Marcus King
TriQuint Semiconductor, TX
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Improved T-Gate Yield Using E-Beam Trilayer Resist Process
Huatang Chen, TriQuint Semiconductor, TXAndrew Ketterson, Qorvo Inc.Marcus King, TriQuint Semiconductor, TXKeith Salzman, TriQuint Semiconductor, TXVicki Milam, TriQuint Semiconductor, TXJames Halvorson, TriQuint Semiconductor, TXJan Campbell -
Set up and Characterization of an Optical Wide Stepper Process For DR15 Technology as a replacement for E-Beam Lithography
Amy Zhou, TriQuint Semiconductor, TXJerry Beene, TriQuint Semiconductor,TXMarcus King, TriQuint Semiconductor, TXMing-Yih Kao, Qorvo, Inc.Hua-Tang Chen, Qorvo, Inc.Chris Puckett, TriQuint Semiconductor