Fabrication Technology of GaN/AlGaN HEMT Slanted Sidewall Gates Using Thermally Reflowed ZEP Resist and CHF3/SF6 Plasma Etching

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K. Y. Osipov, Ferdinand-Braun-Institut

W. John

N. Kemf, Ferdinand-Braun-Institut

S. A. Chevtchenko, Ferdinand-Braun-Institut

P. Kurpas, Ferdinand-Braun-Institut

M. Matalla

O. Krüger

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