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K. Hayashi
Kanazawa University
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4.1.2.2024 (Invited) Progress in Diamond MOSFET Technologies
N. Tokuda, Kanazawa UniversityT. Matsumoto, Kanazawa UniversityX. Zhang, Kanazawa UniversityK. Sato, Kanazawa UniversityK. Kobayashi, Kanazawa UniversityK. Ichikawa, Kanazawa UniversityK. Hayashi, Kanazawa UniversityT. Inokuma, Kanazawa UniversityS. Yamasaki, Kanazawa UniversityC. E. Nebel, Kanazawa University & Diamond and Carbon ApplicationsM. Ogura, National Institute of Advanced Industrial Science and TechnologyH. Kato, National Institute of Advanced Industrial Science and TechnologyT. Makino, National Institute of Advanced Industrial Science and Technology,D. Takeuchi, National Institute of Advanced Industrial Science and Technology