Christopher Ridpath
Northrop Grumman Corporation
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April 30, 2019 // 4:40pm – 5:00pm
5.4 Addressing 0.25 um T-Gate Lithography Defects through Data Driven Fit Model Analysis
Download PaperKai Shin, Northrop Grumman CorporationBrittany Janis, Northrop Grumman CorporationJohn Mason, Northrop Grumman CorporationGary Hughes, Air Force Research Laboratory, Sensors Directorate, Wright-Patterson AFB, OHChristopher Ridpath, Northrop Grumman CorporationMegan Snook, Northrop Grumman CorporationAditya Gupta, Northrop Grumman CorporationH. George Henry, Northrop Grumman CorporationDavid Lawson, Northrop Grumman CorporationJim Arnold, Northrop Grumman Corporation
