Atomic Layer Deposition for GaN Power Semiconductors

H.C.M. Knoops, Oxford Instruments Plasma Technology
Y. Huang, Oxford Instruments Plasma Technology
B. Mackenzie, Oxford Instruments Plasma Technology
T. R. Sharp, Oxford Instruments Plasma Technology
C. J. Hodson, Oxford Instruments Plasma Technology
M. Bourke, Oxford Instruments Plasma Technology
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