Richard Barnett - CS MANTECH Conference CS MANTECH Conference

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Richard Barnett

KLA Corporation (SPTS Division)

11.2.2023 High selectivity GaN to AlGaN etching for HEMT devices

Will Worster, Swansea University

Will Worster, KLA Corporation (SPTS Division)

Richard Barnett, KLA Corporation (SPTS Division)

Jih-Wen Chou, PSMC (8” Tech Dev Center)

Robin Chistine Hwang, PSMC (8” Tech Dev Center)

Yen-Ling Chuang, PSMC (Fab 8B)

Jia-Wei Hsu, PSMC (Fab 8B)

11.2 High selectivity GaN to AlGaN etching for HEMT devices (Matt Day – KLA-PSMC) – FINAL