10.1 Comparison of Charge Dissipation Layers and Dose Sensitivity of PMMA Electron Beam Lithography on Transparent Insulating Substrates such as GaN

Anna Hambitzer, ETH-Zurich
A. Olziersky, IBM-Research Zurich
Tamara Saranovac, ETH-Zurich
Colombo Bolognesi, ETH-Zurich
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