A. Kumar
Imec
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4.2.1.2024 (Invited) Silicon Meets Compound Semiconductors: Pioneering Wireless Communications
N. Collaert, ImecR. Alcotte, ImecA. Alian, ImecM. Asad, ImecI. Bagal, ImecS. Banerjee, imecG. Boccardi, ImecP. Cardinael, Imec and Université catholique de LouvainI. Comart, imec & Vrije Universiteit BrusselsD. Desset, ImecR. ElKashlan, ImecF. Filice, ImecG. Gramegna, ImecH. Jafarpoorchekab, ImecA. Khaled, ImecA. Kumar, ImecB. Kunert, ImecY. Mols, ImecB. O’Sullivan, ImecS. Park, ImecU. Peralagu, ImecN. Pinho, ImecA. Rathi, ImecA. Sibaja-Hernandez, ImecS. Sinha, ImecD. Smellie, ImecX. Sun, ImecA. Vais, ImecB. Vanhouche, ImecB. Vermeersch, ImecD. Xiao, ImecS. Yadav, ImecD. Yan, ImecH. Yu, ImecY. Zhang, ImecJ. Van Driessche, ImecP. Wambacq, ImecM. Peeters, ImecB. Parvais, imec & Vrije Universiteit Brussels -
4.2.3.2024 A monolithic III-V on Si integration technology utilizing 300mm CMOS platform
G. Boccardi, ImecA. Vais, ImecA. Kumar, ImecS. Yadav, ImecY. Mols, ImecR. Alcotte, ImecL. Witters, ImecJ. De Backer, ImecA. Mingardi, ImecA. Milenin, ImecK. Vandersmissen, ImecN. Heylen, ImecK. Ceulemans, ImecD. Goossens, ImecF. Sebaai, ImecJ-P Soulié, ImecR. Langer, ImecB. Kunert, ImecB. Parvais, imec vzw, Leuven, BelgiumN. Collaert, Imec -
7A.1 – First Demonstration of InP HBTs on InP-on-Si (InPOSi) Substrate: A Cost-Effective and Sustainable III/V-on-Si Technology for Advanced RF Applications
A. Vais, ImecA. Kumar, ImecS. Yadav, ImecG. Boccardi, ImecY. Mols, ImecR. Alcotte, ImecB. Vermeersch, ImecU. Peralagu, Imecc. Roda Neve, SOITECBruno Ghyselen, SOITECB. Parvais, imec vzw, Leuven, BelgiumB. Kunert, ImecN. Collaert, ImecAbstract
In this work, we present the first demonstration of InP HBTs grown and fabricated on an engineered InPOSi substrate. Physical and electrical characterizations were performed to measure its crystal quality and device performance. We show that the performance of devices fabricated on an InPOSi substrate is close to devices fabricated on a native InP substrates making such a technology suitable for advanced RF applications. Fabricated devices show ft/fmax of ~140 GHz/70GHz with BVceo/BVcbo of 3.5 V/5.5 V at an ON current density of 8mA/μm2.
