May 01, 2019 // 2:30pm – 2:50pm

10.3 Fabrication of Gallium Nitride Deep-Trench Structures by Photoelectrochemical Etching

Hiroshi Ohta, Osaka University
Naomi Asai, Hosei University
Takehiro Yoshida, Sciocs Company Limited
Tomoyoshi Mishima, Osaka University
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