Fabrication Technology of GaN/AlGaN HEMT Slanted Sidewall Gates Using Thermally Reflowed ZEP Resist and CHF3/SF6 Plasma Etching

K. Y. Osipov, Ferdinand-Braun-Institut
W. John
N. Kemf, Ferdinand-Braun-Institut
S. A. Chevtchenko, Ferdinand-Braun-Institut
P. Kurpas, Ferdinand-Braun-Institut
M. Matalla
O. Krüger
Download Paper