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2024 Advance Program
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8.3 Controlling Impurity-Induced Disordering Via Mask Strain for High-Performance Vertical-Cavity Surface-Emitting Lasers
Patrick Su, University of Illinois at Urbana-Champaign
Thomas O’brien Jr.
Fu-Chen Hsiao, University of Illinois at Urbana-Champaign
John M Dallesasse, University of Illinois at Urbana-Champaign
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