Jeffrey LaRoche

Raytheon IDS Microelectronics, Novati Technologies, Inc. IQE

  • Fabrication of GaN MISHEMTs Fabricated From GaN Grown By MOCVD on High Resistance 200mm <111> Si Substrates

    Jeffrey LaRoche, Raytheon IDS Microelectronics, Novati Technologies, Inc. IQE
    Kelly Ip, Raytheon IDS Microelectronics, Novati Technologies, Inc. IQE
    Mark Breen, Raytheon IDS Microelectronics, Novati Technologies, Inc. IQE
    Yu Cao, Raytheon IDS Microelectronics, Novati Technologies, Inc. IQE
    John P. Bettencourt, Raytheon IDS Microelectronics, Novati Technologies, Inc. IQE
    Doug Guenther, Raytheon IDS Microelectronics, Novati Technologies, Inc. IQE
    Gabe Gebara, Raytheon IDS Microelectronics, Novati Technologies, Inc. IQE
    Oleg Laboutin, IQE
    Chien-Fong, Raytheon IDS Microelectronics, Novati Technologies, Inc. IQE
    Tina Trimble, Raytheon IDS Microelectronics, Novati Technologies, Inc. IQE
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  • Performance and Reliability of GaN MISHEMTs and MMICs Fabricated From GaN Grown on High Resistance Si Substrates by Molecular Beam Epitaxy

    Jeffrey LaRoche, Raytheon IDS Microelectronics, Novati Technologies, Inc. IQE
    William Hoke
    David Altman
    James McClymonds
    Paul Alcorn
    Kurt Smith
    Eduardo Chumbes
    Jeff Letaw
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  • 3.4 Towards a Si Foundry Compatible, High Performance, 0.25 um Gate, GaN on Si MMIC Process on High Resistance 200mm Si With a Cu Damascene BEOL

    Jeffrey LaRoche, Raytheon IDS Microelectronics, Novati Technologies, Inc. IQE
    Kelly Ip, Raytheon IDS Microelectronics, Novati Technologies, Inc. IQE
    Theodore Kennedy, Raytheon IDS
    Lovelace Soirez, Novati
    John Bettencourt, Raytheon IDS
    Doug Guenther, Raytheon IDS Microelectronics, Novati Technologies, Inc. IQE
    Gabe Gebara, Raytheon IDS Microelectronics, Novati Technologies, Inc. IQE
    Tina Trimble, Raytheon IDS Microelectronics, Novati Technologies, Inc. IQE
    William Davis
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