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20.11 Comparison of Ion-Milling and Ion-Sputtering to Remove Edge Roughness of EBL Defined Emitter Metallization in InP/GaAsSb DHBTs
Wei Quan, ETH-Zurich
Ralf Flueckiger, ETH-Zurich
Maria Alexandrova, ETH-Zurich
Colombo Bolognesi, ETH-Zurich
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