The etching of uniform, repeatable GaAs/AlGaAs mesas is an important step in manufacturing VCSELs. This paper presents a high uniformity, low foot etching of mesa structures on 6” wafers. The improved uniformity permits the use of production-friendly optical endpoint techniques which can be used to stop on a specific layer in the VCSEL structure.
Ning Zhang
Oxford Instruments Plasma Technology
-
High Uniformity Etching of GaAs/AlGaAs VCSEL Mesa
Ligang Deng, Oxford Instruments Plasma TechnologyKatie Hore, Oxford Instruments Plasma TechnologyNing Zhang, Oxford Instruments Plasma TechnologyStephanie Baclet, Oxford Instruments Plasma TechnologyDownload Paper -
May 11, 2022 // 3:00pm
9.4 Etching of GaAs/AlGaAs VCSEL Mesa for High Volume Production
Katie Hore, Oxford Instruments Plasma TechnologyNing Zhang, Oxford Instruments Plasma TechnologyStephanie Baclet, Oxford Instruments Plasma TechnologyLigang Deng, Oxford Instruments Plasma TechnologyDavid Hooper, Oxford InstrumentsDownload PaperLoading...