11.2.2023 High selectivity GaN to AlGaN etching for HEMT devices

Will Worster, Swansea University
Will Worster, KLA Corporation (SPTS Division)
Richard Barnett, KLA Corporation (SPTS Division)
Jih-Wen Chou, PSMC (8” Tech Dev Center)
Robin Chistine Hwang, PSMC (8” Tech Dev Center)
Yen-Ling Chuang, PSMC (Fab 8B)
Jia-Wei Hsu, PSMC (Fab 8B)

11.2 High selectivity GaN to AlGaN etching for HEMT devices (Matt Day – KLA-PSMC) – FINAL