Abstract
Herein, we demonstrate top, bottom, and double-side thermal management strategies for gallium nitride (GaN) high electron mobility transistors (HEMTs). The cooling technologies investigated include GaN/SiC (reference), GaN/diamond (bottom-side), diamond/GaN/SiC (top-side), and diamond/GaN/diamond (double-side). We review processing methods to realize these device structures as well as the intricacies of the fabrication process. From DC output characteristics, the diamond/GaN/diamond HEMTs demonstrate over 0.6 A/mm at VGS = 2 V. From a thermal perspective, the double-side diamond cooling approach enabled operation at DC power densities of ~30 W/mm with a peak temperature rise of ~50 K at the drain-side edge of the gate electrode. Finally, we demonstrate our initial efforts towards diamond encasement of AlGaN/GaN epilayers to further reduce device-level thermal resistance.
