Yuichiro Shindo
Matsuda Sangyo Co., Ltd.
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5.4.2023 Gold-Assisted Deposition of a Material with Low Spitting by a New Carbon Removal Process
Taichi Ito, Precious Metals Materials Division, Matsuda Sangyo Co., Ltd.Kiyofumi Kodera, Precious Metals Materials Division, Matsuda Sangyo Co., Ltd.Yuichiro Shindo, Matsuda Sangyo Co., Ltd. -
3.1.2.2024 Electrochemical Additive Selection for Non–Cyanide Gold Plating Bath for Uniform Thickness Gold Layer for GaAs Backside Metallization
Shoei Mizuhashi, Matsuda Sangyo Co., Ltd.Yusuke Sato, Matsuda Sangyo Co., Ltd.Yuichiro Shindo, Matsuda Sangyo Co., Ltd. -
11.1.5.2024 Electron-beam Deposition with Low- Spitting Platinum Source Material Improved by New Impurity Removal Processes
Atsushi Kawashimo, Matsuda Sangyo Co., Ltd.Takahiro Kobayashi, Matsuda Sangyo Co., Ltd.Masatoshi Koyama, Osaka Institute of TechnologyYuichiro Shindo, Matsuda Sangyo Co., Ltd.Loading...
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4B.3 – Heat Resistance Improvement of Palladium Pre Plated Frames of Semiconductor Packaging with a New Additive for Nickel Plating
S. Sekiguchi, Matsuda Sangyo Co., Inc.Shoei Mizuhashi, Matsuda Sangyo Co., Ltd.Yusuke Sato, Matsuda Sangyo Co., Ltd.Taketomo Sato, Hokkaido UniversityYuichiro Shindo, Matsuda Sangyo Co., Ltd.Abstract
We investigated methods for improving the solder wettability of lead frames that connect semiconductor chips to electronic devices. A newly developed Ni plating bath with a Ge additive provided excellent solder wettability to the Ni/Pd/Au protection layer on copper-lead frames, even after heat treatment at 400 °C. It was found that even when the Ni/Pd/Au plating films were heat treated, the diffusion of Cu and Ni was drastically suppressed because the recrystallization of the plated Ni layer was suppressed when the film was deposited with plating chemicals containing Ge.
