Explore
Our Mission
Board of Directors
Executive Committee
Technical Program Committee
2022 Conference Collage
Sponsors
Exhibitor
Authors
Digests
Contact
Attendee Registration
Attendee Registration OPEN!
Exhibit Hall is sold out
Explore
Our Mission
Board of Directors
Executive Committee
Technical Program Committee
2022 Conference Collage
Sponsors
Exhibitor
Authors
Digests
Contact
Attendee Registration
9.1 0.20um gate length formation technology by using i-line stepper exposure and chemical shrink process
Takahiro Ueno, Mitsubishi Electric Corporation
Download Paper