Katie Hore

Oxford Instruments Plasma Technology
  • High Uniformity Etching of GaAs/AlGaAs VCSEL Mesa

    Ligang Deng, Oxford Instruments Plasma Technology
    Katie Hore, Oxford Instruments Plasma Technology
    Ning Zhang, Oxford Instruments Plasma Technology
    Stephanie Baclet, Oxford Instruments Plasma Technology

    The etching of uniform, repeatable GaAs/AlGaAs mesas is an important step in manufacturing VCSELs. This paper presents a high uniformity, low foot etching of mesa structures on 6” wafers. The improved uniformity permits the use of production-friendly optical endpoint techniques which can be used to stop on a specific layer in the VCSEL structure.

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