John Mason

Northrop Grumman Corporation
  • April 30, 2019 // 4:40pm – 5:00pm

    5.4 Addressing 0.25 um T-Gate Lithography Defects through Data Driven Fit Model Analysis

    Kai Shin, Northrop Grumman Corporation
    Brittany Janis, Northrop Grumman Corporation
    John Mason, Northrop Grumman Corporation
    Gary Hughes, Air Force Research Laboratory, Sensors Directorate, Wright-Patterson AFB, OH
    Christopher Ridpath, Northrop Grumman Corporation
    Megan Snook, Northrop Grumman Corporation
    Aditya Gupta, Northrop Grumman Corporation
    H. George Henry, Northrop Grumman Corporation
    David Lawson, Northrop Grumman Corporation
    Jim Arnold, Northrop Grumman Corporation
    Download Paper
  • 11.1.1.2024 Developments in GaAs Photolithography Processing for Improved HBT Base Metal Patterning and Reduced Photoresist Popping and Tearing

    A. Molina, Northrop Grumman Mission Systems
    B. Grisafe, Northrop Grumman Mission Systems
    M. Broda, Northrop Grumman Mission Systems
    H. K. Nguyen, Northrop Grumman Mission Center
    J.S. Mason, Northrop Grumman Electronic Systems
    Loader Loading...
    EAD Logo Taking too long?

    Reload Reload document
    | Open Open in new tab

    Download [2.21 MB]