AlGaN/GaN MOS-HEMTs using RF magnetron Sputtered SiO2 Gate Insulator and Post-Annealing Treatment

Liang Pang, University of Illinois at Urbana-Chamapign
Ogyun Seok, Kumoh National Institute of Technology
Kevin (Kim) Kyekyoon, University of Illinois at Urbana-Chamapign
Download Paper