Thaddeus Asel

UES, Air Force Research Laboratory Materials and Manufacturing Directorate, WPAFB, OH 45433
  • Self-Aligned Refractory Metal Gate Scaling in β-Ga2O3 MOSFETs

    Kelson Chabak, Air Force Research Laboratory
    Kyle Liddy, KBR, Air Force Research Laboratory Sensors Directorate, WPAFB, OH 45433
    Andrew Green, Air Force Research Laboratory
    Thaddeus Asel, UES, Air Force Research Laboratory Materials and Manufacturing Directorate, WPAFB, OH 45433
    Shin Mou, Air Force Research Laboratory Materials and Manufacturing Directorate
    Kevin Leedy, AFRL
    Donald Dorsey, Air Force Research Laboratory Materials and Manufacturing Directorate

    This work characterizes the effects of gate-length (LG) scaling in a self-aligned gate (SAG) β-Ga2O3 MOSFET process. Additional performance gains are expected by extending the SAG process from large LG to sub-micrometer dimensions.  This data incorporates LG scaling down to 200 nm to improve device performance in Ga2O3 SAG MOSFETs using a stepper lithography process to define sub-micron gate lengths.

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