6a.3 Reduction of Thin Film Stress-induced Micro-masking by Using Ti/Ni Hard Mask for High Power SiC Transistor Fabrication - CS MANTECH Conference CS MANTECH Conference

6a.3 Reduction of Thin Film Stress-induced Micro-masking by Using Ti/Ni Hard Mask for High Power SiC Transistor Fabrication

Shamima Afroz, Northrop Grumman

Jason Thomen, Northrop Grumman Corporation

James Oliver, Northrop Grumman Corporation

Evan Jones, Wolfspeed | A Cree Company

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