May 12, 2022 // 3:20pm

18.6 Chemical Mechanical Polishing of β-Ga2O3

M.S. Goorsky, University of California, Los Angeles
M. E. Liao, University of California, Los Angeles, CA USA
K. Huynh, University of California, Los Angeles
W. Olsen, University of California, Los Angeles, CA USA
X. Huang, Argonne National Laboratory
M. Wojcik, Argonne National Laboratory
J. C. Gallagher, U.S. Naval Research Laboratory
Y. Wang, University of California, Los Angeles, CA USA

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Abstract

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