Electrical Properties of GaN Etched by Low Bias Power Process

Yuichi Minoura, Fujitsu Limited and Fujitsu Laboratories Ltd.
Naoya Okamoto, Fujitsu Limited and Fujitsu Laboratories Ltd.
Toshihiro Ohki, Fujitsu Limited and Fujitsu Laboratories Ltd.
Shiro Ozaki, Fujitsu Limited and Fujitsu Laboratories Ltd.
Kozo Makiyama, Fujitsu Limited and Fujitsu Laboratories Ltd.
Keiji Watanabe, Fujitsu Laboratories Ltd.
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