Wen-Kai Wang

WIN Semiconductors Corp.

  • Yield Enhancement of 0.25 μm GaN HEMT Foundry Technology

    Wei-Chou Wang, WIN Semiconductors Corp.
    Jhih-Han Du, WIN Semiconductors Corp
    Ming-Hung Weng, I-Te Cho, Walter Wohlmuth WIN Semiconductors Corp.
    Cheng-Wen Peng, WIN Semiconductors Corp.
    Wen-Kai Wang, WIN Semiconductors Corp.
    Walter Wohlmuth, Vanguard International Semiconductor Corporation, Taiwan
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  • Development and Control of a 0.25μm Gate Process Module for AlGaN/GaN HEMT Production

    Wei-Chou Wang, WIN Semiconductors Corp.
    Chia-Hao Chen, WIN Semiconductors Corp
    Jhih-Han Du, WIN Semiconductors Corp
    Ming-Hung Weng, I-Te Cho, Walter Wohlmuth WIN Semiconductors Corp.
    Willie Huang
    Ricky Chang, I-Te Cho, Walter Wohlmuth WIN Semiconductors Corp.
    Shih-Hui Huang, WIN Semiconductors Corp
    Yi-Feng Wei, I-Te Cho, Walter Wohlmuth WIN Semiconductors Corp.
    Stanley Hsieh, I-Te Cho, Walter Wohlmuth WIN Semiconductors Corp.
    Michael Casbon
    Paul J. Tasker
    Wen-Kai Wang, WIN Semiconductors Corp.
    I-Te Cho, WIN Semiconductors Corp.
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  • To Improve E-beam T-gate Yield by Pre-Cleaning Process

    Hao-Yu Ting, WIN Semiconductors Corp.
    John Huang, WIN Semiconductors Corp.
    Hsi-Tsung Lin, WIN Semiconductors Corp.
    Eric Kuo, WIN Semiconductors Corp.
    Se-Jung Lee, WIN Semiconductors Corp.
    David Wu, WIN Semiconductors Corp
    William Lai, WIN Semiconductors Corp.
    Kerry Chang, WIN Semiconductors Corp.
    Wen-Kai Wang, WIN Semiconductors Corp.