Abstract
Herein, we demonstrate top, bottom, and double-side thermal management strategies for gallium nitride (GaN) high electron mobility transistors (HEMTs). The cooling technologies investigated include GaN/SiC (reference), GaN/diamond (bottom-side), diamond/GaN/SiC (top-side), and diamond/GaN/diamond (double-side). We review processing methods to realize these device structures as well as the intricacies of the fabrication process. From DC output characteristics, the diamond/GaN/diamond HEMTs demonstrate over 0.6 A/mm at VGS = 2 V. From a thermal perspective, the double-side diamond cooling approach enabled operation at DC power densities of ~30 W/mm with a peak temperature rise of ~50 K at the drain-side edge of the gate electrode. Finally, we demonstrate our initial efforts towards diamond encasement of AlGaN/GaN epilayers to further reduce device-level thermal resistance.
F. Vasquez
University of Connecticut
-
4B.4 – Double-Side Diamond Cooling of GaN HEMTs and Progress Towards Further Reductions in Junction-to-Package Thermal Resistance
James Spencer Lundh, National Research Council Postdoctoral Fellow, Residing at NRLF. Vasquez, University of ConnecticutA. J. Cruz Arzon, University of ConnecticutT.I. Feygelson, U.S. Naval Research Laboratory, Washington DCAlan Jacobs, U.S. Naval Research LaboratoryAndrew Koehler, U. S. Naval Research LaboratoryB.B. Pate, U.S. Naval Research LaboratoryKarl D. Hobart, U.S. Naval Research LaboratoryTravis J. Anderson, U.S. Naval Research LaboratoryM.A. Mastro, U.S. Naval Research LaboratoryG. Pavlidis, University of ConnecticutD. FrancisM.J. Tadjer, U.S. Naval Research Laboratory
