The transistor-injected quantum cascade laser (TI-QCL) is a novel design for a mid-wave infrared (MWIR) laser that seeks to overcome some of the primary limitations of standard quantum cascade lasers (QCLs). By growing the active cascade region within the base-collector junction of an n-p-n heterojunction bipolar transistor (HBT), independent control of the injection current and active region bias is achievable through the emitter current and base-collector reverse bias respectively. The active region bias is important to properly align the lasing states and to control the lasing wavelength. Physical design limitations of the TI-QCL and their effects on the fabrication process of samples is presented. In order to characterize device performance and validate fabrication improvements, InP-based device samples designed for λ = 7.3 µm emission are fabricated. Preliminary characterization results are shown in the form of diode measurements to validate the HBT electrical operation of the TI-QCL which is necessary to realize the optical benefits of the device.
Patrick Su
University of Illinois at Urbana-Champaign
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Design and Fabrication Considerations for Transistor-Injected Quantum Cascade Lasers for Compact, Efficient, and Controllable Mid-Wave Infrared Lasing
John Dallesasse, University of Illinois at Urbana-ChamapignRobert Kaufman, University of Illinois at Urbana-ChampaignPatrick Su, University of Illinois at Urbana-ChampaignFu-Chen Hsiao, North Carolina State UniversityDownload Paper -
8.3 Controlling Impurity-Induced Disordering Via Mask Strain for High-Performance Vertical-Cavity Surface-Emitting Lasers
Patrick Su, University of Illinois at Urbana-ChampaignThomas O’brien Jr.Fu-Chen Hsiao, North Carolina State UniversityJohn M Dallesasse, University of Illinois at Urbana-Champaign -
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John A Carlson, University of Illinois at Urbana-ChampaignPatrick Su, University of Illinois at Urbana-ChampaignJohn M Dallesasse, University of Illinois at Urbana-Champaign -
May 11, 2022 // 3:20pm
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Patrick Su, University of Illinois at Urbana-ChampaignJohn M Dallesasse, University of Illinois at Urbana-ChampaignMark Kraman, University of Illinois Urbana-ChampagneKevin P. Pikul, University of Illinois Urbana-ChampagneDownload PaperStudent Presentation
[embeddoc url=”https://csmantech.org/wp-content/uploads/2023/09/9.5.2022-Impact-of-Diffusion-Mask-Strain-on-Impurity-Induced-Disordered-VCSELs.pdf” download=”all”]
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9.6.2021 Standing Wave Engineering for Mode Control in Single-Mode Oxide-Confined Vertical-Cavity Surface-Emitting Lasers
Kevin P. Pikul, University of Illinois Urbana-ChampagnePatrick Su, University of Illinois at Urbana-ChampaignMark Kraman, University of Illinois Urbana-ChampagneFu-Chen Hsiao, North Carolina State UniversityJohn Dallesasse, University of Illinois at Urbana-ChamapignDownload Paper[embeddoc url=”http://csmantech.org/wp-content/uploads/Digest/Digests-2021/9.6.2021-CS-MANTECH-2021-Final-Pikul.pdf” download=”all” viewer=”google”]
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8.2.3.2024 Polarization Control in Vertical-Cavity Surface-Emitting Lasers via Elliptical Aperture Definition in Optical Coatings
Kevin P. Pikul, University of Illinois Urbana-ChampagneLeah Espenhahn, University of Illinois at Urbana-ChampaignPatrick Su, University of Illinois at Urbana-ChampaignJohn M Dallesasse, University of Illinois at Urbana-Champaign[embeddoc url=”https://csmantech.org/wp-content/uploads/2024/06/8.2.3.2024-Polarization-Control-in-Vertical-Cavity-Surface-Emitting-Lasers-via-Elliptical-.pdf” download=”all”]