11.1.1.2024 Developments in GaAs Photolithography Processing for Improved HBT Base Metal Patterning and Reduced Photoresist Popping and Tearing

A. Molina, Northrop Grumman Mission Systems

B. Grisafe, Northrop Grumman Mission Systems

M. Broda, Northrop Grumman Mission Systems

H. K. Nguyen, Northrop Grumman Mission Center

J. S. Mason, Northrop Grumman Mission Systems

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