Abstract
This study reports the melt growth of β-Ga2O3 single crystals using the Optical Floating Zone (OFZ) technique, and defect analysis in these wafers. X-ray diffraction (XRD) rocking curves show a full width at half maximum (FWHM) of 230 arcsec and the chemical mechanical polished surfaces exhibit a low surface roughness of 1.1 nm. Schottky barrier diodes (SBDs) were fabricated on these substrates and deep-level transient spectroscopy (DLTS) measurements were performed to investigate defects within the bandgap. DLTS analysis revealed a dominant single deep-level trap at 0.69 eV below the conduction band, attributed to Fe impurities from the source material used for melt-growth.
A. R. Peaker
The University of Manchester
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8A.3 – Vertical Schottky Barrier Diodes with Optical Floating Zone Growth of β-Ga2O3 Single Crystals and Electrical Defect Study
V. L. Ananthu Vijayan, Anna University, University of BristolV. S. Charan, University of BristolC. A. Dawe, University of BristolV. P. Markevich, The University of ManchesterM. P. Halsall, The University of ManchesterA. R. Peaker, The University of ManchesterS. M. Babu, University of BristolM. Kuball, University of Bristol, Bristol, UK
