10.1 Comparison of Charge Dissipation Layers and Dose Sensitivity of PMMA Electron Beam Lithography on Transparent Insulating Substrates such as GaN - CS MANTECH Conference CS MANTECH Conference

Booth Purchase Information

10.1 Comparison of Charge Dissipation Layers and Dose Sensitivity of PMMA Electron Beam Lithography on Transparent Insulating Substrates such as GaN

Anna Hambitzer, ETH-Zurich

A. Olziersky, IBM-Research Zurich

Tamara Saranovac, ETH-Zurich

Colombo Bolognesi, ETH-Zurich

Download Paper