4.1.2.2024 (Invited) Progress in Diamond MOSFET Technologies

N. Tokuda, Kanazawa University

T. Matsumoto, Kanazawa University

X. Zhang, Kanazawa University

K. Sato, Kanazawa University

K. Kobayashi, Kanazawa University

K. Ichikawa, Kanazawa University

K. Hayashi, Kanazawa University

T. Inokuma, Kanazawa University

S. Yamasaki, Kanazawa University

C. E. Nebel, Kanazawa University & Diamond and Carbon Applications

M. Ogura, National Institute of Advanced Industrial Science and Technology

H. Kato, National Institute of Advanced Industrial Science and Technology

T. Makino, National Institute of Advanced Industrial Science and Technology,

D. Takeuchi, National Institute of Advanced Industrial Science and Technology

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