Anna Hambitzer

  • May 02, 2019 // 1:50pm – 2:10pm

    16.2 Effects of Electrochemical Etching on InP HEMT Fabrication

    Diego Ruiz, ETH-Zurich
    Anna Hambitzer, ETH-Zurich
    Akshay Arabhavi, ETH-Zurich
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  • 10.1 Comparison of Charge Dissipation Layers and Dose Sensitivity of PMMA Electron Beam Lithography on Transparent Insulating Substrates such as GaN

    Anna Hambitzer, ETH-Zurich
    A. Olziersky, IBM-Research Zurich
    Tamara Saranovac, ETH-Zurich
    Colombo Bolognesi, ETH-Zurich
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