Stephanie Chang

Skyworks Solutions Inc.
  • May 10, 2022 // 5:30pm

    5.5 Optimizing Process Conditions for High Uniformity and Stability of Tantalum Nitride Films Stephanie Chang, Shiban Tiku, and Lam Luu-Henderson

    Shiban K. Tiku, Skyworks Solutions, Inc.
    Lam Luu-Henderson, Skyworks Solutions Inc.
    Stephanie Chang, Skyworks Solutions Inc.

    [embeddoc url=”https://csmantech.org/wp-content/uploads/2023/09/5.5.2022-Optimizing-Process-Conditions-for-High-Uniformity-and-Stability.pdf” download=”all”]

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  • 11.1.2.2024 Optimization of Photolithography Process for BiHEMT Gate Layer with High Critical Dimension Uniformity

    Stephanie Y. Chang, Skyworks Solutions, Inc.
    Tom Brown, Skyworks Solutions, Inc.
    Randy Bryie, Skyworks Solutions, Inc.
    Rainier Lee, Skyworks Solutions, Inc.

    [embeddoc url=”https://csmantech.org/wp-content/uploads/2024/06/11.1.2.2024-Optimization-of-Photolithography-Process-for-BiHEMT-Gate-Layer.pdf” download=”all”]