April 30, 2019 // 4:40pm – 5:00pm

5.4 Addressing 0.25 um T-Gate Lithography Defects through Data Driven Fit Model Analysis

Kai Shin, Northrop Grumman Corporation
Brittany Janis, Northrop Grumman Corporation
John Mason, Northrop Grumman Corporation
Gary Hughes, Northrop Grumman Corporation
Christopher Ridpath, Northrop Grumman Corporation
Megan Snook, Northrop Grumman Corporation
Aditya Gupta, Northrop Grumman Corporation
H. George Henry, Northrop Grumman Corporation
David Lawson, Northrop Grumman Corporation
Jim Arnold, Northrop Grumman Corporation
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