Investigation of Thermal Stability of TiN/O3-Al2O3/GaN Metal-Oxide-Semiconductor Diodes with 2 nm H2O-Al2O3 as Oxide/III-Nitride Interfacial Layer
Sen Huang*, Student Presentation , Hong Kong University of Science and Technology, Institute of Microelectronics Chinese Academy of ScienceQilong Bao, Institute of Microelectronics, Chinese Academy of Sciences, Beijing 100029, ChinaXinghua Wang, Institute of Microelectronics, Chinese Academy of Sciences, Beijing 100029, ChinaKe Wei, Institute of Microelectronics, Chinese Academy of SciencesXiaolei Wang, Institute of Microelectronics, Chinese Academy of Sciences, Beijing 100029, ChinaShiping Guo, IQE RF LLCJunfeng Li, Chinese Academy of SciencesXinyu Liu, Institute of Microelectronics, Chinese Academy of SciencesChao Zhao, Chinese Academy of SciencesJinjuan XiangShumin ChaiYankui Li
-
-
Bar-Cohen, A.
Air Force Research Laboratory (AFRL), Defense Advanced Research Projects Agency (DARPA) Booz Allen Hamilton-
7a.1 Developing a New Thermal Paradigm for Gallium Nitride (GaN) Device Technology
John Blevins, Air Force Research Laboratory (AFRL), Wright-Patterson AFB, OHGlen Via, AFRLA. Bar-Cohen, Air Force Research Laboratory (AFRL), Defense Advanced Research Projects Agency (DARPA) Booz Allen HamiltonA Sivananthan, Booz-Allen-Hamilton
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Barlage, Douglas
University of Alberta-
6a.1 Plasma-Enhanced ALD for Improved MOS Interfaces in III-V Semiconductors
Vallen Rezazadeh, University of AlbertaKyle Bothe, University of AlbertaAmir Afshar, University of AlbertaKenneth Cadien, University of AlbertaDouglas Barlage, University of Alberta
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-
Baskaran, Rajesh
MACOM Technology Solutions Inc.-
9.4 Simulation of Fabrication- and Operation-Induced Mechanical Stress in AlGaN/GaN Transistors
Sameer Joglekar, Massachusetts Institute of TechnologyChuanxin Lian, MACOM Technology Solutions Inc.Rajesh Baskaran, MACOM Technology Solutions Inc.Yan Zhang, MACOM Technology Solutions, IncAllen Hanson, MACOM Technology Solutions Inc.
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Bengtsson, Olof
Ferdinand-Braun-Institut, Leibniz-Institut für Höchstfrequenztechnik (FBH)-
3.3 Developing of K- and Ka-band High Power Amplifier GaN MMIC Fabrication Technology
Konstantin Osipov, Ferdinand-Braun-Institut, Leibniz-Institut für Höchstfrequenztechnik (FBH)Sergey Chevtchenko, Ferdinand-Braun-Institut, Leibniz-Institut für Höchstfrequenztechnik (FBH)Richard Lossy, Ferdinand-Braun-Institut, Leibniz-Institut für Höchstfrequenztechnik (FBH),Olof Bengtsson, Ferdinand-Braun-Institut, Leibniz-Institut für Höchstfrequenztechnik (FBH)Paul Kurpas, Ferdinand-Braun-Institut, Leibniz-Institut für Höchstfrequenztechnik (FBH),Natalia Kemf, Ferdinand-Braun-Institut, Leibniz-Institut für Höchstfrequenztechnik (FBH)
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Bettencourt, John
Raytheon IDS-
3.4 Towards a Si Foundry Compatible, High Performance, 0.25 um Gate, GaN on Si MMIC Process on High Resistance 200mm Si With a Cu Damascene BEOL
Jeffrey LaRoche, Raytheon IDS Microelectronics, Novati Technologies, Inc. IQEKelly Ip, Raytheon IDS Microelectronics, Novati Technologies, Inc. IQETheodore Kennedy, Raytheon IDSLovelace Soirez, NovatiJohn Bettencourt, Raytheon IDSDoug Guenther, Raytheon IDS Microelectronics, Novati Technologies, Inc. IQEGabe Gebara, Raytheon IDS Microelectronics, Novati Technologies, Inc. IQETina Trimble, Raytheon IDS Microelectronics, Novati Technologies, Inc. IQEWilliam Davis
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Beutel, Paul
-
5b.2 InP based engineered substrates for CPV cells above 46% of efficiency
Eric Guiot, SOITECFrank Dimroth, Fraunhofer Institute for Solar Energy Systems ISE, Heidenhofstrasse 2, 79110 Freiburg, GermanyAlexis Drouin, SOITECCharlotte DrazekAgnès de ButtetThomas TibbitsPaul BeutelChristian KarcherEduard OlivaGerald Siefer
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Bing Mei, Xiao
Northrop Grumman Corporation-
4.4 A Terahertz Capable 25 nm InP HEMT MMIC Process
William Deal, Northrop Grumman CorporationW Yoshida, Northrop Grumman (AS), Redondo Beach, CA, USAXiao Bing Mei, Northrop Grumman CorporationM Lange, Northrop Grumman CorporationZ Zhou, Northrop Grumman CorporationJ Lee, Northrop Grumman CorporationP H Liu, Northrop Grumman CorporationK Leong, Northrop Grumman Corporation
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Blevins, John
Air Force Research Laboratory (AFRL), Wright-Patterson AFB, OH-
7a.1 Developing a New Thermal Paradigm for Gallium Nitride (GaN) Device Technology
John Blevins, Air Force Research Laboratory (AFRL), Wright-Patterson AFB, OHGlen Via, AFRLA. Bar-Cohen, Air Force Research Laboratory (AFRL), Defense Advanced Research Projects Agency (DARPA) Booz Allen HamiltonA Sivananthan, Booz-Allen-Hamilton
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Bobkowski, Romek
Qorvo, Inc.-
7b.5 Analysis and Solution to Ion Trim Drift Utilizing Software and a Residual Gas Analyzer
Eric McCormick, Qorvo, Inc.Romek Bobkowski, Qorvo, Inc.Karsten Mausolf, QorvoGuy Takayesu, QorvoDario Nappa, TriQuint Semiconductor,TXFrancis Celii, QorvoMike McClureCraig Hall, QorvoJoseph Raff, Qorvo
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Bonafede, Salvatore
X-Celeprint, Inc.-
8a.2 Transfer Printing of Microscale Compound Semiconductor Devices
Kanchan Ghosal, X-Celeprint, Inc.David Gomez, X-Celeprint, Inc.Matthew Meitl, X-Celeprint, Inc.Salvatore Bonafede, X-Celeprint, Inc.Carl Prevatte, X-Celeprint, Inc.Tanya Moore, X-Celeprint, Inc.Brook Raymond*, Nitronex CorporationDavid Kneeburg, X-Celeprint, Inc.Alin Fecioru, X-Celeprint, Ltd., Cork, IrelandAntonio Jose Trinadade, X-Celeprint, Ltd.Chris Bower, X-Celeprint. Inc.
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-
Bonanni, Alberta
Johannes Kepler University Linz-
5b.3 Effect of Carbon Doping on the Voltage-Blocking Properties of AlN/AlGaN/GaN Heterostructures
Martin Huber, Infineon Technologies Austria AGIngo Daumiller, Infineon Technologies Austria AGAndrei Andreev, Infineon Technologies Austria AGMarco Silvestri, Infineon Technologies Austria AGLauri Knuuttila, Infineon Technologies Austria AGMichael Wahl, IFOS Institut fuer Oberflaechen- und Schichtanalytik GmbHMichael Kopnarski, IFOS Institut fuer Oberflaechen- und Schichtanalytik GmbHAlberta Bonanni, Johannes Kepler University LinzAnders Lundskog, Infineon Technologies Austria AG
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Bothe, Kyle
University of Alberta-
6a.1 Plasma-Enhanced ALD for Improved MOS Interfaces in III-V Semiconductors
Vallen Rezazadeh, University of AlbertaKyle Bothe, University of AlbertaAmir Afshar, University of AlbertaKenneth Cadien, University of AlbertaDouglas Barlage, University of Alberta
-
-
Boudelle, Konstantin
-
8a.1 Beyond Silicon CMOS: Progress and Challenges
Bich-Yen Nguyen, SOITECQweltaz GaudinMariam Sadaka, SOITECChristophe Maleville, SOITECWalter Schwarzenbach, SOITECKonstantin BoudelleChristophe Figuet
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-
Bower, Chris
X-Celeprint. Inc.-
8a.2 Transfer Printing of Microscale Compound Semiconductor Devices
Kanchan Ghosal, X-Celeprint, Inc.David Gomez, X-Celeprint, Inc.Matthew Meitl, X-Celeprint, Inc.Salvatore Bonafede, X-Celeprint, Inc.Carl Prevatte, X-Celeprint, Inc.Tanya Moore, X-Celeprint, Inc.Brook Raymond*, Nitronex CorporationDavid Kneeburg, X-Celeprint, Inc.Alin Fecioru, X-Celeprint, Ltd., Cork, IrelandAntonio Jose Trinadade, X-Celeprint, Ltd.Chris Bower, X-Celeprint. Inc.
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Brockett, Steve
Qorvo, Inc.-
7b.2 Fabrication Process Induced ESD Damage of MIM Capacitors on a 0.15um pHEMT Process
Robert Waco, Qorvo Inc.Rose Emergo, Qorvo, Inc.Steve Brockett, Qorvo, Inc.Tertius RiversYiping Wang, Qorvo Inc.
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Brown, Tom
Skyworks Solutions, Inc.-
4.1 Challenges for Establishing a High Volume, High Yielding BiHEMT Manufacturing Process
Jiang Li, Skyworks Solutions, Inc.Tom Brown, Skyworks Solutions, Inc.Mehran Janani, Skyworks Solutions, Inc.Jiro YotaCristian Cismaru, Skyworks Solutions, Inc.Manjeet Singh, Skyworks Solutions, Inc.Mike Sun, Skyworks Solutions, Inc.Ravi Ramanathan
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Burger, Wayne
Freescale Semiconductor, Inc.-
2.2 GaN Compelling Features for Developing RF Power Markets
Pierre Piel, Freescale Semiconductor Inc.Suhail Agwani, Freescale Semiconductor, Inc.Bruce Green, Freescale Semiconductor, Inc.Jim Norling, Freescale Semiconductor, Inc.Wayne Burger, Freescale Semiconductor, Inc.Monte Miller, Freescale Semiconductor Inc.
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-
C. Chao, P.
MEC, BAE Systems, IQE-
7a.5 Near Junction Thermal Transport and Embedded Cooling of High Power GaN Electronics
Carlton Creamer, BAE Systems IncP. C. Chao, MEC, BAE Systems, IQEK K Chu, BAE SystemsA Kassinos, BAE SystemsG Campbell, Science Research Laboratories, Inc.H Eppich, Science Research Laboratories, Inc.A Shooshtari, University of MarylandS Dessiatoun, University of MarylandM Ohadi, University of MarylandC McGray, Modern MicrosystemsR Kallaher, Modern Microsystems
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Cadien, Kenneth
University of Alberta-
6a.1 Plasma-Enhanced ALD for Improved MOS Interfaces in III-V Semiconductors
Vallen Rezazadeh, University of AlbertaKyle Bothe, University of AlbertaAmir Afshar, University of AlbertaKenneth Cadien, University of AlbertaDouglas Barlage, University of Alberta
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Cadotte, Roland
Lockheed Martin-
7a.2 GaN Unleashed: The Benefits of Microfluidic Cooling
John Ditri, Lockheed MartinRobert Pearson, Lockheed MartinRoland Cadotte, Lockheed MartinDavid Fetterolf, Lockheed MartinMichael McNulty, Lockheed MartinDenise Luppa, Lockheed Martin
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-
Caesar, Markus
ON Semiconductor, Oudenaarde 9700, Belgium-
8b.2 Dynamic-Ron in Small and Large C-doped AlGaN/GaN-on-Si HEMTs
Serge Karboyan, Nexperia. Manchester, UKSara Martin Horcajo, Centre for Device Thermography and Reliability (CDTR), University of BristolJames Pomeroy, University of BristolIndranil Chatterjee, H H Wills Physics Laboratory, University of Bristol, BS8 1TL, United KingdomMichael Uren, University of BristolPeter Moens, ON Semiconductor, Corp. R&DAbishek Banerjee, ON Semiconductor, Oudenaarde 9700, BelgiumMarkus Caesar, ON Semiconductor, Oudenaarde 9700, BelgiumMartin Kuball, University of Bristol
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-
Cai, Yong
Suzhou Institute of Nano-Tech and Nano-Bionics, Chinese Academy of Science-
9.3 Compatibility of AlN/SiNx Passivation Technique with High-Temperature Process
Mengyuan Hua, The Hong Kong University of Science and TechnologyYunyou Lu, The Hong Kong University of Science and TechnologyShenghou Liu, Xiamen San'an Integrated Circuit Co., Ltd.Cheng Liu, Xiamen San'an Integrated Circuit Co., Ltd.Kai Fu, Suzhou Institute of Nano-Tech and Nano-Bionics, Chinese Academy of ScienceYong Cai, Suzhou Institute of Nano-Tech and Nano-Bionics, Chinese Academy of ScienceBaoshun Zhang, Suzhou Institute of Nano-Tech and Nano-Bionics, Chinese Academy of ScienceKevin J. Chen, The Hong Kong University of Science and Technology
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-
Campbell, G
Science Research Laboratories, Inc.-
7a.5 Near Junction Thermal Transport and Embedded Cooling of High Power GaN Electronics
Carlton Creamer, BAE Systems IncP. C. Chao, MEC, BAE Systems, IQEK K Chu, BAE SystemsA Kassinos, BAE SystemsG Campbell, Science Research Laboratories, Inc.H Eppich, Science Research Laboratories, Inc.A Shooshtari, University of MarylandS Dessiatoun, University of MarylandM Ohadi, University of MarylandC McGray, Modern MicrosystemsR Kallaher, Modern Microsystems
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Carroll, Patrick
Qorvo, Inc-
7b.1 Automated Optical Inspection (AOI) For Quality Improvement
Yu Wang, Qorvo, IncTom Cheng, QorvoCrystal Chueng, QorvoPatrick Carroll, Qorvo, IncZach Reitmeier, Qorvo, Inc -
7b.4 Using Six-Sigma Methodology to Reduce Metal-Insulator-Metal Capacitance Density Variance
Jing Yao, Qorvo, IncLou Pagentine, Qorovo, IncDan Groft, Qorvo, IncPam Worsley, Qorvo, IncZach Reitmeier, Qorvo, IncPatrick Carroll, Qorvo, Inc
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Carter, James
MACOM-
6b.4 Consolidation Method for SPC Data Review in a High Product Mix Semiconductor Fab
James Carter, MACOMAnne Collins, MACOM Technology Solutions
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-
Celii, Francis
Qorvo-
7b.5 Analysis and Solution to Ion Trim Drift Utilizing Software and a Residual Gas Analyzer
Eric McCormick, Qorvo, Inc.Romek Bobkowski, Qorvo, Inc.Karsten Mausolf, QorvoGuy Takayesu, QorvoDario Nappa, TriQuint Semiconductor,TXFrancis Celii, QorvoMike McClureCraig Hall, QorvoJoseph Raff, Qorvo
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Chabak, Kelson
Air Force Research Laboratory, Sensors Directorate-
3.1 Demonstration of X-band T/R MMIC using AFRL AlGaN/GaN MMIC Process
James Gillespie, Air Force Research LaboratoryKelson Chabak, Air Force Research Laboratory, Sensors DirectorateAntonio Crespo, Air Force Research Laboratory, Sensors DirectorateRobert Fitch, AFRLDarren Ferwalt, Cobham Advanced Electronic SystemsDavid Frey, Cobham Advanced Electronic SystemsJeremy Gassmann, Cobham Advanced Electronic SystemsMark Walker, Cobham Advanced Electronic SolutionsRyan Gilbert, Wyle LaboratoriesDennis Walker Jr, Air Force Research Laboatory, Sensors DirectorateGlen Via, AFRLA.J. GreenK.D. LeedyR.K. MongiaB.S. PolingK.A. SutherlinS.E. TetlakJ.P. TheimerG.H. Jessen
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Chai, Shumin
-
12.5 Investigation of Thermal Stability of TiN/O3-Al2O3/GaN Metal-Oxide-Semiconductor Diodes with 2 nm H2O-Al2O3 as Oxide/III-Nitride Interfacial Layer
Sen Huang*, Student Presentation , Hong Kong University of Science and Technology, Institute of Microelectronics Chinese Academy of ScienceQilong Bao, Institute of Microelectronics, Chinese Academy of Sciences, Beijing 100029, ChinaXinghua Wang, Institute of Microelectronics, Chinese Academy of Sciences, Beijing 100029, ChinaKe Wei, Institute of Microelectronics, Chinese Academy of SciencesXiaolei Wang, Institute of Microelectronics, Chinese Academy of Sciences, Beijing 100029, ChinaShiping Guo, IQE RF LLCJunfeng Li, Chinese Academy of SciencesXinyu Liu, Institute of Microelectronics, Chinese Academy of SciencesChao Zhao, Chinese Academy of SciencesJinjuan XiangShumin ChaiYankui Li
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-
Chang, Chia-Ta
WIN Semiconductors Corp.-
4.3 The Study of InGaP/GaAs HBT for Ruggedness Characteristics
Ju-Hsien Lin, WIN Semiconductors Corp.Rei-Bin Chiou, WIN Semiconductors Corp.Jung-Hao Hsu, WIN Semiconductors Corp.Shu-Hsiao Tsai, WIN Semiconductors CorpChia-Ta Chang, WIN Semiconductors Corp.Chang-Ho Li, WIN Semiconductors Corp.Tung-Yao Chou, WIN Semiconductors Corp.Cheng-Kuo Lin, WIN Semiconductors CorpDennis Williams, WIN Semiconductors CorpYu-Chi Wang, WIN Semiconductors Corp
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Charles, Matthew
CEA, Leti-
9.2 Performance Limiting Leakage Current Across Ar-Implantation Isolation in AlGaN/GaN Structures for High Power Applications
Janina Moereke, United Monolithic Semiconductorss GmBHErwan Morvan, CEA, LetiWilliam Vandendaele, CEA, LetiFabienne Allain, CEA, LetiAlphonse Torres, CEA, LetiMatthew Charles, CEA, LetiMarc Plissonnier, CEA, Leti
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Chatterjee, Indranil
H H Wills Physics Laboratory, University of Bristol, BS8 1TL, United Kingdom-
8b.2 Dynamic-Ron in Small and Large C-doped AlGaN/GaN-on-Si HEMTs
Serge Karboyan, Nexperia. Manchester, UKSara Martin Horcajo, Centre for Device Thermography and Reliability (CDTR), University of BristolJames Pomeroy, University of BristolIndranil Chatterjee, H H Wills Physics Laboratory, University of Bristol, BS8 1TL, United KingdomMichael Uren, University of BristolPeter Moens, ON Semiconductor, Corp. R&DAbishek Banerjee, ON Semiconductor, Oudenaarde 9700, BelgiumMarkus Caesar, ON Semiconductor, Oudenaarde 9700, BelgiumMartin Kuball, University of Bristol
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Chen, Xiang
Institute of Semiconductors, Chinese Academy of Sciences; University of Chinese Academy of Sciences-
12.7 Improvement of Light Extraction Efficiency of AlGaN-based Deep-ultraviolet Light Emitting Diodes
Yanan Guo, Institute of Semiconductors, Chinese Academy of Sciences; University of Chinese Academy of SciencesYun Zhang, Institute of Semiconductors, Chinese Academy of Sciences, BeijingJianchang Yan, Institute of Semiconductors, Chinese Academy of Sciences; University of Chinese Academy of SciencesXiang Chen, Institute of Semiconductors, Chinese Academy of Sciences; University of Chinese Academy of SciencesTongbo WeiJunxi Wang, Institute of Semiconductor, Chinese Academy of Sciences, BeijingJinmin Li, NAURA Technology Group Co., Ltd.
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Cheney, David
University of Florida-
8b.4 Investigation of Traps in AlGaN/GaN High Electron Mobility Transistors by Sub-Bandgap Optical Pumping
Tsung-Sheng Kang, University of FloridaYi-Hsuan Lin, University of FloridaShihyun Ahn, University of FloridaFan Ren, University of FloridaErin Patrick, University of FloridaMark Law, University of FloridaDavid Cheney, University of FloridaBrent Gila, University of FloridaStephen Pearton, University of Florida
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Cheng, Kezia
Skyworks Solutions Inc.-
10a.5 An Evaporation Lift Off Process with Unidirectional Conformal Coverage
Kezia Cheng, Skyworks Solutions Inc.Christopher MacdonaldKamal Tabatabaie Alavi, Raytheon Company, Integrated Defense Systems
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Cheng, Tom
Qorvo-
7b.1 Automated Optical Inspection (AOI) For Quality Improvement
Yu Wang, Qorvo, IncTom Cheng, QorvoCrystal Chueng, QorvoPatrick Carroll, Qorvo, IncZach Reitmeier, Qorvo, Inc
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Cheng, Yuan-Hsiang
-
12.3 The Demonstration and Characterization of In-situ SiNx/AlGaN/GaN HEMT on 6-inch Silicon on Insulator (SOI) Substrate
Hao-Yu Wang, Institute of Semiconductors, Chinese Academy of Sciences; University of Chinese Academy of SciencesLi-Yi Peng, Chang Gung UniversityHsiang-Chun Wang, Chang Gung UniversityYuan-Hsiang Cheng
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Chevtchenko, Sergey
Ferdinand-Braun-Institut, Leibniz-Institut für Höchstfrequenztechnik (FBH)-
3.3 Developing of K- and Ka-band High Power Amplifier GaN MMIC Fabrication Technology
Konstantin Osipov, Ferdinand-Braun-Institut, Leibniz-Institut für Höchstfrequenztechnik (FBH)Sergey Chevtchenko, Ferdinand-Braun-Institut, Leibniz-Institut für Höchstfrequenztechnik (FBH)Richard Lossy, Ferdinand-Braun-Institut, Leibniz-Institut für Höchstfrequenztechnik (FBH),Olof Bengtsson, Ferdinand-Braun-Institut, Leibniz-Institut für Höchstfrequenztechnik (FBH)Paul Kurpas, Ferdinand-Braun-Institut, Leibniz-Institut für Höchstfrequenztechnik (FBH),Natalia Kemf, Ferdinand-Braun-Institut, Leibniz-Institut für Höchstfrequenztechnik (FBH)
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Chiou, Rei-Bin
WIN Semiconductors Corp.-
4.3 The Study of InGaP/GaAs HBT for Ruggedness Characteristics
Ju-Hsien Lin, WIN Semiconductors Corp.Rei-Bin Chiou, WIN Semiconductors Corp.Jung-Hao Hsu, WIN Semiconductors Corp.Shu-Hsiao Tsai, WIN Semiconductors CorpChia-Ta Chang, WIN Semiconductors Corp.Chang-Ho Li, WIN Semiconductors Corp.Tung-Yao Chou, WIN Semiconductors Corp.Cheng-Kuo Lin, WIN Semiconductors CorpDennis Williams, WIN Semiconductors CorpYu-Chi Wang, WIN Semiconductors Corp
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-
Chou, Tung-Yao
WIN Semiconductors Corp.-
4.3 The Study of InGaP/GaAs HBT for Ruggedness Characteristics
Ju-Hsien Lin, WIN Semiconductors Corp.Rei-Bin Chiou, WIN Semiconductors Corp.Jung-Hao Hsu, WIN Semiconductors Corp.Shu-Hsiao Tsai, WIN Semiconductors CorpChia-Ta Chang, WIN Semiconductors Corp.Chang-Ho Li, WIN Semiconductors Corp.Tung-Yao Chou, WIN Semiconductors Corp.Cheng-Kuo Lin, WIN Semiconductors CorpDennis Williams, WIN Semiconductors CorpYu-Chi Wang, WIN Semiconductors Corp
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Christou, Aris
University of Maryland-College Park-
10b.4 Reliability Assessment of Thermally-Stable Gate Materials for AlGaN/GaN HEMTs
David Shahin, University of MarylandJordan Greenlee, NRC Postdoctoral Fellow Residing at the Naval Research LaboratoryAndrew Koehler, U. S. Naval Research LaboratoryVirginia Wheeler, U.S. Naval Research LaboratoryMarko Tadjer, U.S. Naval Research LaboratoryTatyana Feygelson, U. S. Naval Research LaboratoryBradford Pate, Naval Research LaboratoryJennifer Hite, U.S. Naval Research LaboratoryKarl D. Hobart, U.S. Naval Research LaboratoryCharles Eddy, US Naval Research LaboratoryJr., Naval Research LaboratoryFrancis Kub, U.S. Naval Research LaboratoryAris Christou, University of Maryland-College Park
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Chueng, Crystal
Qorvo-
5a.2 Accurate Prediction of Resistor Variation using Minimum Sized Five Resistor TLM
Dheeraj Mohata, Global Communication Semiconductors, LLCCrystal Chueng, QorvoBrian Moser, Qorvo, Inc.Peter Zampardi, Qorvo Inc. -
7b.1 Automated Optical Inspection (AOI) For Quality Improvement
Yu Wang, Qorvo, IncTom Cheng, QorvoCrystal Chueng, QorvoPatrick Carroll, Qorvo, IncZach Reitmeier, Qorvo, Inc
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Chyi, Jen-Inn
National Central University-
12.4 Investigation of InAlN/GaN Schottky Barrier Diode (SBD) on 6-inch SOI substrate
Li-Yi Peng, Chang Gung UniversityHsiang-Chun Wang, Chang Gung UniversityHou-Yu Wang, Chang Gung UniversityJen-Inn Chyi, National Central University
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Cismaru, Cristian
Skyworks Solutions, Inc.-
4.1 Challenges for Establishing a High Volume, High Yielding BiHEMT Manufacturing Process
Jiang Li, Skyworks Solutions, Inc.Tom Brown, Skyworks Solutions, Inc.Mehran Janani, Skyworks Solutions, Inc.Jiro YotaCristian Cismaru, Skyworks Solutions, Inc.Manjeet Singh, Skyworks Solutions, Inc.Mike Sun, Skyworks Solutions, Inc.Ravi Ramanathan -
5a.1 A Method for Yield and Scaling Characterization of FET Structures in an InGaP/GaAs Merged HBT-FET (BiFET) Technology
Andre MetzgerJiang Li, Skyworks Solutions, Inc.Mike Sun, Skyworks Solutions, Inc.Ravi RamanathanCristian Cismaru, Skyworks Solutions, Inc.Jiro Yota
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Collins, Anne
MACOM Technology Solutions-
6b.4 Consolidation Method for SPC Data Review in a High Product Mix Semiconductor Fab
James Carter, MACOMAnne Collins, MACOM Technology Solutions
-
-
Cooper, Jayson
-
6a.5 Temporary Bonding for Backside Processing of 150-mm SiC Wafers
Ramachandran TrichurJayson CooperMolly Hladik, Brewer Science, IncLou Pagentine, Qorovo, Inc
-
-
Creamer, Carlton
BAE Systems Inc-
7a.5 Near Junction Thermal Transport and Embedded Cooling of High Power GaN Electronics
Carlton Creamer, BAE Systems IncP. C. Chao, MEC, BAE Systems, IQEK K Chu, BAE SystemsA Kassinos, BAE SystemsG Campbell, Science Research Laboratories, Inc.H Eppich, Science Research Laboratories, Inc.A Shooshtari, University of MarylandS Dessiatoun, University of MarylandM Ohadi, University of MarylandC McGray, Modern MicrosystemsR Kallaher, Modern Microsystems
-
-
Crespo, Antonio
Air Force Research Laboratory, Sensors Directorate-
3.1 Demonstration of X-band T/R MMIC using AFRL AlGaN/GaN MMIC Process
James Gillespie, Air Force Research LaboratoryKelson Chabak, Air Force Research Laboratory, Sensors DirectorateAntonio Crespo, Air Force Research Laboratory, Sensors DirectorateRobert Fitch, AFRLDarren Ferwalt, Cobham Advanced Electronic SystemsDavid Frey, Cobham Advanced Electronic SystemsJeremy Gassmann, Cobham Advanced Electronic SystemsMark Walker, Cobham Advanced Electronic SolutionsRyan Gilbert, Wyle LaboratoriesDennis Walker Jr, Air Force Research Laboatory, Sensors DirectorateGlen Via, AFRLA.J. GreenK.D. LeedyR.K. MongiaB.S. PolingK.A. SutherlinS.E. TetlakJ.P. TheimerG.H. Jessen
-
-
Daumiller, Ingo
Infineon Technologies Austria AG-
5b.3 Effect of Carbon Doping on the Voltage-Blocking Properties of AlN/AlGaN/GaN Heterostructures
Martin Huber, Infineon Technologies Austria AGIngo Daumiller, Infineon Technologies Austria AGAndrei Andreev, Infineon Technologies Austria AGMarco Silvestri, Infineon Technologies Austria AGLauri Knuuttila, Infineon Technologies Austria AGMichael Wahl, IFOS Institut fuer Oberflaechen- und Schichtanalytik GmbHMichael Kopnarski, IFOS Institut fuer Oberflaechen- und Schichtanalytik GmbHAlberta Bonanni, Johannes Kepler University LinzAnders Lundskog, Infineon Technologies Austria AG
-
-
Davis, William
-
3.4 Towards a Si Foundry Compatible, High Performance, 0.25 um Gate, GaN on Si MMIC Process on High Resistance 200mm Si With a Cu Damascene BEOL
Jeffrey LaRoche, Raytheon IDS Microelectronics, Novati Technologies, Inc. IQEKelly Ip, Raytheon IDS Microelectronics, Novati Technologies, Inc. IQETheodore Kennedy, Raytheon IDSLovelace Soirez, NovatiJohn Bettencourt, Raytheon IDSDoug Guenther, Raytheon IDS Microelectronics, Novati Technologies, Inc. IQEGabe Gebara, Raytheon IDS Microelectronics, Novati Technologies, Inc. IQETina Trimble, Raytheon IDS Microelectronics, Novati Technologies, Inc. IQEWilliam Davis
-
-
de Buttet, Agnès
-
5b.2 InP based engineered substrates for CPV cells above 46% of efficiency
Eric Guiot, SOITECFrank Dimroth, Fraunhofer Institute for Solar Energy Systems ISE, Heidenhofstrasse 2, 79110 Freiburg, GermanyAlexis Drouin, SOITECCharlotte DrazekAgnès de ButtetThomas TibbitsPaul BeutelChristian KarcherEduard OlivaGerald Siefer
-
-
Deal, William
Northrop Grumman Corporation-
4.4 A Terahertz Capable 25 nm InP HEMT MMIC Process
William Deal, Northrop Grumman CorporationW Yoshida, Northrop Grumman (AS), Redondo Beach, CA, USAXiao Bing Mei, Northrop Grumman CorporationM Lange, Northrop Grumman CorporationZ Zhou, Northrop Grumman CorporationJ Lee, Northrop Grumman CorporationP H Liu, Northrop Grumman CorporationK Leong, Northrop Grumman Corporation
-
-
Dessiatoun, S
University of Maryland-
7a.5 Near Junction Thermal Transport and Embedded Cooling of High Power GaN Electronics
Carlton Creamer, BAE Systems IncP. C. Chao, MEC, BAE Systems, IQEK K Chu, BAE SystemsA Kassinos, BAE SystemsG Campbell, Science Research Laboratories, Inc.H Eppich, Science Research Laboratories, Inc.A Shooshtari, University of MarylandS Dessiatoun, University of MarylandM Ohadi, University of MarylandC McGray, Modern MicrosystemsR Kallaher, Modern Microsystems
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-
Detchprohm, Theeradetch
Georgia Institute of Technology-
10a.3 Vanadium-based Ohmic Contact on n-type AlGaN Layers
Tsung-Ting Kao, Georgia Institute of Technology,Xiao-Jia Jia, Georgia Institute of TechnologyYuh-Shiuan Liu, Georgia Institute of TechnologyTheeradetch Detchprohm, Georgia Institute of TechnologyRussell Dupuis, Georgia TechShyh-Chiang Shen, Georgia Institute of Technology
-
-
Dimroth, Frank
Fraunhofer Institute for Solar Energy Systems ISE, Heidenhofstrasse 2, 79110 Freiburg, Germany-
5b.2 InP based engineered substrates for CPV cells above 46% of efficiency
Eric Guiot, SOITECFrank Dimroth, Fraunhofer Institute for Solar Energy Systems ISE, Heidenhofstrasse 2, 79110 Freiburg, GermanyAlexis Drouin, SOITECCharlotte DrazekAgnès de ButtetThomas TibbitsPaul BeutelChristian KarcherEduard OlivaGerald Siefer
-
-
Ditri, John
Lockheed Martin-
7a.2 GaN Unleashed: The Benefits of Microfluidic Cooling
John Ditri, Lockheed MartinRobert Pearson, Lockheed MartinRoland Cadotte, Lockheed MartinDavid Fetterolf, Lockheed MartinMichael McNulty, Lockheed MartinDenise Luppa, Lockheed Martin
-
-
Downey, Brian
US Naval Research Laboratory-
8a.3 Epitaxial Lift-off and Transfer of III-N Materials and Devices from SiC
David Meyer, US Naval Research LaboratoryBrian Downey, US Naval Research LaboratoryD. Scott Katzer, U.S. Naval Research LaboratoryNeeraj Nepal, US Naval Research LaboratoryVirginia Wheeler, U.S. Naval Research LaboratoryDavid Storm, US Naval Research LaboratoryMatthew Hardy, US Naval Research Laboratory
-
-
Drazek, Charlotte
-
5b.2 InP based engineered substrates for CPV cells above 46% of efficiency
Eric Guiot, SOITECFrank Dimroth, Fraunhofer Institute for Solar Energy Systems ISE, Heidenhofstrasse 2, 79110 Freiburg, GermanyAlexis Drouin, SOITECCharlotte DrazekAgnès de ButtetThomas TibbitsPaul BeutelChristian KarcherEduard OlivaGerald Siefer
-
-
Drouin, Alexis
SOITEC-
5b.2 InP based engineered substrates for CPV cells above 46% of efficiency
Eric Guiot, SOITECFrank Dimroth, Fraunhofer Institute for Solar Energy Systems ISE, Heidenhofstrasse 2, 79110 Freiburg, GermanyAlexis Drouin, SOITECCharlotte DrazekAgnès de ButtetThomas TibbitsPaul BeutelChristian KarcherEduard OlivaGerald Siefer
-
-
Dupuis, Russell
Georgia Tech-
10a.3 Vanadium-based Ohmic Contact on n-type AlGaN Layers
Tsung-Ting Kao, Georgia Institute of Technology,Xiao-Jia Jia, Georgia Institute of TechnologyYuh-Shiuan Liu, Georgia Institute of TechnologyTheeradetch Detchprohm, Georgia Institute of TechnologyRussell Dupuis, Georgia TechShyh-Chiang Shen, Georgia Institute of Technology
-
-
Dusseault, Thomas
-
7a.4 GaN MMIC Impingement Jet Cooled Embedded Diamond
V, Gambin, Northrop-Grumman (AS), Redondo Beach, CABenjamin PoustDino Ferizovic, Northrop Grumman Aerospace SystemsMonte Watanabe, Northrop Grumman Aerospace SystemsGary Mandrusiak, GE Global ResearchThomas Dusseault
-
-
Eddy, Charles
US Naval Research Laboratory-
10b.4 Reliability Assessment of Thermally-Stable Gate Materials for AlGaN/GaN HEMTs
David Shahin, University of MarylandJordan Greenlee, NRC Postdoctoral Fellow Residing at the Naval Research LaboratoryAndrew Koehler, U. S. Naval Research LaboratoryVirginia Wheeler, U.S. Naval Research LaboratoryMarko Tadjer, U.S. Naval Research LaboratoryTatyana Feygelson, U. S. Naval Research LaboratoryBradford Pate, Naval Research LaboratoryJennifer Hite, U.S. Naval Research LaboratoryKarl D. Hobart, U.S. Naval Research LaboratoryCharles Eddy, US Naval Research LaboratoryJr., Naval Research LaboratoryFrancis Kub, U.S. Naval Research LaboratoryAris Christou, University of Maryland-College Park -
11.5 Optimization of AlGaN/GaN HEMT SiN Passivation by Mixed Frequency PECVD
Marko Tadjer, U.S. Naval Research LaboratoryAndrew Koehler, U. S. Naval Research LaboratoryCharles Eddy, US Naval Research LaboratoryJr., Naval Research LaboratoryKarl D. Hobart, U.S. Naval Research LaboratoryFritz Kub, Naval Research Laboratory
-
-
Emergo, Rose
Qorvo, Inc.-
7b.2 Fabrication Process Induced ESD Damage of MIM Capacitors on a 0.15um pHEMT Process
Robert Waco, Qorvo Inc.Rose Emergo, Qorvo, Inc.Steve Brockett, Qorvo, Inc.Tertius RiversYiping Wang, Qorvo Inc.
-
-
Eppich, H
Science Research Laboratories, Inc.-
7a.5 Near Junction Thermal Transport and Embedded Cooling of High Power GaN Electronics
Carlton Creamer, BAE Systems IncP. C. Chao, MEC, BAE Systems, IQEK K Chu, BAE SystemsA Kassinos, BAE SystemsG Campbell, Science Research Laboratories, Inc.H Eppich, Science Research Laboratories, Inc.A Shooshtari, University of MarylandS Dessiatoun, University of MarylandM Ohadi, University of MarylandC McGray, Modern MicrosystemsR Kallaher, Modern Microsystems
-
-
F Tsai, H
WIN Semiconductors Corp.-
6b.2 An Effective Data Analysis Approach to Identify Source of Parametric Performance Variations for GaAs Manufacturing
Mingwei Tsai, WIN semiconductorsH T Li, WIN Semiconductors Corp.H F Tsai, WIN Semiconductors Corp.J W Chen, WIN Semiconductors Corp.W H Wang, WIN Semiconductors Corp.
-
-
Faili, Firooz
Element Six Technologies, Santa Clara, CA-
8a.4 GaN-on-Diamond: Robust Mechanical and Thermal Properties
Martin Kuball, University of BristolHuarui Sun, University of BristolDong Liu, University of Oxford, University of BristolJames Pomeroy, University of BristolDaniel Francis, Akash Systems, San Francisco, CA, USAFirooz Faili, Element Six Technologies, Santa Clara, CADaniel Twitchen, Element Six Ltd.
-
-
Fay, Patrick
University of Notre Dame-
12.1 GaN Nanowire MISFETs for Low-Power Applications
Wenjun Li, University of Notre DameKasra Pourang, University of Notre DameS M Moududul Islam, Cornell UniversityDebdeep Jena, Cornell UniversityPatrick Fay, University of Notre Dame
-
-
Fecioru, Alin
X-Celeprint, Ltd., Cork, Ireland-
8a.2 Transfer Printing of Microscale Compound Semiconductor Devices
Kanchan Ghosal, X-Celeprint, Inc.David Gomez, X-Celeprint, Inc.Matthew Meitl, X-Celeprint, Inc.Salvatore Bonafede, X-Celeprint, Inc.Carl Prevatte, X-Celeprint, Inc.Tanya Moore, X-Celeprint, Inc.Brook Raymond*, Nitronex CorporationDavid Kneeburg, X-Celeprint, Inc.Alin Fecioru, X-Celeprint, Ltd., Cork, IrelandAntonio Jose Trinadade, X-Celeprint, Ltd.Chris Bower, X-Celeprint. Inc.
-
-
Feigelson, Boris
Naval Research Laboratory-
9.1 Improvements in the Annealing of Ion Implanted III-Nitride Materials and Related Devices
Jordan Greenlee, NRC Postdoctoral Fellow Residing at the Naval Research LaboratoryBoris Feigelson, Naval Research LaboratoryJennifer Hite, U.S. Naval Research LaboratoryKarl D. Hobart, U.S. Naval Research LaboratoryFrancis Kub, U.S. Naval Research Laboratory
-
-
Feng, Milton
University of Illinois Urbana-Champaign-
6a.2 Inductively Coupled Plasma Dry Etching Process Development for > 50 Gb/s 850 nm Oxide-Confined VCSELs
Michael LiuCurtis Wang, University of Illinois at Urbana-ChampaignMilton Feng, University of Illinois Urbana-Champaign -
10a.2 Nonalloyed Refractory Metals for Self-Aligned InP HBT Emitter Contacts with InAs/InGaAs Emitter Cap
Ardy Winoto, University of Illinois at Urbana ChampaignJunyi Qiu, University of Illinois at Urbana-ChampaignMilton Feng, University of Illinois Urbana-Champaign -
12.8 Microwave Equivalent Circuit Modeling of 28 GHz Modulated 850 nm Oxide-Confined VCSELs
Curtis Wang, University of Illinois at Urbana-ChampaignMichael LiuMilton Feng, University of Illinois Urbana-Champaign
-
-
Ferizovic, Dino
Northrop Grumman Aerospace Systems-
7a.4 GaN MMIC Impingement Jet Cooled Embedded Diamond
V, Gambin, Northrop-Grumman (AS), Redondo Beach, CABenjamin PoustDino Ferizovic, Northrop Grumman Aerospace SystemsMonte Watanabe, Northrop Grumman Aerospace SystemsGary Mandrusiak, GE Global ResearchThomas Dusseault
-
-
Ferwalt, Darren
Cobham Advanced Electronic Systems-
3.1 Demonstration of X-band T/R MMIC using AFRL AlGaN/GaN MMIC Process
James Gillespie, Air Force Research LaboratoryKelson Chabak, Air Force Research Laboratory, Sensors DirectorateAntonio Crespo, Air Force Research Laboratory, Sensors DirectorateRobert Fitch, AFRLDarren Ferwalt, Cobham Advanced Electronic SystemsDavid Frey, Cobham Advanced Electronic SystemsJeremy Gassmann, Cobham Advanced Electronic SystemsMark Walker, Cobham Advanced Electronic SolutionsRyan Gilbert, Wyle LaboratoriesDennis Walker Jr, Air Force Research Laboatory, Sensors DirectorateGlen Via, AFRLA.J. GreenK.D. LeedyR.K. MongiaB.S. PolingK.A. SutherlinS.E. TetlakJ.P. TheimerG.H. Jessen
-
-
Fetterolf, David
Lockheed Martin-
7a.2 GaN Unleashed: The Benefits of Microfluidic Cooling
John Ditri, Lockheed MartinRobert Pearson, Lockheed MartinRoland Cadotte, Lockheed MartinDavid Fetterolf, Lockheed MartinMichael McNulty, Lockheed MartinDenise Luppa, Lockheed Martin
-
-
Feygelson, Tatyana
U. S. Naval Research Laboratory-
10b.4 Reliability Assessment of Thermally-Stable Gate Materials for AlGaN/GaN HEMTs
David Shahin, University of MarylandJordan Greenlee, NRC Postdoctoral Fellow Residing at the Naval Research LaboratoryAndrew Koehler, U. S. Naval Research LaboratoryVirginia Wheeler, U.S. Naval Research LaboratoryMarko Tadjer, U.S. Naval Research LaboratoryTatyana Feygelson, U. S. Naval Research LaboratoryBradford Pate, Naval Research LaboratoryJennifer Hite, U.S. Naval Research LaboratoryKarl D. Hobart, U.S. Naval Research LaboratoryCharles Eddy, US Naval Research LaboratoryJr., Naval Research LaboratoryFrancis Kub, U.S. Naval Research LaboratoryAris Christou, University of Maryland-College Park
-
-
Figuet, Christophe
-
8a.1 Beyond Silicon CMOS: Progress and Challenges
Bich-Yen Nguyen, SOITECQweltaz GaudinMariam Sadaka, SOITECChristophe Maleville, SOITECWalter Schwarzenbach, SOITECKonstantin BoudelleChristophe Figuet
-
-
Fitch, Robert
AFRL-
3.1 Demonstration of X-band T/R MMIC using AFRL AlGaN/GaN MMIC Process
James Gillespie, Air Force Research LaboratoryKelson Chabak, Air Force Research Laboratory, Sensors DirectorateAntonio Crespo, Air Force Research Laboratory, Sensors DirectorateRobert Fitch, AFRLDarren Ferwalt, Cobham Advanced Electronic SystemsDavid Frey, Cobham Advanced Electronic SystemsJeremy Gassmann, Cobham Advanced Electronic SystemsMark Walker, Cobham Advanced Electronic SolutionsRyan Gilbert, Wyle LaboratoriesDennis Walker Jr, Air Force Research Laboatory, Sensors DirectorateGlen Via, AFRLA.J. GreenK.D. LeedyR.K. MongiaB.S. PolingK.A. SutherlinS.E. TetlakJ.P. TheimerG.H. Jessen
-
-
Francis, Daniel
Akash Systems, San Francisco, CA, USA-
8a.4 GaN-on-Diamond: Robust Mechanical and Thermal Properties
Martin Kuball, University of BristolHuarui Sun, University of BristolDong Liu, University of Oxford, University of BristolJames Pomeroy, University of BristolDaniel Francis, Akash Systems, San Francisco, CA, USAFirooz Faili, Element Six Technologies, Santa Clara, CADaniel Twitchen, Element Six Ltd.
-
-
Franklin, Angela
Qorvo-
6b.3 Implementation of a Supplier Ship-To-Control Methodology and Resulting Improvements at Qorvo
Marie Le Guilly, QorvoSheila HurttAngela Franklin, Qorvo
-
-
Frey, David
Cobham Advanced Electronic Systems-
3.1 Demonstration of X-band T/R MMIC using AFRL AlGaN/GaN MMIC Process
James Gillespie, Air Force Research LaboratoryKelson Chabak, Air Force Research Laboratory, Sensors DirectorateAntonio Crespo, Air Force Research Laboratory, Sensors DirectorateRobert Fitch, AFRLDarren Ferwalt, Cobham Advanced Electronic SystemsDavid Frey, Cobham Advanced Electronic SystemsJeremy Gassmann, Cobham Advanced Electronic SystemsMark Walker, Cobham Advanced Electronic SolutionsRyan Gilbert, Wyle LaboratoriesDennis Walker Jr, Air Force Research Laboatory, Sensors DirectorateGlen Via, AFRLA.J. GreenK.D. LeedyR.K. MongiaB.S. PolingK.A. SutherlinS.E. TetlakJ.P. TheimerG.H. Jessen
-
-
Frias, Christopher
Qorvo, Inc.-
6b.1 Automating from Tapeout to Factory for a High-mix Fab
Christopher Frias, Qorvo, Inc.
-
-
Fu, Kai
Suzhou Institute of Nano-Tech and Nano-Bionics, Chinese Academy of Science-
9.3 Compatibility of AlN/SiNx Passivation Technique with High-Temperature Process
Mengyuan Hua, The Hong Kong University of Science and TechnologyYunyou Lu, The Hong Kong University of Science and TechnologyShenghou Liu, Xiamen San'an Integrated Circuit Co., Ltd.Cheng Liu, Xiamen San'an Integrated Circuit Co., Ltd.Kai Fu, Suzhou Institute of Nano-Tech and Nano-Bionics, Chinese Academy of ScienceYong Cai, Suzhou Institute of Nano-Tech and Nano-Bionics, Chinese Academy of ScienceBaoshun Zhang, Suzhou Institute of Nano-Tech and Nano-Bionics, Chinese Academy of ScienceKevin J. Chen, The Hong Kong University of Science and Technology
-
-
Fujiwara, Shinya
Sumiden Semiconductor Materials Co., Ltd.-
5b.1 Crystal growth and wafer processing of Indium Phosphide 6″ substrate
Tomonori Morishita, Sumiden Semiconductor Materials Co., Ltd., Sumitomo Electric Industries, LtdKazuaki Kounoike, Sumiden Semiconductor Materials Co., Ltd.Shinya Fujiwara, Sumiden Semiconductor Materials Co., Ltd.Yoshiaki Hagi, Sumiden Semiconductor Materials Co., Ltd., Sumitomo Electric Industries, Ltd, ItamiYoshiki Yabuhara, Sumitomo Electric Industries, Ltd, Itami
-
-
Gambin, V,
Northrop-Grumman (AS), Redondo Beach, CA-
7a.4 GaN MMIC Impingement Jet Cooled Embedded Diamond
V, Gambin, Northrop-Grumman (AS), Redondo Beach, CABenjamin PoustDino Ferizovic, Northrop Grumman Aerospace SystemsMonte Watanabe, Northrop Grumman Aerospace SystemsGary Mandrusiak, GE Global ResearchThomas Dusseault
-
-
Gammel, Peter
Skyworks Solutions-
1.2 RF Technology Initiatives for 5G
Peter Gammel, Skyworks SolutionsStephen Kovacic, Skyworks Solutions, Inc.
-
-
Gassmann, Jeremy
Cobham Advanced Electronic Systems-
3.1 Demonstration of X-band T/R MMIC using AFRL AlGaN/GaN MMIC Process
James Gillespie, Air Force Research LaboratoryKelson Chabak, Air Force Research Laboratory, Sensors DirectorateAntonio Crespo, Air Force Research Laboratory, Sensors DirectorateRobert Fitch, AFRLDarren Ferwalt, Cobham Advanced Electronic SystemsDavid Frey, Cobham Advanced Electronic SystemsJeremy Gassmann, Cobham Advanced Electronic SystemsMark Walker, Cobham Advanced Electronic SolutionsRyan Gilbert, Wyle LaboratoriesDennis Walker Jr, Air Force Research Laboatory, Sensors DirectorateGlen Via, AFRLA.J. GreenK.D. LeedyR.K. MongiaB.S. PolingK.A. SutherlinS.E. TetlakJ.P. TheimerG.H. Jessen
-
-
Gaudin, Qweltaz
-
8a.1 Beyond Silicon CMOS: Progress and Challenges
Bich-Yen Nguyen, SOITECQweltaz GaudinMariam Sadaka, SOITECChristophe Maleville, SOITECWalter Schwarzenbach, SOITECKonstantin BoudelleChristophe Figuet
-
-
Gebara, Gabe
Raytheon IDS Microelectronics, Novati Technologies, Inc. IQE-
3.4 Towards a Si Foundry Compatible, High Performance, 0.25 um Gate, GaN on Si MMIC Process on High Resistance 200mm Si With a Cu Damascene BEOL
Jeffrey LaRoche, Raytheon IDS Microelectronics, Novati Technologies, Inc. IQEKelly Ip, Raytheon IDS Microelectronics, Novati Technologies, Inc. IQETheodore Kennedy, Raytheon IDSLovelace Soirez, NovatiJohn Bettencourt, Raytheon IDSDoug Guenther, Raytheon IDS Microelectronics, Novati Technologies, Inc. IQEGabe Gebara, Raytheon IDS Microelectronics, Novati Technologies, Inc. IQETina Trimble, Raytheon IDS Microelectronics, Novati Technologies, Inc. IQEWilliam Davis
-
-
Ghosal, Kanchan
X-Celeprint, Inc.-
8a.2 Transfer Printing of Microscale Compound Semiconductor Devices
Kanchan Ghosal, X-Celeprint, Inc.David Gomez, X-Celeprint, Inc.Matthew Meitl, X-Celeprint, Inc.Salvatore Bonafede, X-Celeprint, Inc.Carl Prevatte, X-Celeprint, Inc.Tanya Moore, X-Celeprint, Inc.Brook Raymond*, Nitronex CorporationDavid Kneeburg, X-Celeprint, Inc.Alin Fecioru, X-Celeprint, Ltd., Cork, IrelandAntonio Jose Trinadade, X-Celeprint, Ltd.Chris Bower, X-Celeprint. Inc.
-
-
Gila, Brent
University of Florida-
8b.4 Investigation of Traps in AlGaN/GaN High Electron Mobility Transistors by Sub-Bandgap Optical Pumping
Tsung-Sheng Kang, University of FloridaYi-Hsuan Lin, University of FloridaShihyun Ahn, University of FloridaFan Ren, University of FloridaErin Patrick, University of FloridaMark Law, University of FloridaDavid Cheney, University of FloridaBrent Gila, University of FloridaStephen Pearton, University of Florida
-
-
Gilbert, Ryan
Wyle Laboratories-
3.1 Demonstration of X-band T/R MMIC using AFRL AlGaN/GaN MMIC Process
James Gillespie, Air Force Research LaboratoryKelson Chabak, Air Force Research Laboratory, Sensors DirectorateAntonio Crespo, Air Force Research Laboratory, Sensors DirectorateRobert Fitch, AFRLDarren Ferwalt, Cobham Advanced Electronic SystemsDavid Frey, Cobham Advanced Electronic SystemsJeremy Gassmann, Cobham Advanced Electronic SystemsMark Walker, Cobham Advanced Electronic SolutionsRyan Gilbert, Wyle LaboratoriesDennis Walker Jr, Air Force Research Laboatory, Sensors DirectorateGlen Via, AFRLA.J. GreenK.D. LeedyR.K. MongiaB.S. PolingK.A. SutherlinS.E. TetlakJ.P. TheimerG.H. Jessen
-
-
Gillespie, James
Air Force Research Laboratory-
3.1 Demonstration of X-band T/R MMIC using AFRL AlGaN/GaN MMIC Process
James Gillespie, Air Force Research LaboratoryKelson Chabak, Air Force Research Laboratory, Sensors DirectorateAntonio Crespo, Air Force Research Laboratory, Sensors DirectorateRobert Fitch, AFRLDarren Ferwalt, Cobham Advanced Electronic SystemsDavid Frey, Cobham Advanced Electronic SystemsJeremy Gassmann, Cobham Advanced Electronic SystemsMark Walker, Cobham Advanced Electronic SolutionsRyan Gilbert, Wyle LaboratoriesDennis Walker Jr, Air Force Research Laboatory, Sensors DirectorateGlen Via, AFRLA.J. GreenK.D. LeedyR.K. MongiaB.S. PolingK.A. SutherlinS.E. TetlakJ.P. TheimerG.H. Jessen
-
-
Gomez, David
X-Celeprint, Inc.-
8a.2 Transfer Printing of Microscale Compound Semiconductor Devices
Kanchan Ghosal, X-Celeprint, Inc.David Gomez, X-Celeprint, Inc.Matthew Meitl, X-Celeprint, Inc.Salvatore Bonafede, X-Celeprint, Inc.Carl Prevatte, X-Celeprint, Inc.Tanya Moore, X-Celeprint, Inc.Brook Raymond*, Nitronex CorporationDavid Kneeburg, X-Celeprint, Inc.Alin Fecioru, X-Celeprint, Ltd., Cork, IrelandAntonio Jose Trinadade, X-Celeprint, Ltd.Chris Bower, X-Celeprint. Inc.
-
-
Green, A.J.
-
3.1 Demonstration of X-band T/R MMIC using AFRL AlGaN/GaN MMIC Process
James Gillespie, Air Force Research LaboratoryKelson Chabak, Air Force Research Laboratory, Sensors DirectorateAntonio Crespo, Air Force Research Laboratory, Sensors DirectorateRobert Fitch, AFRLDarren Ferwalt, Cobham Advanced Electronic SystemsDavid Frey, Cobham Advanced Electronic SystemsJeremy Gassmann, Cobham Advanced Electronic SystemsMark Walker, Cobham Advanced Electronic SolutionsRyan Gilbert, Wyle LaboratoriesDennis Walker Jr, Air Force Research Laboatory, Sensors DirectorateGlen Via, AFRLA.J. GreenK.D. LeedyR.K. MongiaB.S. PolingK.A. SutherlinS.E. TetlakJ.P. TheimerG.H. Jessen
-
-
Green, Bruce
Freescale Semiconductor, Inc.-
2.2 GaN Compelling Features for Developing RF Power Markets
Pierre Piel, Freescale Semiconductor Inc.Suhail Agwani, Freescale Semiconductor, Inc.Bruce Green, Freescale Semiconductor, Inc.Jim Norling, Freescale Semiconductor, Inc.Wayne Burger, Freescale Semiconductor, Inc.Monte Miller, Freescale Semiconductor Inc.
-
-
Greenlee, Jordan
NRC Postdoctoral Fellow Residing at the Naval Research Laboratory-
9.1 Improvements in the Annealing of Ion Implanted III-Nitride Materials and Related Devices
Jordan Greenlee, NRC Postdoctoral Fellow Residing at the Naval Research LaboratoryBoris Feigelson, Naval Research LaboratoryJennifer Hite, U.S. Naval Research LaboratoryKarl D. Hobart, U.S. Naval Research LaboratoryFrancis Kub, U.S. Naval Research Laboratory -
10b.4 Reliability Assessment of Thermally-Stable Gate Materials for AlGaN/GaN HEMTs
David Shahin, University of MarylandJordan Greenlee, NRC Postdoctoral Fellow Residing at the Naval Research LaboratoryAndrew Koehler, U. S. Naval Research LaboratoryVirginia Wheeler, U.S. Naval Research LaboratoryMarko Tadjer, U.S. Naval Research LaboratoryTatyana Feygelson, U. S. Naval Research LaboratoryBradford Pate, Naval Research LaboratoryJennifer Hite, U.S. Naval Research LaboratoryKarl D. Hobart, U.S. Naval Research LaboratoryCharles Eddy, US Naval Research LaboratoryJr., Naval Research LaboratoryFrancis Kub, U.S. Naval Research LaboratoryAris Christou, University of Maryland-College Park -
11.2 Effect of Surface Passivation on Current Collapse of Proton-Irradiated AlGaN/GaN HEMTs
Andrew Koehler, U. S. Naval Research LaboratoryMarko Tadjer, U.S. Naval Research LaboratoryBradley Weaver, U.S. Naval Research LaboratoryJordan Greenlee, NRC Postdoctoral Fellow Residing at the Naval Research LaboratoryDavid Shahin, University of MarylandKarl D. Hobart, U.S. Naval Research LaboratoryFrancis Kub, U.S. Naval Research Laboratory
-
-
Groft, Dan
Qorvo, Inc-
7b.4 Using Six-Sigma Methodology to Reduce Metal-Insulator-Metal Capacitance Density Variance
Jing Yao, Qorvo, IncLou Pagentine, Qorovo, IncDan Groft, Qorvo, IncPam Worsley, Qorvo, IncZach Reitmeier, Qorvo, IncPatrick Carroll, Qorvo, Inc
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-
Guenther, Doug
Raytheon IDS Microelectronics, Novati Technologies, Inc. IQE-
3.4 Towards a Si Foundry Compatible, High Performance, 0.25 um Gate, GaN on Si MMIC Process on High Resistance 200mm Si With a Cu Damascene BEOL
Jeffrey LaRoche, Raytheon IDS Microelectronics, Novati Technologies, Inc. IQEKelly Ip, Raytheon IDS Microelectronics, Novati Technologies, Inc. IQETheodore Kennedy, Raytheon IDSLovelace Soirez, NovatiJohn Bettencourt, Raytheon IDSDoug Guenther, Raytheon IDS Microelectronics, Novati Technologies, Inc. IQEGabe Gebara, Raytheon IDS Microelectronics, Novati Technologies, Inc. IQETina Trimble, Raytheon IDS Microelectronics, Novati Technologies, Inc. IQEWilliam Davis
-
-
Guiot, Eric
SOITEC-
5b.2 InP based engineered substrates for CPV cells above 46% of efficiency
Eric Guiot, SOITECFrank Dimroth, Fraunhofer Institute for Solar Energy Systems ISE, Heidenhofstrasse 2, 79110 Freiburg, GermanyAlexis Drouin, SOITECCharlotte DrazekAgnès de ButtetThomas TibbitsPaul BeutelChristian KarcherEduard OlivaGerald Siefer
-
-
Guo, Shiping
IQE RF LLC-
12.5 Investigation of Thermal Stability of TiN/O3-Al2O3/GaN Metal-Oxide-Semiconductor Diodes with 2 nm H2O-Al2O3 as Oxide/III-Nitride Interfacial Layer
Sen Huang*, Student Presentation , Hong Kong University of Science and Technology, Institute of Microelectronics Chinese Academy of ScienceQilong Bao, Institute of Microelectronics, Chinese Academy of Sciences, Beijing 100029, ChinaXinghua Wang, Institute of Microelectronics, Chinese Academy of Sciences, Beijing 100029, ChinaKe Wei, Institute of Microelectronics, Chinese Academy of SciencesXiaolei Wang, Institute of Microelectronics, Chinese Academy of Sciences, Beijing 100029, ChinaShiping Guo, IQE RF LLCJunfeng Li, Chinese Academy of SciencesXinyu Liu, Institute of Microelectronics, Chinese Academy of SciencesChao Zhao, Chinese Academy of SciencesJinjuan XiangShumin ChaiYankui Li
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Guo, Yanan
Institute of Semiconductors, Chinese Academy of Sciences; University of Chinese Academy of Sciences-
12.7 Improvement of Light Extraction Efficiency of AlGaN-based Deep-ultraviolet Light Emitting Diodes
Yanan Guo, Institute of Semiconductors, Chinese Academy of Sciences; University of Chinese Academy of SciencesYun Zhang, Institute of Semiconductors, Chinese Academy of Sciences, BeijingJianchang Yan, Institute of Semiconductors, Chinese Academy of Sciences; University of Chinese Academy of SciencesXiang Chen, Institute of Semiconductors, Chinese Academy of Sciences; University of Chinese Academy of SciencesTongbo WeiJunxi Wang, Institute of Semiconductor, Chinese Academy of Sciences, BeijingJinmin Li, NAURA Technology Group Co., Ltd.
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H Liu, P
Northrop Grumman Corporation-
4.4 A Terahertz Capable 25 nm InP HEMT MMIC Process
William Deal, Northrop Grumman CorporationW Yoshida, Northrop Grumman (AS), Redondo Beach, CA, USAXiao Bing Mei, Northrop Grumman CorporationM Lange, Northrop Grumman CorporationZ Zhou, Northrop Grumman CorporationJ Lee, Northrop Grumman CorporationP H Liu, Northrop Grumman CorporationK Leong, Northrop Grumman Corporation
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H Wang, W
WIN Semiconductors Corp.-
6b.2 An Effective Data Analysis Approach to Identify Source of Parametric Performance Variations for GaAs Manufacturing
Mingwei Tsai, WIN semiconductorsH T Li, WIN Semiconductors Corp.H F Tsai, WIN Semiconductors Corp.J W Chen, WIN Semiconductors Corp.W H Wang, WIN Semiconductors Corp.
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Hagi, Yoshiaki
Sumiden Semiconductor Materials Co., Ltd., Sumitomo Electric Industries, Ltd, Itami-
5b.1 Crystal growth and wafer processing of Indium Phosphide 6″ substrate
Tomonori Morishita, Sumiden Semiconductor Materials Co., Ltd., Sumitomo Electric Industries, LtdKazuaki Kounoike, Sumiden Semiconductor Materials Co., Ltd.Shinya Fujiwara, Sumiden Semiconductor Materials Co., Ltd.Yoshiaki Hagi, Sumiden Semiconductor Materials Co., Ltd., Sumitomo Electric Industries, Ltd, ItamiYoshiki Yabuhara, Sumitomo Electric Industries, Ltd, Itami
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Halac, Greg
Avago Technologies-
11.4 A SiN Passivation for Improved Moisture Reliability of Au Interconnect With Low-K BCB ILD
Jonathan Abrokwah, Avago TechnologiesNathan Perkins, Avago TechnologiesScott Rumery, Avago TechnologiesGreg Halac, Avago TechnologiesRobert Long, Avago Technologies
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Hall, Craig
Qorvo-
7b.5 Analysis and Solution to Ion Trim Drift Utilizing Software and a Residual Gas Analyzer
Eric McCormick, Qorvo, Inc.Romek Bobkowski, Qorvo, Inc.Karsten Mausolf, QorvoGuy Takayesu, QorvoDario Nappa, TriQuint Semiconductor,TXFrancis Celii, QorvoMike McClureCraig Hall, QorvoJoseph Raff, Qorvo
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Hamilton, Don
Qorvo-
10a.1 Uniformity Improvement and Defect Reduction of NiCr Thin Film Resistor
Chang’e Weng, QorvoJinhong Yang, QorvoRonald Herring, QorvoDon Hamilton, QorvoKaushik Vaidyanathan, Qorvo Inc.Brian Zevenbergen, Qorvo, Inc.Fred Pool, QorvoJeremy Middleton*, TriQuint Semiconductor, Inc.
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Hanson, Allen
MACOM Technology Solutions Inc.-
9.4 Simulation of Fabrication- and Operation-Induced Mechanical Stress in AlGaN/GaN Transistors
Sameer Joglekar, Massachusetts Institute of TechnologyChuanxin Lian, MACOM Technology Solutions Inc.Rajesh Baskaran, MACOM Technology Solutions Inc.Yan Zhang, MACOM Technology Solutions, IncAllen Hanson, MACOM Technology Solutions Inc.
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Hardy, Matthew
US Naval Research Laboratory-
8a.3 Epitaxial Lift-off and Transfer of III-N Materials and Devices from SiC
David Meyer, US Naval Research LaboratoryBrian Downey, US Naval Research LaboratoryD. Scott Katzer, U.S. Naval Research LaboratoryNeeraj Nepal, US Naval Research LaboratoryVirginia Wheeler, U.S. Naval Research LaboratoryDavid Storm, US Naval Research LaboratoryMatthew Hardy, US Naval Research Laboratory
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Herring, Ronald
Qorvo-
10a.1 Uniformity Improvement and Defect Reduction of NiCr Thin Film Resistor
Chang’e Weng, QorvoJinhong Yang, QorvoRonald Herring, QorvoDon Hamilton, QorvoKaushik Vaidyanathan, Qorvo Inc.Brian Zevenbergen, Qorvo, Inc.Fred Pool, QorvoJeremy Middleton*, TriQuint Semiconductor, Inc.
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Hite, Jennifer
U.S. Naval Research Laboratory-
9.1 Improvements in the Annealing of Ion Implanted III-Nitride Materials and Related Devices
Jordan Greenlee, NRC Postdoctoral Fellow Residing at the Naval Research LaboratoryBoris Feigelson, Naval Research LaboratoryJennifer Hite, U.S. Naval Research LaboratoryKarl D. Hobart, U.S. Naval Research LaboratoryFrancis Kub, U.S. Naval Research Laboratory -
10b.4 Reliability Assessment of Thermally-Stable Gate Materials for AlGaN/GaN HEMTs
David Shahin, University of MarylandJordan Greenlee, NRC Postdoctoral Fellow Residing at the Naval Research LaboratoryAndrew Koehler, U. S. Naval Research LaboratoryVirginia Wheeler, U.S. Naval Research LaboratoryMarko Tadjer, U.S. Naval Research LaboratoryTatyana Feygelson, U. S. Naval Research LaboratoryBradford Pate, Naval Research LaboratoryJennifer Hite, U.S. Naval Research LaboratoryKarl D. Hobart, U.S. Naval Research LaboratoryCharles Eddy, US Naval Research LaboratoryJr., Naval Research LaboratoryFrancis Kub, U.S. Naval Research LaboratoryAris Christou, University of Maryland-College Park
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Hladik, Molly
Brewer Science, Inc-
6a.5 Temporary Bonding for Backside Processing of 150-mm SiC Wafers
Ramachandran TrichurJayson CooperMolly Hladik, Brewer Science, IncLou Pagentine, Qorovo, Inc
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Hobart, Karl D.
U.S. Naval Research Laboratory-
9.1 Improvements in the Annealing of Ion Implanted III-Nitride Materials and Related Devices
Jordan Greenlee, NRC Postdoctoral Fellow Residing at the Naval Research LaboratoryBoris Feigelson, Naval Research LaboratoryJennifer Hite, U.S. Naval Research LaboratoryKarl D. Hobart, U.S. Naval Research LaboratoryFrancis Kub, U.S. Naval Research Laboratory -
10b.4 Reliability Assessment of Thermally-Stable Gate Materials for AlGaN/GaN HEMTs
David Shahin, University of MarylandJordan Greenlee, NRC Postdoctoral Fellow Residing at the Naval Research LaboratoryAndrew Koehler, U. S. Naval Research LaboratoryVirginia Wheeler, U.S. Naval Research LaboratoryMarko Tadjer, U.S. Naval Research LaboratoryTatyana Feygelson, U. S. Naval Research LaboratoryBradford Pate, Naval Research LaboratoryJennifer Hite, U.S. Naval Research LaboratoryKarl D. Hobart, U.S. Naval Research LaboratoryCharles Eddy, US Naval Research LaboratoryJr., Naval Research LaboratoryFrancis Kub, U.S. Naval Research LaboratoryAris Christou, University of Maryland-College Park -
11.2 Effect of Surface Passivation on Current Collapse of Proton-Irradiated AlGaN/GaN HEMTs
Andrew Koehler, U. S. Naval Research LaboratoryMarko Tadjer, U.S. Naval Research LaboratoryBradley Weaver, U.S. Naval Research LaboratoryJordan Greenlee, NRC Postdoctoral Fellow Residing at the Naval Research LaboratoryDavid Shahin, University of MarylandKarl D. Hobart, U.S. Naval Research LaboratoryFrancis Kub, U.S. Naval Research Laboratory -
11.5 Optimization of AlGaN/GaN HEMT SiN Passivation by Mixed Frequency PECVD
Marko Tadjer, U.S. Naval Research LaboratoryAndrew Koehler, U. S. Naval Research LaboratoryCharles Eddy, US Naval Research LaboratoryJr., Naval Research LaboratoryKarl D. Hobart, U.S. Naval Research LaboratoryFritz Kub, Naval Research Laboratory
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Hong Ng, Jie
University of Fukui-
8b.3 AlGaN/GaN HEMTs on Free-standing GaN Substrates with Breakdown Voltage of 5 kV and Effective Lateral Critical Field of 1 MV/cm
Jie Hong Ng, University of FukuiJoel Asubar, University of FukuiHirokuni Tokuda, University of FukuiMasaaki Kuzuhara, University of Fukui
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Horikiri, Fumimasa
Sciocs Company Limited-
10b.3 Mechanism of Initial Failures in Breakdown Voltage of GaN-on-GaN Power Switching p-n Diodes
Fumimasa Horikiri, Sciocs Company LimitedYoshinobu Narita, Sciocs Company LimitedTakehiro Yoshida, Sciocs Company LimitedHiroshi Ohta, Osaka UniversityTomoyoshi Mishima, Osaka UniversityTohru Nakamura, Hosei University
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Hsu, Jung-Hao
WIN Semiconductors Corp.-
4.3 The Study of InGaP/GaAs HBT for Ruggedness Characteristics
Ju-Hsien Lin, WIN Semiconductors Corp.Rei-Bin Chiou, WIN Semiconductors Corp.Jung-Hao Hsu, WIN Semiconductors Corp.Shu-Hsiao Tsai, WIN Semiconductors CorpChia-Ta Chang, WIN Semiconductors Corp.Chang-Ho Li, WIN Semiconductors Corp.Tung-Yao Chou, WIN Semiconductors Corp.Cheng-Kuo Lin, WIN Semiconductors CorpDennis Williams, WIN Semiconductors CorpYu-Chi Wang, WIN Semiconductors Corp
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Hua, Mengyuan
The Hong Kong University of Science and Technology-
9.3 Compatibility of AlN/SiNx Passivation Technique with High-Temperature Process
Mengyuan Hua, The Hong Kong University of Science and TechnologyYunyou Lu, The Hong Kong University of Science and TechnologyShenghou Liu, Xiamen San'an Integrated Circuit Co., Ltd.Cheng Liu, Xiamen San'an Integrated Circuit Co., Ltd.Kai Fu, Suzhou Institute of Nano-Tech and Nano-Bionics, Chinese Academy of ScienceYong Cai, Suzhou Institute of Nano-Tech and Nano-Bionics, Chinese Academy of ScienceBaoshun Zhang, Suzhou Institute of Nano-Tech and Nano-Bionics, Chinese Academy of ScienceKevin J. Chen, The Hong Kong University of Science and Technology
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Huang, Alex
North Carolina State University-
5b.4 GaN PN Junction Diode Based on Heated Magnesium Implantation And High Temperature Annealing
Sizhen WANG, North Carolina State UniversityIn Hwan JI, North Carolina State UniversityAlex Huang, North Carolina State University
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Huang*, Sen
Student Presentation , Hong Kong University of Science and Technology, Institute of Microelectronics Chinese Academy of Science-
12.5 Investigation of Thermal Stability of TiN/O3-Al2O3/GaN Metal-Oxide-Semiconductor Diodes with 2 nm H2O-Al2O3 as Oxide/III-Nitride Interfacial Layer
Sen Huang*, Student Presentation , Hong Kong University of Science and Technology, Institute of Microelectronics Chinese Academy of ScienceQilong Bao, Institute of Microelectronics, Chinese Academy of Sciences, Beijing 100029, ChinaXinghua Wang, Institute of Microelectronics, Chinese Academy of Sciences, Beijing 100029, ChinaKe Wei, Institute of Microelectronics, Chinese Academy of SciencesXiaolei Wang, Institute of Microelectronics, Chinese Academy of Sciences, Beijing 100029, ChinaShiping Guo, IQE RF LLCJunfeng Li, Chinese Academy of SciencesXinyu Liu, Institute of Microelectronics, Chinese Academy of SciencesChao Zhao, Chinese Academy of SciencesJinjuan XiangShumin ChaiYankui Li
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Huber, Martin
Infineon Technologies Austria AG-
5b.3 Effect of Carbon Doping on the Voltage-Blocking Properties of AlN/AlGaN/GaN Heterostructures
Martin Huber, Infineon Technologies Austria AGIngo Daumiller, Infineon Technologies Austria AGAndrei Andreev, Infineon Technologies Austria AGMarco Silvestri, Infineon Technologies Austria AGLauri Knuuttila, Infineon Technologies Austria AGMichael Wahl, IFOS Institut fuer Oberflaechen- und Schichtanalytik GmbHMichael Kopnarski, IFOS Institut fuer Oberflaechen- und Schichtanalytik GmbHAlberta Bonanni, Johannes Kepler University LinzAnders Lundskog, Infineon Technologies Austria AG
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Hunter, Joe
Avago Technologies-
10a.4 Reduction in Current Leakage Fails Through an Improved Metal Lift-off Process
Joe Hunter, Avago TechnologiesJonathan Abrokwah, Avago Technologies
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Hurtt, Sheila
-
6b.3 Implementation of a Supplier Ship-To-Control Methodology and Resulting Improvements at Qorvo
Marie Le Guilly, QorvoSheila HurttAngela Franklin, Qorvo
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Hwan JI, In
North Carolina State University-
5b.4 GaN PN Junction Diode Based on Heated Magnesium Implantation And High Temperature Annealing
Sizhen WANG, North Carolina State UniversityIn Hwan JI, North Carolina State UniversityAlex Huang, North Carolina State University
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Ip, Kelly
Raytheon IDS Microelectronics, Novati Technologies, Inc. IQE-
3.4 Towards a Si Foundry Compatible, High Performance, 0.25 um Gate, GaN on Si MMIC Process on High Resistance 200mm Si With a Cu Damascene BEOL
Jeffrey LaRoche, Raytheon IDS Microelectronics, Novati Technologies, Inc. IQEKelly Ip, Raytheon IDS Microelectronics, Novati Technologies, Inc. IQETheodore Kennedy, Raytheon IDSLovelace Soirez, NovatiJohn Bettencourt, Raytheon IDSDoug Guenther, Raytheon IDS Microelectronics, Novati Technologies, Inc. IQEGabe Gebara, Raytheon IDS Microelectronics, Novati Technologies, Inc. IQETina Trimble, Raytheon IDS Microelectronics, Novati Technologies, Inc. IQEWilliam Davis
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Ishikawa, Fumitaroh
-
12.9 Improved Optical Quality and 1.26 μm Light Emission from (411) GaAsBi /GaAs MQWs Grown by MBE
Pallavi PatilFumitaroh IshikawaSatoshi Shimomura
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Isom, Harold
Qorvo-
6a.4 Ablation Laser Dicing for GaN HEMT Device on 100um SiC/Au Substrates
Vivian Li, Qorvo Inc.Wade Skelton, Qorvo Inc.Yinbao Yang, Qorvo, Inc.Andrew Ketterson, Qorvo Inc.Michael Lube, QorvoHarold Isom, QorvoCathy Lee, Qorvo Inc.Rob Kraft, Qorvo Inc.
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J. Chen, Kevin
The Hong Kong University of Science and Technology-
9.3 Compatibility of AlN/SiNx Passivation Technique with High-Temperature Process
Mengyuan Hua, The Hong Kong University of Science and TechnologyYunyou Lu, The Hong Kong University of Science and TechnologyShenghou Liu, Xiamen San'an Integrated Circuit Co., Ltd.Cheng Liu, Xiamen San'an Integrated Circuit Co., Ltd.Kai Fu, Suzhou Institute of Nano-Tech and Nano-Bionics, Chinese Academy of ScienceYong Cai, Suzhou Institute of Nano-Tech and Nano-Bionics, Chinese Academy of ScienceBaoshun Zhang, Suzhou Institute of Nano-Tech and Nano-Bionics, Chinese Academy of ScienceKevin J. Chen, The Hong Kong University of Science and Technology
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Janani, Mehran
Skyworks Solutions, Inc.-
4.1 Challenges for Establishing a High Volume, High Yielding BiHEMT Manufacturing Process
Jiang Li, Skyworks Solutions, Inc.Tom Brown, Skyworks Solutions, Inc.Mehran Janani, Skyworks Solutions, Inc.Jiro YotaCristian Cismaru, Skyworks Solutions, Inc.Manjeet Singh, Skyworks Solutions, Inc.Mike Sun, Skyworks Solutions, Inc.Ravi Ramanathan
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Jena, Debdeep
Cornell University-
12.1 GaN Nanowire MISFETs for Low-Power Applications
Wenjun Li, University of Notre DameKasra Pourang, University of Notre DameS M Moududul Islam, Cornell UniversityDebdeep Jena, Cornell UniversityPatrick Fay, University of Notre Dame
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Jessen, G.H.
-
3.1 Demonstration of X-band T/R MMIC using AFRL AlGaN/GaN MMIC Process
James Gillespie, Air Force Research LaboratoryKelson Chabak, Air Force Research Laboratory, Sensors DirectorateAntonio Crespo, Air Force Research Laboratory, Sensors DirectorateRobert Fitch, AFRLDarren Ferwalt, Cobham Advanced Electronic SystemsDavid Frey, Cobham Advanced Electronic SystemsJeremy Gassmann, Cobham Advanced Electronic SystemsMark Walker, Cobham Advanced Electronic SolutionsRyan Gilbert, Wyle LaboratoriesDennis Walker Jr, Air Force Research Laboatory, Sensors DirectorateGlen Via, AFRLA.J. GreenK.D. LeedyR.K. MongiaB.S. PolingK.A. SutherlinS.E. TetlakJ.P. TheimerG.H. Jessen
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Jia, Xiao-Jia
Georgia Institute of Technology-
10a.3 Vanadium-based Ohmic Contact on n-type AlGaN Layers
Tsung-Ting Kao, Georgia Institute of Technology,Xiao-Jia Jia, Georgia Institute of TechnologyYuh-Shiuan Liu, Georgia Institute of TechnologyTheeradetch Detchprohm, Georgia Institute of TechnologyRussell Dupuis, Georgia TechShyh-Chiang Shen, Georgia Institute of Technology
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Jiang, Huaxing
Hong Kong University of Science and Technology-
11.1 Suppression of Current Collapse in AlGaN/GaN MISHEMTs using in-situ SiN Gate Dielectric and PECVD SiN Passivation
Huaxing Jiang, Hong Kong University of Science and TechnologyChao Liu, Hong Kong University of Science and TechnologyXing Lu, Hong Kong University of Science and TechnologyKei May Lau, Hong Kong University of Science and Technology -
11.3 Investigation of the Interface Traps and Current Collapse in LPCVD SiNx/AlGaN/GaN MISHEMTs
Kun Yu, Xi’an Jiaotong UniversityChao Liu, Hong Kong University of Science and TechnologyHuaxing Jiang, Hong Kong University of Science and TechnologyXing Lu, Hong Kong University of Science and TechnologyKei May Lau, Hong Kong University of Science and TechnologyAnping Zhang, Xi'an Jiaotong University
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Joglekar, Sameer
Massachusetts Institute of Technology-
9.4 Simulation of Fabrication- and Operation-Induced Mechanical Stress in AlGaN/GaN Transistors
Sameer Joglekar, Massachusetts Institute of TechnologyChuanxin Lian, MACOM Technology Solutions Inc.Rajesh Baskaran, MACOM Technology Solutions Inc.Yan Zhang, MACOM Technology Solutions, IncAllen Hanson, MACOM Technology Solutions Inc.
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Jones, Evan
Wolfspeed | A Cree Company-
6a.3 Reduction of Thin Film Stress-induced Micro-masking by Using Ti/Ni Hard Mask for High Power SiC Transistor Fabrication
Shamima Afroz, Northrop GrummanJason Thomen, Northrop Grumman CorporationJames Oliver, Northrop Grumman CorporationEvan Jones, Wolfspeed | A Cree Company
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Jose Trinadade, Antonio
X-Celeprint, Ltd.-
8a.2 Transfer Printing of Microscale Compound Semiconductor Devices
Kanchan Ghosal, X-Celeprint, Inc.David Gomez, X-Celeprint, Inc.Matthew Meitl, X-Celeprint, Inc.Salvatore Bonafede, X-Celeprint, Inc.Carl Prevatte, X-Celeprint, Inc.Tanya Moore, X-Celeprint, Inc.Brook Raymond*, Nitronex CorporationDavid Kneeburg, X-Celeprint, Inc.Alin Fecioru, X-Celeprint, Ltd., Cork, IrelandAntonio Jose Trinadade, X-Celeprint, Ltd.Chris Bower, X-Celeprint. Inc.
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Joshin, Kazukiyo
Fujitsu Laboratories Ltd.-
3.2 Millimeter-wave GaN HEMTs with Cavity-gate Structure Using MSQ-based Inter-layer Dielectric
Shiro Ozaki, Fujitsu Limited and Fujitsu Laboratories Ltd.Kozo Makiyama, Fujitsu Limited and Fujitsu Laboratories Ltd.Toshihiro Ohki, Fujitsu Limited and Fujitsu Laboratories Ltd.Yoichi Kamada, Fujitsu LaboratoriesMasaru Sato, Fujitsu Laboratories LTD.Yoshitaka Niida, Fujitsu Laboratories LTD.Naoya Okamoto, Fujitsu Limited and Fujitsu Laboratories Ltd.Kazukiyo Joshin, Fujitsu Laboratories Ltd.
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-
Jr.,
Naval Research Laboratory-
10b.4 Reliability Assessment of Thermally-Stable Gate Materials for AlGaN/GaN HEMTs
David Shahin, University of MarylandJordan Greenlee, NRC Postdoctoral Fellow Residing at the Naval Research LaboratoryAndrew Koehler, U. S. Naval Research LaboratoryVirginia Wheeler, U.S. Naval Research LaboratoryMarko Tadjer, U.S. Naval Research LaboratoryTatyana Feygelson, U. S. Naval Research LaboratoryBradford Pate, Naval Research LaboratoryJennifer Hite, U.S. Naval Research LaboratoryKarl D. Hobart, U.S. Naval Research LaboratoryCharles Eddy, US Naval Research LaboratoryJr., Naval Research LaboratoryFrancis Kub, U.S. Naval Research LaboratoryAris Christou, University of Maryland-College Park -
11.5 Optimization of AlGaN/GaN HEMT SiN Passivation by Mixed Frequency PECVD
Marko Tadjer, U.S. Naval Research LaboratoryAndrew Koehler, U. S. Naval Research LaboratoryCharles Eddy, US Naval Research LaboratoryJr., Naval Research LaboratoryKarl D. Hobart, U.S. Naval Research LaboratoryFritz Kub, Naval Research Laboratory
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Jung, Helmut
United Monolithic Semiconductors GmbH, Ulm, Germany-
10b.5 Transient Thermoreflectance for Device Temperature Assessment in Pulsed-Operated GaN-based HEMTs
Sara Martin Horcajo, Centre for Device Thermography and Reliability (CDTR), University of BristolJames Pomeroy, University of BristolBenoît Lambert, United Monolithic Semiconductors GermanyHelmut Jung, United Monolithic Semiconductors GmbH, Ulm, GermanyMartin Kuball, University of Bristol
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K Chu, K
BAE Systems-
7a.5 Near Junction Thermal Transport and Embedded Cooling of High Power GaN Electronics
Carlton Creamer, BAE Systems IncP. C. Chao, MEC, BAE Systems, IQEK K Chu, BAE SystemsA Kassinos, BAE SystemsG Campbell, Science Research Laboratories, Inc.H Eppich, Science Research Laboratories, Inc.A Shooshtari, University of MarylandS Dessiatoun, University of MarylandM Ohadi, University of MarylandC McGray, Modern MicrosystemsR Kallaher, Modern Microsystems
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Kallaher, R
Modern Microsystems-
7a.5 Near Junction Thermal Transport and Embedded Cooling of High Power GaN Electronics
Carlton Creamer, BAE Systems IncP. C. Chao, MEC, BAE Systems, IQEK K Chu, BAE SystemsA Kassinos, BAE SystemsG Campbell, Science Research Laboratories, Inc.H Eppich, Science Research Laboratories, Inc.A Shooshtari, University of MarylandS Dessiatoun, University of MarylandM Ohadi, University of MarylandC McGray, Modern MicrosystemsR Kallaher, Modern Microsystems
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Kamada, Yoichi
Fujitsu Laboratories-
3.2 Millimeter-wave GaN HEMTs with Cavity-gate Structure Using MSQ-based Inter-layer Dielectric
Shiro Ozaki, Fujitsu Limited and Fujitsu Laboratories Ltd.Kozo Makiyama, Fujitsu Limited and Fujitsu Laboratories Ltd.Toshihiro Ohki, Fujitsu Limited and Fujitsu Laboratories Ltd.Yoichi Kamada, Fujitsu LaboratoriesMasaru Sato, Fujitsu Laboratories LTD.Yoshitaka Niida, Fujitsu Laboratories LTD.Naoya Okamoto, Fujitsu Limited and Fujitsu Laboratories Ltd.Kazukiyo Joshin, Fujitsu Laboratories Ltd.
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Kang, Tsung-Sheng
University of Florida-
8b.4 Investigation of Traps in AlGaN/GaN High Electron Mobility Transistors by Sub-Bandgap Optical Pumping
Tsung-Sheng Kang, University of FloridaYi-Hsuan Lin, University of FloridaShihyun Ahn, University of FloridaFan Ren, University of FloridaErin Patrick, University of FloridaMark Law, University of FloridaDavid Cheney, University of FloridaBrent Gila, University of FloridaStephen Pearton, University of Florida -
10b.2 Recovery in dc Performance of Off-State Step-Stressed AlGaN/GaN High Electron Mobility Transistor with Thermal Annealing
Byungjae Kim, University of FloridaShihyun Ahn, University of FloridaFan Ren, University of FloridaStephen Pearton, University of FloridaDavid Smith, Arizona State UniversityTsung-Sheng Kang, University of FloridaJunhao Zhu
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Kao, Tsung-Ting
Georgia Institute of Technology,-
10a.3 Vanadium-based Ohmic Contact on n-type AlGaN Layers
Tsung-Ting Kao, Georgia Institute of Technology,Xiao-Jia Jia, Georgia Institute of TechnologyYuh-Shiuan Liu, Georgia Institute of TechnologyTheeradetch Detchprohm, Georgia Institute of TechnologyRussell Dupuis, Georgia TechShyh-Chiang Shen, Georgia Institute of Technology
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Kaper, V.
-
7a.3 GaN on Diamond: Pushing the Boundaries of Conventional MMIC Design and Fabrication
D. AltmanMatthew Tyhach, Raytheon CompanyV. KaperJ. Sanctuary
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-
Karboyan, Serge
Nexperia. Manchester, UK-
8b.2 Dynamic-Ron in Small and Large C-doped AlGaN/GaN-on-Si HEMTs
Serge Karboyan, Nexperia. Manchester, UKSara Martin Horcajo, Centre for Device Thermography and Reliability (CDTR), University of BristolJames Pomeroy, University of BristolIndranil Chatterjee, H H Wills Physics Laboratory, University of Bristol, BS8 1TL, United KingdomMichael Uren, University of BristolPeter Moens, ON Semiconductor, Corp. R&DAbishek Banerjee, ON Semiconductor, Oudenaarde 9700, BelgiumMarkus Caesar, ON Semiconductor, Oudenaarde 9700, BelgiumMartin Kuball, University of Bristol
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Karcher, Christian
-
5b.2 InP based engineered substrates for CPV cells above 46% of efficiency
Eric Guiot, SOITECFrank Dimroth, Fraunhofer Institute for Solar Energy Systems ISE, Heidenhofstrasse 2, 79110 Freiburg, GermanyAlexis Drouin, SOITECCharlotte DrazekAgnès de ButtetThomas TibbitsPaul BeutelChristian KarcherEduard OlivaGerald Siefer
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Kassinos, A
BAE Systems-
7a.5 Near Junction Thermal Transport and Embedded Cooling of High Power GaN Electronics
Carlton Creamer, BAE Systems IncP. C. Chao, MEC, BAE Systems, IQEK K Chu, BAE SystemsA Kassinos, BAE SystemsG Campbell, Science Research Laboratories, Inc.H Eppich, Science Research Laboratories, Inc.A Shooshtari, University of MarylandS Dessiatoun, University of MarylandM Ohadi, University of MarylandC McGray, Modern MicrosystemsR Kallaher, Modern Microsystems
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-
Kemf, Natalia
Ferdinand-Braun-Institut, Leibniz-Institut für Höchstfrequenztechnik (FBH)-
3.3 Developing of K- and Ka-band High Power Amplifier GaN MMIC Fabrication Technology
Konstantin Osipov, Ferdinand-Braun-Institut, Leibniz-Institut für Höchstfrequenztechnik (FBH)Sergey Chevtchenko, Ferdinand-Braun-Institut, Leibniz-Institut für Höchstfrequenztechnik (FBH)Richard Lossy, Ferdinand-Braun-Institut, Leibniz-Institut für Höchstfrequenztechnik (FBH),Olof Bengtsson, Ferdinand-Braun-Institut, Leibniz-Institut für Höchstfrequenztechnik (FBH)Paul Kurpas, Ferdinand-Braun-Institut, Leibniz-Institut für Höchstfrequenztechnik (FBH),Natalia Kemf, Ferdinand-Braun-Institut, Leibniz-Institut für Höchstfrequenztechnik (FBH)
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-
Kennedy, Theodore
Raytheon IDS-
3.4 Towards a Si Foundry Compatible, High Performance, 0.25 um Gate, GaN on Si MMIC Process on High Resistance 200mm Si With a Cu Damascene BEOL
Jeffrey LaRoche, Raytheon IDS Microelectronics, Novati Technologies, Inc. IQEKelly Ip, Raytheon IDS Microelectronics, Novati Technologies, Inc. IQETheodore Kennedy, Raytheon IDSLovelace Soirez, NovatiJohn Bettencourt, Raytheon IDSDoug Guenther, Raytheon IDS Microelectronics, Novati Technologies, Inc. IQEGabe Gebara, Raytheon IDS Microelectronics, Novati Technologies, Inc. IQETina Trimble, Raytheon IDS Microelectronics, Novati Technologies, Inc. IQEWilliam Davis
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Ketterson, Andrew
Qorvo Inc.-
6a.4 Ablation Laser Dicing for GaN HEMT Device on 100um SiC/Au Substrates
Vivian Li, Qorvo Inc.Wade Skelton, Qorvo Inc.Yinbao Yang, Qorvo, Inc.Andrew Ketterson, Qorvo Inc.Michael Lube, QorvoHarold Isom, QorvoCathy Lee, Qorvo Inc.Rob Kraft, Qorvo Inc.
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Kim, Byungjae
University of Florida-
10b.2 Recovery in dc Performance of Off-State Step-Stressed AlGaN/GaN High Electron Mobility Transistor with Thermal Annealing
Byungjae Kim, University of FloridaShihyun Ahn, University of FloridaFan Ren, University of FloridaStephen Pearton, University of FloridaDavid Smith, Arizona State UniversityTsung-Sheng Kang, University of FloridaJunhao Zhu
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-
Kleven, Brian
Qorvo-
6b.5 Outlier Labeling Method for Univariate Data for Module Test and Die Sort
Thorsten SaegerBrian Kleven, QorvoIngrid Otero, QorvoMichelle Wallace, QorvoRandi Ziglar, Qorvo
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-
Kneeburg, David
X-Celeprint, Inc.-
8a.2 Transfer Printing of Microscale Compound Semiconductor Devices
Kanchan Ghosal, X-Celeprint, Inc.David Gomez, X-Celeprint, Inc.Matthew Meitl, X-Celeprint, Inc.Salvatore Bonafede, X-Celeprint, Inc.Carl Prevatte, X-Celeprint, Inc.Tanya Moore, X-Celeprint, Inc.Brook Raymond*, Nitronex CorporationDavid Kneeburg, X-Celeprint, Inc.Alin Fecioru, X-Celeprint, Ltd., Cork, IrelandAntonio Jose Trinadade, X-Celeprint, Ltd.Chris Bower, X-Celeprint. Inc.
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Knuuttila, Lauri
Infineon Technologies Austria AG-
5b.3 Effect of Carbon Doping on the Voltage-Blocking Properties of AlN/AlGaN/GaN Heterostructures
Martin Huber, Infineon Technologies Austria AGIngo Daumiller, Infineon Technologies Austria AGAndrei Andreev, Infineon Technologies Austria AGMarco Silvestri, Infineon Technologies Austria AGLauri Knuuttila, Infineon Technologies Austria AGMichael Wahl, IFOS Institut fuer Oberflaechen- und Schichtanalytik GmbHMichael Kopnarski, IFOS Institut fuer Oberflaechen- und Schichtanalytik GmbHAlberta Bonanni, Johannes Kepler University LinzAnders Lundskog, Infineon Technologies Austria AG
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Koehler, Andrew
U. S. Naval Research Laboratory-
10b.4 Reliability Assessment of Thermally-Stable Gate Materials for AlGaN/GaN HEMTs
David Shahin, University of MarylandJordan Greenlee, NRC Postdoctoral Fellow Residing at the Naval Research LaboratoryAndrew Koehler, U. S. Naval Research LaboratoryVirginia Wheeler, U.S. Naval Research LaboratoryMarko Tadjer, U.S. Naval Research LaboratoryTatyana Feygelson, U. S. Naval Research LaboratoryBradford Pate, Naval Research LaboratoryJennifer Hite, U.S. Naval Research LaboratoryKarl D. Hobart, U.S. Naval Research LaboratoryCharles Eddy, US Naval Research LaboratoryJr., Naval Research LaboratoryFrancis Kub, U.S. Naval Research LaboratoryAris Christou, University of Maryland-College Park -
11.2 Effect of Surface Passivation on Current Collapse of Proton-Irradiated AlGaN/GaN HEMTs
Andrew Koehler, U. S. Naval Research LaboratoryMarko Tadjer, U.S. Naval Research LaboratoryBradley Weaver, U.S. Naval Research LaboratoryJordan Greenlee, NRC Postdoctoral Fellow Residing at the Naval Research LaboratoryDavid Shahin, University of MarylandKarl D. Hobart, U.S. Naval Research LaboratoryFrancis Kub, U.S. Naval Research Laboratory -
11.5 Optimization of AlGaN/GaN HEMT SiN Passivation by Mixed Frequency PECVD
Marko Tadjer, U.S. Naval Research LaboratoryAndrew Koehler, U. S. Naval Research LaboratoryCharles Eddy, US Naval Research LaboratoryJr., Naval Research LaboratoryKarl D. Hobart, U.S. Naval Research LaboratoryFritz Kub, Naval Research Laboratory
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Kopnarski, Michael
IFOS Institut fuer Oberflaechen- und Schichtanalytik GmbH-
5b.3 Effect of Carbon Doping on the Voltage-Blocking Properties of AlN/AlGaN/GaN Heterostructures
Martin Huber, Infineon Technologies Austria AGIngo Daumiller, Infineon Technologies Austria AGAndrei Andreev, Infineon Technologies Austria AGMarco Silvestri, Infineon Technologies Austria AGLauri Knuuttila, Infineon Technologies Austria AGMichael Wahl, IFOS Institut fuer Oberflaechen- und Schichtanalytik GmbHMichael Kopnarski, IFOS Institut fuer Oberflaechen- und Schichtanalytik GmbHAlberta Bonanni, Johannes Kepler University LinzAnders Lundskog, Infineon Technologies Austria AG
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Kounoike, Kazuaki
Sumiden Semiconductor Materials Co., Ltd.-
5b.1 Crystal growth and wafer processing of Indium Phosphide 6″ substrate
Tomonori Morishita, Sumiden Semiconductor Materials Co., Ltd., Sumitomo Electric Industries, LtdKazuaki Kounoike, Sumiden Semiconductor Materials Co., Ltd.Shinya Fujiwara, Sumiden Semiconductor Materials Co., Ltd.Yoshiaki Hagi, Sumiden Semiconductor Materials Co., Ltd., Sumitomo Electric Industries, Ltd, ItamiYoshiki Yabuhara, Sumitomo Electric Industries, Ltd, Itami
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Kovacic, Stephen
Skyworks Solutions, Inc.-
1.2 RF Technology Initiatives for 5G
Peter Gammel, Skyworks SolutionsStephen Kovacic, Skyworks Solutions, Inc.
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Kraft, Rob
Qorvo Inc.-
6a.4 Ablation Laser Dicing for GaN HEMT Device on 100um SiC/Au Substrates
Vivian Li, Qorvo Inc.Wade Skelton, Qorvo Inc.Yinbao Yang, Qorvo, Inc.Andrew Ketterson, Qorvo Inc.Michael Lube, QorvoHarold Isom, QorvoCathy Lee, Qorvo Inc.Rob Kraft, Qorvo Inc.
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Kub, Francis
U.S. Naval Research Laboratory-
9.1 Improvements in the Annealing of Ion Implanted III-Nitride Materials and Related Devices
Jordan Greenlee, NRC Postdoctoral Fellow Residing at the Naval Research LaboratoryBoris Feigelson, Naval Research LaboratoryJennifer Hite, U.S. Naval Research LaboratoryKarl D. Hobart, U.S. Naval Research LaboratoryFrancis Kub, U.S. Naval Research Laboratory -
10b.4 Reliability Assessment of Thermally-Stable Gate Materials for AlGaN/GaN HEMTs
David Shahin, University of MarylandJordan Greenlee, NRC Postdoctoral Fellow Residing at the Naval Research LaboratoryAndrew Koehler, U. S. Naval Research LaboratoryVirginia Wheeler, U.S. Naval Research LaboratoryMarko Tadjer, U.S. Naval Research LaboratoryTatyana Feygelson, U. S. Naval Research LaboratoryBradford Pate, Naval Research LaboratoryJennifer Hite, U.S. Naval Research LaboratoryKarl D. Hobart, U.S. Naval Research LaboratoryCharles Eddy, US Naval Research LaboratoryJr., Naval Research LaboratoryFrancis Kub, U.S. Naval Research LaboratoryAris Christou, University of Maryland-College Park -
11.2 Effect of Surface Passivation on Current Collapse of Proton-Irradiated AlGaN/GaN HEMTs
Andrew Koehler, U. S. Naval Research LaboratoryMarko Tadjer, U.S. Naval Research LaboratoryBradley Weaver, U.S. Naval Research LaboratoryJordan Greenlee, NRC Postdoctoral Fellow Residing at the Naval Research LaboratoryDavid Shahin, University of MarylandKarl D. Hobart, U.S. Naval Research LaboratoryFrancis Kub, U.S. Naval Research Laboratory
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Kub, Fritz
Naval Research Laboratory-
11.5 Optimization of AlGaN/GaN HEMT SiN Passivation by Mixed Frequency PECVD
Marko Tadjer, U.S. Naval Research LaboratoryAndrew Koehler, U. S. Naval Research LaboratoryCharles Eddy, US Naval Research LaboratoryJr., Naval Research LaboratoryKarl D. Hobart, U.S. Naval Research LaboratoryFritz Kub, Naval Research Laboratory
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Kuball, Martin
University of Bristol-
5a.4 Back Bias Ramping and Photoionization Spectroscopy Analysis of GaN-on-Si HFETs
Alexander Pooth, University of BristolMichael Uren, University of BristolTrevor Martin, IQE Europe, St Mellons, Cardiff, UKMartin Kuball, University of Bristol -
8a.4 GaN-on-Diamond: Robust Mechanical and Thermal Properties
Martin Kuball, University of BristolHuarui Sun, University of BristolDong Liu, University of Oxford, University of BristolJames Pomeroy, University of BristolDaniel Francis, Akash Systems, San Francisco, CA, USAFirooz Faili, Element Six Technologies, Santa Clara, CADaniel Twitchen, Element Six Ltd. -
8b.2 Dynamic-Ron in Small and Large C-doped AlGaN/GaN-on-Si HEMTs
Serge Karboyan, Nexperia. Manchester, UKSara Martin Horcajo, Centre for Device Thermography and Reliability (CDTR), University of BristolJames Pomeroy, University of BristolIndranil Chatterjee, H H Wills Physics Laboratory, University of Bristol, BS8 1TL, United KingdomMichael Uren, University of BristolPeter Moens, ON Semiconductor, Corp. R&DAbishek Banerjee, ON Semiconductor, Oudenaarde 9700, BelgiumMarkus Caesar, ON Semiconductor, Oudenaarde 9700, BelgiumMartin Kuball, University of Bristol -
10b.5 Transient Thermoreflectance for Device Temperature Assessment in Pulsed-Operated GaN-based HEMTs
Sara Martin Horcajo, Centre for Device Thermography and Reliability (CDTR), University of BristolJames Pomeroy, University of BristolBenoît Lambert, United Monolithic Semiconductors GermanyHelmut Jung, United Monolithic Semiconductors GmbH, Ulm, GermanyMartin Kuball, University of Bristol
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Kurpas, Paul
Ferdinand-Braun-Institut, Leibniz-Institut für Höchstfrequenztechnik (FBH),-
3.3 Developing of K- and Ka-band High Power Amplifier GaN MMIC Fabrication Technology
Konstantin Osipov, Ferdinand-Braun-Institut, Leibniz-Institut für Höchstfrequenztechnik (FBH)Sergey Chevtchenko, Ferdinand-Braun-Institut, Leibniz-Institut für Höchstfrequenztechnik (FBH)Richard Lossy, Ferdinand-Braun-Institut, Leibniz-Institut für Höchstfrequenztechnik (FBH),Olof Bengtsson, Ferdinand-Braun-Institut, Leibniz-Institut für Höchstfrequenztechnik (FBH)Paul Kurpas, Ferdinand-Braun-Institut, Leibniz-Institut für Höchstfrequenztechnik (FBH),Natalia Kemf, Ferdinand-Braun-Institut, Leibniz-Institut für Höchstfrequenztechnik (FBH)
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Kuzuhara, Masaaki
University of Fukui-
8b.3 AlGaN/GaN HEMTs on Free-standing GaN Substrates with Breakdown Voltage of 5 kV and Effective Lateral Critical Field of 1 MV/cm
Jie Hong Ng, University of FukuiJoel Asubar, University of FukuiHirokuni Tokuda, University of FukuiMasaaki Kuzuhara, University of Fukui
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Lambert, Benoît
United Monolithic Semiconductors Germany-
10b.5 Transient Thermoreflectance for Device Temperature Assessment in Pulsed-Operated GaN-based HEMTs
Sara Martin Horcajo, Centre for Device Thermography and Reliability (CDTR), University of BristolJames Pomeroy, University of BristolBenoît Lambert, United Monolithic Semiconductors GermanyHelmut Jung, United Monolithic Semiconductors GmbH, Ulm, GermanyMartin Kuball, University of Bristol
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Lange, M
Northrop Grumman Corporation-
4.4 A Terahertz Capable 25 nm InP HEMT MMIC Process
William Deal, Northrop Grumman CorporationW Yoshida, Northrop Grumman (AS), Redondo Beach, CA, USAXiao Bing Mei, Northrop Grumman CorporationM Lange, Northrop Grumman CorporationZ Zhou, Northrop Grumman CorporationJ Lee, Northrop Grumman CorporationP H Liu, Northrop Grumman CorporationK Leong, Northrop Grumman Corporation
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LaRoche, Jeffrey
Raytheon IDS Microelectronics, Novati Technologies, Inc. IQE-
3.4 Towards a Si Foundry Compatible, High Performance, 0.25 um Gate, GaN on Si MMIC Process on High Resistance 200mm Si With a Cu Damascene BEOL
Jeffrey LaRoche, Raytheon IDS Microelectronics, Novati Technologies, Inc. IQEKelly Ip, Raytheon IDS Microelectronics, Novati Technologies, Inc. IQETheodore Kennedy, Raytheon IDSLovelace Soirez, NovatiJohn Bettencourt, Raytheon IDSDoug Guenther, Raytheon IDS Microelectronics, Novati Technologies, Inc. IQEGabe Gebara, Raytheon IDS Microelectronics, Novati Technologies, Inc. IQETina Trimble, Raytheon IDS Microelectronics, Novati Technologies, Inc. IQEWilliam Davis
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Law, Mark
University of Florida-
8b.4 Investigation of Traps in AlGaN/GaN High Electron Mobility Transistors by Sub-Bandgap Optical Pumping
Tsung-Sheng Kang, University of FloridaYi-Hsuan Lin, University of FloridaShihyun Ahn, University of FloridaFan Ren, University of FloridaErin Patrick, University of FloridaMark Law, University of FloridaDavid Cheney, University of FloridaBrent Gila, University of FloridaStephen Pearton, University of Florida
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Le Guilly, Marie
Qorvo-
6b.3 Implementation of a Supplier Ship-To-Control Methodology and Resulting Improvements at Qorvo
Marie Le Guilly, QorvoSheila HurttAngela Franklin, Qorvo
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Lee, Cathy
Qorvo Inc.-
6a.4 Ablation Laser Dicing for GaN HEMT Device on 100um SiC/Au Substrates
Vivian Li, Qorvo Inc.Wade Skelton, Qorvo Inc.Yinbao Yang, Qorvo, Inc.Andrew Ketterson, Qorvo Inc.Michael Lube, QorvoHarold Isom, QorvoCathy Lee, Qorvo Inc.Rob Kraft, Qorvo Inc.
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Lee, J
Northrop Grumman Corporation-
4.4 A Terahertz Capable 25 nm InP HEMT MMIC Process
William Deal, Northrop Grumman CorporationW Yoshida, Northrop Grumman (AS), Redondo Beach, CA, USAXiao Bing Mei, Northrop Grumman CorporationM Lange, Northrop Grumman CorporationZ Zhou, Northrop Grumman CorporationJ Lee, Northrop Grumman CorporationP H Liu, Northrop Grumman CorporationK Leong, Northrop Grumman Corporation
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Leedy, K.D.
-
3.1 Demonstration of X-band T/R MMIC using AFRL AlGaN/GaN MMIC Process
James Gillespie, Air Force Research LaboratoryKelson Chabak, Air Force Research Laboratory, Sensors DirectorateAntonio Crespo, Air Force Research Laboratory, Sensors DirectorateRobert Fitch, AFRLDarren Ferwalt, Cobham Advanced Electronic SystemsDavid Frey, Cobham Advanced Electronic SystemsJeremy Gassmann, Cobham Advanced Electronic SystemsMark Walker, Cobham Advanced Electronic SolutionsRyan Gilbert, Wyle LaboratoriesDennis Walker Jr, Air Force Research Laboatory, Sensors DirectorateGlen Via, AFRLA.J. GreenK.D. LeedyR.K. MongiaB.S. PolingK.A. SutherlinS.E. TetlakJ.P. TheimerG.H. Jessen
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Leong, K
Northrop Grumman Corporation-
4.4 A Terahertz Capable 25 nm InP HEMT MMIC Process
William Deal, Northrop Grumman CorporationW Yoshida, Northrop Grumman (AS), Redondo Beach, CA, USAXiao Bing Mei, Northrop Grumman CorporationM Lange, Northrop Grumman CorporationZ Zhou, Northrop Grumman CorporationJ Lee, Northrop Grumman CorporationP H Liu, Northrop Grumman CorporationK Leong, Northrop Grumman Corporation
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Li, Chang-Ho
WIN Semiconductors Corp.-
4.3 The Study of InGaP/GaAs HBT for Ruggedness Characteristics
Ju-Hsien Lin, WIN Semiconductors Corp.Rei-Bin Chiou, WIN Semiconductors Corp.Jung-Hao Hsu, WIN Semiconductors Corp.Shu-Hsiao Tsai, WIN Semiconductors CorpChia-Ta Chang, WIN Semiconductors Corp.Chang-Ho Li, WIN Semiconductors Corp.Tung-Yao Chou, WIN Semiconductors Corp.Cheng-Kuo Lin, WIN Semiconductors CorpDennis Williams, WIN Semiconductors CorpYu-Chi Wang, WIN Semiconductors Corp
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Li, Jiang
Skyworks Solutions, Inc.-
4.1 Challenges for Establishing a High Volume, High Yielding BiHEMT Manufacturing Process
Jiang Li, Skyworks Solutions, Inc.Tom Brown, Skyworks Solutions, Inc.Mehran Janani, Skyworks Solutions, Inc.Jiro YotaCristian Cismaru, Skyworks Solutions, Inc.Manjeet Singh, Skyworks Solutions, Inc.Mike Sun, Skyworks Solutions, Inc.Ravi Ramanathan -
5a.1 A Method for Yield and Scaling Characterization of FET Structures in an InGaP/GaAs Merged HBT-FET (BiFET) Technology
Andre MetzgerJiang Li, Skyworks Solutions, Inc.Mike Sun, Skyworks Solutions, Inc.Ravi RamanathanCristian Cismaru, Skyworks Solutions, Inc.Jiro Yota
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Li, Jinmin
NAURA Technology Group Co., Ltd.-
12.7 Improvement of Light Extraction Efficiency of AlGaN-based Deep-ultraviolet Light Emitting Diodes
Yanan Guo, Institute of Semiconductors, Chinese Academy of Sciences; University of Chinese Academy of SciencesYun Zhang, Institute of Semiconductors, Chinese Academy of Sciences, BeijingJianchang Yan, Institute of Semiconductors, Chinese Academy of Sciences; University of Chinese Academy of SciencesXiang Chen, Institute of Semiconductors, Chinese Academy of Sciences; University of Chinese Academy of SciencesTongbo WeiJunxi Wang, Institute of Semiconductor, Chinese Academy of Sciences, BeijingJinmin Li, NAURA Technology Group Co., Ltd.
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Li, Junfeng
Chinese Academy of Sciences-
12.5 Investigation of Thermal Stability of TiN/O3-Al2O3/GaN Metal-Oxide-Semiconductor Diodes with 2 nm H2O-Al2O3 as Oxide/III-Nitride Interfacial Layer
Sen Huang*, Student Presentation , Hong Kong University of Science and Technology, Institute of Microelectronics Chinese Academy of ScienceQilong Bao, Institute of Microelectronics, Chinese Academy of Sciences, Beijing 100029, ChinaXinghua Wang, Institute of Microelectronics, Chinese Academy of Sciences, Beijing 100029, ChinaKe Wei, Institute of Microelectronics, Chinese Academy of SciencesXiaolei Wang, Institute of Microelectronics, Chinese Academy of Sciences, Beijing 100029, ChinaShiping Guo, IQE RF LLCJunfeng Li, Chinese Academy of SciencesXinyu Liu, Institute of Microelectronics, Chinese Academy of SciencesChao Zhao, Chinese Academy of SciencesJinjuan XiangShumin ChaiYankui Li
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Li, Vivian
Qorvo Inc.-
6a.4 Ablation Laser Dicing for GaN HEMT Device on 100um SiC/Au Substrates
Vivian Li, Qorvo Inc.Wade Skelton, Qorvo Inc.Yinbao Yang, Qorvo, Inc.Andrew Ketterson, Qorvo Inc.Michael Lube, QorvoHarold Isom, QorvoCathy Lee, Qorvo Inc.Rob Kraft, Qorvo Inc.
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Li, Wenjun
University of Notre Dame-
12.1 GaN Nanowire MISFETs for Low-Power Applications
Wenjun Li, University of Notre DameKasra Pourang, University of Notre DameS M Moududul Islam, Cornell UniversityDebdeep Jena, Cornell UniversityPatrick Fay, University of Notre Dame
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Li, Yankui
-
12.5 Investigation of Thermal Stability of TiN/O3-Al2O3/GaN Metal-Oxide-Semiconductor Diodes with 2 nm H2O-Al2O3 as Oxide/III-Nitride Interfacial Layer
Sen Huang*, Student Presentation , Hong Kong University of Science and Technology, Institute of Microelectronics Chinese Academy of ScienceQilong Bao, Institute of Microelectronics, Chinese Academy of Sciences, Beijing 100029, ChinaXinghua Wang, Institute of Microelectronics, Chinese Academy of Sciences, Beijing 100029, ChinaKe Wei, Institute of Microelectronics, Chinese Academy of SciencesXiaolei Wang, Institute of Microelectronics, Chinese Academy of Sciences, Beijing 100029, ChinaShiping Guo, IQE RF LLCJunfeng Li, Chinese Academy of SciencesXinyu Liu, Institute of Microelectronics, Chinese Academy of SciencesChao Zhao, Chinese Academy of SciencesJinjuan XiangShumin ChaiYankui Li
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Lian, Chuanxin
MACOM Technology Solutions Inc.-
9.4 Simulation of Fabrication- and Operation-Induced Mechanical Stress in AlGaN/GaN Transistors
Sameer Joglekar, Massachusetts Institute of TechnologyChuanxin Lian, MACOM Technology Solutions Inc.Rajesh Baskaran, MACOM Technology Solutions Inc.Yan Zhang, MACOM Technology Solutions, IncAllen Hanson, MACOM Technology Solutions Inc.
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Lin, Cheng-Kuo
WIN Semiconductors Corp-
4.3 The Study of InGaP/GaAs HBT for Ruggedness Characteristics
Ju-Hsien Lin, WIN Semiconductors Corp.Rei-Bin Chiou, WIN Semiconductors Corp.Jung-Hao Hsu, WIN Semiconductors Corp.Shu-Hsiao Tsai, WIN Semiconductors CorpChia-Ta Chang, WIN Semiconductors Corp.Chang-Ho Li, WIN Semiconductors Corp.Tung-Yao Chou, WIN Semiconductors Corp.Cheng-Kuo Lin, WIN Semiconductors CorpDennis Williams, WIN Semiconductors CorpYu-Chi Wang, WIN Semiconductors Corp
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Lin, Ju-Hsien
WIN Semiconductors Corp.-
4.3 The Study of InGaP/GaAs HBT for Ruggedness Characteristics
Ju-Hsien Lin, WIN Semiconductors Corp.Rei-Bin Chiou, WIN Semiconductors Corp.Jung-Hao Hsu, WIN Semiconductors Corp.Shu-Hsiao Tsai, WIN Semiconductors CorpChia-Ta Chang, WIN Semiconductors Corp.Chang-Ho Li, WIN Semiconductors Corp.Tung-Yao Chou, WIN Semiconductors Corp.Cheng-Kuo Lin, WIN Semiconductors CorpDennis Williams, WIN Semiconductors CorpYu-Chi Wang, WIN Semiconductors Corp
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Lin, Yi-Hsuan
University of Florida-
8b.4 Investigation of Traps in AlGaN/GaN High Electron Mobility Transistors by Sub-Bandgap Optical Pumping
Tsung-Sheng Kang, University of FloridaYi-Hsuan Lin, University of FloridaShihyun Ahn, University of FloridaFan Ren, University of FloridaErin Patrick, University of FloridaMark Law, University of FloridaDavid Cheney, University of FloridaBrent Gila, University of FloridaStephen Pearton, University of Florida
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Liu, Chao
Hong Kong University of Science and Technology-
11.1 Suppression of Current Collapse in AlGaN/GaN MISHEMTs using in-situ SiN Gate Dielectric and PECVD SiN Passivation
Huaxing Jiang, Hong Kong University of Science and TechnologyChao Liu, Hong Kong University of Science and TechnologyXing Lu, Hong Kong University of Science and TechnologyKei May Lau, Hong Kong University of Science and Technology -
11.3 Investigation of the Interface Traps and Current Collapse in LPCVD SiNx/AlGaN/GaN MISHEMTs
Kun Yu, Xi’an Jiaotong UniversityChao Liu, Hong Kong University of Science and TechnologyHuaxing Jiang, Hong Kong University of Science and TechnologyXing Lu, Hong Kong University of Science and TechnologyKei May Lau, Hong Kong University of Science and TechnologyAnping Zhang, Xi'an Jiaotong University
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Liu, Cheng
Xiamen San'an Integrated Circuit Co., Ltd.-
9.3 Compatibility of AlN/SiNx Passivation Technique with High-Temperature Process
Mengyuan Hua, The Hong Kong University of Science and TechnologyYunyou Lu, The Hong Kong University of Science and TechnologyShenghou Liu, Xiamen San'an Integrated Circuit Co., Ltd.Cheng Liu, Xiamen San'an Integrated Circuit Co., Ltd.Kai Fu, Suzhou Institute of Nano-Tech and Nano-Bionics, Chinese Academy of ScienceYong Cai, Suzhou Institute of Nano-Tech and Nano-Bionics, Chinese Academy of ScienceBaoshun Zhang, Suzhou Institute of Nano-Tech and Nano-Bionics, Chinese Academy of ScienceKevin J. Chen, The Hong Kong University of Science and Technology
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Liu, Dong
University of Oxford, University of Bristol-
8a.4 GaN-on-Diamond: Robust Mechanical and Thermal Properties
Martin Kuball, University of BristolHuarui Sun, University of BristolDong Liu, University of Oxford, University of BristolJames Pomeroy, University of BristolDaniel Francis, Akash Systems, San Francisco, CA, USAFirooz Faili, Element Six Technologies, Santa Clara, CADaniel Twitchen, Element Six Ltd.
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Liu, Michael
-
6a.2 Inductively Coupled Plasma Dry Etching Process Development for > 50 Gb/s 850 nm Oxide-Confined VCSELs
Michael LiuCurtis Wang, University of Illinois at Urbana-ChampaignMilton Feng, University of Illinois Urbana-Champaign -
12.8 Microwave Equivalent Circuit Modeling of 28 GHz Modulated 850 nm Oxide-Confined VCSELs
Curtis Wang, University of Illinois at Urbana-ChampaignMichael LiuMilton Feng, University of Illinois Urbana-Champaign
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Liu, Shenghou
Xiamen San'an Integrated Circuit Co., Ltd.-
9.3 Compatibility of AlN/SiNx Passivation Technique with High-Temperature Process
Mengyuan Hua, The Hong Kong University of Science and TechnologyYunyou Lu, The Hong Kong University of Science and TechnologyShenghou Liu, Xiamen San'an Integrated Circuit Co., Ltd.Cheng Liu, Xiamen San'an Integrated Circuit Co., Ltd.Kai Fu, Suzhou Institute of Nano-Tech and Nano-Bionics, Chinese Academy of ScienceYong Cai, Suzhou Institute of Nano-Tech and Nano-Bionics, Chinese Academy of ScienceBaoshun Zhang, Suzhou Institute of Nano-Tech and Nano-Bionics, Chinese Academy of ScienceKevin J. Chen, The Hong Kong University of Science and Technology
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Liu, Xinyu
Institute of Microelectronics, Chinese Academy of Sciences-
12.5 Investigation of Thermal Stability of TiN/O3-Al2O3/GaN Metal-Oxide-Semiconductor Diodes with 2 nm H2O-Al2O3 as Oxide/III-Nitride Interfacial Layer
Sen Huang*, Student Presentation , Hong Kong University of Science and Technology, Institute of Microelectronics Chinese Academy of ScienceQilong Bao, Institute of Microelectronics, Chinese Academy of Sciences, Beijing 100029, ChinaXinghua Wang, Institute of Microelectronics, Chinese Academy of Sciences, Beijing 100029, ChinaKe Wei, Institute of Microelectronics, Chinese Academy of SciencesXiaolei Wang, Institute of Microelectronics, Chinese Academy of Sciences, Beijing 100029, ChinaShiping Guo, IQE RF LLCJunfeng Li, Chinese Academy of SciencesXinyu Liu, Institute of Microelectronics, Chinese Academy of SciencesChao Zhao, Chinese Academy of SciencesJinjuan XiangShumin ChaiYankui Li
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Liu, Yuh-Shiuan
Georgia Institute of Technology-
10a.3 Vanadium-based Ohmic Contact on n-type AlGaN Layers
Tsung-Ting Kao, Georgia Institute of Technology,Xiao-Jia Jia, Georgia Institute of TechnologyYuh-Shiuan Liu, Georgia Institute of TechnologyTheeradetch Detchprohm, Georgia Institute of TechnologyRussell Dupuis, Georgia TechShyh-Chiang Shen, Georgia Institute of Technology
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Long, Robert
Avago Technologies-
11.4 A SiN Passivation for Improved Moisture Reliability of Au Interconnect With Low-K BCB ILD
Jonathan Abrokwah, Avago TechnologiesNathan Perkins, Avago TechnologiesScott Rumery, Avago TechnologiesGreg Halac, Avago TechnologiesRobert Long, Avago Technologies
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Lossy, Richard
Ferdinand-Braun-Institut, Leibniz-Institut für Höchstfrequenztechnik (FBH),-
3.3 Developing of K- and Ka-band High Power Amplifier GaN MMIC Fabrication Technology
Konstantin Osipov, Ferdinand-Braun-Institut, Leibniz-Institut für Höchstfrequenztechnik (FBH)Sergey Chevtchenko, Ferdinand-Braun-Institut, Leibniz-Institut für Höchstfrequenztechnik (FBH)Richard Lossy, Ferdinand-Braun-Institut, Leibniz-Institut für Höchstfrequenztechnik (FBH),Olof Bengtsson, Ferdinand-Braun-Institut, Leibniz-Institut für Höchstfrequenztechnik (FBH)Paul Kurpas, Ferdinand-Braun-Institut, Leibniz-Institut für Höchstfrequenztechnik (FBH),Natalia Kemf, Ferdinand-Braun-Institut, Leibniz-Institut für Höchstfrequenztechnik (FBH)
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Lu, Xing
Hong Kong University of Science and Technology-
11.1 Suppression of Current Collapse in AlGaN/GaN MISHEMTs using in-situ SiN Gate Dielectric and PECVD SiN Passivation
Huaxing Jiang, Hong Kong University of Science and TechnologyChao Liu, Hong Kong University of Science and TechnologyXing Lu, Hong Kong University of Science and TechnologyKei May Lau, Hong Kong University of Science and Technology -
11.3 Investigation of the Interface Traps and Current Collapse in LPCVD SiNx/AlGaN/GaN MISHEMTs
Kun Yu, Xi’an Jiaotong UniversityChao Liu, Hong Kong University of Science and TechnologyHuaxing Jiang, Hong Kong University of Science and TechnologyXing Lu, Hong Kong University of Science and TechnologyKei May Lau, Hong Kong University of Science and TechnologyAnping Zhang, Xi'an Jiaotong University
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Lu, Yunyou
The Hong Kong University of Science and Technology-
9.3 Compatibility of AlN/SiNx Passivation Technique with High-Temperature Process
Mengyuan Hua, The Hong Kong University of Science and TechnologyYunyou Lu, The Hong Kong University of Science and TechnologyShenghou Liu, Xiamen San'an Integrated Circuit Co., Ltd.Cheng Liu, Xiamen San'an Integrated Circuit Co., Ltd.Kai Fu, Suzhou Institute of Nano-Tech and Nano-Bionics, Chinese Academy of ScienceYong Cai, Suzhou Institute of Nano-Tech and Nano-Bionics, Chinese Academy of ScienceBaoshun Zhang, Suzhou Institute of Nano-Tech and Nano-Bionics, Chinese Academy of ScienceKevin J. Chen, The Hong Kong University of Science and Technology
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Lube, Michael
Qorvo-
6a.4 Ablation Laser Dicing for GaN HEMT Device on 100um SiC/Au Substrates
Vivian Li, Qorvo Inc.Wade Skelton, Qorvo Inc.Yinbao Yang, Qorvo, Inc.Andrew Ketterson, Qorvo Inc.Michael Lube, QorvoHarold Isom, QorvoCathy Lee, Qorvo Inc.Rob Kraft, Qorvo Inc.
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Lundskog, Anders
Infineon Technologies Austria AG-
5b.3 Effect of Carbon Doping on the Voltage-Blocking Properties of AlN/AlGaN/GaN Heterostructures
Martin Huber, Infineon Technologies Austria AGIngo Daumiller, Infineon Technologies Austria AGAndrei Andreev, Infineon Technologies Austria AGMarco Silvestri, Infineon Technologies Austria AGLauri Knuuttila, Infineon Technologies Austria AGMichael Wahl, IFOS Institut fuer Oberflaechen- und Schichtanalytik GmbHMichael Kopnarski, IFOS Institut fuer Oberflaechen- und Schichtanalytik GmbHAlberta Bonanni, Johannes Kepler University LinzAnders Lundskog, Infineon Technologies Austria AG
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Luppa, Denise
Lockheed Martin-
7a.2 GaN Unleashed: The Benefits of Microfluidic Cooling
John Ditri, Lockheed MartinRobert Pearson, Lockheed MartinRoland Cadotte, Lockheed MartinDavid Fetterolf, Lockheed MartinMichael McNulty, Lockheed MartinDenise Luppa, Lockheed Martin
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M Moududul Islam, S
Cornell University-
12.1 GaN Nanowire MISFETs for Low-Power Applications
Wenjun Li, University of Notre DameKasra Pourang, University of Notre DameS M Moududul Islam, Cornell UniversityDebdeep Jena, Cornell UniversityPatrick Fay, University of Notre Dame
-
-
Macdonald, Christopher
-
10a.5 An Evaporation Lift Off Process with Unidirectional Conformal Coverage
Kezia Cheng, Skyworks Solutions Inc.Christopher MacdonaldKamal Tabatabaie Alavi, Raytheon Company, Integrated Defense Systems
-
-
Makiyama, Kozo
Fujitsu Limited and Fujitsu Laboratories Ltd.-
3.2 Millimeter-wave GaN HEMTs with Cavity-gate Structure Using MSQ-based Inter-layer Dielectric
Shiro Ozaki, Fujitsu Limited and Fujitsu Laboratories Ltd.Kozo Makiyama, Fujitsu Limited and Fujitsu Laboratories Ltd.Toshihiro Ohki, Fujitsu Limited and Fujitsu Laboratories Ltd.Yoichi Kamada, Fujitsu LaboratoriesMasaru Sato, Fujitsu Laboratories LTD.Yoshitaka Niida, Fujitsu Laboratories LTD.Naoya Okamoto, Fujitsu Limited and Fujitsu Laboratories Ltd.Kazukiyo Joshin, Fujitsu Laboratories Ltd.
-
-
Maleville, Christophe
SOITEC-
8a.1 Beyond Silicon CMOS: Progress and Challenges
Bich-Yen Nguyen, SOITECQweltaz GaudinMariam Sadaka, SOITECChristophe Maleville, SOITECWalter Schwarzenbach, SOITECKonstantin BoudelleChristophe Figuet
-
-
Mandrusiak, Gary
GE Global Research-
7a.4 GaN MMIC Impingement Jet Cooled Embedded Diamond
V, Gambin, Northrop-Grumman (AS), Redondo Beach, CABenjamin PoustDino Ferizovic, Northrop Grumman Aerospace SystemsMonte Watanabe, Northrop Grumman Aerospace SystemsGary Mandrusiak, GE Global ResearchThomas Dusseault
-
-
Martin, Trevor
IQE Europe, St Mellons, Cardiff, UK-
5a.4 Back Bias Ramping and Photoionization Spectroscopy Analysis of GaN-on-Si HFETs
Alexander Pooth, University of BristolMichael Uren, University of BristolTrevor Martin, IQE Europe, St Mellons, Cardiff, UKMartin Kuball, University of Bristol
-
-
Martin Horcajo, Sara
Centre for Device Thermography and Reliability (CDTR), University of Bristol-
8b.2 Dynamic-Ron in Small and Large C-doped AlGaN/GaN-on-Si HEMTs
Serge Karboyan, Nexperia. Manchester, UKSara Martin Horcajo, Centre for Device Thermography and Reliability (CDTR), University of BristolJames Pomeroy, University of BristolIndranil Chatterjee, H H Wills Physics Laboratory, University of Bristol, BS8 1TL, United KingdomMichael Uren, University of BristolPeter Moens, ON Semiconductor, Corp. R&DAbishek Banerjee, ON Semiconductor, Oudenaarde 9700, BelgiumMarkus Caesar, ON Semiconductor, Oudenaarde 9700, BelgiumMartin Kuball, University of Bristol -
10b.5 Transient Thermoreflectance for Device Temperature Assessment in Pulsed-Operated GaN-based HEMTs
Sara Martin Horcajo, Centre for Device Thermography and Reliability (CDTR), University of BristolJames Pomeroy, University of BristolBenoît Lambert, United Monolithic Semiconductors GermanyHelmut Jung, United Monolithic Semiconductors GmbH, Ulm, GermanyMartin Kuball, University of Bristol
-
-
Mason, Sarah
Broadcom-
7b.3 Reduction of Capacitor Metal Defect Formation in High Volume Manufacturing
Sarah Mason, Broadcom
-
-
Mausolf, Karsten
Qorvo-
7b.5 Analysis and Solution to Ion Trim Drift Utilizing Software and a Residual Gas Analyzer
Eric McCormick, Qorvo, Inc.Romek Bobkowski, Qorvo, Inc.Karsten Mausolf, QorvoGuy Takayesu, QorvoDario Nappa, TriQuint Semiconductor,TXFrancis Celii, QorvoMike McClureCraig Hall, QorvoJoseph Raff, Qorvo
-
-
May Lau, Kei
Hong Kong University of Science and Technology-
11.1 Suppression of Current Collapse in AlGaN/GaN MISHEMTs using in-situ SiN Gate Dielectric and PECVD SiN Passivation
Huaxing Jiang, Hong Kong University of Science and TechnologyChao Liu, Hong Kong University of Science and TechnologyXing Lu, Hong Kong University of Science and TechnologyKei May Lau, Hong Kong University of Science and Technology -
11.3 Investigation of the Interface Traps and Current Collapse in LPCVD SiNx/AlGaN/GaN MISHEMTs
Kun Yu, Xi’an Jiaotong UniversityChao Liu, Hong Kong University of Science and TechnologyHuaxing Jiang, Hong Kong University of Science and TechnologyXing Lu, Hong Kong University of Science and TechnologyKei May Lau, Hong Kong University of Science and TechnologyAnping Zhang, Xi'an Jiaotong University
-
-
McClure, Mike
-
7b.5 Analysis and Solution to Ion Trim Drift Utilizing Software and a Residual Gas Analyzer
Eric McCormick, Qorvo, Inc.Romek Bobkowski, Qorvo, Inc.Karsten Mausolf, QorvoGuy Takayesu, QorvoDario Nappa, TriQuint Semiconductor,TXFrancis Celii, QorvoMike McClureCraig Hall, QorvoJoseph Raff, Qorvo
-
-
McCormick, Eric
Qorvo, Inc.-
7b.5 Analysis and Solution to Ion Trim Drift Utilizing Software and a Residual Gas Analyzer
Eric McCormick, Qorvo, Inc.Romek Bobkowski, Qorvo, Inc.Karsten Mausolf, QorvoGuy Takayesu, QorvoDario Nappa, TriQuint Semiconductor,TXFrancis Celii, QorvoMike McClureCraig Hall, QorvoJoseph Raff, Qorvo
-
-
McGray, C
Modern Microsystems-
7a.5 Near Junction Thermal Transport and Embedded Cooling of High Power GaN Electronics
Carlton Creamer, BAE Systems IncP. C. Chao, MEC, BAE Systems, IQEK K Chu, BAE SystemsA Kassinos, BAE SystemsG Campbell, Science Research Laboratories, Inc.H Eppich, Science Research Laboratories, Inc.A Shooshtari, University of MarylandS Dessiatoun, University of MarylandM Ohadi, University of MarylandC McGray, Modern MicrosystemsR Kallaher, Modern Microsystems
-
-
McNulty, Michael
Lockheed Martin-
7a.2 GaN Unleashed: The Benefits of Microfluidic Cooling
John Ditri, Lockheed MartinRobert Pearson, Lockheed MartinRoland Cadotte, Lockheed MartinDavid Fetterolf, Lockheed MartinMichael McNulty, Lockheed MartinDenise Luppa, Lockheed Martin
-
-
Meitl, Matthew
X-Celeprint, Inc.-
8a.2 Transfer Printing of Microscale Compound Semiconductor Devices
Kanchan Ghosal, X-Celeprint, Inc.David Gomez, X-Celeprint, Inc.Matthew Meitl, X-Celeprint, Inc.Salvatore Bonafede, X-Celeprint, Inc.Carl Prevatte, X-Celeprint, Inc.Tanya Moore, X-Celeprint, Inc.Brook Raymond*, Nitronex CorporationDavid Kneeburg, X-Celeprint, Inc.Alin Fecioru, X-Celeprint, Ltd., Cork, IrelandAntonio Jose Trinadade, X-Celeprint, Ltd.Chris Bower, X-Celeprint. Inc.
-
-
Metzger, Andre
-
5a.1 A Method for Yield and Scaling Characterization of FET Structures in an InGaP/GaAs Merged HBT-FET (BiFET) Technology
Andre MetzgerJiang Li, Skyworks Solutions, Inc.Mike Sun, Skyworks Solutions, Inc.Ravi RamanathanCristian Cismaru, Skyworks Solutions, Inc.Jiro Yota
-
-
Meyer, David
US Naval Research Laboratory-
8a.3 Epitaxial Lift-off and Transfer of III-N Materials and Devices from SiC
David Meyer, US Naval Research LaboratoryBrian Downey, US Naval Research LaboratoryD. Scott Katzer, U.S. Naval Research LaboratoryNeeraj Nepal, US Naval Research LaboratoryVirginia Wheeler, U.S. Naval Research LaboratoryDavid Storm, US Naval Research LaboratoryMatthew Hardy, US Naval Research Laboratory
-
-
Middleton*, Jeremy
TriQuint Semiconductor, Inc.-
10a.1 Uniformity Improvement and Defect Reduction of NiCr Thin Film Resistor
Chang’e Weng, QorvoJinhong Yang, QorvoRonald Herring, QorvoDon Hamilton, QorvoKaushik Vaidyanathan, Qorvo Inc.Brian Zevenbergen, Qorvo, Inc.Fred Pool, QorvoJeremy Middleton*, TriQuint Semiconductor, Inc.
-
-
Miller, Monte
Freescale Semiconductor Inc.-
2.2 GaN Compelling Features for Developing RF Power Markets
Pierre Piel, Freescale Semiconductor Inc.Suhail Agwani, Freescale Semiconductor, Inc.Bruce Green, Freescale Semiconductor, Inc.Jim Norling, Freescale Semiconductor, Inc.Wayne Burger, Freescale Semiconductor, Inc.Monte Miller, Freescale Semiconductor Inc.
-
-
Mishima, Tomoyoshi
Osaka University-
10b.3 Mechanism of Initial Failures in Breakdown Voltage of GaN-on-GaN Power Switching p-n Diodes
Fumimasa Horikiri, Sciocs Company LimitedYoshinobu Narita, Sciocs Company LimitedTakehiro Yoshida, Sciocs Company LimitedHiroshi Ohta, Osaka UniversityTomoyoshi Mishima, Osaka UniversityTohru Nakamura, Hosei University
-
-
Moens, Peter
ON Semiconductor, Corp. R&D-
8b.2 Dynamic-Ron in Small and Large C-doped AlGaN/GaN-on-Si HEMTs
Serge Karboyan, Nexperia. Manchester, UKSara Martin Horcajo, Centre for Device Thermography and Reliability (CDTR), University of BristolJames Pomeroy, University of BristolIndranil Chatterjee, H H Wills Physics Laboratory, University of Bristol, BS8 1TL, United KingdomMichael Uren, University of BristolPeter Moens, ON Semiconductor, Corp. R&DAbishek Banerjee, ON Semiconductor, Oudenaarde 9700, BelgiumMarkus Caesar, ON Semiconductor, Oudenaarde 9700, BelgiumMartin Kuball, University of Bristol
-
-
Moereke, Janina
United Monolithic Semiconductorss GmBH-
9.2 Performance Limiting Leakage Current Across Ar-Implantation Isolation in AlGaN/GaN Structures for High Power Applications
Janina Moereke, United Monolithic Semiconductorss GmBHErwan Morvan, CEA, LetiWilliam Vandendaele, CEA, LetiFabienne Allain, CEA, LetiAlphonse Torres, CEA, LetiMatthew Charles, CEA, LetiMarc Plissonnier, CEA, Leti
-
-
Mohata, Dheeraj
Global Communication Semiconductors, LLC-
5a.2 Accurate Prediction of Resistor Variation using Minimum Sized Five Resistor TLM
Dheeraj Mohata, Global Communication Semiconductors, LLCCrystal Chueng, QorvoBrian Moser, Qorvo, Inc.Peter Zampardi, Qorvo Inc.
-
-
Mongia, R.K.
-
3.1 Demonstration of X-band T/R MMIC using AFRL AlGaN/GaN MMIC Process
James Gillespie, Air Force Research LaboratoryKelson Chabak, Air Force Research Laboratory, Sensors DirectorateAntonio Crespo, Air Force Research Laboratory, Sensors DirectorateRobert Fitch, AFRLDarren Ferwalt, Cobham Advanced Electronic SystemsDavid Frey, Cobham Advanced Electronic SystemsJeremy Gassmann, Cobham Advanced Electronic SystemsMark Walker, Cobham Advanced Electronic SolutionsRyan Gilbert, Wyle LaboratoriesDennis Walker Jr, Air Force Research Laboatory, Sensors DirectorateGlen Via, AFRLA.J. GreenK.D. LeedyR.K. MongiaB.S. PolingK.A. SutherlinS.E. TetlakJ.P. TheimerG.H. Jessen
-
-
Moore, Tanya
X-Celeprint, Inc.-
8a.2 Transfer Printing of Microscale Compound Semiconductor Devices
Kanchan Ghosal, X-Celeprint, Inc.David Gomez, X-Celeprint, Inc.Matthew Meitl, X-Celeprint, Inc.Salvatore Bonafede, X-Celeprint, Inc.Carl Prevatte, X-Celeprint, Inc.Tanya Moore, X-Celeprint, Inc.Brook Raymond*, Nitronex CorporationDavid Kneeburg, X-Celeprint, Inc.Alin Fecioru, X-Celeprint, Ltd., Cork, IrelandAntonio Jose Trinadade, X-Celeprint, Ltd.Chris Bower, X-Celeprint. Inc.
-
-
Morishita, Tomonori
Sumiden Semiconductor Materials Co., Ltd., Sumitomo Electric Industries, Ltd-
5b.1 Crystal growth and wafer processing of Indium Phosphide 6″ substrate
Tomonori Morishita, Sumiden Semiconductor Materials Co., Ltd., Sumitomo Electric Industries, LtdKazuaki Kounoike, Sumiden Semiconductor Materials Co., Ltd.Shinya Fujiwara, Sumiden Semiconductor Materials Co., Ltd.Yoshiaki Hagi, Sumiden Semiconductor Materials Co., Ltd., Sumitomo Electric Industries, Ltd, ItamiYoshiki Yabuhara, Sumitomo Electric Industries, Ltd, Itami
-
-
Morvan, Erwan
CEA, Leti-
9.2 Performance Limiting Leakage Current Across Ar-Implantation Isolation in AlGaN/GaN Structures for High Power Applications
Janina Moereke, United Monolithic Semiconductorss GmBHErwan Morvan, CEA, LetiWilliam Vandendaele, CEA, LetiFabienne Allain, CEA, LetiAlphonse Torres, CEA, LetiMatthew Charles, CEA, LetiMarc Plissonnier, CEA, Leti
-
-
Moser, Brian
Qorvo, Inc.-
5a.2 Accurate Prediction of Resistor Variation using Minimum Sized Five Resistor TLM
Dheeraj Mohata, Global Communication Semiconductors, LLCCrystal Chueng, QorvoBrian Moser, Qorvo, Inc.Peter Zampardi, Qorvo Inc.
-
-
Nakamura, Tohru
Hosei University-
10b.3 Mechanism of Initial Failures in Breakdown Voltage of GaN-on-GaN Power Switching p-n Diodes
Fumimasa Horikiri, Sciocs Company LimitedYoshinobu Narita, Sciocs Company LimitedTakehiro Yoshida, Sciocs Company LimitedHiroshi Ohta, Osaka UniversityTomoyoshi Mishima, Osaka UniversityTohru Nakamura, Hosei University
-
-
Nappa, Dario
TriQuint Semiconductor,TX-
7b.5 Analysis and Solution to Ion Trim Drift Utilizing Software and a Residual Gas Analyzer
Eric McCormick, Qorvo, Inc.Romek Bobkowski, Qorvo, Inc.Karsten Mausolf, QorvoGuy Takayesu, QorvoDario Nappa, TriQuint Semiconductor,TXFrancis Celii, QorvoMike McClureCraig Hall, QorvoJoseph Raff, Qorvo
-
-
Narita, Yoshinobu
Sciocs Company Limited-
10b.3 Mechanism of Initial Failures in Breakdown Voltage of GaN-on-GaN Power Switching p-n Diodes
Fumimasa Horikiri, Sciocs Company LimitedYoshinobu Narita, Sciocs Company LimitedTakehiro Yoshida, Sciocs Company LimitedHiroshi Ohta, Osaka UniversityTomoyoshi Mishima, Osaka UniversityTohru Nakamura, Hosei University
-
-
Nepal, Neeraj
US Naval Research Laboratory-
8a.3 Epitaxial Lift-off and Transfer of III-N Materials and Devices from SiC
David Meyer, US Naval Research LaboratoryBrian Downey, US Naval Research LaboratoryD. Scott Katzer, U.S. Naval Research LaboratoryNeeraj Nepal, US Naval Research LaboratoryVirginia Wheeler, U.S. Naval Research LaboratoryDavid Storm, US Naval Research LaboratoryMatthew Hardy, US Naval Research Laboratory
-
-
Nguyen, Bich-Yen
SOITEC-
8a.1 Beyond Silicon CMOS: Progress and Challenges
Bich-Yen Nguyen, SOITECQweltaz GaudinMariam Sadaka, SOITECChristophe Maleville, SOITECWalter Schwarzenbach, SOITECKonstantin BoudelleChristophe Figuet
-
-
Niida, Yoshitaka
Fujitsu Laboratories LTD.-
3.2 Millimeter-wave GaN HEMTs with Cavity-gate Structure Using MSQ-based Inter-layer Dielectric
Shiro Ozaki, Fujitsu Limited and Fujitsu Laboratories Ltd.Kozo Makiyama, Fujitsu Limited and Fujitsu Laboratories Ltd.Toshihiro Ohki, Fujitsu Limited and Fujitsu Laboratories Ltd.Yoichi Kamada, Fujitsu LaboratoriesMasaru Sato, Fujitsu Laboratories LTD.Yoshitaka Niida, Fujitsu Laboratories LTD.Naoya Okamoto, Fujitsu Limited and Fujitsu Laboratories Ltd.Kazukiyo Joshin, Fujitsu Laboratories Ltd.
-
-
Norling, Jim
Freescale Semiconductor, Inc.-
2.2 GaN Compelling Features for Developing RF Power Markets
Pierre Piel, Freescale Semiconductor Inc.Suhail Agwani, Freescale Semiconductor, Inc.Bruce Green, Freescale Semiconductor, Inc.Jim Norling, Freescale Semiconductor, Inc.Wayne Burger, Freescale Semiconductor, Inc.Monte Miller, Freescale Semiconductor Inc.
-
-
Ohadi, M
University of Maryland-
7a.5 Near Junction Thermal Transport and Embedded Cooling of High Power GaN Electronics
Carlton Creamer, BAE Systems IncP. C. Chao, MEC, BAE Systems, IQEK K Chu, BAE SystemsA Kassinos, BAE SystemsG Campbell, Science Research Laboratories, Inc.H Eppich, Science Research Laboratories, Inc.A Shooshtari, University of MarylandS Dessiatoun, University of MarylandM Ohadi, University of MarylandC McGray, Modern MicrosystemsR Kallaher, Modern Microsystems
-
-
Ohki, Toshihiro
Fujitsu Limited and Fujitsu Laboratories Ltd.-
3.2 Millimeter-wave GaN HEMTs with Cavity-gate Structure Using MSQ-based Inter-layer Dielectric
Shiro Ozaki, Fujitsu Limited and Fujitsu Laboratories Ltd.Kozo Makiyama, Fujitsu Limited and Fujitsu Laboratories Ltd.Toshihiro Ohki, Fujitsu Limited and Fujitsu Laboratories Ltd.Yoichi Kamada, Fujitsu LaboratoriesMasaru Sato, Fujitsu Laboratories LTD.Yoshitaka Niida, Fujitsu Laboratories LTD.Naoya Okamoto, Fujitsu Limited and Fujitsu Laboratories Ltd.Kazukiyo Joshin, Fujitsu Laboratories Ltd.
-
-
Ohta, Hiroshi
Osaka University-
10b.3 Mechanism of Initial Failures in Breakdown Voltage of GaN-on-GaN Power Switching p-n Diodes
Fumimasa Horikiri, Sciocs Company LimitedYoshinobu Narita, Sciocs Company LimitedTakehiro Yoshida, Sciocs Company LimitedHiroshi Ohta, Osaka UniversityTomoyoshi Mishima, Osaka UniversityTohru Nakamura, Hosei University
-
-
Okamoto, Naoya
Fujitsu Limited and Fujitsu Laboratories Ltd.-
3.2 Millimeter-wave GaN HEMTs with Cavity-gate Structure Using MSQ-based Inter-layer Dielectric
Shiro Ozaki, Fujitsu Limited and Fujitsu Laboratories Ltd.Kozo Makiyama, Fujitsu Limited and Fujitsu Laboratories Ltd.Toshihiro Ohki, Fujitsu Limited and Fujitsu Laboratories Ltd.Yoichi Kamada, Fujitsu LaboratoriesMasaru Sato, Fujitsu Laboratories LTD.Yoshitaka Niida, Fujitsu Laboratories LTD.Naoya Okamoto, Fujitsu Limited and Fujitsu Laboratories Ltd.Kazukiyo Joshin, Fujitsu Laboratories Ltd.
-
-
Oksanen, Lauri
Nokia Solutions and Networks-
1.1 Looking Ahead to 5G
Lauri Oksanen, Nokia Solutions and Networks
-
-
Oliva, Eduard
-
5b.2 InP based engineered substrates for CPV cells above 46% of efficiency
Eric Guiot, SOITECFrank Dimroth, Fraunhofer Institute for Solar Energy Systems ISE, Heidenhofstrasse 2, 79110 Freiburg, GermanyAlexis Drouin, SOITECCharlotte DrazekAgnès de ButtetThomas TibbitsPaul BeutelChristian KarcherEduard OlivaGerald Siefer
-
-
Oliver, James
Northrop Grumman Corporation-
6a.3 Reduction of Thin Film Stress-induced Micro-masking by Using Ti/Ni Hard Mask for High Power SiC Transistor Fabrication
Shamima Afroz, Northrop GrummanJason Thomen, Northrop Grumman CorporationJames Oliver, Northrop Grumman CorporationEvan Jones, Wolfspeed | A Cree Company
-
-
Osipov, Konstantin
Ferdinand-Braun-Institut, Leibniz-Institut für Höchstfrequenztechnik (FBH)-
3.3 Developing of K- and Ka-band High Power Amplifier GaN MMIC Fabrication Technology
Konstantin Osipov, Ferdinand-Braun-Institut, Leibniz-Institut für Höchstfrequenztechnik (FBH)Sergey Chevtchenko, Ferdinand-Braun-Institut, Leibniz-Institut für Höchstfrequenztechnik (FBH)Richard Lossy, Ferdinand-Braun-Institut, Leibniz-Institut für Höchstfrequenztechnik (FBH),Olof Bengtsson, Ferdinand-Braun-Institut, Leibniz-Institut für Höchstfrequenztechnik (FBH)Paul Kurpas, Ferdinand-Braun-Institut, Leibniz-Institut für Höchstfrequenztechnik (FBH),Natalia Kemf, Ferdinand-Braun-Institut, Leibniz-Institut für Höchstfrequenztechnik (FBH)
-
-
Otero, Ingrid
Qorvo-
6b.5 Outlier Labeling Method for Univariate Data for Module Test and Die Sort
Thorsten SaegerBrian Kleven, QorvoIngrid Otero, QorvoMichelle Wallace, QorvoRandi Ziglar, Qorvo
-
-
Ozaki, Shiro
Fujitsu Limited and Fujitsu Laboratories Ltd.-
3.2 Millimeter-wave GaN HEMTs with Cavity-gate Structure Using MSQ-based Inter-layer Dielectric
Shiro Ozaki, Fujitsu Limited and Fujitsu Laboratories Ltd.Kozo Makiyama, Fujitsu Limited and Fujitsu Laboratories Ltd.Toshihiro Ohki, Fujitsu Limited and Fujitsu Laboratories Ltd.Yoichi Kamada, Fujitsu LaboratoriesMasaru Sato, Fujitsu Laboratories LTD.Yoshitaka Niida, Fujitsu Laboratories LTD.Naoya Okamoto, Fujitsu Limited and Fujitsu Laboratories Ltd.Kazukiyo Joshin, Fujitsu Laboratories Ltd.
-
-
Pagentine, Lou
Qorovo, Inc-
6a.5 Temporary Bonding for Backside Processing of 150-mm SiC Wafers
Ramachandran TrichurJayson CooperMolly Hladik, Brewer Science, IncLou Pagentine, Qorovo, Inc -
7b.4 Using Six-Sigma Methodology to Reduce Metal-Insulator-Metal Capacitance Density Variance
Jing Yao, Qorvo, IncLou Pagentine, Qorovo, IncDan Groft, Qorvo, IncPam Worsley, Qorvo, IncZach Reitmeier, Qorvo, IncPatrick Carroll, Qorvo, Inc
-
-
Pate, Bradford
Naval Research Laboratory-
10b.4 Reliability Assessment of Thermally-Stable Gate Materials for AlGaN/GaN HEMTs
David Shahin, University of MarylandJordan Greenlee, NRC Postdoctoral Fellow Residing at the Naval Research LaboratoryAndrew Koehler, U. S. Naval Research LaboratoryVirginia Wheeler, U.S. Naval Research LaboratoryMarko Tadjer, U.S. Naval Research LaboratoryTatyana Feygelson, U. S. Naval Research LaboratoryBradford Pate, Naval Research LaboratoryJennifer Hite, U.S. Naval Research LaboratoryKarl D. Hobart, U.S. Naval Research LaboratoryCharles Eddy, US Naval Research LaboratoryJr., Naval Research LaboratoryFrancis Kub, U.S. Naval Research LaboratoryAris Christou, University of Maryland-College Park
-
-
Patil, Pallavi
-
12.9 Improved Optical Quality and 1.26 μm Light Emission from (411) GaAsBi /GaAs MQWs Grown by MBE
Pallavi PatilFumitaroh IshikawaSatoshi Shimomura
-
-
Patrick, Erin
University of Florida-
8b.4 Investigation of Traps in AlGaN/GaN High Electron Mobility Transistors by Sub-Bandgap Optical Pumping
Tsung-Sheng Kang, University of FloridaYi-Hsuan Lin, University of FloridaShihyun Ahn, University of FloridaFan Ren, University of FloridaErin Patrick, University of FloridaMark Law, University of FloridaDavid Cheney, University of FloridaBrent Gila, University of FloridaStephen Pearton, University of Florida
-
-
Pearson, Chris
5G Americas-
2.1 LTE Guides the Path to the 5G Revolution
Chris Pearson, 5G Americas
-
-
Pearson, Robert
Lockheed Martin-
7a.2 GaN Unleashed: The Benefits of Microfluidic Cooling
John Ditri, Lockheed MartinRobert Pearson, Lockheed MartinRoland Cadotte, Lockheed MartinDavid Fetterolf, Lockheed MartinMichael McNulty, Lockheed MartinDenise Luppa, Lockheed Martin
-
-
Pearton, Stephen
University of Florida-
8b.4 Investigation of Traps in AlGaN/GaN High Electron Mobility Transistors by Sub-Bandgap Optical Pumping
Tsung-Sheng Kang, University of FloridaYi-Hsuan Lin, University of FloridaShihyun Ahn, University of FloridaFan Ren, University of FloridaErin Patrick, University of FloridaMark Law, University of FloridaDavid Cheney, University of FloridaBrent Gila, University of FloridaStephen Pearton, University of Florida -
10b.2 Recovery in dc Performance of Off-State Step-Stressed AlGaN/GaN High Electron Mobility Transistor with Thermal Annealing
Byungjae Kim, University of FloridaShihyun Ahn, University of FloridaFan Ren, University of FloridaStephen Pearton, University of FloridaDavid Smith, Arizona State UniversityTsung-Sheng Kang, University of FloridaJunhao Zhu
-
-
Peng, Li-Yi
Chang Gung University-
12.3 The Demonstration and Characterization of In-situ SiNx/AlGaN/GaN HEMT on 6-inch Silicon on Insulator (SOI) Substrate
Hao-Yu Wang, Institute of Semiconductors, Chinese Academy of Sciences; University of Chinese Academy of SciencesLi-Yi Peng, Chang Gung UniversityHsiang-Chun Wang, Chang Gung UniversityYuan-Hsiang Cheng -
12.4 Investigation of InAlN/GaN Schottky Barrier Diode (SBD) on 6-inch SOI substrate
Li-Yi Peng, Chang Gung UniversityHsiang-Chun Wang, Chang Gung UniversityHou-Yu Wang, Chang Gung UniversityJen-Inn Chyi, National Central University
-
-
Perkins, Nathan
Avago Technologies-
11.4 A SiN Passivation for Improved Moisture Reliability of Au Interconnect With Low-K BCB ILD
Jonathan Abrokwah, Avago TechnologiesNathan Perkins, Avago TechnologiesScott Rumery, Avago TechnologiesGreg Halac, Avago TechnologiesRobert Long, Avago Technologies
-
-
Piel, Pierre
Freescale Semiconductor Inc.-
2.2 GaN Compelling Features for Developing RF Power Markets
Pierre Piel, Freescale Semiconductor Inc.Suhail Agwani, Freescale Semiconductor, Inc.Bruce Green, Freescale Semiconductor, Inc.Jim Norling, Freescale Semiconductor, Inc.Wayne Burger, Freescale Semiconductor, Inc.Monte Miller, Freescale Semiconductor Inc.
-
-
Plissonnier, Marc
CEA, Leti-
9.2 Performance Limiting Leakage Current Across Ar-Implantation Isolation in AlGaN/GaN Structures for High Power Applications
Janina Moereke, United Monolithic Semiconductorss GmBHErwan Morvan, CEA, LetiWilliam Vandendaele, CEA, LetiFabienne Allain, CEA, LetiAlphonse Torres, CEA, LetiMatthew Charles, CEA, LetiMarc Plissonnier, CEA, Leti
-
-
Poling, B.S.
-
3.1 Demonstration of X-band T/R MMIC using AFRL AlGaN/GaN MMIC Process
James Gillespie, Air Force Research LaboratoryKelson Chabak, Air Force Research Laboratory, Sensors DirectorateAntonio Crespo, Air Force Research Laboratory, Sensors DirectorateRobert Fitch, AFRLDarren Ferwalt, Cobham Advanced Electronic SystemsDavid Frey, Cobham Advanced Electronic SystemsJeremy Gassmann, Cobham Advanced Electronic SystemsMark Walker, Cobham Advanced Electronic SolutionsRyan Gilbert, Wyle LaboratoriesDennis Walker Jr, Air Force Research Laboatory, Sensors DirectorateGlen Via, AFRLA.J. GreenK.D. LeedyR.K. MongiaB.S. PolingK.A. SutherlinS.E. TetlakJ.P. TheimerG.H. Jessen
-
-
Pomeroy, James
University of Bristol-
8a.4 GaN-on-Diamond: Robust Mechanical and Thermal Properties
Martin Kuball, University of BristolHuarui Sun, University of BristolDong Liu, University of Oxford, University of BristolJames Pomeroy, University of BristolDaniel Francis, Akash Systems, San Francisco, CA, USAFirooz Faili, Element Six Technologies, Santa Clara, CADaniel Twitchen, Element Six Ltd. -
8b.2 Dynamic-Ron in Small and Large C-doped AlGaN/GaN-on-Si HEMTs
Serge Karboyan, Nexperia. Manchester, UKSara Martin Horcajo, Centre for Device Thermography and Reliability (CDTR), University of BristolJames Pomeroy, University of BristolIndranil Chatterjee, H H Wills Physics Laboratory, University of Bristol, BS8 1TL, United KingdomMichael Uren, University of BristolPeter Moens, ON Semiconductor, Corp. R&DAbishek Banerjee, ON Semiconductor, Oudenaarde 9700, BelgiumMarkus Caesar, ON Semiconductor, Oudenaarde 9700, BelgiumMartin Kuball, University of Bristol -
10b.5 Transient Thermoreflectance for Device Temperature Assessment in Pulsed-Operated GaN-based HEMTs
Sara Martin Horcajo, Centre for Device Thermography and Reliability (CDTR), University of BristolJames Pomeroy, University of BristolBenoît Lambert, United Monolithic Semiconductors GermanyHelmut Jung, United Monolithic Semiconductors GmbH, Ulm, GermanyMartin Kuball, University of Bristol
-
-
Pool, Fred
Qorvo-
10a.1 Uniformity Improvement and Defect Reduction of NiCr Thin Film Resistor
Chang’e Weng, QorvoJinhong Yang, QorvoRonald Herring, QorvoDon Hamilton, QorvoKaushik Vaidyanathan, Qorvo Inc.Brian Zevenbergen, Qorvo, Inc.Fred Pool, QorvoJeremy Middleton*, TriQuint Semiconductor, Inc.
-
-
Pooth, Alexander
University of Bristol-
5a.4 Back Bias Ramping and Photoionization Spectroscopy Analysis of GaN-on-Si HFETs
Alexander Pooth, University of BristolMichael Uren, University of BristolTrevor Martin, IQE Europe, St Mellons, Cardiff, UKMartin Kuball, University of Bristol
-
-
Pourang, Kasra
University of Notre Dame-
12.1 GaN Nanowire MISFETs for Low-Power Applications
Wenjun Li, University of Notre DameKasra Pourang, University of Notre DameS M Moududul Islam, Cornell UniversityDebdeep Jena, Cornell UniversityPatrick Fay, University of Notre Dame
-
-
Poust, Benjamin
-
7a.4 GaN MMIC Impingement Jet Cooled Embedded Diamond
V, Gambin, Northrop-Grumman (AS), Redondo Beach, CABenjamin PoustDino Ferizovic, Northrop Grumman Aerospace SystemsMonte Watanabe, Northrop Grumman Aerospace SystemsGary Mandrusiak, GE Global ResearchThomas Dusseault
-
-
Prevatte, Carl
X-Celeprint, Inc.-
8a.2 Transfer Printing of Microscale Compound Semiconductor Devices
Kanchan Ghosal, X-Celeprint, Inc.David Gomez, X-Celeprint, Inc.Matthew Meitl, X-Celeprint, Inc.Salvatore Bonafede, X-Celeprint, Inc.Carl Prevatte, X-Celeprint, Inc.Tanya Moore, X-Celeprint, Inc.Brook Raymond*, Nitronex CorporationDavid Kneeburg, X-Celeprint, Inc.Alin Fecioru, X-Celeprint, Ltd., Cork, IrelandAntonio Jose Trinadade, X-Celeprint, Ltd.Chris Bower, X-Celeprint. Inc.
-
-
Qiu, Junyi
University of Illinois at Urbana-Champaign-
10a.2 Nonalloyed Refractory Metals for Self-Aligned InP HBT Emitter Contacts with InAs/InGaAs Emitter Cap
Ardy Winoto, University of Illinois at Urbana ChampaignJunyi Qiu, University of Illinois at Urbana-ChampaignMilton Feng, University of Illinois Urbana-Champaign
-
-
Raff, Joseph
Qorvo-
7b.5 Analysis and Solution to Ion Trim Drift Utilizing Software and a Residual Gas Analyzer
Eric McCormick, Qorvo, Inc.Romek Bobkowski, Qorvo, Inc.Karsten Mausolf, QorvoGuy Takayesu, QorvoDario Nappa, TriQuint Semiconductor,TXFrancis Celii, QorvoMike McClureCraig Hall, QorvoJoseph Raff, Qorvo
-
-
Ramanathan, Ravi
-
4.1 Challenges for Establishing a High Volume, High Yielding BiHEMT Manufacturing Process
Jiang Li, Skyworks Solutions, Inc.Tom Brown, Skyworks Solutions, Inc.Mehran Janani, Skyworks Solutions, Inc.Jiro YotaCristian Cismaru, Skyworks Solutions, Inc.Manjeet Singh, Skyworks Solutions, Inc.Mike Sun, Skyworks Solutions, Inc.Ravi Ramanathan -
5a.1 A Method for Yield and Scaling Characterization of FET Structures in an InGaP/GaAs Merged HBT-FET (BiFET) Technology
Andre MetzgerJiang Li, Skyworks Solutions, Inc.Mike Sun, Skyworks Solutions, Inc.Ravi RamanathanCristian Cismaru, Skyworks Solutions, Inc.Jiro Yota
-
-
Raymond*, Brook
Nitronex Corporation-
8a.2 Transfer Printing of Microscale Compound Semiconductor Devices
Kanchan Ghosal, X-Celeprint, Inc.David Gomez, X-Celeprint, Inc.Matthew Meitl, X-Celeprint, Inc.Salvatore Bonafede, X-Celeprint, Inc.Carl Prevatte, X-Celeprint, Inc.Tanya Moore, X-Celeprint, Inc.Brook Raymond*, Nitronex CorporationDavid Kneeburg, X-Celeprint, Inc.Alin Fecioru, X-Celeprint, Ltd., Cork, IrelandAntonio Jose Trinadade, X-Celeprint, Ltd.Chris Bower, X-Celeprint. Inc.
-
-
Reitmeier, Zach
Qorvo, Inc-
7b.1 Automated Optical Inspection (AOI) For Quality Improvement
Yu Wang, Qorvo, IncTom Cheng, QorvoCrystal Chueng, QorvoPatrick Carroll, Qorvo, IncZach Reitmeier, Qorvo, Inc -
7b.4 Using Six-Sigma Methodology to Reduce Metal-Insulator-Metal Capacitance Density Variance
Jing Yao, Qorvo, IncLou Pagentine, Qorovo, IncDan Groft, Qorvo, IncPam Worsley, Qorvo, IncZach Reitmeier, Qorvo, IncPatrick Carroll, Qorvo, Inc
-
-
Ren, Fan
University of Florida-
8b.4 Investigation of Traps in AlGaN/GaN High Electron Mobility Transistors by Sub-Bandgap Optical Pumping
Tsung-Sheng Kang, University of FloridaYi-Hsuan Lin, University of FloridaShihyun Ahn, University of FloridaFan Ren, University of FloridaErin Patrick, University of FloridaMark Law, University of FloridaDavid Cheney, University of FloridaBrent Gila, University of FloridaStephen Pearton, University of Florida -
10b.2 Recovery in dc Performance of Off-State Step-Stressed AlGaN/GaN High Electron Mobility Transistor with Thermal Annealing
Byungjae Kim, University of FloridaShihyun Ahn, University of FloridaFan Ren, University of FloridaStephen Pearton, University of FloridaDavid Smith, Arizona State UniversityTsung-Sheng Kang, University of FloridaJunhao Zhu
-
-
Rezazadeh, Vallen
University of Alberta-
6a.1 Plasma-Enhanced ALD for Improved MOS Interfaces in III-V Semiconductors
Vallen Rezazadeh, University of AlbertaKyle Bothe, University of AlbertaAmir Afshar, University of AlbertaKenneth Cadien, University of AlbertaDouglas Barlage, University of Alberta
-
-
Rivers, Tertius
-
7b.2 Fabrication Process Induced ESD Damage of MIM Capacitors on a 0.15um pHEMT Process
Robert Waco, Qorvo Inc.Rose Emergo, Qorvo, Inc.Steve Brockett, Qorvo, Inc.Tertius RiversYiping Wang, Qorvo Inc.
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-
Rumery, Scott
Avago Technologies-
11.4 A SiN Passivation for Improved Moisture Reliability of Au Interconnect With Low-K BCB ILD
Jonathan Abrokwah, Avago TechnologiesNathan Perkins, Avago TechnologiesScott Rumery, Avago TechnologiesGreg Halac, Avago TechnologiesRobert Long, Avago Technologies
-
-
Sadaka, Mariam
SOITEC-
8a.1 Beyond Silicon CMOS: Progress and Challenges
Bich-Yen Nguyen, SOITECQweltaz GaudinMariam Sadaka, SOITECChristophe Maleville, SOITECWalter Schwarzenbach, SOITECKonstantin BoudelleChristophe Figuet
-
-
Saeger, Thorsten
-
6b.5 Outlier Labeling Method for Univariate Data for Module Test and Die Sort
Thorsten SaegerBrian Kleven, QorvoIngrid Otero, QorvoMichelle Wallace, QorvoRandi Ziglar, Qorvo
-
-
Salib, Mike
Northrop Grumman Corporation-
5a.3 Characterization and Modeling of Sub-Harmonic Oscillations in GaAs and GaN FET Technologies
Mike Salib, Northrop Grumman CorporationImad Ahmad, Northrop Grumman Corporation
-
-
Sanctuary, J.
-
7a.3 GaN on Diamond: Pushing the Boundaries of Conventional MMIC Design and Fabrication
D. AltmanMatthew Tyhach, Raytheon CompanyV. KaperJ. Sanctuary
-
-
Sato, Masaru
Fujitsu Laboratories LTD.-
3.2 Millimeter-wave GaN HEMTs with Cavity-gate Structure Using MSQ-based Inter-layer Dielectric
Shiro Ozaki, Fujitsu Limited and Fujitsu Laboratories Ltd.Kozo Makiyama, Fujitsu Limited and Fujitsu Laboratories Ltd.Toshihiro Ohki, Fujitsu Limited and Fujitsu Laboratories Ltd.Yoichi Kamada, Fujitsu LaboratoriesMasaru Sato, Fujitsu Laboratories LTD.Yoshitaka Niida, Fujitsu Laboratories LTD.Naoya Okamoto, Fujitsu Limited and Fujitsu Laboratories Ltd.Kazukiyo Joshin, Fujitsu Laboratories Ltd.
-
-
Schauwecker, Bernd
United Monolithic Semiconductors-
10b.1 RF-WLR Investigation on 0.5µm AlGaN-GaN HEMTs
Bernd Schauwecker, United Monolithic SemiconductorsSimon Stolz, United Monoloihtic Semiconductors GmbH
-
-
Schubert, Peter
Indiana University-Purdue University Indianapolis-
12.2 Doubly Self-Aligned DMOSFET in SiC for Microgravity Manufacture
Peter Schubert, Indiana University-Purdue University Indianapolis
-
-
Schwarzenbach, Walter
SOITEC-
8a.1 Beyond Silicon CMOS: Progress and Challenges
Bich-Yen Nguyen, SOITECQweltaz GaudinMariam Sadaka, SOITECChristophe Maleville, SOITECWalter Schwarzenbach, SOITECKonstantin BoudelleChristophe Figuet
-
-
Scott Katzer, D.
U.S. Naval Research Laboratory-
8a.3 Epitaxial Lift-off and Transfer of III-N Materials and Devices from SiC
David Meyer, US Naval Research LaboratoryBrian Downey, US Naval Research LaboratoryD. Scott Katzer, U.S. Naval Research LaboratoryNeeraj Nepal, US Naval Research LaboratoryVirginia Wheeler, U.S. Naval Research LaboratoryDavid Storm, US Naval Research LaboratoryMatthew Hardy, US Naval Research Laboratory
-
-
Shahin, David
University of Maryland-
10b.4 Reliability Assessment of Thermally-Stable Gate Materials for AlGaN/GaN HEMTs
David Shahin, University of MarylandJordan Greenlee, NRC Postdoctoral Fellow Residing at the Naval Research LaboratoryAndrew Koehler, U. S. Naval Research LaboratoryVirginia Wheeler, U.S. Naval Research LaboratoryMarko Tadjer, U.S. Naval Research LaboratoryTatyana Feygelson, U. S. Naval Research LaboratoryBradford Pate, Naval Research LaboratoryJennifer Hite, U.S. Naval Research LaboratoryKarl D. Hobart, U.S. Naval Research LaboratoryCharles Eddy, US Naval Research LaboratoryJr., Naval Research LaboratoryFrancis Kub, U.S. Naval Research LaboratoryAris Christou, University of Maryland-College Park -
11.2 Effect of Surface Passivation on Current Collapse of Proton-Irradiated AlGaN/GaN HEMTs
Andrew Koehler, U. S. Naval Research LaboratoryMarko Tadjer, U.S. Naval Research LaboratoryBradley Weaver, U.S. Naval Research LaboratoryJordan Greenlee, NRC Postdoctoral Fellow Residing at the Naval Research LaboratoryDavid Shahin, University of MarylandKarl D. Hobart, U.S. Naval Research LaboratoryFrancis Kub, U.S. Naval Research Laboratory
-
-
Shamsi, Sajid
Qorvo.Inc-
4.2 Reducing Power vs. Time (PVT) Failure in BiFET2 Device Technology
Sajid Shamsi, Qorvo.Inc
-
-
Shen, Shyh-Chiang
Georgia Institute of Technology-
10a.3 Vanadium-based Ohmic Contact on n-type AlGaN Layers
Tsung-Ting Kao, Georgia Institute of Technology,Xiao-Jia Jia, Georgia Institute of TechnologyYuh-Shiuan Liu, Georgia Institute of TechnologyTheeradetch Detchprohm, Georgia Institute of TechnologyRussell Dupuis, Georgia TechShyh-Chiang Shen, Georgia Institute of Technology
-
-
Shimomura, Satoshi
-
12.9 Improved Optical Quality and 1.26 μm Light Emission from (411) GaAsBi /GaAs MQWs Grown by MBE
Pallavi PatilFumitaroh IshikawaSatoshi Shimomura
-
-
Shooshtari, A
University of Maryland-
7a.5 Near Junction Thermal Transport and Embedded Cooling of High Power GaN Electronics
Carlton Creamer, BAE Systems IncP. C. Chao, MEC, BAE Systems, IQEK K Chu, BAE SystemsA Kassinos, BAE SystemsG Campbell, Science Research Laboratories, Inc.H Eppich, Science Research Laboratories, Inc.A Shooshtari, University of MarylandS Dessiatoun, University of MarylandM Ohadi, University of MarylandC McGray, Modern MicrosystemsR Kallaher, Modern Microsystems
-
-
Siefer, Gerald
-
5b.2 InP based engineered substrates for CPV cells above 46% of efficiency
Eric Guiot, SOITECFrank Dimroth, Fraunhofer Institute for Solar Energy Systems ISE, Heidenhofstrasse 2, 79110 Freiburg, GermanyAlexis Drouin, SOITECCharlotte DrazekAgnès de ButtetThomas TibbitsPaul BeutelChristian KarcherEduard OlivaGerald Siefer
-
-
Silvestri, Marco
Infineon Technologies Austria AG-
5b.3 Effect of Carbon Doping on the Voltage-Blocking Properties of AlN/AlGaN/GaN Heterostructures
Martin Huber, Infineon Technologies Austria AGIngo Daumiller, Infineon Technologies Austria AGAndrei Andreev, Infineon Technologies Austria AGMarco Silvestri, Infineon Technologies Austria AGLauri Knuuttila, Infineon Technologies Austria AGMichael Wahl, IFOS Institut fuer Oberflaechen- und Schichtanalytik GmbHMichael Kopnarski, IFOS Institut fuer Oberflaechen- und Schichtanalytik GmbHAlberta Bonanni, Johannes Kepler University LinzAnders Lundskog, Infineon Technologies Austria AG
-
-
Singh, Manjeet
Skyworks Solutions, Inc.-
4.1 Challenges for Establishing a High Volume, High Yielding BiHEMT Manufacturing Process
Jiang Li, Skyworks Solutions, Inc.Tom Brown, Skyworks Solutions, Inc.Mehran Janani, Skyworks Solutions, Inc.Jiro YotaCristian Cismaru, Skyworks Solutions, Inc.Manjeet Singh, Skyworks Solutions, Inc.Mike Sun, Skyworks Solutions, Inc.Ravi Ramanathan
-
-
Sivananthan, A
Booz-Allen-Hamilton-
7a.1 Developing a New Thermal Paradigm for Gallium Nitride (GaN) Device Technology
John Blevins, Air Force Research Laboratory (AFRL), Wright-Patterson AFB, OHGlen Via, AFRLA. Bar-Cohen, Air Force Research Laboratory (AFRL), Defense Advanced Research Projects Agency (DARPA) Booz Allen HamiltonA Sivananthan, Booz-Allen-Hamilton
-
-
Skelton, Wade
Qorvo Inc.-
6a.4 Ablation Laser Dicing for GaN HEMT Device on 100um SiC/Au Substrates
Vivian Li, Qorvo Inc.Wade Skelton, Qorvo Inc.Yinbao Yang, Qorvo, Inc.Andrew Ketterson, Qorvo Inc.Michael Lube, QorvoHarold Isom, QorvoCathy Lee, Qorvo Inc.Rob Kraft, Qorvo Inc.
-
-
Smith, David
Arizona State University-
10b.2 Recovery in dc Performance of Off-State Step-Stressed AlGaN/GaN High Electron Mobility Transistor with Thermal Annealing
Byungjae Kim, University of FloridaShihyun Ahn, University of FloridaFan Ren, University of FloridaStephen Pearton, University of FloridaDavid Smith, Arizona State UniversityTsung-Sheng Kang, University of FloridaJunhao Zhu
-
-
Soirez, Lovelace
Novati-
3.4 Towards a Si Foundry Compatible, High Performance, 0.25 um Gate, GaN on Si MMIC Process on High Resistance 200mm Si With a Cu Damascene BEOL
Jeffrey LaRoche, Raytheon IDS Microelectronics, Novati Technologies, Inc. IQEKelly Ip, Raytheon IDS Microelectronics, Novati Technologies, Inc. IQETheodore Kennedy, Raytheon IDSLovelace Soirez, NovatiJohn Bettencourt, Raytheon IDSDoug Guenther, Raytheon IDS Microelectronics, Novati Technologies, Inc. IQEGabe Gebara, Raytheon IDS Microelectronics, Novati Technologies, Inc. IQETina Trimble, Raytheon IDS Microelectronics, Novati Technologies, Inc. IQEWilliam Davis
-
-
Stolz, Simon
United Monoloihtic Semiconductors GmbH-
10b.1 RF-WLR Investigation on 0.5µm AlGaN-GaN HEMTs
Bernd Schauwecker, United Monolithic SemiconductorsSimon Stolz, United Monoloihtic Semiconductors GmbH
-
-
Storm, David
US Naval Research Laboratory-
8a.3 Epitaxial Lift-off and Transfer of III-N Materials and Devices from SiC
David Meyer, US Naval Research LaboratoryBrian Downey, US Naval Research LaboratoryD. Scott Katzer, U.S. Naval Research LaboratoryNeeraj Nepal, US Naval Research LaboratoryVirginia Wheeler, U.S. Naval Research LaboratoryDavid Storm, US Naval Research LaboratoryMatthew Hardy, US Naval Research Laboratory
-
-
Sun, Huarui
University of Bristol-
8a.4 GaN-on-Diamond: Robust Mechanical and Thermal Properties
Martin Kuball, University of BristolHuarui Sun, University of BristolDong Liu, University of Oxford, University of BristolJames Pomeroy, University of BristolDaniel Francis, Akash Systems, San Francisco, CA, USAFirooz Faili, Element Six Technologies, Santa Clara, CADaniel Twitchen, Element Six Ltd.
-
-
Sun, Mike
Skyworks Solutions, Inc.-
4.1 Challenges for Establishing a High Volume, High Yielding BiHEMT Manufacturing Process
Jiang Li, Skyworks Solutions, Inc.Tom Brown, Skyworks Solutions, Inc.Mehran Janani, Skyworks Solutions, Inc.Jiro YotaCristian Cismaru, Skyworks Solutions, Inc.Manjeet Singh, Skyworks Solutions, Inc.Mike Sun, Skyworks Solutions, Inc.Ravi Ramanathan -
5a.1 A Method for Yield and Scaling Characterization of FET Structures in an InGaP/GaAs Merged HBT-FET (BiFET) Technology
Andre MetzgerJiang Li, Skyworks Solutions, Inc.Mike Sun, Skyworks Solutions, Inc.Ravi RamanathanCristian Cismaru, Skyworks Solutions, Inc.Jiro Yota
-
-
Sutherlin, K.A.
-
3.1 Demonstration of X-band T/R MMIC using AFRL AlGaN/GaN MMIC Process
James Gillespie, Air Force Research LaboratoryKelson Chabak, Air Force Research Laboratory, Sensors DirectorateAntonio Crespo, Air Force Research Laboratory, Sensors DirectorateRobert Fitch, AFRLDarren Ferwalt, Cobham Advanced Electronic SystemsDavid Frey, Cobham Advanced Electronic SystemsJeremy Gassmann, Cobham Advanced Electronic SystemsMark Walker, Cobham Advanced Electronic SolutionsRyan Gilbert, Wyle LaboratoriesDennis Walker Jr, Air Force Research Laboatory, Sensors DirectorateGlen Via, AFRLA.J. GreenK.D. LeedyR.K. MongiaB.S. PolingK.A. SutherlinS.E. TetlakJ.P. TheimerG.H. Jessen
-
-
T Li, H
WIN Semiconductors Corp.-
6b.2 An Effective Data Analysis Approach to Identify Source of Parametric Performance Variations for GaAs Manufacturing
Mingwei Tsai, WIN semiconductorsH T Li, WIN Semiconductors Corp.H F Tsai, WIN Semiconductors Corp.J W Chen, WIN Semiconductors Corp.W H Wang, WIN Semiconductors Corp.
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-
Tabatabaie Alavi, Kamal
Raytheon Company, Integrated Defense Systems-
10a.5 An Evaporation Lift Off Process with Unidirectional Conformal Coverage
Kezia Cheng, Skyworks Solutions Inc.Christopher MacdonaldKamal Tabatabaie Alavi, Raytheon Company, Integrated Defense Systems
-
-
Tadjer, Marko
U.S. Naval Research Laboratory-
10b.4 Reliability Assessment of Thermally-Stable Gate Materials for AlGaN/GaN HEMTs
David Shahin, University of MarylandJordan Greenlee, NRC Postdoctoral Fellow Residing at the Naval Research LaboratoryAndrew Koehler, U. S. Naval Research LaboratoryVirginia Wheeler, U.S. Naval Research LaboratoryMarko Tadjer, U.S. Naval Research LaboratoryTatyana Feygelson, U. S. Naval Research LaboratoryBradford Pate, Naval Research LaboratoryJennifer Hite, U.S. Naval Research LaboratoryKarl D. Hobart, U.S. Naval Research LaboratoryCharles Eddy, US Naval Research LaboratoryJr., Naval Research LaboratoryFrancis Kub, U.S. Naval Research LaboratoryAris Christou, University of Maryland-College Park -
11.2 Effect of Surface Passivation on Current Collapse of Proton-Irradiated AlGaN/GaN HEMTs
Andrew Koehler, U. S. Naval Research LaboratoryMarko Tadjer, U.S. Naval Research LaboratoryBradley Weaver, U.S. Naval Research LaboratoryJordan Greenlee, NRC Postdoctoral Fellow Residing at the Naval Research LaboratoryDavid Shahin, University of MarylandKarl D. Hobart, U.S. Naval Research LaboratoryFrancis Kub, U.S. Naval Research Laboratory -
11.5 Optimization of AlGaN/GaN HEMT SiN Passivation by Mixed Frequency PECVD
Marko Tadjer, U.S. Naval Research LaboratoryAndrew Koehler, U. S. Naval Research LaboratoryCharles Eddy, US Naval Research LaboratoryJr., Naval Research LaboratoryKarl D. Hobart, U.S. Naval Research LaboratoryFritz Kub, Naval Research Laboratory
-
-
Takayesu, Guy
Qorvo-
7b.5 Analysis and Solution to Ion Trim Drift Utilizing Software and a Residual Gas Analyzer
Eric McCormick, Qorvo, Inc.Romek Bobkowski, Qorvo, Inc.Karsten Mausolf, QorvoGuy Takayesu, QorvoDario Nappa, TriQuint Semiconductor,TXFrancis Celii, QorvoMike McClureCraig Hall, QorvoJoseph Raff, Qorvo
-
-
Tatum, Jim
Finisar-
2.3 Vertical Cavity Surface Emitting Lasers in Data Networks and Consumer Devices
Jim Tatum, Finisar
-
-
Tetlak, S.E.
-
3.1 Demonstration of X-band T/R MMIC using AFRL AlGaN/GaN MMIC Process
James Gillespie, Air Force Research LaboratoryKelson Chabak, Air Force Research Laboratory, Sensors DirectorateAntonio Crespo, Air Force Research Laboratory, Sensors DirectorateRobert Fitch, AFRLDarren Ferwalt, Cobham Advanced Electronic SystemsDavid Frey, Cobham Advanced Electronic SystemsJeremy Gassmann, Cobham Advanced Electronic SystemsMark Walker, Cobham Advanced Electronic SolutionsRyan Gilbert, Wyle LaboratoriesDennis Walker Jr, Air Force Research Laboatory, Sensors DirectorateGlen Via, AFRLA.J. GreenK.D. LeedyR.K. MongiaB.S. PolingK.A. SutherlinS.E. TetlakJ.P. TheimerG.H. Jessen
-
-
Theimer, J.P.
-
3.1 Demonstration of X-band T/R MMIC using AFRL AlGaN/GaN MMIC Process
James Gillespie, Air Force Research LaboratoryKelson Chabak, Air Force Research Laboratory, Sensors DirectorateAntonio Crespo, Air Force Research Laboratory, Sensors DirectorateRobert Fitch, AFRLDarren Ferwalt, Cobham Advanced Electronic SystemsDavid Frey, Cobham Advanced Electronic SystemsJeremy Gassmann, Cobham Advanced Electronic SystemsMark Walker, Cobham Advanced Electronic SolutionsRyan Gilbert, Wyle LaboratoriesDennis Walker Jr, Air Force Research Laboatory, Sensors DirectorateGlen Via, AFRLA.J. GreenK.D. LeedyR.K. MongiaB.S. PolingK.A. SutherlinS.E. TetlakJ.P. TheimerG.H. Jessen
-
-
Thomen, Jason
Northrop Grumman Corporation-
6a.3 Reduction of Thin Film Stress-induced Micro-masking by Using Ti/Ni Hard Mask for High Power SiC Transistor Fabrication
Shamima Afroz, Northrop GrummanJason Thomen, Northrop Grumman CorporationJames Oliver, Northrop Grumman CorporationEvan Jones, Wolfspeed | A Cree Company
-
-
Tibbits, Thomas
-
5b.2 InP based engineered substrates for CPV cells above 46% of efficiency
Eric Guiot, SOITECFrank Dimroth, Fraunhofer Institute for Solar Energy Systems ISE, Heidenhofstrasse 2, 79110 Freiburg, GermanyAlexis Drouin, SOITECCharlotte DrazekAgnès de ButtetThomas TibbitsPaul BeutelChristian KarcherEduard OlivaGerald Siefer
-
-
Tokuda, Hirokuni
University of Fukui-
8b.3 AlGaN/GaN HEMTs on Free-standing GaN Substrates with Breakdown Voltage of 5 kV and Effective Lateral Critical Field of 1 MV/cm
Jie Hong Ng, University of FukuiJoel Asubar, University of FukuiHirokuni Tokuda, University of FukuiMasaaki Kuzuhara, University of Fukui
-
-
Torres, Alphonse
CEA, Leti-
9.2 Performance Limiting Leakage Current Across Ar-Implantation Isolation in AlGaN/GaN Structures for High Power Applications
Janina Moereke, United Monolithic Semiconductorss GmBHErwan Morvan, CEA, LetiWilliam Vandendaele, CEA, LetiFabienne Allain, CEA, LetiAlphonse Torres, CEA, LetiMatthew Charles, CEA, LetiMarc Plissonnier, CEA, Leti
-
-
Trichur, Ramachandran
-
6a.5 Temporary Bonding for Backside Processing of 150-mm SiC Wafers
Ramachandran TrichurJayson CooperMolly Hladik, Brewer Science, IncLou Pagentine, Qorovo, Inc
-
-
Trimble, Tina
Raytheon IDS Microelectronics, Novati Technologies, Inc. IQE-
3.4 Towards a Si Foundry Compatible, High Performance, 0.25 um Gate, GaN on Si MMIC Process on High Resistance 200mm Si With a Cu Damascene BEOL
Jeffrey LaRoche, Raytheon IDS Microelectronics, Novati Technologies, Inc. IQEKelly Ip, Raytheon IDS Microelectronics, Novati Technologies, Inc. IQETheodore Kennedy, Raytheon IDSLovelace Soirez, NovatiJohn Bettencourt, Raytheon IDSDoug Guenther, Raytheon IDS Microelectronics, Novati Technologies, Inc. IQEGabe Gebara, Raytheon IDS Microelectronics, Novati Technologies, Inc. IQETina Trimble, Raytheon IDS Microelectronics, Novati Technologies, Inc. IQEWilliam Davis
-
-
Tsai, Mingwei
WIN semiconductors-
6b.2 An Effective Data Analysis Approach to Identify Source of Parametric Performance Variations for GaAs Manufacturing
Mingwei Tsai, WIN semiconductorsH T Li, WIN Semiconductors Corp.H F Tsai, WIN Semiconductors Corp.J W Chen, WIN Semiconductors Corp.W H Wang, WIN Semiconductors Corp.
-
-
Tsai, Shu-Hsiao
WIN Semiconductors Corp-
4.3 The Study of InGaP/GaAs HBT for Ruggedness Characteristics
Ju-Hsien Lin, WIN Semiconductors Corp.Rei-Bin Chiou, WIN Semiconductors Corp.Jung-Hao Hsu, WIN Semiconductors Corp.Shu-Hsiao Tsai, WIN Semiconductors CorpChia-Ta Chang, WIN Semiconductors Corp.Chang-Ho Li, WIN Semiconductors Corp.Tung-Yao Chou, WIN Semiconductors Corp.Cheng-Kuo Lin, WIN Semiconductors CorpDennis Williams, WIN Semiconductors CorpYu-Chi Wang, WIN Semiconductors Corp
-
-
Twitchen, Daniel
Element Six Ltd.-
8a.4 GaN-on-Diamond: Robust Mechanical and Thermal Properties
Martin Kuball, University of BristolHuarui Sun, University of BristolDong Liu, University of Oxford, University of BristolJames Pomeroy, University of BristolDaniel Francis, Akash Systems, San Francisco, CA, USAFirooz Faili, Element Six Technologies, Santa Clara, CADaniel Twitchen, Element Six Ltd.
-
-
Tyhach, Matthew
Raytheon Company-
7a.3 GaN on Diamond: Pushing the Boundaries of Conventional MMIC Design and Fabrication
D. AltmanMatthew Tyhach, Raytheon CompanyV. KaperJ. Sanctuary
-
-
Uren, Michael
University of Bristol-
5a.4 Back Bias Ramping and Photoionization Spectroscopy Analysis of GaN-on-Si HFETs
Alexander Pooth, University of BristolMichael Uren, University of BristolTrevor Martin, IQE Europe, St Mellons, Cardiff, UKMartin Kuball, University of Bristol -
8b.2 Dynamic-Ron in Small and Large C-doped AlGaN/GaN-on-Si HEMTs
Serge Karboyan, Nexperia. Manchester, UKSara Martin Horcajo, Centre for Device Thermography and Reliability (CDTR), University of BristolJames Pomeroy, University of BristolIndranil Chatterjee, H H Wills Physics Laboratory, University of Bristol, BS8 1TL, United KingdomMichael Uren, University of BristolPeter Moens, ON Semiconductor, Corp. R&DAbishek Banerjee, ON Semiconductor, Oudenaarde 9700, BelgiumMarkus Caesar, ON Semiconductor, Oudenaarde 9700, BelgiumMartin Kuball, University of Bristol
-
-
Vaidyanathan, Kaushik
Qorvo Inc.-
10a.1 Uniformity Improvement and Defect Reduction of NiCr Thin Film Resistor
Chang’e Weng, QorvoJinhong Yang, QorvoRonald Herring, QorvoDon Hamilton, QorvoKaushik Vaidyanathan, Qorvo Inc.Brian Zevenbergen, Qorvo, Inc.Fred Pool, QorvoJeremy Middleton*, TriQuint Semiconductor, Inc.
-
-
Vandendaele, William
CEA, Leti-
9.2 Performance Limiting Leakage Current Across Ar-Implantation Isolation in AlGaN/GaN Structures for High Power Applications
Janina Moereke, United Monolithic Semiconductorss GmBHErwan Morvan, CEA, LetiWilliam Vandendaele, CEA, LetiFabienne Allain, CEA, LetiAlphonse Torres, CEA, LetiMatthew Charles, CEA, LetiMarc Plissonnier, CEA, Leti
-
-
Via, Glen
AFRL-
3.1 Demonstration of X-band T/R MMIC using AFRL AlGaN/GaN MMIC Process
James Gillespie, Air Force Research LaboratoryKelson Chabak, Air Force Research Laboratory, Sensors DirectorateAntonio Crespo, Air Force Research Laboratory, Sensors DirectorateRobert Fitch, AFRLDarren Ferwalt, Cobham Advanced Electronic SystemsDavid Frey, Cobham Advanced Electronic SystemsJeremy Gassmann, Cobham Advanced Electronic SystemsMark Walker, Cobham Advanced Electronic SolutionsRyan Gilbert, Wyle LaboratoriesDennis Walker Jr, Air Force Research Laboatory, Sensors DirectorateGlen Via, AFRLA.J. GreenK.D. LeedyR.K. MongiaB.S. PolingK.A. SutherlinS.E. TetlakJ.P. TheimerG.H. Jessen -
7a.1 Developing a New Thermal Paradigm for Gallium Nitride (GaN) Device Technology
John Blevins, Air Force Research Laboratory (AFRL), Wright-Patterson AFB, OHGlen Via, AFRLA. Bar-Cohen, Air Force Research Laboratory (AFRL), Defense Advanced Research Projects Agency (DARPA) Booz Allen HamiltonA Sivananthan, Booz-Allen-Hamilton
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W Chen, J
WIN Semiconductors Corp.-
6b.2 An Effective Data Analysis Approach to Identify Source of Parametric Performance Variations for GaAs Manufacturing
Mingwei Tsai, WIN semiconductorsH T Li, WIN Semiconductors Corp.H F Tsai, WIN Semiconductors Corp.J W Chen, WIN Semiconductors Corp.W H Wang, WIN Semiconductors Corp.
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Waco, Robert
Qorvo Inc.-
7b.2 Fabrication Process Induced ESD Damage of MIM Capacitors on a 0.15um pHEMT Process
Robert Waco, Qorvo Inc.Rose Emergo, Qorvo, Inc.Steve Brockett, Qorvo, Inc.Tertius RiversYiping Wang, Qorvo Inc.
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Wahl, Michael
IFOS Institut fuer Oberflaechen- und Schichtanalytik GmbH-
5b.3 Effect of Carbon Doping on the Voltage-Blocking Properties of AlN/AlGaN/GaN Heterostructures
Martin Huber, Infineon Technologies Austria AGIngo Daumiller, Infineon Technologies Austria AGAndrei Andreev, Infineon Technologies Austria AGMarco Silvestri, Infineon Technologies Austria AGLauri Knuuttila, Infineon Technologies Austria AGMichael Wahl, IFOS Institut fuer Oberflaechen- und Schichtanalytik GmbHMichael Kopnarski, IFOS Institut fuer Oberflaechen- und Schichtanalytik GmbHAlberta Bonanni, Johannes Kepler University LinzAnders Lundskog, Infineon Technologies Austria AG
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Walker, Mark
Cobham Advanced Electronic Solutions-
3.1 Demonstration of X-band T/R MMIC using AFRL AlGaN/GaN MMIC Process
James Gillespie, Air Force Research LaboratoryKelson Chabak, Air Force Research Laboratory, Sensors DirectorateAntonio Crespo, Air Force Research Laboratory, Sensors DirectorateRobert Fitch, AFRLDarren Ferwalt, Cobham Advanced Electronic SystemsDavid Frey, Cobham Advanced Electronic SystemsJeremy Gassmann, Cobham Advanced Electronic SystemsMark Walker, Cobham Advanced Electronic SolutionsRyan Gilbert, Wyle LaboratoriesDennis Walker Jr, Air Force Research Laboatory, Sensors DirectorateGlen Via, AFRLA.J. GreenK.D. LeedyR.K. MongiaB.S. PolingK.A. SutherlinS.E. TetlakJ.P. TheimerG.H. Jessen
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Walker Jr, Dennis
Air Force Research Laboatory, Sensors Directorate-
3.1 Demonstration of X-band T/R MMIC using AFRL AlGaN/GaN MMIC Process
James Gillespie, Air Force Research LaboratoryKelson Chabak, Air Force Research Laboratory, Sensors DirectorateAntonio Crespo, Air Force Research Laboratory, Sensors DirectorateRobert Fitch, AFRLDarren Ferwalt, Cobham Advanced Electronic SystemsDavid Frey, Cobham Advanced Electronic SystemsJeremy Gassmann, Cobham Advanced Electronic SystemsMark Walker, Cobham Advanced Electronic SolutionsRyan Gilbert, Wyle LaboratoriesDennis Walker Jr, Air Force Research Laboatory, Sensors DirectorateGlen Via, AFRLA.J. GreenK.D. LeedyR.K. MongiaB.S. PolingK.A. SutherlinS.E. TetlakJ.P. TheimerG.H. Jessen
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Wallace, Michelle
Qorvo-
6b.5 Outlier Labeling Method for Univariate Data for Module Test and Die Sort
Thorsten SaegerBrian Kleven, QorvoIngrid Otero, QorvoMichelle Wallace, QorvoRandi Ziglar, Qorvo
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Wang, Curtis
University of Illinois at Urbana-Champaign-
6a.2 Inductively Coupled Plasma Dry Etching Process Development for > 50 Gb/s 850 nm Oxide-Confined VCSELs
Michael LiuCurtis Wang, University of Illinois at Urbana-ChampaignMilton Feng, University of Illinois Urbana-Champaign -
12.8 Microwave Equivalent Circuit Modeling of 28 GHz Modulated 850 nm Oxide-Confined VCSELs
Curtis Wang, University of Illinois at Urbana-ChampaignMichael LiuMilton Feng, University of Illinois Urbana-Champaign
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Wang, Hao-Yu
Institute of Semiconductors, Chinese Academy of Sciences; University of Chinese Academy of Sciences-
12.3 The Demonstration and Characterization of In-situ SiNx/AlGaN/GaN HEMT on 6-inch Silicon on Insulator (SOI) Substrate
Hao-Yu Wang, Institute of Semiconductors, Chinese Academy of Sciences; University of Chinese Academy of SciencesLi-Yi Peng, Chang Gung UniversityHsiang-Chun Wang, Chang Gung UniversityYuan-Hsiang Cheng
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Wang, Hou-Yu
Chang Gung University-
12.4 Investigation of InAlN/GaN Schottky Barrier Diode (SBD) on 6-inch SOI substrate
Li-Yi Peng, Chang Gung UniversityHsiang-Chun Wang, Chang Gung UniversityHou-Yu Wang, Chang Gung UniversityJen-Inn Chyi, National Central University
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Wang, Hsiang-Chun
Chang Gung University-
12.3 The Demonstration and Characterization of In-situ SiNx/AlGaN/GaN HEMT on 6-inch Silicon on Insulator (SOI) Substrate
Hao-Yu Wang, Institute of Semiconductors, Chinese Academy of Sciences; University of Chinese Academy of SciencesLi-Yi Peng, Chang Gung UniversityHsiang-Chun Wang, Chang Gung UniversityYuan-Hsiang Cheng -
12.4 Investigation of InAlN/GaN Schottky Barrier Diode (SBD) on 6-inch SOI substrate
Li-Yi Peng, Chang Gung UniversityHsiang-Chun Wang, Chang Gung UniversityHou-Yu Wang, Chang Gung UniversityJen-Inn Chyi, National Central University
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Wang, Junxi
Institute of Semiconductor, Chinese Academy of Sciences, Beijing-
12.7 Improvement of Light Extraction Efficiency of AlGaN-based Deep-ultraviolet Light Emitting Diodes
Yanan Guo, Institute of Semiconductors, Chinese Academy of Sciences; University of Chinese Academy of SciencesYun Zhang, Institute of Semiconductors, Chinese Academy of Sciences, BeijingJianchang Yan, Institute of Semiconductors, Chinese Academy of Sciences; University of Chinese Academy of SciencesXiang Chen, Institute of Semiconductors, Chinese Academy of Sciences; University of Chinese Academy of SciencesTongbo WeiJunxi Wang, Institute of Semiconductor, Chinese Academy of Sciences, BeijingJinmin Li, NAURA Technology Group Co., Ltd.
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WANG, Sizhen
North Carolina State University-
5b.4 GaN PN Junction Diode Based on Heated Magnesium Implantation And High Temperature Annealing
Sizhen WANG, North Carolina State UniversityIn Hwan JI, North Carolina State UniversityAlex Huang, North Carolina State University
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Wang, Xiaolei
Institute of Microelectronics, Chinese Academy of Sciences, Beijing 100029, China-
12.5 Investigation of Thermal Stability of TiN/O3-Al2O3/GaN Metal-Oxide-Semiconductor Diodes with 2 nm H2O-Al2O3 as Oxide/III-Nitride Interfacial Layer
Sen Huang*, Student Presentation , Hong Kong University of Science and Technology, Institute of Microelectronics Chinese Academy of ScienceQilong Bao, Institute of Microelectronics, Chinese Academy of Sciences, Beijing 100029, ChinaXinghua Wang, Institute of Microelectronics, Chinese Academy of Sciences, Beijing 100029, ChinaKe Wei, Institute of Microelectronics, Chinese Academy of SciencesXiaolei Wang, Institute of Microelectronics, Chinese Academy of Sciences, Beijing 100029, ChinaShiping Guo, IQE RF LLCJunfeng Li, Chinese Academy of SciencesXinyu Liu, Institute of Microelectronics, Chinese Academy of SciencesChao Zhao, Chinese Academy of SciencesJinjuan XiangShumin ChaiYankui Li
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Wang, Xinghua
Institute of Microelectronics, Chinese Academy of Sciences, Beijing 100029, China-
12.5 Investigation of Thermal Stability of TiN/O3-Al2O3/GaN Metal-Oxide-Semiconductor Diodes with 2 nm H2O-Al2O3 as Oxide/III-Nitride Interfacial Layer
Sen Huang*, Student Presentation , Hong Kong University of Science and Technology, Institute of Microelectronics Chinese Academy of ScienceQilong Bao, Institute of Microelectronics, Chinese Academy of Sciences, Beijing 100029, ChinaXinghua Wang, Institute of Microelectronics, Chinese Academy of Sciences, Beijing 100029, ChinaKe Wei, Institute of Microelectronics, Chinese Academy of SciencesXiaolei Wang, Institute of Microelectronics, Chinese Academy of Sciences, Beijing 100029, ChinaShiping Guo, IQE RF LLCJunfeng Li, Chinese Academy of SciencesXinyu Liu, Institute of Microelectronics, Chinese Academy of SciencesChao Zhao, Chinese Academy of SciencesJinjuan XiangShumin ChaiYankui Li
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Wang, Yiping
Qorvo Inc.-
7b.2 Fabrication Process Induced ESD Damage of MIM Capacitors on a 0.15um pHEMT Process
Robert Waco, Qorvo Inc.Rose Emergo, Qorvo, Inc.Steve Brockett, Qorvo, Inc.Tertius RiversYiping Wang, Qorvo Inc.
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Wang, Yu
Qorvo, Inc-
7b.1 Automated Optical Inspection (AOI) For Quality Improvement
Yu Wang, Qorvo, IncTom Cheng, QorvoCrystal Chueng, QorvoPatrick Carroll, Qorvo, IncZach Reitmeier, Qorvo, Inc
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Wang, Yu-Chi
WIN Semiconductors Corp-
4.3 The Study of InGaP/GaAs HBT for Ruggedness Characteristics
Ju-Hsien Lin, WIN Semiconductors Corp.Rei-Bin Chiou, WIN Semiconductors Corp.Jung-Hao Hsu, WIN Semiconductors Corp.Shu-Hsiao Tsai, WIN Semiconductors CorpChia-Ta Chang, WIN Semiconductors Corp.Chang-Ho Li, WIN Semiconductors Corp.Tung-Yao Chou, WIN Semiconductors Corp.Cheng-Kuo Lin, WIN Semiconductors CorpDennis Williams, WIN Semiconductors CorpYu-Chi Wang, WIN Semiconductors Corp
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Watanabe, Monte
Northrop Grumman Aerospace Systems-
7a.4 GaN MMIC Impingement Jet Cooled Embedded Diamond
V, Gambin, Northrop-Grumman (AS), Redondo Beach, CABenjamin PoustDino Ferizovic, Northrop Grumman Aerospace SystemsMonte Watanabe, Northrop Grumman Aerospace SystemsGary Mandrusiak, GE Global ResearchThomas Dusseault
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Weaver, Bradley
U.S. Naval Research Laboratory-
11.2 Effect of Surface Passivation on Current Collapse of Proton-Irradiated AlGaN/GaN HEMTs
Andrew Koehler, U. S. Naval Research LaboratoryMarko Tadjer, U.S. Naval Research LaboratoryBradley Weaver, U.S. Naval Research LaboratoryJordan Greenlee, NRC Postdoctoral Fellow Residing at the Naval Research LaboratoryDavid Shahin, University of MarylandKarl D. Hobart, U.S. Naval Research LaboratoryFrancis Kub, U.S. Naval Research Laboratory
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Wei, Ke
Institute of Microelectronics, Chinese Academy of Sciences-
12.5 Investigation of Thermal Stability of TiN/O3-Al2O3/GaN Metal-Oxide-Semiconductor Diodes with 2 nm H2O-Al2O3 as Oxide/III-Nitride Interfacial Layer
Sen Huang*, Student Presentation , Hong Kong University of Science and Technology, Institute of Microelectronics Chinese Academy of ScienceQilong Bao, Institute of Microelectronics, Chinese Academy of Sciences, Beijing 100029, ChinaXinghua Wang, Institute of Microelectronics, Chinese Academy of Sciences, Beijing 100029, ChinaKe Wei, Institute of Microelectronics, Chinese Academy of SciencesXiaolei Wang, Institute of Microelectronics, Chinese Academy of Sciences, Beijing 100029, ChinaShiping Guo, IQE RF LLCJunfeng Li, Chinese Academy of SciencesXinyu Liu, Institute of Microelectronics, Chinese Academy of SciencesChao Zhao, Chinese Academy of SciencesJinjuan XiangShumin ChaiYankui Li
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Wei, Tongbo
-
12.7 Improvement of Light Extraction Efficiency of AlGaN-based Deep-ultraviolet Light Emitting Diodes
Yanan Guo, Institute of Semiconductors, Chinese Academy of Sciences; University of Chinese Academy of SciencesYun Zhang, Institute of Semiconductors, Chinese Academy of Sciences, BeijingJianchang Yan, Institute of Semiconductors, Chinese Academy of Sciences; University of Chinese Academy of SciencesXiang Chen, Institute of Semiconductors, Chinese Academy of Sciences; University of Chinese Academy of SciencesTongbo WeiJunxi Wang, Institute of Semiconductor, Chinese Academy of Sciences, BeijingJinmin Li, NAURA Technology Group Co., Ltd.
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Weng, Chang'e
Qorvo-
10a.1 Uniformity Improvement and Defect Reduction of NiCr Thin Film Resistor
Chang’e Weng, QorvoJinhong Yang, QorvoRonald Herring, QorvoDon Hamilton, QorvoKaushik Vaidyanathan, Qorvo Inc.Brian Zevenbergen, Qorvo, Inc.Fred Pool, QorvoJeremy Middleton*, TriQuint Semiconductor, Inc.
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Wheeler, Virginia
U.S. Naval Research Laboratory-
8a.3 Epitaxial Lift-off and Transfer of III-N Materials and Devices from SiC
David Meyer, US Naval Research LaboratoryBrian Downey, US Naval Research LaboratoryD. Scott Katzer, U.S. Naval Research LaboratoryNeeraj Nepal, US Naval Research LaboratoryVirginia Wheeler, U.S. Naval Research LaboratoryDavid Storm, US Naval Research LaboratoryMatthew Hardy, US Naval Research Laboratory -
10b.4 Reliability Assessment of Thermally-Stable Gate Materials for AlGaN/GaN HEMTs
David Shahin, University of MarylandJordan Greenlee, NRC Postdoctoral Fellow Residing at the Naval Research LaboratoryAndrew Koehler, U. S. Naval Research LaboratoryVirginia Wheeler, U.S. Naval Research LaboratoryMarko Tadjer, U.S. Naval Research LaboratoryTatyana Feygelson, U. S. Naval Research LaboratoryBradford Pate, Naval Research LaboratoryJennifer Hite, U.S. Naval Research LaboratoryKarl D. Hobart, U.S. Naval Research LaboratoryCharles Eddy, US Naval Research LaboratoryJr., Naval Research LaboratoryFrancis Kub, U.S. Naval Research LaboratoryAris Christou, University of Maryland-College Park
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Williams, Dennis
WIN Semiconductors Corp-
4.3 The Study of InGaP/GaAs HBT for Ruggedness Characteristics
Ju-Hsien Lin, WIN Semiconductors Corp.Rei-Bin Chiou, WIN Semiconductors Corp.Jung-Hao Hsu, WIN Semiconductors Corp.Shu-Hsiao Tsai, WIN Semiconductors CorpChia-Ta Chang, WIN Semiconductors Corp.Chang-Ho Li, WIN Semiconductors Corp.Tung-Yao Chou, WIN Semiconductors Corp.Cheng-Kuo Lin, WIN Semiconductors CorpDennis Williams, WIN Semiconductors CorpYu-Chi Wang, WIN Semiconductors Corp
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Winoto, Ardy
University of Illinois at Urbana Champaign-
10a.2 Nonalloyed Refractory Metals for Self-Aligned InP HBT Emitter Contacts with InAs/InGaAs Emitter Cap
Ardy Winoto, University of Illinois at Urbana ChampaignJunyi Qiu, University of Illinois at Urbana-ChampaignMilton Feng, University of Illinois Urbana-Champaign
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Worsley, Pam
Qorvo, Inc-
7b.4 Using Six-Sigma Methodology to Reduce Metal-Insulator-Metal Capacitance Density Variance
Jing Yao, Qorvo, IncLou Pagentine, Qorovo, IncDan Groft, Qorvo, IncPam Worsley, Qorvo, IncZach Reitmeier, Qorvo, IncPatrick Carroll, Qorvo, Inc
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Xiang, Jinjuan
-
12.5 Investigation of Thermal Stability of TiN/O3-Al2O3/GaN Metal-Oxide-Semiconductor Diodes with 2 nm H2O-Al2O3 as Oxide/III-Nitride Interfacial Layer
Sen Huang*, Student Presentation , Hong Kong University of Science and Technology, Institute of Microelectronics Chinese Academy of ScienceQilong Bao, Institute of Microelectronics, Chinese Academy of Sciences, Beijing 100029, ChinaXinghua Wang, Institute of Microelectronics, Chinese Academy of Sciences, Beijing 100029, ChinaKe Wei, Institute of Microelectronics, Chinese Academy of SciencesXiaolei Wang, Institute of Microelectronics, Chinese Academy of Sciences, Beijing 100029, ChinaShiping Guo, IQE RF LLCJunfeng Li, Chinese Academy of SciencesXinyu Liu, Institute of Microelectronics, Chinese Academy of SciencesChao Zhao, Chinese Academy of SciencesJinjuan XiangShumin ChaiYankui Li
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Yabuhara, Yoshiki
Sumitomo Electric Industries, Ltd, Itami-
5b.1 Crystal growth and wafer processing of Indium Phosphide 6″ substrate
Tomonori Morishita, Sumiden Semiconductor Materials Co., Ltd., Sumitomo Electric Industries, LtdKazuaki Kounoike, Sumiden Semiconductor Materials Co., Ltd.Shinya Fujiwara, Sumiden Semiconductor Materials Co., Ltd.Yoshiaki Hagi, Sumiden Semiconductor Materials Co., Ltd., Sumitomo Electric Industries, Ltd, ItamiYoshiki Yabuhara, Sumitomo Electric Industries, Ltd, Itami
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Yamamoto, Masayoshi
Nagoya University-
8b.1 Benefits and Requirements of Using SiC and/or GaN Power Switching Devices for “Real” Power Control Systems
Masayoshi Yamamoto, Nagoya University
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Yan, Jianchang
Institute of Semiconductors, Chinese Academy of Sciences; University of Chinese Academy of Sciences-
12.7 Improvement of Light Extraction Efficiency of AlGaN-based Deep-ultraviolet Light Emitting Diodes
Yanan Guo, Institute of Semiconductors, Chinese Academy of Sciences; University of Chinese Academy of SciencesYun Zhang, Institute of Semiconductors, Chinese Academy of Sciences, BeijingJianchang Yan, Institute of Semiconductors, Chinese Academy of Sciences; University of Chinese Academy of SciencesXiang Chen, Institute of Semiconductors, Chinese Academy of Sciences; University of Chinese Academy of SciencesTongbo WeiJunxi Wang, Institute of Semiconductor, Chinese Academy of Sciences, BeijingJinmin Li, NAURA Technology Group Co., Ltd.
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Yang, Jinhong
Qorvo-
10a.1 Uniformity Improvement and Defect Reduction of NiCr Thin Film Resistor
Chang’e Weng, QorvoJinhong Yang, QorvoRonald Herring, QorvoDon Hamilton, QorvoKaushik Vaidyanathan, Qorvo Inc.Brian Zevenbergen, Qorvo, Inc.Fred Pool, QorvoJeremy Middleton*, TriQuint Semiconductor, Inc.
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Yang, Yinbao
Qorvo, Inc.-
6a.4 Ablation Laser Dicing for GaN HEMT Device on 100um SiC/Au Substrates
Vivian Li, Qorvo Inc.Wade Skelton, Qorvo Inc.Yinbao Yang, Qorvo, Inc.Andrew Ketterson, Qorvo Inc.Michael Lube, QorvoHarold Isom, QorvoCathy Lee, Qorvo Inc.Rob Kraft, Qorvo Inc.
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Yao, Jing
Qorvo, Inc-
7b.4 Using Six-Sigma Methodology to Reduce Metal-Insulator-Metal Capacitance Density Variance
Jing Yao, Qorvo, IncLou Pagentine, Qorovo, IncDan Groft, Qorvo, IncPam Worsley, Qorvo, IncZach Reitmeier, Qorvo, IncPatrick Carroll, Qorvo, Inc
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Yoshida, Takehiro
Sciocs Company Limited-
10b.3 Mechanism of Initial Failures in Breakdown Voltage of GaN-on-GaN Power Switching p-n Diodes
Fumimasa Horikiri, Sciocs Company LimitedYoshinobu Narita, Sciocs Company LimitedTakehiro Yoshida, Sciocs Company LimitedHiroshi Ohta, Osaka UniversityTomoyoshi Mishima, Osaka UniversityTohru Nakamura, Hosei University
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Yoshida, W
Northrop Grumman (AS), Redondo Beach, CA, USA-
4.4 A Terahertz Capable 25 nm InP HEMT MMIC Process
William Deal, Northrop Grumman CorporationW Yoshida, Northrop Grumman (AS), Redondo Beach, CA, USAXiao Bing Mei, Northrop Grumman CorporationM Lange, Northrop Grumman CorporationZ Zhou, Northrop Grumman CorporationJ Lee, Northrop Grumman CorporationP H Liu, Northrop Grumman CorporationK Leong, Northrop Grumman Corporation
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Yota, Jiro
-
4.1 Challenges for Establishing a High Volume, High Yielding BiHEMT Manufacturing Process
Jiang Li, Skyworks Solutions, Inc.Tom Brown, Skyworks Solutions, Inc.Mehran Janani, Skyworks Solutions, Inc.Jiro YotaCristian Cismaru, Skyworks Solutions, Inc.Manjeet Singh, Skyworks Solutions, Inc.Mike Sun, Skyworks Solutions, Inc.Ravi Ramanathan -
5a.1 A Method for Yield and Scaling Characterization of FET Structures in an InGaP/GaAs Merged HBT-FET (BiFET) Technology
Andre MetzgerJiang Li, Skyworks Solutions, Inc.Mike Sun, Skyworks Solutions, Inc.Ravi RamanathanCristian Cismaru, Skyworks Solutions, Inc.Jiro Yota
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Yu, Kun
Xi’an Jiaotong University-
11.3 Investigation of the Interface Traps and Current Collapse in LPCVD SiNx/AlGaN/GaN MISHEMTs
Kun Yu, Xi’an Jiaotong UniversityChao Liu, Hong Kong University of Science and TechnologyHuaxing Jiang, Hong Kong University of Science and TechnologyXing Lu, Hong Kong University of Science and TechnologyKei May Lau, Hong Kong University of Science and TechnologyAnping Zhang, Xi'an Jiaotong University
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Zampardi, Peter
Qorvo Inc.-
5a.2 Accurate Prediction of Resistor Variation using Minimum Sized Five Resistor TLM
Dheeraj Mohata, Global Communication Semiconductors, LLCCrystal Chueng, QorvoBrian Moser, Qorvo, Inc.Peter Zampardi, Qorvo Inc.
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Zevenbergen, Brian
Qorvo, Inc.-
10a.1 Uniformity Improvement and Defect Reduction of NiCr Thin Film Resistor
Chang’e Weng, QorvoJinhong Yang, QorvoRonald Herring, QorvoDon Hamilton, QorvoKaushik Vaidyanathan, Qorvo Inc.Brian Zevenbergen, Qorvo, Inc.Fred Pool, QorvoJeremy Middleton*, TriQuint Semiconductor, Inc.
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Zhang, Anping
Xi'an Jiaotong University-
11.3 Investigation of the Interface Traps and Current Collapse in LPCVD SiNx/AlGaN/GaN MISHEMTs
Kun Yu, Xi’an Jiaotong UniversityChao Liu, Hong Kong University of Science and TechnologyHuaxing Jiang, Hong Kong University of Science and TechnologyXing Lu, Hong Kong University of Science and TechnologyKei May Lau, Hong Kong University of Science and TechnologyAnping Zhang, Xi'an Jiaotong University
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Zhang, Baoshun
Suzhou Institute of Nano-Tech and Nano-Bionics, Chinese Academy of Science-
9.3 Compatibility of AlN/SiNx Passivation Technique with High-Temperature Process
Mengyuan Hua, The Hong Kong University of Science and TechnologyYunyou Lu, The Hong Kong University of Science and TechnologyShenghou Liu, Xiamen San'an Integrated Circuit Co., Ltd.Cheng Liu, Xiamen San'an Integrated Circuit Co., Ltd.Kai Fu, Suzhou Institute of Nano-Tech and Nano-Bionics, Chinese Academy of ScienceYong Cai, Suzhou Institute of Nano-Tech and Nano-Bionics, Chinese Academy of ScienceBaoshun Zhang, Suzhou Institute of Nano-Tech and Nano-Bionics, Chinese Academy of ScienceKevin J. Chen, The Hong Kong University of Science and Technology
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Zhang, Yan
MACOM Technology Solutions, Inc-
9.4 Simulation of Fabrication- and Operation-Induced Mechanical Stress in AlGaN/GaN Transistors
Sameer Joglekar, Massachusetts Institute of TechnologyChuanxin Lian, MACOM Technology Solutions Inc.Rajesh Baskaran, MACOM Technology Solutions Inc.Yan Zhang, MACOM Technology Solutions, IncAllen Hanson, MACOM Technology Solutions Inc.
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Zhang, Yun
Institute of Semiconductors, Chinese Academy of Sciences, Beijing-
12.7 Improvement of Light Extraction Efficiency of AlGaN-based Deep-ultraviolet Light Emitting Diodes
Yanan Guo, Institute of Semiconductors, Chinese Academy of Sciences; University of Chinese Academy of SciencesYun Zhang, Institute of Semiconductors, Chinese Academy of Sciences, BeijingJianchang Yan, Institute of Semiconductors, Chinese Academy of Sciences; University of Chinese Academy of SciencesXiang Chen, Institute of Semiconductors, Chinese Academy of Sciences; University of Chinese Academy of SciencesTongbo WeiJunxi Wang, Institute of Semiconductor, Chinese Academy of Sciences, BeijingJinmin Li, NAURA Technology Group Co., Ltd.
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Zhao, Chao
Chinese Academy of Sciences-
12.5 Investigation of Thermal Stability of TiN/O3-Al2O3/GaN Metal-Oxide-Semiconductor Diodes with 2 nm H2O-Al2O3 as Oxide/III-Nitride Interfacial Layer
Sen Huang*, Student Presentation , Hong Kong University of Science and Technology, Institute of Microelectronics Chinese Academy of ScienceQilong Bao, Institute of Microelectronics, Chinese Academy of Sciences, Beijing 100029, ChinaXinghua Wang, Institute of Microelectronics, Chinese Academy of Sciences, Beijing 100029, ChinaKe Wei, Institute of Microelectronics, Chinese Academy of SciencesXiaolei Wang, Institute of Microelectronics, Chinese Academy of Sciences, Beijing 100029, ChinaShiping Guo, IQE RF LLCJunfeng Li, Chinese Academy of SciencesXinyu Liu, Institute of Microelectronics, Chinese Academy of SciencesChao Zhao, Chinese Academy of SciencesJinjuan XiangShumin ChaiYankui Li
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Zhou, Z
Northrop Grumman Corporation-
4.4 A Terahertz Capable 25 nm InP HEMT MMIC Process
William Deal, Northrop Grumman CorporationW Yoshida, Northrop Grumman (AS), Redondo Beach, CA, USAXiao Bing Mei, Northrop Grumman CorporationM Lange, Northrop Grumman CorporationZ Zhou, Northrop Grumman CorporationJ Lee, Northrop Grumman CorporationP H Liu, Northrop Grumman CorporationK Leong, Northrop Grumman Corporation
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Zhu, Junhao
-
10b.2 Recovery in dc Performance of Off-State Step-Stressed AlGaN/GaN High Electron Mobility Transistor with Thermal Annealing
Byungjae Kim, University of FloridaShihyun Ahn, University of FloridaFan Ren, University of FloridaStephen Pearton, University of FloridaDavid Smith, Arizona State UniversityTsung-Sheng Kang, University of FloridaJunhao Zhu
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Ziglar, Randi
Qorvo-
6b.5 Outlier Labeling Method for Univariate Data for Module Test and Die Sort
Thorsten SaegerBrian Kleven, QorvoIngrid Otero, QorvoMichelle Wallace, QorvoRandi Ziglar, Qorvo
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