The etching of uniform, repeatable GaAs/AlGaAs mesas is an important step in manufacturing VCSELs. This paper presents a high uniformity, low foot etching of mesa structures on 6” wafers. The improved uniformity permits the use of production-friendly optical endpoint techniques which can be used to stop on a specific layer in the VCSEL structure.
Oxford Instruments Plasma Technology
High Uniformity Etching of GaAs/AlGaAs VCSEL MesaLigang Deng, Oxford Instruments Plasma TechnologyKatie Hore, Oxford Instruments Plasma TechnologyNing Zhang, Oxford Instruments Plasma TechnologyStephanie Baclet, Oxford Instruments Plasma TechnologyDownload Paper
May 11, 2022 // 3:00pm
9.4 Etching of GaAs/AlGaAs VCSEL Mesa for High Volume Production