Kenneth D. Mackenzie
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Recent Developments in Real-Time Thickness Control of Plasma Deposited Thin Film Dielectrics Using Optical Emission Interferometry
Kenneth D. MackenzieDavid J. JohnsonChristopher W. Johnson -
High Throughput Stress-Controlled Silicon Nitride Deposition For Compound Semiconductor Device Manufacturing
Kenneth D. MackenzieRohit Khanna, Plasma-Therm LLC