K. Saito

Saga University
  • 12.1 – Impact of P Doping on Properties of ZnCdTe Thin Films Grown by Molecular Beam Epitaxy on GaAs(100) Substrates for Photovoltaic Applications

    E. V. Sule, Saga University
    M. Mustofa, Saga University
    K. Saito, Saga University
    Q. Guo, Saga University
    T. Tanaka, Hitachi Metals

    12.1 Final.2025

    Abstract
    ZnₓCd₁₋ₓTe (ZnCdTe) is a tunable II-VI semiconductor alloy with a direct bandgap energy ranging from 1.44 eV (CdTe) to 2.26 eV (ZnTe), making it a promising candidate for single-junction and tandem solar cells [1]. However, its performance is hindered by deep-level defects, such as cadmium vacancies and interstitials, which reduce carrier concentrations and lifetimes. While shallow-level doping is critical for optimizing conductivity, it remains underexplored in ZnCdTe[2]. This study investigates phosphorus (P) doping in ZnCdTe thin films grown on GaAs(100) substrates via molecular beam epitaxy (MBE), using Zn₃P₂ as the P source. By systematically varying the Zn₃P₂ flux, we examine the structural, optical, and electrical properties of P-doped ZnCdTe. The X-ray diffraction (XRD) reveals controlled Zn incorporation, while photoluminescence (PL) spectroscopy demonstrates bandgap tuning and defect mitigation.