8.1 Real-Time Control of Layer Thickness and Thickness Uniformity for Single Wafer Reactor MOCVD Systems

Sandeep Krishnan, Veeco Instruments Inc.
Michael Chansky, Veeco Instruments Inc.
Daewon Kwon, Veeco Instruments Inc.
Earl Marcelo, Veeco MOCVD Operations
Mandar Deshpande, Veeco Instruments Inc.
Ronald Arif, Veeco Instruments Inc.
Ajit Paranjpe, Veeco Instruments
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