Naomi Asai

Hosei University
  • May 01, 2019 // 2:30pm – 2:50pm

    10.3 Fabrication of Gallium Nitride Deep-Trench Structures by Photoelectrochemical Etching

    Hiroshi Ohta, Hosei University
    Naomi Asai, Hosei University
    Takehiro Yoshida, Sciocs Company Limited
    Tomoyoshi Mishima, Hosei University
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