Speakers
Jeehwan Kim
Massachusetts Institute of Technology,
William D. Palmer
Defense Advanced Research Projects Agency
Mark Rosker
Defense Advanced Research Projects Agency
Tsu-Hsi Chang
HetInTec Corp., Rockville, MD
Joseph J. Mauer
MBO Partners, Herndon, VA
Justin Hodiak
MBO Partners, Herndon, VA
Young-Kyun Noh
IVWorks Co., Ltd.,
Hong-Kyun Noh
VWorks Co., Ltd.,
Byung-Guon Park
IVWorks Co., Ltd.,
Seullam Kim
IVWorks Co., Ltd.,
Cheng-Yu Chen
IntelliEpi Inc.,
Tsung-Pei Chin
IntelliEpi Inc.
Wei Li
IntelliEpi Inc.
Yung-Chung Kao
IntelliEpi Inc.
Xiang Liu
Transphorm Inc.,
Brian Romanczyk
Transphorm Inc.
Stacia Keller
Transphorm Inc.
Brian Swenson
Transphorm Inc.
Ron Birkhahn
Transphorm Inc.
Geetak Gupta
Transphorm Inc.
Cheng-Kuo Lin
WIN Semiconductors Corp
M. Wilson
Semilab SDI
Yuan-Hsin Lin
WIN Semiconductors Corp
Chi-Hsiang Kuo
WIN Semiconductors Corp
Cheng-Kuo Lin
WIN Semiconductors Corp
S. Savtchouk
Semilab SDI,
S. Toth
Semilab ZRT
Z. Szekrenyes
Semilab ZRT
L. Badeeb
Semilab ZRT
A. Faragó
Semilab ZRT
Daniel Sommer
United Monolithic Semiconductorss GmBH
Mehdy Neffati
United Monolithic Semiconductorss SAS
Simon Maus
MSG Lithoglas GmbH
Tina Kebede
Qorvo
April Morilon
Qorvo
Jesse Walker
Qorvo
Kris Zimmerman
Qorvo
Lee Tye
Qorvo
John Coudriet
Qorvo
Josh Ochoa
Qorvo
Jeff Moran
Qorvo
Matthew Porter
Qorvo
Kenneth P. Reis
Qorvo
Jia-You Lo
WIN Semiconductors Corporation
, Yang-Hao Chen
WIN Semiconductors Corporation
Jui-Ping Chuang
WIN Semiconductors Corporation
Chun-Jui Chiu
WIN Semiconductors Corporation
Po-Chun Weng
WIN Semiconductors Corporation
Kuo-Hua Chen
WIN Semiconductors Corporation
Elizabeth Werner
KBR
Daniel Brooks
Air Force Research Laboratory
Kyle Liddy
Air Force Research Laboratory
Robert Fitch Jr.
Air Force Research Laboratory
James Gillespie
Air Force Research Laboratory
Dennis Walker Jr.
Air Force Research Laboratory
Antonio Crespo
Air Force Research Laboratory, Sensors Directorate
Daniel M. Dryden
KBR
Andrew Green
Air Force Research Laboratory, Sensors Directorate
Kelson Chabak
Air Force Research Laboratory, Sensors Directorate
Kai C. Herbert
Kwansei Gakuin University
Kazuki Shibata
Kwansei Gakuin University
Joel T. Asubar
University of Fukui
Masaaki Kuzuhara
Kwansei Gakuin University
P. Neudeck
NASA Glenn Research Center
D. Spry
NASA Glenn Research Center
M. Krasowski
NASA Glenn Research Center
L. Chen
2Ohio Aerospace Institute
E. Dogmus
Yole Developpement, France
Ming Chin Chen
Unikorn Semiconductor Corporation
Chia Cheng Liu
Unikorn Semiconductor Corporation
Vladimir Odnoblyudov
Qromis, Inc.
Sangmin Lee
Wavice Inc.,
Byoungchul Jun
Wavice Inc.,
Chulsoon Choi
Wavice Inc.,
Hyeyoung Jung
Wavice Inc.,
Wen-Hsin Wu
WIN Semiconductors Corporation
Yong-Han Lin
WIN Semiconductors Corporation
Che-Kai Lin
WIN Semiconductors Corporation
Wei-Chou Wang
WIN Semiconductors Corporation
Hossein Yazdani
Ferdinand-Braun-Institut,
Joachim Würfl
Ferdinand-Braun-Institut
Hsiang Chun Wang
Chang Gung University,
L. Cao
University of Notre Dame
Z. Zhu
University of Notre Dame
G. Harden
University of Notre Dame
H. Ye
University of Notre Dame
J. Wang
University of Notre Dame
A. Hoffman
University of Notre Dame
P. Fay
University of Notre Dame
Yu-Chun Huang
Chang Gung University,
Hsuan-Ling Kao
Chang Gung University,
Si-Wen Chen
Chang Gung University,
N. Okamoto
Fujitsu Limited and Fujitsu Laboratories Ltd.
A. Takahashi
Fujitsu Limited and Fujitsu Laboratories Ltd
Y. Minoura
Fujitsu Limited and Fujitsu Laboratories Ltd
Y. Kumazaki
Fujitsu Limited and Fujitsu Laboratories Ltd
S. Ozaki
Fujitsu Limited and Fujitsu Laboratories Ltd
J. Kotani
Fujitsu Limited and Fujitsu Laboratories Ltd
T. Ohki
Fujitsu Limited and Fujitsu Laboratories Ltd
N. Kurahash
Fujitsu Limited
M. Sato
Fujitsu Limited
N. Hara
Fujitsu Limited and Fujitsu Laboratories Ltd
K. Watanabe
Fujitsu Limited and Fujitsu Laboratories Ltd
I. Toledo
Gal-El (MMIC)
Y. Gerchman
Gal-El (MMIC)
G. Lerner
Gal-El (MMIC)
M. Vinokorov
Gal-El (MMIC)
Phillip Tyler
Veeco Instruments – Precision Surface Processing
Jonathan Fijal
Veeco Instruments – Precision Surface Processing
Ian Cochran
Veeco Instruments – Precision Surface Processing
John Taddei
Veeco Instruments – Precision Surface Processing
Eric Tucker
Veeco Instruments – MOCVD
Soo Min Lee
Veeco Instruments – MOCVD
Eric Armour
Veeco Instruments – MOCVD
Christine Notarangelo
Veeco Instruments – MOCVD
L. Huynh
Qorvo
F. Pool
Qorvo
T. Henderson
Qorvo
B. Lindstedt
Qorvo
C. Nevers
Qorvo
C. Wang
Qorvo
L. Tarof
ELPHiC
Naoteru Shigekawa
Osaka City University
Jianbo Liang
Osaka City University
Kok Kheong Looi
MAX I.E.G. LLC
Patrick See
MAX I.E.G. LLC
Ding-Yuan Chen
SweGaN AB and Chalmers University of Technology
Kai-Hsin Wen
SweGaN AB and Chalmers University of Technology
Mattias Thorsell
Chalmers University of Technology
Olof Kordina
SweGaN AB
Jr-Tai Chen
SweGaN AB
Niklas Rorsman
Chalmers University of Technology
Jörg Splettstößer
United Monolithic Semiconductors – GmbH
K. Geens
imec,
H. Hahn
AIXTRON SE
H. Liang
imec,
M. Borga
imec
D. Cingu
imec
S. You
imec
M. Marx
AIXTRON SE
R. Oligschlaeger
AIXTRON SE
D. Fahle
AIXTRON SE
M. Heuken
AIXTRON SE
V. Odnoblyudov
Qromis, inc.
O. Aktas
Qromis, Inc.
C. Basceri
Qromis, Inc.
S. Decoutere
imec
Hocine Ziad
ON-Semiconductor
Joanne Carpenter
SPTS Technologies Limited
Scott Haymore
SPTS Technologies Limited
Adrian Thomas
SPTS Technologies Limited
Dr. A. Mazzalai
BU Semiconductor, Evatec AG, Trübbach (SG),
Dr. X. Yao
BU Semiconductor, Evatec AG, Trübbach (SG),
Michael Thomas Welch
MAX I.E.G. LLC