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Explore
Our Mission
Board of Directors
Executive Committee
Technical Program Committee
2022 Conference Collage
Sponsors
Exhibitor
Authors
Digests
Contact
Fabrication Technology of GaN/AlGaN HEMT Slanted Sidewall Gates Using Thermally Reflowed ZEP Resist and CHF3/SF6 Plasma Etching
K. Y. Osipov, Ferdinand-Braun-Institut
W. John
N. Kemf, Ferdinand-Braun-Institut
S. A. Chevtchenko, Ferdinand-Braun-Institut
P. Kurpas, Ferdinand-Braun-Institut
M. Matalla
O. Krüger
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