Jie Su

Veeco Instruments

  • Influence of MOCVD Growth Conditions on the Two-dimensional Electron Gas in AlGaN/GaN Heterostructures

    Jie Su, Veeco Instruments
    Balakrishnan Krishnan, Papasouliotis, Veeco
    Download Paper

  • MOCVD Growth of AlGaN/GaN Heterostructures on 6 inch Silicon

    Jie Su, Veeco Instruments
    Hongwei Li
    Seungjae Lee
    Balakrishnan Krishnan, Papasouliotis, Veeco
    Dong Lee
    George Papasouliotis
    Download Paper

  • 20.7 Process Condition Optimization for High Throughput and High Efficiency Growth of the AlGaN/GaN HEMT Structure in a Single Wafer Rotating Disc MOCVD Reactor

    Bojan Mitrovic, Veeco MOCVD Operations.
    Randhir Bubber, Veeco Instruments
    Jie Su, Veeco Instruments
    Earl Marcelo, Veeco MOCVD Operations
    Mandar Deshpande, Veeco Instruments Inc.
    Ajit Paranjpe, Veeco Instruments
    Download Paper

  • 7.3 RF GaN/Si HEMT Growth Development Using Single Wafer MOCVD Technology

    Ming Pan, Veeco Instruments
    Soo-Min Lee, Veeco Instruments
    Jie Su, Veeco Instruments
    Eric Tucker, Veeco Instruments
    Randhir Bubber, Veeco Instruments
    Somit Joshi, Veeco Instruments
    Ajit Paranjpe, Veeco Instruments
    Download Paper