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H. K. Nguyen
Northrop Grumman Mission Center
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11.1.1.2024 Developments in GaAs Photolithography Processing for Improved HBT Base Metal Patterning and Reduced Photoresist Popping and Tearing
A. Molina, Northrop Grumman Mission SystemsB. Grisafe, Northrop Grumman Mission SystemsM. Broda, Northrop Grumman Mission SystemsH. K. Nguyen, Northrop Grumman Mission CenterJ. S. Mason, Northrop Grumman Mission Systems