18.9 Optimization in Noble Metal Hard Mask Selectivity in Chlorine-Based Plasma Etch - CS MANTECH Conference CS MANTECH Conference

Abstract Submission Site is LIVE! The first 10 abstracts submitted and accepted will be eligible for a prize drawing.

Submission Link

May 12, 2022 // 3:20pm

18.9 Optimization in Noble Metal Hard Mask Selectivity in Chlorine-Based Plasma Etch

Mohammadsadegh Beheshti, Skyworks Solutions Inc.

Samuel Mony, Skyworks Solutions, Inc.

Jiang Li, Skyworks Solutions, Inc.

Nercy Ebrahimi, Skyworks Solution Inc.

Loading...

Taking too long?

Reload document

|

Open in new tab

Download [434.47 KB]

Download Paper