Mandar Deshpande

Veeco Instruments Inc.

  • 8.1 Real-Time Control of Layer Thickness and Thickness Uniformity for Single Wafer Reactor MOCVD Systems

    Sandeep Krishnan, Veeco Instruments Inc.
    Michael Chansky, Veeco Instruments Inc.
    Daewon Kwon, Veeco Instruments Inc.
    Earl Marcelo, Veeco MOCVD Operations
    Mandar Deshpande, Veeco Instruments Inc.
    Ronald Arif, Veeco Instruments Inc.
    Ajit Paranjpe, Veeco Instruments
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  • 20.7 Process Condition Optimization for High Throughput and High Efficiency Growth of the AlGaN/GaN HEMT Structure in a Single Wafer Rotating Disc MOCVD Reactor

    Bojan Mitrovic, Veeco MOCVD Operations.
    Randhir Bubber, Veeco Instruments
    Jie Su, Veeco Instruments
    Earl Marcelo, Veeco MOCVD Operations
    Mandar Deshpande, Veeco Instruments Inc.
    Ajit Paranjpe, Veeco Instruments
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